JPS61124600A - Formation of frame pattern - Google Patents

Formation of frame pattern

Info

Publication number
JPS61124600A
JPS61124600A JP24685384A JP24685384A JPS61124600A JP S61124600 A JPS61124600 A JP S61124600A JP 24685384 A JP24685384 A JP 24685384A JP 24685384 A JP24685384 A JP 24685384A JP S61124600 A JPS61124600 A JP S61124600A
Authority
JP
Japan
Prior art keywords
foil
thickness
frame pattern
frame
pattern
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP24685384A
Other languages
Japanese (ja)
Other versions
JPH0355556B2 (en
Inventor
Mamoru Onda
護 御田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Cable Ltd
Original Assignee
Hitachi Cable Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Cable Ltd filed Critical Hitachi Cable Ltd
Priority to JP24685384A priority Critical patent/JPS61124600A/en
Publication of JPS61124600A publication Critical patent/JPS61124600A/en
Publication of JPH0355556B2 publication Critical patent/JPH0355556B2/ja
Granted legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/10Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
    • H05K3/20Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern by affixing prefabricated conductor pattern
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/10Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
    • H05K3/20Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern by affixing prefabricated conductor pattern
    • H05K3/202Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern by affixing prefabricated conductor pattern using self-supporting metal foil pattern

Abstract

PURPOSE:To form economically a frame pattern of a metallic frame by printing a reverse pattern to metallic foil and forming a plating layer to the exposed part thereof then removing successively the metallic foil and printing part. CONSTITUTION:The reverse patter of the desired frame pattern is negative- printed on the surface of starting sheet foil 4 made of copper, etc. to <=0.1mm thickness by using resist ink 3. The plating layer 3 is formed to 0.05-0.2mm thickness by electroplating or chemical plating to the exposed part of the foil 4. The sheet 4 is then dissolved away by using an etching soln., etc. The ink 3 is removed by an ultrasonic oscillation method or solvent dipping method in succession thereto. The advantageous formation of the fine frame pattern is made possible by the above-mentioned method.

Description

【発明の詳細な説明】 [産業上の利用分野1 この発明は、金属フレームを製作する際のフレームパタ
ーンの形成方法に関するものである。
DETAILED DESCRIPTION OF THE INVENTION [Industrial Application Field 1] The present invention relates to a method for forming a frame pattern when manufacturing a metal frame.

[従来の技術] 従来、金属フレームを製作する際のフレームパターンの
形成方法としてはプレス打扱き若しくは、エツチングに
よる方法が採られている。
[Prior Art] Conventionally, a method using a press or an etching method has been adopted as a method for forming a frame pattern when manufacturing a metal frame.

[発明が解決しようとする問題点] しかしながら、プレス打扱き法では金型が非常に高価で
あるため製品原価に反映し、他方エツチング法では金属
箔を溶解除去してフレームパターンを形成するため金属
箔のロスが多く、かつ溶解薬品の排水処理費が高いとい
う欠点があった。特にエツチング法ではエネルギーを付
加して製造した金属箔を薬品を消費して溶解させ、更に
溶解した金属をエネルギーを付加して回収するという全
く省エネルギーに反した方式で行っているのが現状であ
る。
[Problems to be solved by the invention] However, in the press processing method, the mold is very expensive, which is reflected in the product cost.On the other hand, in the etching method, the metal foil is melted and removed to form a frame pattern. The drawbacks were that there was a lot of loss of foil and the cost of treating the wastewater from the dissolved chemicals was high. In particular, in the etching method, the metal foil produced by adding energy is melted by consuming chemicals, and the molten metal is recovered by adding energy, which is completely contrary to energy conservation. .

この発明の目的は、前記した従来技術の欠点を解消し、
極めて経済的に金属フレームのフレームパターン形成す
る方法を提供することにある。
The purpose of this invention is to eliminate the drawbacks of the prior art described above,
The object of the present invention is to provide a method of forming a frame pattern of a metal frame in a very economical manner.

[問題点を解決するための手段及び作用]この発明の要
旨とするところは、(a)最初に厚さ0.1#以下の金
属箔に目的とするフレームパターンの逆パターンをレジ
スト印刷し、(b)次いでこの金属箔の露出部に電気め
っき法又は化学めっき法により厚さ0.05〜0.2m
mのめつき層を施し、(c)次に前記の金属箔を電解溶
解法又は化学溶解法により除去し、(d)最後に前記の
レジスト印刷部分を超音波振動法又は溶剤浸漬法により
除去して目的とするフレームパターンを形成することに
ある。
[Means and operations for solving the problems] The gist of the present invention is as follows: (a) First, a pattern opposite to the intended frame pattern is printed in resist on a metal foil having a thickness of 0.1 # or less; (b) Next, the exposed part of this metal foil is coated with a thickness of 0.05 to 0.2 m by electroplating or chemical plating.
(c) Next, the metal foil is removed by an electrolytic dissolution method or a chemical dissolution method. (d) Finally, the resist printed part is removed by an ultrasonic vibration method or a solvent immersion method. The objective is to form a desired frame pattern.

第6図は、前記した一運の工程を概略的に示したもので
あり、第7図はこの発明に使用できる金属フレーム連続
製造装置の断面図である。図において、種板箔4はコイ
ル状であり、ローラコーター6により連続的にレジスト
インクが塗布される。
FIG. 6 schematically shows the above-mentioned process, and FIG. 7 is a sectional view of a continuous metal frame manufacturing apparatus that can be used in the present invention. In the figure, the seed plate foil 4 has a coil shape and is continuously coated with resist ink by a roller coater 6.

図に示してはいないが、ローラコーター6の部分には露
光器と現像装置が布設されている。印刷された箔は電気
めっき槽7に入り、次いで種板箔溶解層8に入り両面エ
ツチングされる。ff1llにレジスト除去槽9内で超
音波振動又は溶剤浸漬により中間のレジストインク層を
除去し、この一連の工程により連続的に完成フレーム1
0を製造することができる。
Although not shown in the figure, an exposure device and a developing device are installed in the roller coater 6 portion. The printed foil enters an electroplating bath 7 and then enters a seed plate foil dissolving layer 8 where it is etched on both sides. ff1ll, the intermediate resist ink layer is removed by ultrasonic vibration or solvent immersion in the resist removal tank 9, and this series of steps continuously forms the completed frame 1.
0 can be manufactured.

以下、この発明を実施例により更に詳細に説明する。Hereinafter, this invention will be explained in more detail with reference to Examples.

[実施例1 第1図に示すフレームパターンの銅製フレームを製造す
るために銅製の種板箔4として厚さ0.02m+の箔を
用いた。なお、この種板箔4は最小板厚0.15Mまで
の電気めっきを施すため幅40履、長さ200履のもの
を用意したが、最終的にスリット幅切断する場合は40
#11以上の幅のものでも構わない。この種板箔4の表
面に第1図に示すパターンのネが印刷を施した。その断
面′を第2図に示す。
[Example 1] In order to manufacture a copper frame having the frame pattern shown in FIG. 1, a foil having a thickness of 0.02 m+ was used as the copper seed plate foil 4. In addition, this seed foil 4 was prepared with a width of 40mm and a length of 200mm in order to perform electroplating to a minimum board thickness of 0.15M, but when cutting the final slit width, the width of 40mm was prepared.
A width of #11 or more may also be used. The pattern shown in FIG. 1 was printed on the surface of this seed plate foil 4. Its cross section is shown in FIG.

なお、ネが印刷インクの膜厚は最終電気めっき厚さによ
り異なり、最終板厚0.15111Nの場合は0゜1〜
0.15mの範囲が望ましい。また、ネが印刷の方法と
してはインクの膜厚を厚くできるフォトレジストインク
の塗布(ローラーコータ法)又はドライフィルムの貼付
が好ましい。
In addition, the film thickness of the printing ink varies depending on the final electroplating thickness, and in the case of the final plate thickness of 0.15111N, it is 0°1~
A range of 0.15 m is desirable. Further, as a method for printing, it is preferable to apply a photoresist ink (roller coater method) or apply a dry film, which can increase the film thickness of the ink.

次いで、この表面に電気めっきして第3図に示す断面形
状を形成させた。その際、電気めっきはレジストコート
されていない部分に施され、目的とする板厚になるまで
行われた。
Next, this surface was electroplated to form the cross-sectional shape shown in FIG. At that time, electroplating was applied to the areas not coated with resist until the desired board thickness was achieved.

なお、電気めっきの厚さは通電電流と時間により±0.
0INIの精度で調整することができる。
The thickness of electroplating varies by ±0.0 depending on the applied current and time.
It can be adjusted with an accuracy of 0INI.

次に、これを銅のエツチング液に入れて種板箔を溶解除
去し第4図に示す断面のものを形成させた。
Next, this was placed in a copper etching solution to dissolve and remove the seed plate foil to form the cross section shown in FIG.

その際、電気めっき層も溶解されたが1.その溶解は種
板箔の厚さ0.02Mと同程度であり、そしの分は電気
メッキの際に見込んで予め厚付けしておいた。R&のに
中間のレジストインクを除去すると第5図に示す銅製フ
レームが得られた。
At that time, the electroplated layer was also dissolved, but 1. The dissolution was about the same as the thickness of the seed plate foil of 0.02M, and the thickness was made in advance in anticipation of electroplating. After removing the intermediate resist ink from R&, the copper frame shown in FIG. 5 was obtained.

[発明の効果] 以上説明したようにこの発明によれば、極めて経済的に
金属フレームのフレームパターンを形成することができ
、特に微細なパターンを形成する場合に有利である。
[Effects of the Invention] As explained above, according to the present invention, a frame pattern of a metal frame can be formed extremely economically, and is particularly advantageous when forming a fine pattern.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は金属フレームの一例を示す平面図、第2〜5図
は実施例におけるフレームパターンの形成態様を示す説
明図、第6図は、この発明の概略を示すニ[程図、第7
図はこの発明に使用できる金属フレーム連続製造装置の
断面図である。 1・・・銅製フレーム。 2・・・開  口  部。 3・・・レジストインク。 4・・・種  板  箭。 5・・・めっき層、  ″ 6・・・レジスト印刷機 7・・・めっき槽。 8・・・溶 解 槽。 9・・・レジスト除去槽。 10・・・完成フレーム
FIG. 1 is a plan view showing an example of a metal frame, FIGS.
The figure is a sectional view of a metal frame continuous manufacturing apparatus that can be used in the present invention. 1...Copper frame. 2...Opening. 3...Resist ink. 4...seed board bamboo. 5... Plating layer, '' 6... Resist printing machine 7... Plating tank. 8... Dissolving tank. 9... Resist removal tank. 10... Completed frame

Claims (1)

【特許請求の範囲】[Claims] (1)(a)厚さ0.1mm以下の金属箔に所望のフレ
ームパターンの逆パターンをレジスト印刷する工程、(
b)金属箔の露出部に電気めつき法又は化学めつき法に
より厚さ0.05〜0.2mmのめつき層を形成させる
工程、(c)金属箔を電解溶解法又は化学溶解法により
除去する工程、及び(d)レジスト印刷した部分を超音
波振動法又は溶剤浸漬法により除去する工程から成るこ
とを特徴とするフレームパターンの形成方法。
(1) (a) A step of resist printing a reverse pattern of the desired frame pattern on a metal foil with a thickness of 0.1 mm or less, (
b) forming a plating layer with a thickness of 0.05 to 0.2 mm on the exposed part of the metal foil by electroplating or chemical plating; (c) forming the metal foil by electrolytic dissolution or chemical dissolution; and (d) removing the resist-printed portion by ultrasonic vibration or solvent immersion.
JP24685384A 1984-11-21 1984-11-21 Formation of frame pattern Granted JPS61124600A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP24685384A JPS61124600A (en) 1984-11-21 1984-11-21 Formation of frame pattern

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP24685384A JPS61124600A (en) 1984-11-21 1984-11-21 Formation of frame pattern

Publications (2)

Publication Number Publication Date
JPS61124600A true JPS61124600A (en) 1986-06-12
JPH0355556B2 JPH0355556B2 (en) 1991-08-23

Family

ID=17154685

Family Applications (1)

Application Number Title Priority Date Filing Date
JP24685384A Granted JPS61124600A (en) 1984-11-21 1984-11-21 Formation of frame pattern

Country Status (1)

Country Link
JP (1) JPS61124600A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2013057772A1 (en) * 2011-10-17 2013-04-25 株式会社 ベアック Method for producing perforated metal foil
JP2016530140A (en) * 2013-09-19 2016-09-29 トレデガー フィルム プロダクツ コーポレイション Method for making a molding screen

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5492527A (en) * 1977-12-28 1979-07-21 Dainippon Printing Co Ltd Manufacture of metal foil having apertures

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5492527A (en) * 1977-12-28 1979-07-21 Dainippon Printing Co Ltd Manufacture of metal foil having apertures

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2013057772A1 (en) * 2011-10-17 2013-04-25 株式会社 ベアック Method for producing perforated metal foil
WO2013058289A1 (en) * 2011-10-17 2013-04-25 株式会社 ベアック Method for producing perforated metal foil
JP2016530140A (en) * 2013-09-19 2016-09-29 トレデガー フィルム プロダクツ コーポレイション Method for making a molding screen
US10556376B2 (en) 2013-09-19 2020-02-11 Tredegar Film Products Corporation Method of making forming screens

Also Published As

Publication number Publication date
JPH0355556B2 (en) 1991-08-23

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Legal Events

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