JPS6090202A - キレート性吸着剤及びその製造法 - Google Patents
キレート性吸着剤及びその製造法Info
- Publication number
- JPS6090202A JPS6090202A JP58198349A JP19834983A JPS6090202A JP S6090202 A JPS6090202 A JP S6090202A JP 58198349 A JP58198349 A JP 58198349A JP 19834983 A JP19834983 A JP 19834983A JP S6090202 A JPS6090202 A JP S6090202A
- Authority
- JP
- Japan
- Prior art keywords
- polymer
- group
- hydrogen
- vinyl
- expressed
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP58198349A JPS6090202A (ja) | 1983-10-25 | 1983-10-25 | キレート性吸着剤及びその製造法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP58198349A JPS6090202A (ja) | 1983-10-25 | 1983-10-25 | キレート性吸着剤及びその製造法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6090202A true JPS6090202A (ja) | 1985-05-21 |
| JPH0469166B2 JPH0469166B2 (enrdf_load_html_response) | 1992-11-05 |
Family
ID=16389630
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP58198349A Granted JPS6090202A (ja) | 1983-10-25 | 1983-10-25 | キレート性吸着剤及びその製造法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6090202A (enrdf_load_html_response) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US11592742B2 (en) * | 2017-08-25 | 2023-02-28 | Hefei Xinsheng Optoelectronics Technology Co., Ltd. | Photoresist composition, its manufacturing method, and manufacturing methods of metal pattern and array substrate |
-
1983
- 1983-10-25 JP JP58198349A patent/JPS6090202A/ja active Granted
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US11592742B2 (en) * | 2017-08-25 | 2023-02-28 | Hefei Xinsheng Optoelectronics Technology Co., Ltd. | Photoresist composition, its manufacturing method, and manufacturing methods of metal pattern and array substrate |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0469166B2 (enrdf_load_html_response) | 1992-11-05 |
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