JPS61100141U - - Google Patents
Info
- Publication number
- JPS61100141U JPS61100141U JP18594784U JP18594784U JPS61100141U JP S61100141 U JPS61100141 U JP S61100141U JP 18594784 U JP18594784 U JP 18594784U JP 18594784 U JP18594784 U JP 18594784U JP S61100141 U JPS61100141 U JP S61100141U
- Authority
- JP
- Japan
- Prior art keywords
- boat
- holding
- holding device
- heat treatment
- vertical semiconductor
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000004065 semiconductor Substances 0.000 claims description 4
- 238000010438 heat treatment Methods 0.000 claims 2
- 239000011810 insulating material Substances 0.000 claims 1
- 239000010453 quartz Substances 0.000 claims 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims 1
- 239000012774 insulation material Substances 0.000 description 1
Description
第１図は本考案の実施例を示す縦断面図、第２
図は従来のボート保持装置の一例を示す縦断面図
である。
Ｆ…炉本体、Ｗ…半導体ウエハ、１２…ボート
、１３…支持軸、１４…支持台、１６…ボート保
持台、１７…断熱材。
Fig. 1 is a vertical sectional view showing an embodiment of the present invention;
The figure is a longitudinal sectional view showing an example of a conventional boat holding device. F...furnace body, W...semiconductor wafer, 12...boat, 13...support shaft, 14...support stand, 16...boat holding stand, 17...insulation material.
Claims (1)
の炉本体をもつ縦形半導体熱処理炉で熱処理すべ
き半導体を載置するためのボートを保持するボー
ト保持装置において、回転自在に垂直に配設され
て下端側が駆動源に連結される支持軸と、該支持
軸の上端部に水平に固着された板状の支持台と、
内部に断熱材が充填された所定の長さの筒状の石
英からなり前記支持台の上に配置されて上面に前
記ボートを保持するボート保持台とからなること
を特徴とする縦形半導体熱処理炉のボート保持装
置。 In a boat holding device for holding a boat for mounting semiconductors to be heat-treated in a vertical semiconductor heat treatment furnace having a cylindrical furnace body with an upper end substantially closed and a lower end open, the boat holding device is vertically disposed rotatably. a support shaft whose lower end side is connected to a drive source; a plate-shaped support stand horizontally fixed to the upper end of the support shaft;
A vertical semiconductor heat treatment furnace comprising a boat holding stand made of cylindrical quartz of a predetermined length and filled with a heat insulating material, and placed on the support stand and holding the boat on its upper surface. boat holding device.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP18594784U JPS61100141U (en) | 1984-12-07 | 1984-12-07 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP18594784U JPS61100141U (en) | 1984-12-07 | 1984-12-07 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS61100141U true JPS61100141U (en) | 1986-06-26 |
Family
ID=30743406
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP18594784U Pending JPS61100141U (en) | 1984-12-07 | 1984-12-07 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS61100141U (en) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6447020A (en) * | 1987-08-18 | 1989-02-21 | Shinetsu Sekiei Kk | Heat treatment device for manufacturing semiconductor |
| JPH01145807A (en) * | 1987-12-01 | 1989-06-07 | Toshiba Ceramics Co Ltd | Jig for wafer heat treatment |
| JPH01133728U (en) * | 1988-03-07 | 1989-09-12 | ||
| JPH01315137A (en) * | 1988-06-15 | 1989-12-20 | Tel Sagami Ltd | Plasma treatment |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS497264U (en) * | 1972-05-02 | 1974-01-22 | ||
| JPS5285731A (en) * | 1976-01-09 | 1977-07-16 | Hitachi Ltd | Heat treatment furnace |
-
1984
- 1984-12-07 JP JP18594784U patent/JPS61100141U/ja active Pending
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS497264U (en) * | 1972-05-02 | 1974-01-22 | ||
| JPS5285731A (en) * | 1976-01-09 | 1977-07-16 | Hitachi Ltd | Heat treatment furnace |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6447020A (en) * | 1987-08-18 | 1989-02-21 | Shinetsu Sekiei Kk | Heat treatment device for manufacturing semiconductor |
| JPH01145807A (en) * | 1987-12-01 | 1989-06-07 | Toshiba Ceramics Co Ltd | Jig for wafer heat treatment |
| JPH01133728U (en) * | 1988-03-07 | 1989-09-12 | ||
| JPH01315137A (en) * | 1988-06-15 | 1989-12-20 | Tel Sagami Ltd | Plasma treatment |
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