JPS61106027U - - Google Patents
Info
- Publication number
- JPS61106027U JPS61106027U JP19120184U JP19120184U JPS61106027U JP S61106027 U JPS61106027 U JP S61106027U JP 19120184 U JP19120184 U JP 19120184U JP 19120184 U JP19120184 U JP 19120184U JP S61106027 U JPS61106027 U JP S61106027U
- Authority
- JP
- Japan
- Prior art keywords
- wafer
- developer
- wafer chuck
- chuck
- developer container
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000011148 porous material Substances 0.000 claims description 2
Description
図面は本考案装置を示し、第１図は装置の一部
切欠き側断面図、第２図はウエハチヤツクの平面
図である。
１…ウエハチヤツク、２…受け皿、３…回転軸
、４…真空吸着溝、５…ウエハ、６…現像液容器
、７…細孔、８…現像液、９…供給管、１０…シ
ヤワー、１１…ドレン。
The drawings show the device of the present invention, with FIG. 1 being a partially cutaway side sectional view of the device, and FIG. 2 being a plan view of the wafer chuck. DESCRIPTION OF SYMBOLS 1... Wafer chuck, 2... Receiver, 3... Rotating shaft, 4... Vacuum suction groove, 5... Wafer, 6... Developer container, 7... Pore, 8... Developer, 9... Supply pipe, 10... Shower, 11... Drain.
Claims (1)
、現像すべき箇所が上向きになるようにしたウエ
ハを載置し、ウエハチヤツクの上方に適宜現像液
を補充できるようにした現像液容器を配設し、該
現像液容器の底面に穿設した多数の細孔から現像
液をウエハ上に自然落下させる一方、前記現像液
容器又はウエハチヤツクのいずれか一方若しくは
両方を、略水平回転できるように構成して成るウ
エハのレジスト現像装置。 A wafer with the area to be developed facing upward is placed on a wafer chuck in a resist developing device, and a developer container is provided above the wafer chuck so that a developer can be replenished as appropriate. A resist development method for a wafer comprising a structure in which either or both of the developer container and the wafer chuck can be rotated substantially horizontally while the developer is allowed to fall naturally onto the wafer through a number of pores formed in the bottom surface of the wafer. Device.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP19120184U JPS61106027U (en) | 1984-12-17 | 1984-12-17 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP19120184U JPS61106027U (en) | 1984-12-17 | 1984-12-17 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS61106027U true JPS61106027U (en) | 1986-07-05 |
Family
ID=30748641
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP19120184U Pending JPS61106027U (en) | 1984-12-17 | 1984-12-17 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS61106027U (en) |
-
1984
- 1984-12-17 JP JP19120184U patent/JPS61106027U/ja active Pending
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