JPS6090061A - Pure water spray nozzle - Google Patents

Pure water spray nozzle

Info

Publication number
JPS6090061A
JPS6090061A JP19699783A JP19699783A JPS6090061A JP S6090061 A JPS6090061 A JP S6090061A JP 19699783 A JP19699783 A JP 19699783A JP 19699783 A JP19699783 A JP 19699783A JP S6090061 A JPS6090061 A JP S6090061A
Authority
JP
Japan
Prior art keywords
pure water
nozzle
ionized gas
high speed
stream
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP19699783A
Other languages
Japanese (ja)
Inventor
Seiichi Iwamatsu
誠一 岩松
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Seiko Epson Corp
Suwa Seikosha KK
Original Assignee
Seiko Epson Corp
Suwa Seikosha KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Seiko Epson Corp, Suwa Seikosha KK filed Critical Seiko Epson Corp
Priority to JP19699783A priority Critical patent/JPS6090061A/en
Publication of JPS6090061A publication Critical patent/JPS6090061A/en
Pending legal-status Critical Current

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  • Nozzles (AREA)

Abstract

PURPOSE:To prevent the generation of electrostatic discharge when pure water is injected at a high speed, by mounting an internal nozzle for introducing ionized gas to a pure water jet nozzle. CONSTITUTION:A nozzle 2 for injecting ionized gas 4 from an ionizer is provided in a pure water jet nozzle 1 and ionized gas 4 from the nozzle 2 is taken in the stream of pure water as bubbles. By this method, the charged pure water stream can be neutralized and electrostatic breakdown of an article to be injected by charge of the pure water stream can be prevented.

Description

【発明の詳細な説明】 本発明は純水を噴射するノズルの構造に関する。[Detailed description of the invention] The present invention relates to the structure of a nozzle that injects pure water.

従来、純水fr、aX躬するノズルは一本のステンシス
管内に高圧で純水を供給するのが通例であり、これら純
水が高速噴射は、半導体装置の表面洗浄に用いられるの
が通例であった。
Conventionally, pure water fr, ax nozzles have typically supplied pure water at high pressure into a single stencil tube, and these pure water jets at high speed are typically used for cleaning the surfaces of semiconductor devices. there were.

しかし、上記従来技術によると、純水が高い絶紅性を有
するために、ノズル口から明水後、静電気を帯び、半導
体装置との間等被噴射物との間で放電を発見し、被噴射
物を静電破壊、たとえば半導体表面のsS oa Mの
絶縁破壊や、Al配線の溶断を起す等の欠点があった。
However, according to the above-mentioned conventional technology, since the pure water has a high blushing property, it is charged with static electricity after it leaves the nozzle opening, and discharge is discovered between the jetted object such as between the semiconductor device and the jetted object. There are disadvantages in that the ejected material causes electrostatic damage, such as dielectric breakdown of sS oa M on the semiconductor surface and melting of Al wiring.

本発明はかかる従来技術の欠点をなくシ、純水の高速噴
射時に静電放電の発生のな込純水の噴射ノズルを提供す
る仁とを目的とする。
SUMMARY OF THE INVENTION It is an object of the present invention to eliminate the drawbacks of the prior art and to provide a pure water injection nozzle that does not generate electrostatic discharge during high-speed injection of pure water.

上記目的を達成するための本発明の基本的な構成/ri
%純水噴射ノズルに関し、純水を高速で噴射するノズル
に於て、イオン化ガスを純水流内に導入する内部ノズル
を具備することを特徴とすること、またはイオン化ガス
を純水流周辺に供給する外周ノズルを具備することを特
徴とする。
Basic configuration/ri of the present invention to achieve the above object
%Regarding a pure water injection nozzle, a nozzle that injects pure water at high speed is characterized by being equipped with an internal nozzle that introduces ionized gas into the pure water stream, or supplies ionized gas around the pure water stream. It is characterized by having a peripheral nozzle.

以下、実施例により本発明を詳述する。Hereinafter, the present invention will be explained in detail with reference to Examples.

第1図は本発明の一実施例を示す純水噴水ノズルの断面
図である。すなわち、純水4を高速で通して噴出するノ
ズルであシ、該純水’l出/ Xk lの内部にイオナ
イザーCガスをイオン化する装置)カラノイオン化カス
4t−噴出するノズル2が設置され、該イオン化ガス、
ノズル2からのイオン化ガス4が純水4流水中に泡とし
て取ル込まれることとなる。
FIG. 1 is a sectional view of a pure water fountain nozzle showing one embodiment of the present invention. That is, there is a nozzle that ejects pure water 4 through it at high speed, and a nozzle 2 that ejects ionized scum (a device for ionizing ionizer C gas) is installed inside the pure water. the ionized gas,
The ionized gas 4 from the nozzle 2 is taken into the flowing pure water 4 as bubbles.

第2図は、本発明の他の実施例を示す純水噴出ノズルの
断面図である。すなわち、純水4を高速で流し噴出する
ノズル12の外周はイオン化ガス3を噴出するノズル1
】で覆われて成p、噴出流水の外周にイオン化ガス3が
流れることとなる。
FIG. 2 is a sectional view of a pure water jet nozzle showing another embodiment of the present invention. That is, the outer periphery of the nozzle 12 that flows and spouts pure water 4 at high speed is the same as the nozzle 1 that spouts ionized gas 3.
], and the ionized gas 3 flows around the outer periphery of the spouting water.

本発明の如く、高速で噴出する純水4内または外にイオ
ン化ガス3′t−取p込んだζり、イオン化ガス3に晒
すことにより、帯電純水流の中和が、X計ることができ
、ひいては、純水流の帯電による被噴射物の静電破壊が
防止できる効果がある。
As in the present invention, by introducing ionized gas 3' into or outside of pure water 4 jetting out at high speed and exposing it to the ionized gas 3, neutralization of the charged pure water flow can be measured. This has the effect of preventing electrostatic damage to the object to be jetted due to charging of the pure water stream.

【図面の簡単な説明】[Brief explanation of the drawing]

記1図は本発明の一実施例を示す純水噴出ノズルの断面
図、第2図は、本発明の他の実施例を示す純水噴出ノズ
ルの断面図である。 1.12・・純水噴水ノズル 2.11・・イオン化ガ
ス噴出ノズル 3・・イオン化ガス 4−・純水 以 上 山聞A444−キ八仙1且□エム 第2図
FIG. 1 is a cross-sectional view of a pure water jet nozzle showing one embodiment of the present invention, and FIG. 2 is a cross-sectional view of a pure water jet nozzle showing another embodiment of the present invention. 1.12...Pure water fountain nozzle 2.11...Ionized gas jetting nozzle 3...Ionized gas 4--Pure water or more Kamiyama A444-Kihasen 1 and □M Figure 2

Claims (1)

【特許請求の範囲】 1、純水を高速で噴射するノズルに於て、イオン化ガス
を純水流内に導入する内部ノズル金具備することを特徴
とする純水噴射ノズル。 2、純水を高速で噴射するノズルに於て、イオン化ガス
を純水DIし周辺に供給する外周、ノズルを具備するこ
とを特徴とする純水噴射ノズル。
[Scope of Claims] 1. A pure water injection nozzle for injecting pure water at high speed, characterized in that the nozzle is equipped with an internal nozzle fitting for introducing ionized gas into the pure water flow. 2. A pure water injection nozzle for injecting pure water at high speed, characterized by comprising an outer periphery and a nozzle for converting ionized gas into pure water DI and supplying it to the surrounding area.
JP19699783A 1983-10-21 1983-10-21 Pure water spray nozzle Pending JPS6090061A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP19699783A JPS6090061A (en) 1983-10-21 1983-10-21 Pure water spray nozzle

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP19699783A JPS6090061A (en) 1983-10-21 1983-10-21 Pure water spray nozzle

Publications (1)

Publication Number Publication Date
JPS6090061A true JPS6090061A (en) 1985-05-21

Family

ID=16367105

Family Applications (1)

Application Number Title Priority Date Filing Date
JP19699783A Pending JPS6090061A (en) 1983-10-21 1983-10-21 Pure water spray nozzle

Country Status (1)

Country Link
JP (1) JPS6090061A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH1098402A (en) * 1996-09-19 1998-04-14 Nippon Columbia Co Ltd Information receiver

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH1098402A (en) * 1996-09-19 1998-04-14 Nippon Columbia Co Ltd Information receiver

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