JPS61115366A - Semiconductor laser device - Google Patents
Semiconductor laser deviceInfo
- Publication number
- JPS61115366A JPS61115366A JP23730084A JP23730084A JPS61115366A JP S61115366 A JPS61115366 A JP S61115366A JP 23730084 A JP23730084 A JP 23730084A JP 23730084 A JP23730084 A JP 23730084A JP S61115366 A JPS61115366 A JP S61115366A
- Authority
- JP
- Japan
- Prior art keywords
- sections
- end surface
- resonator
- junction
- semiconductor laser
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
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- Semiconductor Lasers (AREA)
Abstract
Description
【発明の詳細な説明】 (産業上の利用分野) 本発明は、半導体レーザ装置に関するものである。[Detailed description of the invention] (Industrial application field) The present invention relates to a semiconductor laser device.
(従来例の構成とその問題点)
半導体レーザは、小型でかつ効率が高く、駆動電流によ
る直接変調が可能であるなど、多くの長所を有しており
、光通信、光情報処理などの光源として有望であり、実
用化されつつある。(Conventional structure and its problems) Semiconductor lasers have many advantages such as being small, highly efficient, and can be directly modulated by drive current, and are useful as light sources for optical communications, optical information processing, etc. It is promising and is being put into practical use.
これらの目的に使用するためには、半導体レーザチップ
を、電極を兼ねた放熱体に、発振領域に近い側の表面を
半田材を用いて接合する必要がある。In order to use the semiconductor laser chip for these purposes, it is necessary to bond the surface of the semiconductor laser chip close to the oscillation region to a heat sink that also serves as an electrode using a solder material.
第1図に、従来のストライプ型ダブルへテロ構造半導体
レーザの光の進行方向に垂直な断面を示すO
第1図において、1はn−GaAs基板、2はn−Ga
Aムs層、3はn−GaAtAs層、4はp−GaAt
As層、5はn−GaAs層、6はp側電極、7はn側
電極、8はZn拡散領域である。このような半導体レー
ザは、通常、第2図に示すように、p側電極6面を下に
して、InあるいはSn半田10を用いて銅などの放熱
体9に融着される。この時、第1図に示す従来の構造で
は、側面に露出したpn接合部が、p側電極から2〜4
μm程度しか離れていないため、第2図に示したように
、融着のために使用した半田材10の盛り上がりが、p
n接合のn側部に接触する状態がおこりやすく、従って
電気的短絡が発生するという問題点があった。Figure 1 shows a cross section of a conventional striped double heterostructure semiconductor laser perpendicular to the direction of light propagation. In Figure 1, 1 is an n-GaAs substrate, 2 is an n-Ga
Ams layer, 3 is n-GaAtAs layer, 4 is p-GaAt
5 is an n-GaAs layer, 6 is a p-side electrode, 7 is an n-side electrode, and 8 is a Zn diffusion region. As shown in FIG. 2, such a semiconductor laser is usually fused to a heat sink 9 made of copper or the like using In or Sn solder 10 with the p-side electrode 6 facing down. At this time, in the conventional structure shown in FIG. 1, the pn junction exposed on the side surface is 2 to 4
Since the distance is only about μm, as shown in FIG. 2, the swelling of the solder material 10 used for fusion
There is a problem in that the n-side portion of the n-junction is likely to come into contact with the n-side portion, resulting in an electrical short circuit.
(発明の目的)
本発明は、上記欠点に鑑み、pn接合部を下にして放熱
体にデンディングした際にも、半田材による電気的短絡
の起こりにくい半導体レーザ装置を提供することを目的
とする。(Object of the Invention) In view of the above drawbacks, an object of the present invention is to provide a semiconductor laser device in which electrical short circuits due to solder material are less likely to occur even when the device is attached to a heat sink with the pn junction facing down. do.
(発明の構成)
この目的を達成するために、本発明の半導体レーザ装置
は、共振器端面以外の側面近傍のpn接合部が内部のp
n接合部よりも基板側に凹んで形成された構成となって
いる。共振器端面には、端面の劣化を防ぐだめの適当な
保護膜が形成される。(Structure of the Invention) In order to achieve this object, the semiconductor laser device of the present invention has a pn junction near the side surface other than the cavity end face.
It has a configuration in which it is recessed closer to the substrate than the n-junction. A suitable protective film is formed on the resonator end face to prevent deterioration of the end face.
この構成によって、半導体レーザをへき開などの切断に
よって作製した場合に、四方に露出するpn接合の端部
のうち、共振器端面に含まれる部分は、保護膜によって
電気的に絶縁され、これらにほぼ垂直な側面のpn接合
の端は、表面より離れて、より基板側に形成されている
ので、表面を下にして、半田材を用いてデンディングし
た際に、半田材のまわり込み等による電気的短絡を防ぐ
ことができる。With this configuration, when a semiconductor laser is manufactured by cutting such as cleavage, among the ends of the pn junction that are exposed on all sides, the part included in the cavity end face is electrically insulated by the protective film, and is almost insulated from these ends. The end of the pn junction on the vertical side is formed farther away from the surface and closer to the substrate, so when soldering is done with the surface facing down, there is no electricity caused by the solder material wrapping around. can prevent short circuits.
(実施例の説明)
以下、本発明の一実施例について、図面を参照しながら
説明する。第3図は、本発明の一実施例における半導体
レーザ装置の構造を示すもので、光の進行方向に垂直な
断面を示している。このような構造の半導体レーザチy
7’ Id、第4図に示したように、半導体基板1上
に溝をつけておき、この上に活性層を含むダブルへテロ
構造を形成し、基板溝部の中央で、分離することによっ
て作製することができる。こうして作製されたレーザチ
ップは、第3図に示した断面に平行な、共振器を形成す
る2つの断面には、Az2o3などの絶縁膜を付着させ
ることによって端面酸化などによる劣化を防ぐと同時に
、電気的に絶縁することができる。(Description of Embodiment) Hereinafter, an embodiment of the present invention will be described with reference to the drawings. FIG. 3 shows the structure of a semiconductor laser device according to an embodiment of the present invention, and shows a cross section perpendicular to the direction in which light travels. A semiconductor laser chip with such a structure
7' Id, as shown in FIG. 4, a groove is formed on the semiconductor substrate 1, a double heterostructure including an active layer is formed on this, and the structure is separated at the center of the substrate groove. can do. The laser chip manufactured in this way has an insulating film such as Az2O3 attached to the two cross sections forming the resonator, which are parallel to the cross section shown in FIG. 3, to prevent deterioration due to end face oxidation, etc. Can be electrically insulated.
一方、これらの端面にほぼ垂直な側面は、第5図に示し
たようにぎンディングした際、ハンダによる融着面より
離れた位置にくるため、電気的短絡状態がおこりにくく
なる。On the other hand, when the side surfaces that are substantially perpendicular to these end surfaces are bonded as shown in FIG. 5, they are located at a distance from the surface fused by the solder, so that electrical short circuits are less likely to occur.
(発明の効果)
以上のように、本発明は、半導体レーザの共振器端面以
外の側面に露出するpn接合部を、内部のpn接合部よ
りも基板側に凹んだ状態に構成することにより、従来組
立工程で発生していた電気的短絡による不良を大幅に減
少させることができ、その工業的効果は、犬なるものが
ある。(Effects of the Invention) As described above, the present invention provides the following effects by configuring the pn junction portion exposed on the side surface other than the cavity end face of the semiconductor laser to be recessed toward the substrate side than the internal pn junction portion. It is possible to significantly reduce defects caused by electrical short circuits that conventionally occur in the assembly process, and the industrial effects are significant.
第1図は、従来の半導体レーザチップの断面図、第2図
は、従来の半導体レーザチップのデンディング状態を示
す図、
第3図は、本発明の一実施例の半導体レーザチップの断
面図、第今図+4、同号9フI%裂上方5天と3−1図
、第5図は、同半導体レーザチップのデンディング状態
を示す図である。
1−−− n−GaAs基板、2− n−GaAtAs
、3− n−GaAlAs、4 ・・・p−GaAtA
s、5 ・・n−GaAs、 6− p側電極、7・・
・n側電極、8・・・Zn拡散領域、9・・・放熱体、
10・・・半田材。
第1図
第2図FIG. 1 is a cross-sectional view of a conventional semiconductor laser chip, FIG. 2 is a diagram showing a denting state of a conventional semiconductor laser chip, and FIG. 3 is a cross-sectional view of a semiconductor laser chip according to an embodiment of the present invention. , Fig. 4, Fig. 9 of the same issue, Fig. 3-1, and Fig. 5 are diagrams showing the bending state of the semiconductor laser chip. 1---- n-GaAs substrate, 2- n-GaAtAs
, 3-n-GaAlAs, 4... p-GaAtA
s, 5...n-GaAs, 6-p side electrode, 7...
・N-side electrode, 8... Zn diffusion region, 9... heat sink,
10...Solder material. Figure 1 Figure 2
Claims (1)
以外の側面近傍のpn接合部が、他のpn接合部よりも
基板側に凹んで形成されていることを特徴とする半導体
レーザ装置。1. A semiconductor laser device characterized in that, among pn junctions formed on a semiconductor substrate, a pn junction near a side surface other than a resonator end face is recessed toward the substrate than other pn junctions.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP23730084A JPS61115366A (en) | 1984-11-10 | 1984-11-10 | Semiconductor laser device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP23730084A JPS61115366A (en) | 1984-11-10 | 1984-11-10 | Semiconductor laser device |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS61115366A true JPS61115366A (en) | 1986-06-02 |
Family
ID=17013318
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP23730084A Pending JPS61115366A (en) | 1984-11-10 | 1984-11-10 | Semiconductor laser device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS61115366A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2687857A1 (en) * | 1992-02-04 | 1993-08-27 | Mitsubishi Electric Corp | Semiconductor laser and method of manufacture |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS58216485A (en) * | 1982-06-09 | 1983-12-16 | Hitachi Ltd | Semiconductor laser element |
-
1984
- 1984-11-10 JP JP23730084A patent/JPS61115366A/en active Pending
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS58216485A (en) * | 1982-06-09 | 1983-12-16 | Hitachi Ltd | Semiconductor laser element |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2687857A1 (en) * | 1992-02-04 | 1993-08-27 | Mitsubishi Electric Corp | Semiconductor laser and method of manufacture |
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