JPS6070452A - 露光装置 - Google Patents

露光装置

Info

Publication number
JPS6070452A
JPS6070452A JP58178305A JP17830583A JPS6070452A JP S6070452 A JPS6070452 A JP S6070452A JP 58178305 A JP58178305 A JP 58178305A JP 17830583 A JP17830583 A JP 17830583A JP S6070452 A JPS6070452 A JP S6070452A
Authority
JP
Japan
Prior art keywords
shutter
exposure
light
time
light intensity
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP58178305A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0423818B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html
Inventor
Keiichiro Sakado
坂戸　啓一郎
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nikon Corp
Nippon Kogaku KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp, Nippon Kogaku KK filed Critical Nikon Corp
Priority to JP58178305A priority Critical patent/JPS6070452A/ja
Publication of JPS6070452A publication Critical patent/JPS6070452A/ja
Publication of JPH0423818B2 publication Critical patent/JPH0423818B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • G03F7/70558—Dose control, i.e. achievement of a desired dose

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Photoreceptors In Electrophotography (AREA)
  • Control Of Exposure In Printing And Copying (AREA)
JP58178305A 1983-09-28 1983-09-28 露光装置 Granted JPS6070452A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP58178305A JPS6070452A (ja) 1983-09-28 1983-09-28 露光装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58178305A JPS6070452A (ja) 1983-09-28 1983-09-28 露光装置

Publications (2)

Publication Number Publication Date
JPS6070452A true JPS6070452A (ja) 1985-04-22
JPH0423818B2 JPH0423818B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1992-04-23

Family

ID=16046146

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58178305A Granted JPS6070452A (ja) 1983-09-28 1983-09-28 露光装置

Country Status (1)

Country Link
JP (1) JPS6070452A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63111617A (ja) * 1986-10-29 1988-05-16 Mitsubishi Electric Corp 縮小投影露光装置

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5450270A (en) * 1977-09-09 1979-04-20 Shii Hoiraa Koubarii Constant intensity light source
JPS54108478A (en) * 1978-02-14 1979-08-25 Ushio Electric Inc Printing or transcribing method of semiconductor and discharge lamp suitable for printing or transcription
JPS57101839A (en) * 1980-12-18 1982-06-24 Nippon Kogaku Kk <Nikon> Exposure device for wafer or photomask

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5450270A (en) * 1977-09-09 1979-04-20 Shii Hoiraa Koubarii Constant intensity light source
JPS54108478A (en) * 1978-02-14 1979-08-25 Ushio Electric Inc Printing or transcribing method of semiconductor and discharge lamp suitable for printing or transcription
JPS57101839A (en) * 1980-12-18 1982-06-24 Nippon Kogaku Kk <Nikon> Exposure device for wafer or photomask

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63111617A (ja) * 1986-10-29 1988-05-16 Mitsubishi Electric Corp 縮小投影露光装置

Also Published As

Publication number Publication date
JPH0423818B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1992-04-23

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