JPS609189A - Semiconductor laser device - Google Patents

Semiconductor laser device

Info

Publication number
JPS609189A
JPS609189A JP11759383A JP11759383A JPS609189A JP S609189 A JPS609189 A JP S609189A JP 11759383 A JP11759383 A JP 11759383A JP 11759383 A JP11759383 A JP 11759383A JP S609189 A JPS609189 A JP S609189A
Authority
JP
Japan
Prior art keywords
film
attached
laser device
semiconductor laser
cavity
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP11759383A
Other languages
Japanese (ja)
Inventor
Kunio Ito
国雄 伊藤
Masaru Wada
優 和田
Yuichi Shimizu
裕一 清水
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP11759383A priority Critical patent/JPS609189A/en
Publication of JPS609189A publication Critical patent/JPS609189A/en
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00Semiconductor lasers
    • H01S5/02Structural details or components not essential to laser action
    • H01S5/028Coatings ; Treatment of the laser facets, e.g. etching, passivation layers or reflecting layers

Landscapes

  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Optics & Photonics (AREA)
  • Semiconductor Lasers (AREA)

Abstract

PURPOSE:To obtain a high output while operating an APC by attaching an insulating film on the outside of a metallic film on one cavity end surface. CONSTITUTION:SiO2 films 2 in 2,750Angstrom thickness are attached on both cleavage planes of a laser chip 1 through a sputtering method. A gold film 3 in 1,000Angstrom thickness is attached only on one cleavage plane. An SiO2 film 6 in 1,000Angstrom thickness is attached on the gold film 3. The laser chip 1 is bonded with a radiator 4 made of copper by using tin. The metal 3 cannot protrude because the outermost section of a cavity end surface is constituted by not a metal but the insulating film 6 in the laser element 1. Accordingly, beams can be lead out of the side, to which the gold film 3 is attached, of a cavity even under the state in which the laser element is bonded with the radiator 4, and an APC can be operated.

Description

【発明の詳細な説明】 産業上の利用分野 本発明は半導体レーザ装置に関するものである。[Detailed description of the invention] Industrial applications The present invention relates to a semiconductor laser device.

従来例の、構成とその問題点 半導体レーザから高出力f iQるために、従来、第1
図に示すように、レーザ素子1の一方のキャビテイ面に
、厚さ1/2 (λはレーザ光の波長)の8102膜2
を付着しその上に金膜3を付着するという方法が行われ
ている。このような構造によれば、キャビティ内のレー
ザ光は金膜3により反射されて、金膜3が付着されたキ
ャビティ端面からは、光はほとんど出ない。したがって
、レーザ光は金膜が付着されないキャビティ端面からほ
とんど取り出される。こうして、発振しきい値電流は下
り、また高出力のレーザ光を取9出すことができる。し
かしながら、レーザ素子のAPC(Automatic
 Power C1ntrol )動作全行わせるため
には、キャビティの背面から出る光を用いなければなら
ないから、金膜3を付着したキャビティ端面からも光は
若干用る必要がある。
Conventional configuration and its problems In order to obtain high output f iQ from a semiconductor laser, conventionally, the first
As shown in the figure, an 8102 film 2 with a thickness of 1/2 (λ is the wavelength of the laser beam) is placed on one cavity surface of the laser element 1.
A method is used in which a gold film 3 is deposited on top of the gold film 3. According to such a structure, the laser light inside the cavity is reflected by the gold film 3, and almost no light is emitted from the end face of the cavity to which the gold film 3 is attached. Therefore, most of the laser light is extracted from the end face of the cavity to which the gold film is not attached. In this way, the oscillation threshold current is reduced, and high-output laser light can be extracted. However, the APC (Automatic
Power C1ntrol) In order to perform the entire operation, it is necessary to use light emitted from the back side of the cavity, so it is also necessary to use some light from the end face of the cavity to which the gold film 3 is attached.

ところで、前述の従来の構造のレーザ素子を、第2図に
示すように、放熱体4の上にボンディングすると、放熱
体4に付着された錫などの金属5が、キャビティ端面の
金膜3の個所に吸い上げられ、金属5と金膜3とが合金
化してしまう。その結果、キャビティの背面からの光は
全く取り出すことができない。したがって、前述のAP
C動作を行わせることができない。
By the way, when the laser element having the above-mentioned conventional structure is bonded onto the heat sink 4 as shown in FIG. The metal 5 and the gold film 3 become alloyed. As a result, no light can be extracted from the back side of the cavity. Therefore, the aforementioned AP
C operation cannot be performed.

発明の目的 本発明は、前記従来の欠点に鑑み、放熱体にボンディン
グされた状態でも、APC動作を行わせることができる
半導体レーザ装置を提供するものである。
OBJECTS OF THE INVENTION In view of the above-mentioned conventional drawbacks, the present invention provides a semiconductor laser device that can perform APC operation even when bonded to a heat sink.

発明の構成 この目的全達成するために、本発明の半導体レーザ装置
は、一方のキャビテイ面に、絶縁膜、金属膜、絶縁膜が
順次形成された半導体レーザ装置である。
Structure of the Invention In order to achieve all of the above objects, the semiconductor laser device of the present invention is a semiconductor laser device in which an insulating film, a metal film, and an insulating film are sequentially formed on one cavity surface.

実施例の説明 以下、本発明の一実施例について、図面全参照しながら
説明する。第3図は本発明の一実施例における中心体レ
ーザ装置の構成を示すものである。
DESCRIPTION OF EMBODIMENTS An embodiment of the present invention will be described below with reference to all the drawings. FIG. 3 shows the configuration of a central body laser device in one embodiment of the present invention.

先ずこの構成の半導体レーザ装置の製造方法を述べる。First, a method for manufacturing a semiconductor laser device having this configuration will be described.

レーザチップ1の両へき開面に、スパッタ法により厚さ
2760人の5102膜2を付着する。次に一方のへき
開面にのみ厚さ1000への金膜3を付着する。さらに
、金膜3の上に厚さ1000人の8102膜6を付着す
る。このレーザチップ1を銅製の放熱体4に錫を用いて
ボンディングする。
A 5102 film 2 having a thickness of 2760 mm is deposited on both cleavage planes of the laser chip 1 by sputtering. Next, a gold film 3 with a thickness of 1000 mm is deposited on only one cleavage surface. Further, an 8102 film 6 with a thickness of 1000 mm is deposited on the gold film 3. This laser chip 1 is bonded to a heat sink 4 made of copper using tin.

5i02膜2の厚さ2750人はλ/2の厚さに付着さ
れているので、キャビティから出てくる光の量は、第1
図の構造のレーザと全く同じである。
Since the thickness of the 5i02 film 2 is 2750 λ/2, the amount of light coming out of the cavity is
The structure is exactly the same as the laser shown in the figure.

しかも発振しきい値電流も同じである。このレーザ素子
1は、キャビティ端面の最外部が金属でなく絶縁膜6で
構成されているので、第2図における金属5をはじいて
しまい、金属6は盛り上ることができない。従って、放
熱体4にボンディングされた状態でも、キャビティの金
膜3を付着した側から、光を取り出すことができ、AP
C動作が可能である。
Moreover, the oscillation threshold current is also the same. In this laser element 1, since the outermost part of the cavity end face is made of an insulating film 6 instead of metal, the metal 5 shown in FIG. 2 is repelled, and the metal 6 cannot rise up. Therefore, even when bonded to the heat sink 4, light can be extracted from the side of the cavity where the gold film 3 is attached, and the AP
C operation is possible.

第4図はこのような構造のレーザの前および後から取り
出せる光出力を示す図である。すなわち後面からの光(
特性曲線a)は前面からの光(特1(10曲曲線)の約
1/I0の光出力が出ており、Apc動作を十分に可能
である。また電流工。pは、両面に単に5102膜2だ
けを付着した場合の光(特性曲線C)の約60%であり
、発振効率も高くなり、高出力が得られる。また、との
レーザ装置は、6o n2 W出力、500Cで100
00時間以上のライフが得られた。
FIG. 4 is a diagram showing the optical outputs that can be extracted from the front and rear of a laser having such a structure. In other words, the light from the rear (
Characteristic curve a) has a light output that is approximately 1/I0 of the light from the front (Special 1 (10-curve curve)), and is sufficient for APC operation. This is about 60% of the light when only film 2 is attached (characteristic curve C), and the oscillation efficiency is also high, resulting in high output.In addition, the laser device with 6 o n2 W output, 100
A life of over 00 hours was obtained.

なお、本実施例で用いたSiO2膜2,6のかわりにA
l2O3、5i3Naなどの絶縁膜を、金膜3のかわシ
に白金などの金属膜あるいはそれらの金属の積層膜を用
いてもよい。
Note that instead of the SiO2 films 2 and 6 used in this example, A
An insulating film such as 12O3 or 5i3Na may be used as a substitute for the gold film 3, and a metal film such as platinum or a laminated film of these metals may be used.

発明の効果 以上のように、本発明は、一方のキャビティ端面の金属
膜の外側に絶縁膜が付着されており、高出力が得られる
とともにAPC動作を行わせることができる。
Effects of the Invention As described above, in the present invention, an insulating film is attached to the outside of the metal film on one end face of the cavity, and high output can be obtained and APC operation can be performed.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は従来の半導体レーザ装置の断面図、第2図は従
来の半導体レーザ装置を放熱体にボンディングした状態
を示す図、第3図は本発明の半導体レーザ装置の一実施
例の断面図、第4図は本発明の一実施例の半導体レーザ
装置における電流−光出力関係図である。 2・・・・5102膜、3・・・・・金膜、6・・・・
・・SiO2膜、a・・・・・・前面からの光出力、b
−・・・・後面からの光出力、C・・・・・・5102
膜2のみのレーザ装置の光出力。 代理人の氏名 弁理士 中 尾 敏 男 ほか1名第1
図 2
FIG. 1 is a sectional view of a conventional semiconductor laser device, FIG. 2 is a diagram showing a conventional semiconductor laser device bonded to a heat sink, and FIG. 3 is a sectional view of an embodiment of the semiconductor laser device of the present invention. , FIG. 4 is a current-optical output relationship diagram in a semiconductor laser device according to an embodiment of the present invention. 2...5102 film, 3...gold film, 6...
...SiO2 film, a... Light output from the front, b
-...Light output from the rear surface, C...5102
Optical output of the laser device with only film 2. Name of agent: Patent attorney Toshio Nakao and 1 other person No. 1
Figure 2

Claims (1)

【特許請求の範囲】 半導体レーザの一方のキャビテイ面に絶l膜。 金属膜、絶縁膜が順次積層されたことを特徴とする半導
体レーザ装置。
[Claims] An insulating film is provided on one cavity surface of a semiconductor laser. A semiconductor laser device characterized in that a metal film and an insulating film are sequentially laminated.
JP11759383A 1983-06-28 1983-06-28 Semiconductor laser device Pending JPS609189A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP11759383A JPS609189A (en) 1983-06-28 1983-06-28 Semiconductor laser device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11759383A JPS609189A (en) 1983-06-28 1983-06-28 Semiconductor laser device

Publications (1)

Publication Number Publication Date
JPS609189A true JPS609189A (en) 1985-01-18

Family

ID=14715651

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11759383A Pending JPS609189A (en) 1983-06-28 1983-06-28 Semiconductor laser device

Country Status (1)

Country Link
JP (1) JPS609189A (en)

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4725450A (en) * 1986-02-28 1988-02-16 Mitsubishi Denki Kabushiki Kaisha Method for fabricating a semiconductor laser device
US4840922A (en) * 1986-07-29 1989-06-20 Ricoh Company, Ltd. Method of manufacturing masked semiconductor laser
US4855256A (en) * 1987-02-13 1989-08-08 Ricoh Company, Ltd. Method of manufacturing masked semiconductor laser
US5355424A (en) * 1991-09-10 1994-10-11 Alcatel, N.V. Method of operating a semiconductor device as an optical filter and semiconductor device for implementing the method
JPH07254748A (en) * 1994-03-16 1995-10-03 Matsushita Electron Corp Semiconductor laser equipment and its manufacture
JPH10242583A (en) * 1997-02-27 1998-09-11 Sharp Corp Manufacture of semiconductor laser element and semiconductor laser device
JP2019009346A (en) * 2017-06-27 2019-01-17 住友電気工業株式会社 Quantum cascade laser

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4725450A (en) * 1986-02-28 1988-02-16 Mitsubishi Denki Kabushiki Kaisha Method for fabricating a semiconductor laser device
US4840922A (en) * 1986-07-29 1989-06-20 Ricoh Company, Ltd. Method of manufacturing masked semiconductor laser
US4855256A (en) * 1987-02-13 1989-08-08 Ricoh Company, Ltd. Method of manufacturing masked semiconductor laser
US5355424A (en) * 1991-09-10 1994-10-11 Alcatel, N.V. Method of operating a semiconductor device as an optical filter and semiconductor device for implementing the method
JPH07254748A (en) * 1994-03-16 1995-10-03 Matsushita Electron Corp Semiconductor laser equipment and its manufacture
JPH10242583A (en) * 1997-02-27 1998-09-11 Sharp Corp Manufacture of semiconductor laser element and semiconductor laser device
JP2019009346A (en) * 2017-06-27 2019-01-17 住友電気工業株式会社 Quantum cascade laser

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