JPS6110978B2 - - Google Patents
Info
- Publication number
- JPS6110978B2 JPS6110978B2 JP50043578A JP4357875A JPS6110978B2 JP S6110978 B2 JPS6110978 B2 JP S6110978B2 JP 50043578 A JP50043578 A JP 50043578A JP 4357875 A JP4357875 A JP 4357875A JP S6110978 B2 JPS6110978 B2 JP S6110978B2
- Authority
- JP
- Japan
- Prior art keywords
- wiring
- gate electrode
- sides
- polycrystalline silicon
- wiring layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000012535 impurity Substances 0.000 claims description 18
- 229910021420 polycrystalline silicon Inorganic materials 0.000 claims description 16
- 238000009792 diffusion process Methods 0.000 claims description 15
- 239000000758 substrate Substances 0.000 claims description 9
- 239000004065 semiconductor Substances 0.000 claims description 5
- 238000004519 manufacturing process Methods 0.000 claims description 3
- 238000010438 heat treatment Methods 0.000 claims 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 6
- 229910052710 silicon Inorganic materials 0.000 description 6
- 239000010703 silicon Substances 0.000 description 6
- 239000007772 electrode material Substances 0.000 description 5
- 238000000034 method Methods 0.000 description 2
- 238000001259 photo etching Methods 0.000 description 2
- 230000005669 field effect Effects 0.000 description 1
Landscapes
- Metal-Oxide And Bipolar Metal-Oxide Semiconductor Integrated Circuits (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP50043578A JPS51117878A (en) | 1975-04-09 | 1975-04-09 | Manufacturing method of semiconductor device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP50043578A JPS51117878A (en) | 1975-04-09 | 1975-04-09 | Manufacturing method of semiconductor device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS51117878A JPS51117878A (en) | 1976-10-16 |
| JPS6110978B2 true JPS6110978B2 (cs) | 1986-04-01 |
Family
ID=12667629
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP50043578A Granted JPS51117878A (en) | 1975-04-09 | 1975-04-09 | Manufacturing method of semiconductor device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS51117878A (cs) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5441085A (en) * | 1977-09-07 | 1979-03-31 | Nec Corp | Insulated gate field effect semiconductor device |
| JPS581527Y2 (ja) * | 1978-06-02 | 1983-01-12 | 株式会社クラレ | 折板加工用三層複合建材 |
-
1975
- 1975-04-09 JP JP50043578A patent/JPS51117878A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS51117878A (en) | 1976-10-16 |
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