JPS6067662A - 薄膜形成方法及びその装置 - Google Patents

薄膜形成方法及びその装置

Info

Publication number
JPS6067662A
JPS6067662A JP17477383A JP17477383A JPS6067662A JP S6067662 A JPS6067662 A JP S6067662A JP 17477383 A JP17477383 A JP 17477383A JP 17477383 A JP17477383 A JP 17477383A JP S6067662 A JPS6067662 A JP S6067662A
Authority
JP
Japan
Prior art keywords
substrate
thin film
particles
evaporation source
base
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP17477383A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0344143B2 (enrdf_load_stackoverflow
Inventor
Yasuo Morohoshi
保雄 諸星
Akira Nishiwaki
彰 西脇
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Konica Minolta Inc
Original Assignee
Konica Minolta Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Konica Minolta Inc filed Critical Konica Minolta Inc
Priority to JP17477383A priority Critical patent/JPS6067662A/ja
Priority to US06/649,858 priority patent/US4601922A/en
Priority to DE19843434433 priority patent/DE3434433A1/de
Publication of JPS6067662A publication Critical patent/JPS6067662A/ja
Publication of JPH0344143B2 publication Critical patent/JPH0344143B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/04—Coating on selected surface areas, e.g. using masks
    • C23C14/042—Coating on selected surface areas, e.g. using masks using masks
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Photoreceptors In Electrophotography (AREA)
  • Physical Vapour Deposition (AREA)
JP17477383A 1983-09-21 1983-09-21 薄膜形成方法及びその装置 Granted JPS6067662A (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP17477383A JPS6067662A (ja) 1983-09-21 1983-09-21 薄膜形成方法及びその装置
US06/649,858 US4601922A (en) 1983-09-21 1984-09-12 Method of forming a layer of thin film on a substrate having a multiplicity of mesh-like holes
DE19843434433 DE3434433A1 (de) 1983-09-21 1984-09-19 Verfahren und vorrichtung zum erzeugen einer duennen schicht auf einem substrat

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP17477383A JPS6067662A (ja) 1983-09-21 1983-09-21 薄膜形成方法及びその装置

Publications (2)

Publication Number Publication Date
JPS6067662A true JPS6067662A (ja) 1985-04-18
JPH0344143B2 JPH0344143B2 (enrdf_load_stackoverflow) 1991-07-05

Family

ID=15984414

Family Applications (1)

Application Number Title Priority Date Filing Date
JP17477383A Granted JPS6067662A (ja) 1983-09-21 1983-09-21 薄膜形成方法及びその装置

Country Status (1)

Country Link
JP (1) JPS6067662A (enrdf_load_stackoverflow)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63192859A (ja) * 1987-02-05 1988-08-10 Mitsubishi Heavy Ind Ltd 連続式真空蒸着装置
KR100764178B1 (ko) 2000-03-06 2007-10-08 가부시키가이샤 한도오따이 에네루기 켄큐쇼 박막 형성 장치
WO2015062311A1 (zh) * 2013-10-30 2015-05-07 京东方科技集团股份有限公司 真空蒸镀装置

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5333640A (en) * 1976-09-10 1978-03-29 Hitachi Ltd Formation of orientation control film for liquid crystal display element

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5333640A (en) * 1976-09-10 1978-03-29 Hitachi Ltd Formation of orientation control film for liquid crystal display element

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63192859A (ja) * 1987-02-05 1988-08-10 Mitsubishi Heavy Ind Ltd 連続式真空蒸着装置
KR100764178B1 (ko) 2000-03-06 2007-10-08 가부시키가이샤 한도오따이 에네루기 켄큐쇼 박막 형성 장치
KR100764185B1 (ko) * 2000-03-06 2007-10-08 가부시키가이샤 한도오따이 에네루기 켄큐쇼 박막 형성 방법 및 ｅｌ 표시장치 제작방법
US7564054B2 (en) 2000-03-06 2009-07-21 Semiconductor Energy Laboratory Co., Ltd. Thin film forming device, method of forming a thin film, and self-light-emitting device
WO2015062311A1 (zh) * 2013-10-30 2015-05-07 京东方科技集团股份有限公司 真空蒸镀装置
US10316401B2 (en) 2013-10-30 2019-06-11 Boe Technology Group Co., Ltd. Vacuum evaporation device

Also Published As

Publication number Publication date
JPH0344143B2 (enrdf_load_stackoverflow) 1991-07-05

Similar Documents

Publication Publication Date Title
US4634259A (en) Apparatus for maintaining distinct edges between two colors in a two-color image forming device
US4415256A (en) Apparatus for transferring images
JPS6067662A (ja) 薄膜形成方法及びその装置
EP0173621B1 (en) Method for forming a toner imager in electrophotographic printing
EP0036290B1 (en) Apparatus for cleaning particles from a surface
US4601922A (en) Method of forming a layer of thin film on a substrate having a multiplicity of mesh-like holes
JPH02148075A (ja) 転写装置
JPS6067658A (ja) 薄膜形成方法
JPS6067663A (ja) 薄膜形成装置
JPH0323629B2 (enrdf_load_stackoverflow)
JPS6067661A (ja) 薄膜形成装置
JPH0352532B2 (enrdf_load_stackoverflow)
US4265531A (en) Electrophotography
JP3094614B2 (ja) 帯電装置
US4022528A (en) Ion modulator having independently controllable bias electrode
US4600292A (en) Photoconductive screen
US4022527A (en) Ion modulator having independently controllable bias electrode
JPS6147967A (ja) 感光体および画像形成装置
JPH0215063B2 (enrdf_load_stackoverflow)
JPH05297683A (ja) 帯電装置
CA1114005A (en) Method of image formation
JPH06110297A (ja) 帯電装置
JPS6197671A (ja) 画像形成方法
JP2850732B2 (ja) 画像形成装置
JP3006580B2 (ja) 画像形成装置