JPS6088945A - 画像複製材料用水性処理液 - Google Patents

画像複製材料用水性処理液

Info

Publication number
JPS6088945A
JPS6088945A JP19716183A JP19716183A JPS6088945A JP S6088945 A JPS6088945 A JP S6088945A JP 19716183 A JP19716183 A JP 19716183A JP 19716183 A JP19716183 A JP 19716183A JP S6088945 A JPS6088945 A JP S6088945A
Authority
JP
Japan
Prior art keywords
image
acid
colorant
nonionic surfactant
aqueous
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP19716183A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0331249B2 (enrdf_load_stackoverflow
Inventor
Takamasa Ariki
有木　孝允
Yoshio Kato
加藤　義夫
Michiatsu Kouno
通篤 河野
Shinichi Tanaka
新一 田中
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toyobo Co Ltd
Original Assignee
Toyobo Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toyobo Co Ltd filed Critical Toyobo Co Ltd
Priority to JP19716183A priority Critical patent/JPS6088945A/ja
Publication of JPS6088945A publication Critical patent/JPS6088945A/ja
Publication of JPH0331249B2 publication Critical patent/JPH0331249B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/32—Liquid compositions therefor, e.g. developers
    • G03F7/322—Aqueous alkaline compositions

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
JP19716183A 1983-10-20 1983-10-20 画像複製材料用水性処理液 Granted JPS6088945A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP19716183A JPS6088945A (ja) 1983-10-20 1983-10-20 画像複製材料用水性処理液

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP19716183A JPS6088945A (ja) 1983-10-20 1983-10-20 画像複製材料用水性処理液

Publications (2)

Publication Number Publication Date
JPS6088945A true JPS6088945A (ja) 1985-05-18
JPH0331249B2 JPH0331249B2 (enrdf_load_stackoverflow) 1991-05-02

Family

ID=16369784

Family Applications (1)

Application Number Title Priority Date Filing Date
JP19716183A Granted JPS6088945A (ja) 1983-10-20 1983-10-20 画像複製材料用水性処理液

Country Status (1)

Country Link
JP (1) JPS6088945A (enrdf_load_stackoverflow)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6211852A (ja) * 1985-07-10 1987-01-20 Nippon Telegr & Teleph Corp <Ntt> パタ−ン形成方法
JPH0225846A (ja) * 1988-07-15 1990-01-29 Fuji Photo Film Co Ltd 減力液及び銀画像の減力処理法
JPH03198046A (ja) * 1989-12-27 1991-08-29 Konica Corp 着色画像形成材料用現像液
WO1997033197A1 (fr) * 1996-03-08 1997-09-12 Nippon Zeon Co., Ltd. Procede de preparation d'une planche d'impression photosensible, solution de developpement aqueuse associee, solution de rinçage aqueuse et revelateur destine a la planche d'impression photosensible

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5525100A (en) * 1978-08-10 1980-02-22 Hoechst Ag Developing exposed print plate
JPS5752053A (en) * 1980-09-12 1982-03-27 Asahi Chem Ind Co Ltd Manufacture of photosensitive resin plate

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5525100A (en) * 1978-08-10 1980-02-22 Hoechst Ag Developing exposed print plate
JPS5752053A (en) * 1980-09-12 1982-03-27 Asahi Chem Ind Co Ltd Manufacture of photosensitive resin plate

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6211852A (ja) * 1985-07-10 1987-01-20 Nippon Telegr & Teleph Corp <Ntt> パタ−ン形成方法
JPH0225846A (ja) * 1988-07-15 1990-01-29 Fuji Photo Film Co Ltd 減力液及び銀画像の減力処理法
JPH03198046A (ja) * 1989-12-27 1991-08-29 Konica Corp 着色画像形成材料用現像液
WO1997033197A1 (fr) * 1996-03-08 1997-09-12 Nippon Zeon Co., Ltd. Procede de preparation d'une planche d'impression photosensible, solution de developpement aqueuse associee, solution de rinçage aqueuse et revelateur destine a la planche d'impression photosensible

Also Published As

Publication number Publication date
JPH0331249B2 (enrdf_load_stackoverflow) 1991-05-02

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