JPS61106411A - ジシランおよびトリシランの製造法 - Google Patents
ジシランおよびトリシランの製造法Info
- Publication number
- JPS61106411A JPS61106411A JP22607384A JP22607384A JPS61106411A JP S61106411 A JPS61106411 A JP S61106411A JP 22607384 A JP22607384 A JP 22607384A JP 22607384 A JP22607384 A JP 22607384A JP S61106411 A JPS61106411 A JP S61106411A
- Authority
- JP
- Japan
- Prior art keywords
- monosilane
- reaction
- disilane
- silane
- gas
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 title claims abstract description 68
- 229910000077 silane Inorganic materials 0.000 title claims abstract description 32
- 238000002360 preparation method Methods 0.000 title description 2
- 238000006243 chemical reaction Methods 0.000 claims abstract description 33
- PZPGRFITIJYNEJ-UHFFFAOYSA-N disilane Chemical compound [SiH3][SiH3] PZPGRFITIJYNEJ-UHFFFAOYSA-N 0.000 claims abstract description 27
- 150000004756 silanes Chemical class 0.000 claims abstract description 21
- 238000000034 method Methods 0.000 claims abstract description 18
- VEDJZFSRVVQBIL-UHFFFAOYSA-N trisilane Chemical compound [SiH3][SiH2][SiH3] VEDJZFSRVVQBIL-UHFFFAOYSA-N 0.000 claims abstract description 16
- 239000011261 inert gas Substances 0.000 claims abstract description 6
- 238000004519 manufacturing process Methods 0.000 claims description 9
- 239000007789 gas Substances 0.000 abstract description 27
- 239000002994 raw material Substances 0.000 abstract description 7
- 238000000926 separation method Methods 0.000 abstract description 2
- 229910007264 Si2H6 Inorganic materials 0.000 abstract 3
- 229910005096 Si3H8 Inorganic materials 0.000 abstract 3
- 238000011109 contamination Methods 0.000 description 5
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 4
- 230000008901 benefit Effects 0.000 description 4
- 238000007796 conventional method Methods 0.000 description 4
- 239000007788 liquid Substances 0.000 description 4
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 3
- 239000000047 product Substances 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000004880 explosion Methods 0.000 description 2
- 229910052757 nitrogen Inorganic materials 0.000 description 2
- 238000010926 purge Methods 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- FADJIMDKDQYNCG-UHFFFAOYSA-N 1h-azet-2-one Chemical compound O=C1NC=C1 FADJIMDKDQYNCG-UHFFFAOYSA-N 0.000 description 1
- 241000251468 Actinopterygii Species 0.000 description 1
- 241000410518 Cyrano Species 0.000 description 1
- 241001379910 Ephemera danica Species 0.000 description 1
- CBENFWSGALASAD-UHFFFAOYSA-N Ozone Chemical compound [O-][O+]=O CBENFWSGALASAD-UHFFFAOYSA-N 0.000 description 1
- 241001282110 Pagrus major Species 0.000 description 1
- 241000212342 Sium Species 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 238000009530 blood pressure measurement Methods 0.000 description 1
- 239000006227 byproduct Substances 0.000 description 1
- 239000003638 chemical reducing agent Substances 0.000 description 1
- 238000005660 chlorination reaction Methods 0.000 description 1
- 238000009833 condensation Methods 0.000 description 1
- 230000005494 condensation Effects 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 239000000356 contaminant Substances 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 238000007872 degassing Methods 0.000 description 1
- 239000003085 diluting agent Substances 0.000 description 1
- 238000007599 discharging Methods 0.000 description 1
- 238000004868 gas analysis Methods 0.000 description 1
- 238000002309 gasification Methods 0.000 description 1
- 238000005984 hydrogenation reaction Methods 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 150000003961 organosilicon compounds Chemical class 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 239000012495 reaction gas Substances 0.000 description 1
- 238000004064 recycling Methods 0.000 description 1
- 239000003507 refrigerant Substances 0.000 description 1
- 229910021332 silicide Inorganic materials 0.000 description 1
- FVBUAEGBCNSCDD-UHFFFAOYSA-N silicide(4-) Chemical compound [Si-4] FVBUAEGBCNSCDD-UHFFFAOYSA-N 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 238000001308 synthesis method Methods 0.000 description 1
- 230000002194 synthesizing effect Effects 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Silicon Compounds (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP22607384A JPS61106411A (ja) | 1984-10-27 | 1984-10-27 | ジシランおよびトリシランの製造法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP22607384A JPS61106411A (ja) | 1984-10-27 | 1984-10-27 | ジシランおよびトリシランの製造法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS61106411A true JPS61106411A (ja) | 1986-05-24 |
| JPH0470251B2 JPH0470251B2 (enExample) | 1992-11-10 |
Family
ID=16839384
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP22607384A Granted JPS61106411A (ja) | 1984-10-27 | 1984-10-27 | ジシランおよびトリシランの製造法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS61106411A (enExample) |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6321210A (ja) * | 1986-07-15 | 1988-01-28 | エレクトリツク パワ− リサ−チ インスチテユ−ト インコ−ポレ−テツド | 水素化アモルファスシリコン又は水素化アモルファスゲルマニウムの蒸着方法 |
| EP0614852A1 (fr) * | 1993-03-11 | 1994-09-14 | L'air Liquide, Societe Anonyme Pour L'etude Et L'exploitation Des Procedes Georges Claude | Procédé de préparation du disilane à partir du monosilane par décharge électrique et piégeage cryogénique et réacteur pour sa mise en oeuvre |
| WO1996006802A1 (fr) * | 1994-09-01 | 1996-03-07 | L'air Liquide, Societe Anonyme Pour L'etude Et L'exploitation Des Procedes Georges Claude | Procede de preparation de trisilane a partir de monosilane |
| JP2013520389A (ja) * | 2010-02-26 | 2013-06-06 | エボニック デグサ ゲーエムベーハー | ヒドリドシランをオリゴマー化する方法、該方法により製造可能なオリゴマー及びその使用 |
| JP2016522140A (ja) * | 2013-04-24 | 2016-07-28 | エボニック デグサ ゲーエムベーハーＥｖｏｎｉｋ Ｄｅｇｕｓｓａ ＧｍｂＨ | ポリシランの製造方法および製造装置 |
-
1984
- 1984-10-27 JP JP22607384A patent/JPS61106411A/ja active Granted
Cited By (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6321210A (ja) * | 1986-07-15 | 1988-01-28 | エレクトリツク パワ− リサ−チ インスチテユ−ト インコ−ポレ−テツド | 水素化アモルファスシリコン又は水素化アモルファスゲルマニウムの蒸着方法 |
| EP0614852A1 (fr) * | 1993-03-11 | 1994-09-14 | L'air Liquide, Societe Anonyme Pour L'etude Et L'exploitation Des Procedes Georges Claude | Procédé de préparation du disilane à partir du monosilane par décharge électrique et piégeage cryogénique et réacteur pour sa mise en oeuvre |
| FR2702467A1 (fr) * | 1993-03-11 | 1994-09-16 | Air Liquide | Procédé de préparation du disilane à partir du monosilane par décharge électrique et piégeage cryogénique et nouveau réacteur pour sa mise en Óoeuvre. |
| WO1996006802A1 (fr) * | 1994-09-01 | 1996-03-07 | L'air Liquide, Societe Anonyme Pour L'etude Et L'exploitation Des Procedes Georges Claude | Procede de preparation de trisilane a partir de monosilane |
| FR2724162A1 (fr) * | 1994-09-01 | 1996-03-08 | Air Liquide | Procede de preparation de trisilane a partir de monosilane, par decharge electrique et piegeage cryogenique |
| JP2013520389A (ja) * | 2010-02-26 | 2013-06-06 | エボニック デグサ ゲーエムベーハー | ヒドリドシランをオリゴマー化する方法、該方法により製造可能なオリゴマー及びその使用 |
| US8969610B2 (en) | 2010-02-26 | 2015-03-03 | Evonik Degussa Gmbh | Method for oligomerizing hydridosilanes, the oligomers that can be produced by means of the method, and the use thereof |
| JP2016522140A (ja) * | 2013-04-24 | 2016-07-28 | エボニック デグサ ゲーエムベーハーＥｖｏｎｉｋ Ｄｅｇｕｓｓａ ＧｍｂＨ | ポリシランの製造方法および製造装置 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0470251B2 (enExample) | 1992-11-10 |
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