JPS61138238U - - Google Patents

Info

Publication number
JPS61138238U
JPS61138238U JP2024785U JP2024785U JPS61138238U JP S61138238 U JPS61138238 U JP S61138238U JP 2024785 U JP2024785 U JP 2024785U JP 2024785 U JP2024785 U JP 2024785U JP S61138238 U JPS61138238 U JP S61138238U
Authority
JP
Japan
Prior art keywords
boat
lid
processing tube
opening
semiconductor articles
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2024785U
Other languages
Japanese (ja)
Other versions
JPH0220826Y2 (en
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP2024785U priority Critical patent/JPH0220826Y2/ja
Publication of JPS61138238U publication Critical patent/JPS61138238U/ja
Application granted granted Critical
Publication of JPH0220826Y2 publication Critical patent/JPH0220826Y2/ja
Expired legal-status Critical Current

Links

Description

【図面の簡単な説明】[Brief explanation of the drawing]

図面は本考案をシリコンウエハの縦型拡散炉に
適用した実施例を示すもので、第１図はウエハボ
ートを取り出した状態の拡散炉の概略縦断面図、
第２図は熱処理時の拡散炉の概略縦断面図、第３
図は蓋体の開閉動作を示す拡散炉の上面図、第４
図は蓋体駆動機構の概略斜視図、第５図はカム部
材の外観斜視図、第６Ａ図〜第６Ｃ図はロツク機
構の動作を順に示す部分拡大正面図、第７Ａ図〜
第７Ｄ図は蓋体の構造例を夫々示す縦断面図、第
８Ａ図及び第８Ｂ図は蓋体の開閉動作の変形例を
示す概略上面図である。 なお図面に用いられた符号において、１……処
理管、５……シリコンウエハ、６……ウエハボー
ト、３１，５１，６１，７１，８１，９１……蓋
体、３５……断熱材、である。 The drawings show an embodiment in which the present invention is applied to a vertical diffusion furnace for silicon wafers.
Figure 2 is a schematic vertical cross-sectional view of the diffusion furnace during heat treatment;
The figure is a top view of the diffusion furnace showing the opening/closing operation of the lid.
The figure is a schematic perspective view of the lid drive mechanism, Figure 5 is an external perspective view of the cam member, Figures 6A to 6C are partially enlarged front views showing the operation of the lock mechanism in order, and Figures 7A to 6C.
FIG. 7D is a vertical sectional view showing an example of the structure of the lid, and FIGS. 8A and 8B are schematic top views showing a modification of the opening/closing operation of the lid. In addition, in the symbols used in the drawings, 1...processing tube, 5...silicon wafer, 6...wafer boat, 31, 51, 61, 71, 81, 91...lid, 35...insulating material, be.

Claims (1)

【実用新案登録請求の範囲】 長手軸が実質的に垂直方向に延在するように配
された処理管と、熱処理される半導体物品を積載
するボートと、このボートを上記処理管内部の所
定位置に移動させる昇降機構とを夫々具備した半
導体物品の縦型熱処理装置において、 断熱構造を有する蓋体と、 上記ボートの昇降に同期して上記蓋体を上記処
理管の開口に移動させる移動手段とを夫々具備し
、 上記ボートが上記処理管の上記開口から出た直
後に上記蓋体によつて上記開口が閉塞されるよう
に構成したことを特徴とする装置。[Claims for Utility Model Registration] A processing tube arranged such that its longitudinal axis extends substantially vertically, a boat for loading semiconductor articles to be heat treated, and a boat placed at a predetermined position inside the processing tube. A vertical heat treatment apparatus for semiconductor articles, each comprising a lid having a heat insulating structure; and a moving means for moving the lid to the opening of the processing tube in synchronization with the lifting and lowering of the boat. An apparatus characterized in that the opening is closed by the lid immediately after the boat leaves the opening of the processing tube.
JP2024785U 1985-02-15 1985-02-15 Expired JPH0220826Y2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2024785U JPH0220826Y2 (en) 1985-02-15 1985-02-15

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2024785U JPH0220826Y2 (en) 1985-02-15 1985-02-15

Publications (2)

Publication Number Publication Date
JPS61138238U true JPS61138238U (en) 1986-08-27
JPH0220826Y2 JPH0220826Y2 (en) 1990-06-06

Family

ID=30510557

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2024785U Expired JPH0220826Y2 (en) 1985-02-15 1985-02-15

Country Status (1)

Country Link
JP (1) JPH0220826Y2 (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63201325U (en) * 1987-06-17 1988-12-26
JPH0193112A (en) * 1987-10-05 1989-04-12 Tel Sagami Ltd Method for heat treatment
JPH01175228A (en) * 1987-12-29 1989-07-11 Tel Sagami Ltd Vertical-type heat-treatment furnace
JP2003297770A (en) * 2002-03-29 2003-10-17 Toshiba Ceramics Co Ltd Reflector for semiconductor heat treatment and method for manufacturing the reflector
WO2004070814A1 (en) * 2003-02-06 2004-08-19 Tokyo Electron Limited Vacuum treating device with lidded treatment container

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63201325U (en) * 1987-06-17 1988-12-26
JPH0193112A (en) * 1987-10-05 1989-04-12 Tel Sagami Ltd Method for heat treatment
JPH01175228A (en) * 1987-12-29 1989-07-11 Tel Sagami Ltd Vertical-type heat-treatment furnace
JP2003297770A (en) * 2002-03-29 2003-10-17 Toshiba Ceramics Co Ltd Reflector for semiconductor heat treatment and method for manufacturing the reflector
WO2004070814A1 (en) * 2003-02-06 2004-08-19 Tokyo Electron Limited Vacuum treating device with lidded treatment container

Also Published As

Publication number Publication date
JPH0220826Y2 (en) 1990-06-06

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