JPS6110985B2 - - Google Patents

Info

Publication number
JPS6110985B2
JPS6110985B2 JP56095892A JP9589281A JPS6110985B2 JP S6110985 B2 JPS6110985 B2 JP S6110985B2 JP 56095892 A JP56095892 A JP 56095892A JP 9589281 A JP9589281 A JP 9589281A JP S6110985 B2 JPS6110985 B2 JP S6110985B2
Authority
JP
Japan
Prior art keywords
substrate
incident light
image sensor
refractive index
photo sensor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP56095892A
Other languages
English (en)
Japanese (ja)
Other versions
JPS57211268A (en
Inventor
Kyoshi Ozawa
Nobuyoshi Takagi
Satoru Kawai
Toshiro Kodama
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP56095892A priority Critical patent/JPS57211268A/ja
Publication of JPS57211268A publication Critical patent/JPS57211268A/ja
Publication of JPS6110985B2 publication Critical patent/JPS6110985B2/ja
Granted legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10FINORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F39/00Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
    • H10F39/10Integrated devices
    • H10F39/12Image sensors
    • H10F39/18Complementary metal-oxide-semiconductor [CMOS] image sensors; Photodiode array image sensors

Landscapes

  • Solid State Image Pick-Up Elements (AREA)
  • Transforming Light Signals Into Electric Signals (AREA)
JP56095892A 1981-06-23 1981-06-23 Image sensor and manufacture thereof Granted JPS57211268A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP56095892A JPS57211268A (en) 1981-06-23 1981-06-23 Image sensor and manufacture thereof

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP56095892A JPS57211268A (en) 1981-06-23 1981-06-23 Image sensor and manufacture thereof

Publications (2)

Publication Number Publication Date
JPS57211268A JPS57211268A (en) 1982-12-25
JPS6110985B2 true JPS6110985B2 (OSRAM) 1986-04-01

Family

ID=14149956

Family Applications (1)

Application Number Title Priority Date Filing Date
JP56095892A Granted JPS57211268A (en) 1981-06-23 1981-06-23 Image sensor and manufacture thereof

Country Status (1)

Country Link
JP (1) JPS57211268A (OSRAM)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63291466A (ja) * 1987-05-25 1988-11-29 Nippon Sheet Glass Co Ltd 固体撮像装置
JP2001068658A (ja) 1999-08-27 2001-03-16 Sony Corp 固体撮像装置及びその製造方法

Also Published As

Publication number Publication date
JPS57211268A (en) 1982-12-25

Similar Documents

Publication Publication Date Title
JPH05134111A (ja) 固体撮像装置
KR960043255A (ko) 고체촬상장치 및 그 제조방법
US5708497A (en) Fingerprint image input apparatus and method of producing the same
JPS6135449A (ja) レントゲンリトグラフイ用マスク
KR100194841B1 (ko) 고체 상태 상 감지 장치 제조방법
JPS6110985B2 (OSRAM)
JPH05335533A (ja) 固体撮像装置の製造方法
US4671853A (en) Image sensor manufacturing method
JPH06140321A (ja) 半導体薄膜の結晶化方法
JP2910683B2 (ja) 指紋画像入力装置及びその製造方法
JPS60262458A (ja) 固体撮像装置の製造方法
JPH10173159A (ja) 固体撮像素子およびその製造方法
JPH0564468B2 (OSRAM)
JPS6327871B2 (OSRAM)
JPS59180310A (ja) カラ−イメ−ジセンサ装置
JPH0158711B2 (OSRAM)
JPS6189661A (ja) イメ−ジセンサの製造方法
JP2974151B2 (ja) 密着センサ
JPH06132515A (ja) 固体撮像素子
KR910005603B1 (ko) 광전 변환 장치
JPH051665B2 (OSRAM)
JP2573342B2 (ja) 受光素子
JPH06260397A (ja) X線露光用マスクとその製造方法
JPH03148176A (ja) 完全密着型等倍センサ
JPH01130562A (ja) 電荷結合素子