JPS61100931A - 縮小投影式アライメント方法 - Google Patents

縮小投影式アライメント方法

Info

Publication number
JPS61100931A
JPS61100931A JP59222010A JP22201084A JPS61100931A JP S61100931 A JPS61100931 A JP S61100931A JP 59222010 A JP59222010 A JP 59222010A JP 22201084 A JP22201084 A JP 22201084A JP S61100931 A JPS61100931 A JP S61100931A
Authority
JP
Japan
Prior art keywords
pattern
image
wafer
alignment
forming
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP59222010A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0318732B2 (enExample
Inventor
Yoshisada Oshida
良忠 押田
Naoto Nakajima
直人 中島
Masataka Shiba
正孝 芝
Toshihiko Nakada
俊彦 中田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP59222010A priority Critical patent/JPS61100931A/ja
Priority to US06/684,292 priority patent/US4668089A/en
Priority to EP84115889A priority patent/EP0148477B1/en
Priority to DE8484115889T priority patent/DE3485022D1/de
Priority to KR1019840008344A priority patent/KR900001269B1/ko
Publication of JPS61100931A publication Critical patent/JPS61100931A/ja
Publication of JPH0318732B2 publication Critical patent/JPH0318732B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7049—Technique, e.g. interferometric

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP59222010A 1983-12-26 1984-10-24 縮小投影式アライメント方法 Granted JPS61100931A (ja)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP59222010A JPS61100931A (ja) 1984-10-24 1984-10-24 縮小投影式アライメント方法
US06/684,292 US4668089A (en) 1983-12-26 1984-12-20 Exposure apparatus and method of aligning exposure mask with workpiece
EP84115889A EP0148477B1 (en) 1983-12-26 1984-12-20 Exposure apparatus and method of aligning exposure mask with workpiece
DE8484115889T DE3485022D1 (de) 1983-12-26 1984-12-20 Belichtungsvorrichtung und verfahren fuer die ausrichtung einer maske mit einem arbeitsstueck.
KR1019840008344A KR900001269B1 (ko) 1983-12-26 1984-12-26 노출 마스크와 대상물을 얼라인먼트하는 노출장치 및 그 방법

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59222010A JPS61100931A (ja) 1984-10-24 1984-10-24 縮小投影式アライメント方法

Publications (2)

Publication Number Publication Date
JPS61100931A true JPS61100931A (ja) 1986-05-19
JPH0318732B2 JPH0318732B2 (enExample) 1991-03-13

Family

ID=16775689

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59222010A Granted JPS61100931A (ja) 1983-12-26 1984-10-24 縮小投影式アライメント方法

Country Status (1)

Country Link
JP (1) JPS61100931A (enExample)

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6146024A (ja) * 1984-08-10 1986-03-06 Hitachi Ltd アライメント方法

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6146024A (ja) * 1984-08-10 1986-03-06 Hitachi Ltd アライメント方法

Also Published As

Publication number Publication date
JPH0318732B2 (enExample) 1991-03-13

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Legal Events

Date Code Title Description
EXPY Cancellation because of completion of term