JPS6081134A - オクタフルオロプロパンの製造方法 - Google Patents
オクタフルオロプロパンの製造方法Info
- Publication number
- JPS6081134A JPS6081134A JP18927983A JP18927983A JPS6081134A JP S6081134 A JPS6081134 A JP S6081134A JP 18927983 A JP18927983 A JP 18927983A JP 18927983 A JP18927983 A JP 18927983A JP S6081134 A JPS6081134 A JP S6081134A
- Authority
- JP
- Japan
- Prior art keywords
- gas
- reaction
- higher metal
- fluorine
- products
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- QYSGYZVSCZSLHT-UHFFFAOYSA-N octafluoropropane Chemical compound FC(F)(F)C(F)(F)C(F)(F)F QYSGYZVSCZSLHT-UHFFFAOYSA-N 0.000 title claims abstract description 8
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 7
- 229960004065 perflutren Drugs 0.000 title claims abstract description 6
- 229910001512 metal fluoride Inorganic materials 0.000 claims abstract description 18
- 229910021571 Manganese(III) fluoride Inorganic materials 0.000 claims abstract description 8
- SRVINXWCFNHIQZ-UHFFFAOYSA-K manganese(iii) fluoride Chemical compound [F-].[F-].[F-].[Mn+3] SRVINXWCFNHIQZ-UHFFFAOYSA-K 0.000 claims abstract description 8
- HCDGVLDPFQMKDK-UHFFFAOYSA-N hexafluoropropylene Chemical group FC(F)=C(F)C(F)(F)F HCDGVLDPFQMKDK-UHFFFAOYSA-N 0.000 claims abstract description 7
- 229910021583 Cobalt(III) fluoride Inorganic materials 0.000 claims abstract description 6
- WZJQNLGQTOCWDS-UHFFFAOYSA-K cobalt(iii) fluoride Chemical compound F[Co](F)F WZJQNLGQTOCWDS-UHFFFAOYSA-K 0.000 claims abstract description 6
- 238000000034 method Methods 0.000 claims description 20
- XSNQEMWVLMRPFR-UHFFFAOYSA-N silver nitride Chemical compound [N-3].[Ag+].[Ag+].[Ag+] XSNQEMWVLMRPFR-UHFFFAOYSA-N 0.000 claims 1
- 238000006243 chemical reaction Methods 0.000 abstract description 21
- 239000006227 byproduct Substances 0.000 abstract description 7
- KWVVTSALYXIJSS-UHFFFAOYSA-L silver(ii) fluoride Chemical compound [F-].[F-].[Ag+2] KWVVTSALYXIJSS-UHFFFAOYSA-L 0.000 abstract description 6
- 150000001875 compounds Chemical class 0.000 abstract description 5
- 238000005530 etching Methods 0.000 abstract description 2
- 239000012530 fluid Substances 0.000 abstract description 2
- 239000000463 material Substances 0.000 abstract description 2
- 239000004065 semiconductor Substances 0.000 abstract description 2
- 239000007789 gas Substances 0.000 description 24
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 14
- 229910052731 fluorine Inorganic materials 0.000 description 14
- 239000011737 fluorine Substances 0.000 description 14
- 238000003682 fluorination reaction Methods 0.000 description 11
- 239000000203 mixture Substances 0.000 description 10
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 5
- 239000000047 product Substances 0.000 description 5
- ATUOYWHBWRKTHZ-UHFFFAOYSA-N Propane Chemical compound CCC ATUOYWHBWRKTHZ-UHFFFAOYSA-N 0.000 description 4
- 239000007795 chemical reaction product Substances 0.000 description 4
- WUKWITHWXAAZEY-UHFFFAOYSA-L calcium difluoride Chemical compound [F-].[F-].[Ca+2] WUKWITHWXAAZEY-UHFFFAOYSA-L 0.000 description 3
- 229910001634 calcium fluoride Inorganic materials 0.000 description 3
- 239000011203 carbon fibre reinforced carbon Substances 0.000 description 3
- 239000012025 fluorinating agent Substances 0.000 description 3
- 239000002994 raw material Substances 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 2
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 2
- 238000009835 boiling Methods 0.000 description 2
- 239000000460 chlorine Substances 0.000 description 2
- 229910052801 chlorine Inorganic materials 0.000 description 2
- 239000003085 diluting agent Substances 0.000 description 2
- -1 fluorosilicates Chemical class 0.000 description 2
- 239000001307 helium Substances 0.000 description 2
- 229910052734 helium Inorganic materials 0.000 description 2
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 2
- 239000001257 hydrogen Substances 0.000 description 2
- 229910052739 hydrogen Inorganic materials 0.000 description 2
- 229910052757 nitrogen Inorganic materials 0.000 description 2
- 239000000843 powder Substances 0.000 description 2
- 239000001294 propane Substances 0.000 description 2
- 238000007086 side reaction Methods 0.000 description 2
- GKXWTRSVUPXQMM-UHFFFAOYSA-N 1,1,1,2,2-pentachloro-3,3,3-trifluoropropane Chemical compound FC(F)(F)C(Cl)(Cl)C(Cl)(Cl)Cl GKXWTRSVUPXQMM-UHFFFAOYSA-N 0.000 description 1
- KLZUFWVZNOTSEM-UHFFFAOYSA-K Aluminium flouride Chemical compound F[Al](F)F KLZUFWVZNOTSEM-UHFFFAOYSA-K 0.000 description 1
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 1
- 229910021607 Silver chloride Inorganic materials 0.000 description 1
- 150000001242 acetic acid derivatives Chemical class 0.000 description 1
- 229910001515 alkali metal fluoride Inorganic materials 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- RRZKHZBOZDIQJG-UHFFFAOYSA-N azane;manganese Chemical compound N.[Mn] RRZKHZBOZDIQJG-UHFFFAOYSA-N 0.000 description 1
- 150000003842 bromide salts Chemical class 0.000 description 1
- 239000011575 calcium Substances 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 150000004649 carbonic acid derivatives Chemical class 0.000 description 1
- 150000008280 chlorinated hydrocarbons Chemical class 0.000 description 1
- 150000001805 chlorine compounds Chemical class 0.000 description 1
- 238000003776 cleavage reaction Methods 0.000 description 1
- 229910017052 cobalt Inorganic materials 0.000 description 1
- 239000010941 cobalt Substances 0.000 description 1
- GVPFVAHMJGGAJG-UHFFFAOYSA-L cobalt dichloride Chemical compound [Cl-].[Cl-].[Co+2] GVPFVAHMJGGAJG-UHFFFAOYSA-L 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- CTNMMTCXUUFYAP-UHFFFAOYSA-L difluoromanganese Chemical compound F[Mn]F CTNMMTCXUUFYAP-UHFFFAOYSA-L 0.000 description 1
- 229910001873 dinitrogen Inorganic materials 0.000 description 1
- 238000004880 explosion Methods 0.000 description 1
- 150000002222 fluorine compounds Chemical class 0.000 description 1
- 238000004817 gas chromatography Methods 0.000 description 1
- 239000008187 granular material Substances 0.000 description 1
- UKACHOXRXFQJFN-UHFFFAOYSA-N heptafluoropropane Chemical compound FC(F)C(F)(F)C(F)(F)F UKACHOXRXFQJFN-UHFFFAOYSA-N 0.000 description 1
- 229910000040 hydrogen fluoride Inorganic materials 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 150000004694 iodide salts Chemical class 0.000 description 1
- 239000011572 manganese Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- SNMVRZFUUCLYTO-UHFFFAOYSA-N n-propyl chloride Chemical compound CCCCl SNMVRZFUUCLYTO-UHFFFAOYSA-N 0.000 description 1
- 150000002823 nitrates Chemical class 0.000 description 1
- 238000006116 polymerization reaction Methods 0.000 description 1
- 230000007017 scission Effects 0.000 description 1
- HKZLPVFGJNLROG-UHFFFAOYSA-M silver monochloride Chemical compound [Cl-].[Ag+] HKZLPVFGJNLROG-UHFFFAOYSA-M 0.000 description 1
- 150000003467 sulfuric acid derivatives Chemical class 0.000 description 1
- JOHWNGGYGAVMGU-UHFFFAOYSA-N trifluorochlorine Chemical compound FCl(F)F JOHWNGGYGAVMGU-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP18927983A JPS6081134A (ja) | 1983-10-12 | 1983-10-12 | オクタフルオロプロパンの製造方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP18927983A JPS6081134A (ja) | 1983-10-12 | 1983-10-12 | オクタフルオロプロパンの製造方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6081134A true JPS6081134A (ja) | 1985-05-09 |
| JPS6254777B2 JPS6254777B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1987-11-17 |
Family
ID=16238653
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP18927983A Granted JPS6081134A (ja) | 1983-10-12 | 1983-10-12 | オクタフルオロプロパンの製造方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6081134A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) |
Cited By (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO1995010494A1 (de) * | 1993-10-15 | 1995-04-20 | Solvay Fluor Und Derivate Gmbh | Verfahren zur herstellung von pentafluorethan und zur reinigung von 1,1,1,2-tetrafluorethan |
| JP2002069014A (ja) * | 2000-08-30 | 2002-03-08 | Showa Denko Kk | オクタフルオロプロパンの製造方法及びその用途 |
| WO2002022254A3 (en) * | 2000-09-14 | 2002-10-10 | Showa Denko Kk | Adsorbent for purifying perfluorocarbon, process for producing same, high purity octafluoropropane and octafluorocyclobutane, and use thereof |
| KR100447804B1 (ko) * | 2001-07-09 | 2004-09-08 | 울산화학주식회사 | 고순도 퍼플루오로프로판의 제조방법 |
| US7041264B2 (en) | 2001-01-15 | 2006-05-09 | Showa Denko K.K. | Process for purifying octafluoropropane |
| JP2007106726A (ja) * | 2005-10-17 | 2007-04-26 | National Institute Of Advanced Industrial & Technology | １，１，２，２，３−ペンタフルオロシクロブタンの製造方法 |
| JP2007176842A (ja) * | 2005-12-27 | 2007-07-12 | Showa Denko Kk | オクタフルオロプロパンの製造方法 |
| CN103497086A (zh) * | 2013-09-22 | 2014-01-08 | 佛山市华特气体有限公司 | 八氟丙烷的制备方法 |
-
1983
- 1983-10-12 JP JP18927983A patent/JPS6081134A/ja active Granted
Non-Patent Citations (1)
| Title |
|---|
| THE JOURNAL OF ORGANIC CHEMISTRY 28=1963 * |
Cited By (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO1995010494A1 (de) * | 1993-10-15 | 1995-04-20 | Solvay Fluor Und Derivate Gmbh | Verfahren zur herstellung von pentafluorethan und zur reinigung von 1,1,1,2-tetrafluorethan |
| JP2002069014A (ja) * | 2000-08-30 | 2002-03-08 | Showa Denko Kk | オクタフルオロプロパンの製造方法及びその用途 |
| WO2002022254A3 (en) * | 2000-09-14 | 2002-10-10 | Showa Denko Kk | Adsorbent for purifying perfluorocarbon, process for producing same, high purity octafluoropropane and octafluorocyclobutane, and use thereof |
| US7094935B2 (en) | 2000-09-14 | 2006-08-22 | Showa Denko K.K. | Adsorbent for purifying perfluorocarbon, process for producing same, high purity octafluoropropane and octafluorocyclobutane, and use thereof |
| US7041264B2 (en) | 2001-01-15 | 2006-05-09 | Showa Denko K.K. | Process for purifying octafluoropropane |
| KR100447804B1 (ko) * | 2001-07-09 | 2004-09-08 | 울산화학주식회사 | 고순도 퍼플루오로프로판의 제조방법 |
| JP2007106726A (ja) * | 2005-10-17 | 2007-04-26 | National Institute Of Advanced Industrial & Technology | １，１，２，２，３−ペンタフルオロシクロブタンの製造方法 |
| JP2007176842A (ja) * | 2005-12-27 | 2007-07-12 | Showa Denko Kk | オクタフルオロプロパンの製造方法 |
| CN103497086A (zh) * | 2013-09-22 | 2014-01-08 | 佛山市华特气体有限公司 | 八氟丙烷的制备方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6254777B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1987-11-17 |
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