JPS6083399A - Multilayer printed circuit board and method of producing same - Google Patents

Multilayer printed circuit board and method of producing same

Info

Publication number
JPS6083399A
JPS6083399A JP19098883A JP19098883A JPS6083399A JP S6083399 A JPS6083399 A JP S6083399A JP 19098883 A JP19098883 A JP 19098883A JP 19098883 A JP19098883 A JP 19098883A JP S6083399 A JPS6083399 A JP S6083399A
Authority
JP
Japan
Prior art keywords
circuit board
printed circuit
multilayer printed
copper
chemical
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP19098883A
Other languages
Japanese (ja)
Inventor
昭雄 高橋
正博 小野
和嶋 元世
奈良原 俊和
捷夫 菅原
古川 清則
嶋崎 威
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP19098883A priority Critical patent/JPS6083399A/en
Publication of JPS6083399A publication Critical patent/JPS6083399A/en
Pending legal-status Critical Current

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  • Production Of Multi-Layered Print Wiring Board (AREA)

Abstract

(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。
(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.

Description

【発明の詳細な説明】 〔発明の利用分野〕 本発明は、表面及び内部に回路網を構成する複数の導電
体層を有する多層プリント回路板において、回路導体と
レジン間の接着性を良くし信頼性を向上した多層プリン
ト回路板及びその製造方法に関する。
Detailed Description of the Invention [Field of Application of the Invention] The present invention is directed to improving the adhesion between a circuit conductor and a resin in a multilayer printed circuit board having a plurality of conductor layers constituting a circuit network on the surface and inside. The present invention relates to a multilayer printed circuit board with improved reliability and a method for manufacturing the same.

〔発明の背景〕[Background of the invention]

従来より、この種の回路板の接着に当り、中間層に使用
する銅箔としては、あらかじめ接着用プリプレグと接す
る表面をマット面(銅箔裏面)と同じ程度の粗さにした
両面粗化箔を使用したり、あるいは酸化第1銅若しくは
酸化第2銅の被膜形成処理を行うことにより回路用銅箔
上前記プリプレグ間の接着力を補う方法が用いられてい
る。
Conventionally, when bonding this type of circuit board, the copper foil used for the intermediate layer has been a double-sided roughened foil whose surface in contact with the adhesive prepreg has been roughened to the same roughness as the matte surface (back surface of the copper foil). A method of supplementing the adhesion between the prepregs on the circuit copper foil by using copper oxide or by forming a film of cuprous oxide or cupric oxide is used.

しかし、両面粗化銅箔は通常の片面粗化剤と比べてコス
トが高い。
However, double-sided roughened copper foil is more expensive than ordinary single-sided roughened copper foil.

最近、パターン精度、経済性等の関係から、回路用導体
として、上記電解銅箔に代シ、化学銅めっき被膜が使用
されつつある。
Recently, chemical copper plating films have been increasingly used as circuit conductors in place of the electrolytic copper foils described above due to considerations such as pattern accuracy and economical efficiency.

化学銅めっき被膜の場合、従来使用されていた銅箔(電
解銅箔、圧延銅箔)と大きく異なる点は、加熱による水
素ガスの発生量が極めて多い点である。したがって各回
路板をプリプレグを介して加熱加圧下要層化接着する際
、その熱によシ銅箔表面に形成された酸化第1銅若しく
は酸化第2銅被膜の1部が水素によシ還元され元の銅に
戻るため、回路表面とプリプレグ間の接着力が低下する
ことが、本発明者等の検討でわかった。− この点を添付の第1図を用いて具体的に説明する。すガ
わち第1図は、多層プリント回路板の1例を製造する場
合における、多層化接着工程及び外i回路導体形成工程
の模式図であり、(°)は多層1ヒ接着前の各部品の配
置!示し・(b)は多層プリント回路板を示す。第1し
1において、符号1は外層用回路板、2は内層用回路板
、5は化学銅、4は酸化銅被膜、5はプリプレグ、6は
外層回路銅、7はスルーホールめっき膜を意味する。
In the case of chemical copper plating films, the major difference from conventionally used copper foils (electrolytic copper foils, rolled copper foils) is that they generate an extremely large amount of hydrogen gas when heated. Therefore, when each circuit board is bonded in layers under heat and pressure via prepreg, a part of the cuprous oxide or cupric oxide film formed on the surface of the copper foil is reduced by hydrogen due to the heat. The inventors of the present invention found through their studies that the adhesive force between the circuit surface and the prepreg decreases because the prepreg returns to its original state. - This point will be explained in detail using the attached Figure 1. Figure 1 is a schematic diagram of the multilayer adhesion process and the outer i-circuit conductor formation process in the case of manufacturing an example of a multilayer printed circuit board, and (°) indicates each stage before multilayer bonding. Placement of parts! Figure (b) shows a multilayer printed circuit board. In No. 1 and 1, the code 1 means the outer layer circuit board, 2 means the inner layer circuit board, 5 means chemical copper, 4 means copper oxide coating, 5 means prepreg, 6 means outer layer circuit copper, and 7 means through hole plating film. do.

しかして従来技術では、多層化接着工程で、酸化銅被膜
4の1部が還元されて元の銅に戻るため、前記したよう
に接着力が低下することが判明した。
However, in the prior art, it has been found that in the multilayer bonding process, a portion of the copper oxide film 4 is reduced and returned to the original copper, resulting in a decrease in adhesive strength as described above.

〔発明の目的〕[Purpose of the invention]

本発明の目的は、化学銅めっき被膜を有する多層プリン
ト回路板の層面接着性を良くし、信頼性を向上した多層
プリント回路板及びその製造方法を提供することにある
An object of the present invention is to provide a multilayer printed circuit board with improved interlayer adhesion and reliability of a multilayer printed circuit board having a chemical copper plating film, and a method for manufacturing the same.

〔発明の概要〕 □ 本発明を概説すれば、本発明の第1の発明は多層プリン
ト回路板に関する械明であって、内層用プリント回路板
の回路用導体の少なくとも一部として化学銅めっき被膜
を用いた多層プリント回路板において、該回路板が、そ
の製造工程中に脱水素処理を行っ苑ものであることを特
徴とする。
[Summary of the Invention] □ To summarize the present invention, the first invention of the present invention is a machine relating to a multilayer printed circuit board, which comprises a chemical copper plating coating as at least a part of the circuit conductor of the inner layer printed circuit board. A multilayer printed circuit board using the present invention is characterized in that the circuit board is subjected to dehydrogenation treatment during its manufacturing process.

また本発明の第2の発明は、上記第1の発明の多層プリ
ント回路板の製造方法に関する発明であって、多層化接
着前に、化学銅めっき被膜成分中の水素含有量を50 
ppm以下にする脱水素処理を行うことを特徴とする。
Further, a second invention of the present invention relates to a method for manufacturing a multilayer printed circuit board according to the first invention, wherein the hydrogen content in the chemical copper plating film component is reduced to 50% before multilayer adhesion.
It is characterized by performing dehydrogenation treatment to reduce the hydrogen content to ppm or less.

既述のように、本発明者等は、多層化接着時に水素の存
在が不都合であること、特にある量以上の存在が望まし
くないことを見出した。
As mentioned above, the present inventors have found that the presence of hydrogen is disadvantageous during multilayer bonding, particularly that the presence of hydrogen in excess of a certain amount is undesirable.

しかして脱水素処理としては、常圧若しくは減圧下にお
ける酸化雰囲気中での処理、水素吸着剤を用いる処理等
がある。
Examples of dehydrogenation treatment include treatment in an oxidizing atmosphere at normal pressure or reduced pressure, treatment using a hydrogen adsorbent, and the like.

しかしなか、ら、本発明者醇・は種種検討した結果、処
理の容易さ、後処理への影響、脱水素効果などの点、か
ら、常圧下における加熱処理が最適であることを見出し
た。
However, as a result of various studies, the inventors of the present invention have found that heat treatment under normal pressure is optimal in terms of ease of treatment, influence on post-treatment, dehydrogenation effect, etc.

更に・許容残存水素量の検討、を行った結果・脱水素処
理を行う時期を含めて:、本発明者等は、内層用回路導
体として化学銅めっき被膜を用いる場合、多層化接着前
に十分な加熱処理をして化学銅めっき被膜中の水素ガス
を50ppm以下に追出してから、酸化第1銅若しくは
酸化第2銅被膜を形成すると、従来のような多層化接着
後の接着力の低下がなくなることを見出した。
Furthermore, as a result of examining the allowable amount of residual hydrogen, including the timing of dehydrogenation treatment, the inventors found that when using a chemical copper plating film as an inner layer circuit conductor, If a cuprous oxide or cupric oxide coating is formed after the hydrogen gas in the chemical copper plating film is expelled to 50 ppm or less by heat treatment, the decrease in adhesive strength after multilayer adhesion as in conventional methods is avoided. I found out that it disappears.

また、上記加熱処理を化学銅めっき表面に酸化第1銅若
しくは酸化第2銅被膜形成後、接着前に行ってもある程
度効果があることがわかった。
Furthermore, it has been found that performing the above heat treatment after forming a cuprous oxide or cupric oxide coating on the chemical copper plating surface and before bonding has some effect.

本発明で行う加熱処理は、化学銅めっき後に通常行われ
ている10’01::前後(D温&で1〜2時間の処理
では化学銅めっき被膜中の残存水素量が50 ppm超
あシ、全く□効果がない。加熱温度としては110℃〜
3oo℃の範囲で効果があるが、好ましくは120〜2
60℃の範囲が最も良いことがわかった。それよシ低温
では、水素ガスが銅被膜から十分排出され難いため、極
めて長時間の加熱時間を要し、作業性が悪い。
The heat treatment performed in the present invention is carried out around 10'01::, which is usually performed after chemical copper plating (1 to 2 hours at D temperature & heat treatment, so that the amount of residual hydrogen in the chemical copper plating film exceeds 50 ppm. , No effect at all.The heating temperature is 110℃~
It is effective in the range of 300°C, but preferably 120-200°C.
It was found that a temperature range of 60°C was best. On the other hand, at low temperatures, it is difficult for hydrogen gas to be sufficiently discharged from the copper coating, so an extremely long heating time is required, resulting in poor workability.

また、加熱処理温度が高すぎると、銅被膜が酸化されて
物性低下を起す。
Furthermore, if the heat treatment temperature is too high, the copper coating will be oxidized and physical properties will deteriorate.

本発明において、銅被膜中の水素含有量が30ppm 
超になると、多層化接着時の加熱によシ、被膜中よシ発
生する水素ガスにより銅被膜上のプリプレグと接する酸
化膜の1部が還元されて元の銅に戻るため、プリプレグ
との接着力が低下する。すなわち、目標とする0、 6
 kg / c!n以上の接着力を得るためには、30
 ppm以下である必要がある。
In the present invention, the hydrogen content in the copper coating is 30 ppm.
When the temperature exceeds 100%, a part of the oxide film in contact with the prepreg on the copper film is reduced by the hydrogen gas generated in the film due to heating during multilayer adhesion and returns to the original copper, making it difficult to bond with the prepreg. Power decreases. In other words, the target is 0, 6
kg/c! In order to obtain adhesive strength of n or more, 30
It needs to be less than ppm.

なお、銅箔中の水素量の測定は、銅箔を不活性ガス雰囲
気中で加熱溶融(約1500℃)させ、発生する水素量
を測定するという方法を用いた。使用した測定機器は国
際電気社′4′!「ナイトロマット」である。
The amount of hydrogen in the copper foil was measured by heating and melting the copper foil (approximately 1500° C.) in an inert gas atmosphere and measuring the amount of hydrogen generated. The measuring equipment used was Kokusai Denkisha '4'! It is "Nitromat".

〔発明の実施例〕[Embodiments of the invention]

次に本発明を実施例によシ更に具体的に説明するが、本
発明はこれらに限定されない。
Next, the present invention will be explained in more detail with reference to Examples, but the present invention is not limited thereto.

なお、本発明に用いた化学銅めっき法は以下に示す通り
である。
The chemical copper plating method used in the present invention is as shown below.

A法:日立製作所が開発したフルアディティブ方式(A
P’−11法)に使用されている化学銅めっき液を使用
した方法で、めっき前処理、温度条件もすべて同じにし
た。(%’i′公昭56−27594号参照) B法:日立化成工業で行われているフルアディティブ方
式(CC−4法)に使用されている化学銅めっき液を使
用した方法で、めっき前処理、温度等の条件もすべて同
じにした。
A method: Full additive method (A method developed by Hitachi, Ltd.)
The method used the chemical copper plating solution used in the P'-11 method), and the plating pretreatment and temperature conditions were all the same. (Refer to %'i' Publication No. 56-27594) Method B: Pre-plating treatment using the chemical copper plating solution used in the fully additive method (CC-4 method) carried out by Hitachi Chemical. All conditions such as temperature and so on were the same.

実施例1 厚さ9μm の極薄銅箔を両面に張合せたポリイミド系
銅張り積層板(MOL−■−67,02濯厚、日立化成
工業社製)に層間接続用のφ050の穴あけを行った後
、前記A法により全面に化学銅めっき被膜(厚み35μ
m)を形成した。
Example 1 A hole of φ050 for interlayer connection was drilled in a polyimide copper-clad laminate (MOL-■-67.02 washing thickness, manufactured by Hitachi Chemical Co., Ltd.) with ultra-thin copper foil of 9 μm thick laminated on both sides. After that, a chemical copper plating film (thickness 35 μm) was applied to the entire surface by method A.
m) was formed.

この時の化学鋼めっき被膜中の水素含有量は55ppm
であった。その後、200℃恒温槽中で1時間加熱処理
した。加熱処理後の化学銅めっき被膜中の水素含有量は
15 ppmに減っていることを確認した。この後、エ
ツチングにより回路を形成した。それから、脱脂処理し
、家温の過硫酸アンモニウム水溶g(zoor/4)中
で30秒間浸漬し表面粗化を行った後、リン酸−三ナト
リウム(102/l)、水酸化ナトリウム(52/l)
、亜塩素酸ナトリウム(502/l)の水溶液中で、7
0〜80℃で120秒処理した後、100℃で約1時間
乾燥させ、酸化被膜形成処理を行った・ 次に、上記のようにして作成した各内層用回路板同士を
ポリイミド系プリプレグ(G工A−67N°、0,1圃
厚、日立化成工業社製)を介して、多層化接着した。こ
の時の加熱□条件は130〜170℃、90分、圧力は
26層kg/l、Iであった。
At this time, the hydrogen content in the chemical steel plating film was 55 ppm.
Met. Thereafter, it was heat-treated in a constant temperature bath at 200° C. for 1 hour. It was confirmed that the hydrogen content in the chemical copper plating film after heat treatment was reduced to 15 ppm. After this, a circuit was formed by etching. Then, it was degreased and surface roughened by immersion in ammonium persulfate aqueous solution g (zoor/4) at home temperature for 30 seconds. )
, in an aqueous solution of sodium chlorite (502/l), 7
After processing at 0 to 80°C for 120 seconds, it was dried at 100°C for about 1 hour to form an oxide film.Next, each inner layer circuit board created as described above was coated with polyimide prepreg (G Multi-layer bonding was carried out using A-67N°, 0.1 field thickness, manufactured by Hitachi Chemical Co., Ltd.). The heating conditions at this time were 130 to 170°C for 90 minutes, and the pressure was 26 kg/l, I.

最徒に、スルーホール穴あけ、めっきを行った後、外層
用回路導体を形成し、導体層数12層の多層プリント回
路板を作成した。
Finally, after drilling through holes and plating, a circuit conductor for the outer layer was formed to create a multilayer printed circuit board with 12 conductor layers.

実施例2 化学銅めっき法として前記B法を用いた以外は実施例1
と全く同様にして多層プリント回路板を作成した。ただ
し、加熱処理前の化学銅めっき被膜中の水素含有量は1
1 ’、5 ppmであったが、200℃、1時間加熱
処理後28 ppmになっていることを確認した。
Example 2 Example 1 except that the above method B was used as the chemical copper plating method
A multilayer printed circuit board was created in exactly the same manner as above. However, the hydrogen content in the chemical copper plating film before heat treatment is 1
1', 5 ppm, but after heat treatment at 200° C. for 1 hour, it was confirmed that it was 28 ppm.

実施例3 両面銅張り積層板としてエポキシ系の−MOL −60
8(日立化成工業社製)、多層化接着用プリプレグとし
てやはりエポキシ系のGFA−608N(日立化成工業
社製)を用いた以外は実施例1と全く同様にして多層プ
リント回路板を作成した。ただし、化学銅めっき被膜の
加熱処理は170℃、120分で行った。水素量は25
ppmとなった。
Example 3 Epoxy-based -MOL-60 as double-sided copper-clad laminate
A multilayer printed circuit board was prepared in exactly the same manner as in Example 1, except that GFA-608N (manufactured by Hitachi Chemical Industries, Ltd.), also an epoxy type, was used as the multilayer adhesive prepreg. However, the heat treatment of the chemical copper plating film was performed at 170° C. for 120 minutes. The amount of hydrogen is 25
ppm.

実施例4 表面粗化処理として塩化第2銅(40r/l)、塩酸(
500グ/l’)の水溶液中、45℃で50秒間処理し
、酸化被膜形成処理としては酢酸銅(zor/z)、酢
酸アンモニウム(60f/l)、塩化アンモニウム(5
t/l)、硫酸銅(sr/l)、アンモニア(1p/4
’)の水溶液中、70〜80℃で約120秒間浸漬し、
酸化被膜形成処理を行った以外は実施例3と全く同様に
して、多層プリント板を作成した。化学銅やつき被膜中
の水素量は実施例3と同じ<25ppmであった。
Example 4 Surface roughening treatment using cupric chloride (40 r/l), hydrochloric acid (
The treatment was carried out at 45°C for 50 seconds in an aqueous solution of
t/l), copper sulfate (sr/l), ammonia (1p/4
') in an aqueous solution at 70 to 80°C for about 120 seconds,
A multilayer printed board was produced in exactly the same manner as in Example 3 except that the oxide film formation treatment was performed. The amount of hydrogen in the chemical copper gloss coating was <25 ppm, the same as in Example 3.

実施例5 化学銅めっき後の加熱処理を酸化被膜形成後に行った以
外は実施例1と全く同様にして多層プリント板を作成し
た。なお、水素量は実施例1と同じ(15pp’mであ
った。
Example 5 A multilayer printed board was produced in exactly the same manner as in Example 1, except that the heat treatment after chemical copper plating was performed after the oxide film was formed. Note that the amount of hydrogen was the same as in Example 1 (15 pp'm).

実〃蕊例6 化学鋼めっき被膜の加熱処理条件をj50℃、ろ時間に
した以外は実施例6と全く同様にして多層プリント回路
板を作成した。加熱処理後の化学銅めっき被膜中の水素
含有量は18 ppmであった。
Fruit Example 6 A multilayer printed circuit board was produced in exactly the same manner as in Example 6, except that the heat treatment conditions for the chemical steel plating film were 50° C. and the filtration time. The hydrogen content in the chemical copper plating film after the heat treatment was 18 ppm.

実施例7 化学銅めっき被膜形成をパターン状に行った以□外は実
施例1と全く同様にして多層プリント回路板を作成した
。ただしこの時は、加熱処理後、パターン部以外の極薄
銅膜のエツチング除去を行った。加熱条件は、190℃
、60分である。なお、加熱処理後の化学銅めつき被5
膜中の水素含有量は20 ppmであった。
Example 7 A multilayer printed circuit board was produced in exactly the same manner as in Example 1, except that the chemical copper plating film was formed in a pattern. However, in this case, after the heat treatment, the ultra-thin copper film other than the pattern area was removed by etching. Heating conditions are 190℃
, 60 minutes. In addition, chemical copper plating coat 5 after heat treatment
The hydrogen content in the film was 20 ppm.

比較例1〜3 イヒ学鋼めっき被膜の加熱処理を行わな−かった以外は
すべて実施例1〜3と同イ1にした多層プリント回路板
を作成した。
Comparative Examples 1 to 3 Multilayer printed circuit boards were prepared in the same manner as in Examples 1 to 3 except that the heat treatment of the steel plating film was not performed.

以上の各実施例及び比較例で得た化学銅めっき被膜の性
質を表1にまとめて示す。
The properties of the chemical copper plating films obtained in each of the above Examples and Comparative Examples are summarized in Table 1.

表 1 表1中、内層銅〜プリプレグ間の接着力は、表面よ)内
層銅まで削り出しく゛内層銅〜プリプレグ間で内層鋼の
引き剥し強度を測定した。
Table 1 In Table 1, the adhesive strength between the inner layer copper and the prepreg was measured by cutting out the inner layer copper (from the surface) and measuring the peeling strength of the inner layer steel between the inner layer copper and the prepreg.

スルーホールめっき前処理時の塩酸浸み込みは、スルー
ホールめっき後、断面を切断し観察した。□ はんだ耐熱性は、260℃のはんだ浴中に試験片を浮べ
、ふくれが発生するまでの時間を測定した。
Hydrochloric acid seepage during through-hole plating pretreatment was observed by cutting a cross section after through-hole plating. □ Soldering heat resistance was determined by floating a test piece in a solder bath at 260°C and measuring the time until blistering occurred.

〔発明の効果〕〔Effect of the invention〕

以上の説明で明らかなように、本発明により製造された
多層プリント回路板は、接着力、耐酸性、耐熱性に滑れ
、極めて信頼性の高いものである。
As is clear from the above description, the multilayer printed circuit board manufactured according to the present invention has excellent adhesive strength, acid resistance, and heat resistance, and is extremely reliable.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は多層プリント回路板の1例を製造する場合にお
ける、多層化接着工程及び多層回路導体形成工種の模式
図でちる。□ 1:外層用回路板、2:内層用回路板、3:化学銅、4
二酸化銅被膜、5:′プリプレグ、6:外層回路銅、7
:スルーホールめつき膜特許出願人 株式会社日立製作
所 □ 代理人 中本 宏 第1図
FIG. 1 is a schematic diagram of a multilayer bonding process and a multilayer circuit conductor forming process in the case of manufacturing an example of a multilayer printed circuit board. □ 1: Circuit board for outer layer, 2: Circuit board for inner layer, 3: Chemical copper, 4
Copper dioxide coating, 5: prepreg, 6: outer layer circuit copper, 7
: Through-hole plating membrane patent applicant: Hitachi, Ltd. □ Agent: Hiroshi Nakamoto Figure 1

Claims (1)

【特許請求の範囲】 1、内層用プリント回路板の回路用導体の少なくとも一
部として化学銅めっき被膜を用いた多層プリント回路板
において、該回路板が、その製造工程中に脱水素処理を
行つんものであることを特徴とする多層プリント回路板
。 2、内層用プリント回路板の回路用導体の少なくとも一
部として化学銅めつき被1を用いる多層プリント回路板
の製造方法において、多層化接着前に、化学鋼めつき疲
膜成分中の水素含有量を30 ppm以下にする脱水素
処理を行うことを特徴とする多層プ□す〜ト□回路板の
5、該脱水素処理が、イヒ学銅め′)き被膜形成後の酸
化銅被膜形成処理の前又は後に行う110℃以上におけ
る加熱−理であ込特許請求の範囲第2項且己載の多層プ
リント回路板の製造方法。
[Claims] 1. A multilayer printed circuit board using a chemical copper plating film as at least a part of the circuit conductor of the inner layer printed circuit board, wherein the circuit board is subjected to dehydrogenation treatment during its manufacturing process. A multilayer printed circuit board characterized by its solidity. 2. In a method for manufacturing a multilayer printed circuit board using chemical copper plating 1 as at least a part of the circuit conductor of the inner layer printed circuit board, hydrogen content in the chemical steel plating fatigue film component is removed before multilayer bonding. 5 of a multilayer printed circuit board characterized by performing a dehydrogenation treatment to reduce the amount of hydrogen to 30 ppm or less, the dehydrogenation treatment is performed after the formation of a copper oxide film after the formation of a copper plated film. A method for manufacturing a self-mounted multilayer printed circuit board according to claim 2, including heating at 110° C. or higher before or after the treatment.
JP19098883A 1983-10-14 1983-10-14 Multilayer printed circuit board and method of producing same Pending JPS6083399A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP19098883A JPS6083399A (en) 1983-10-14 1983-10-14 Multilayer printed circuit board and method of producing same

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP19098883A JPS6083399A (en) 1983-10-14 1983-10-14 Multilayer printed circuit board and method of producing same

Publications (1)

Publication Number Publication Date
JPS6083399A true JPS6083399A (en) 1985-05-11

Family

ID=16266992

Family Applications (1)

Application Number Title Priority Date Filing Date
JP19098883A Pending JPS6083399A (en) 1983-10-14 1983-10-14 Multilayer printed circuit board and method of producing same

Country Status (1)

Country Link
JP (1) JPS6083399A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2017082368A1 (en) * 2015-11-11 2017-05-18 日本発條株式会社 Laminate and laminate manufacturing method

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2017082368A1 (en) * 2015-11-11 2017-05-18 日本発條株式会社 Laminate and laminate manufacturing method
KR20180057662A (en) * 2015-11-11 2018-05-30 닛폰 하츠죠 가부시키가이샤 LAMINATE AND METHOD FOR MANUFACTURING LAMINATE
CN108290380A (en) * 2015-11-11 2018-07-17 日本发条株式会社 The manufacturing method of laminated body and laminated body
EP3375606A4 (en) * 2015-11-11 2019-07-03 NHK Spring Co., Ltd. Laminate and laminate manufacturing method
CN108290380B (en) * 2015-11-11 2020-06-30 日本发条株式会社 Laminate and method for producing laminate

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