JPS605519A - Ｘ線露光用マスクおよびその製法 - Google Patents

Ｘ線露光用マスクおよびその製法

Info

Publication number
JPS605519A
JPS605519A JP58112916A JP11291683A JPS605519A JP S605519 A JPS605519 A JP S605519A JP 58112916 A JP58112916 A JP 58112916A JP 11291683 A JP11291683 A JP 11291683A JP S605519 A JPS605519 A JP S605519A
Authority
JP
Japan
Prior art keywords
layer
ray
pattern
mask
ray exposure
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP58112916A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0458171B2 (cg-RX-API-DMAC7.html
Inventor
「よし」原　秀雄
Hideo Yoshihara
Akira Ozawa
小澤　章
Misao Sekimoto
関本　美佐雄
Toshiro Ono
俊郎 小野
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NTT Inc
Original Assignee
Nippon Telegraph and Telephone Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Telegraph and Telephone Corp filed Critical Nippon Telegraph and Telephone Corp
Priority to JP58112916A priority Critical patent/JPS605519A/ja
Priority to US06/513,954 priority patent/US4515876A/en
Priority to FR8311817A priority patent/FR2542882B1/fr
Priority to DE19833325832 priority patent/DE3325832A1/de
Publication of JPS605519A publication Critical patent/JPS605519A/ja
Publication of JPH0458171B2 publication Critical patent/JPH0458171B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP58112916A 1982-07-17 1983-06-24 Ｘ線露光用マスクおよびその製法 Granted JPS605519A (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP58112916A JPS605519A (ja) 1983-06-24 1983-06-24 Ｘ線露光用マスクおよびその製法
US06/513,954 US4515876A (en) 1982-07-17 1983-07-15 X-Ray lithography mask and method for fabricating the same
FR8311817A FR2542882B1 (fr) 1982-07-17 1983-07-18 Masque de lithographie a rayons x et procede de fabrication de celui-ci
DE19833325832 DE3325832A1 (de) 1982-07-17 1983-07-18 Roentgenstrahlenlithographie-maske und verfahren zu seiner herstellung

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58112916A JPS605519A (ja) 1983-06-24 1983-06-24 Ｘ線露光用マスクおよびその製法

Publications (2)

Publication Number Publication Date
JPS605519A true JPS605519A (ja) 1985-01-12
JPH0458171B2 JPH0458171B2 (cg-RX-API-DMAC7.html) 1992-09-16

Family

ID=14598694

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58112916A Granted JPS605519A (ja) 1982-07-17 1983-06-24 Ｘ線露光用マスクおよびその製法

Country Status (1)

Country Link
JP (1) JPS605519A (cg-RX-API-DMAC7.html)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62140421A (ja) * 1985-12-14 1987-06-24 Nippon Telegr & Teleph Corp <Ntt> Ｘ線露光用マスク及びその製法
JPH01150324A (ja) * 1987-12-07 1989-06-13 Dainippon Printing Co Ltd Ｘ線露光用マスクの製造方法
JPH03110821A (ja) * 1989-09-26 1991-05-10 Toppan Printing Co Ltd Ｘ線露光用マスク

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5337704A (en) * 1976-09-20 1978-04-07 Kobe Steel Ltd Conversion of coal
JPS57198461A (en) * 1981-05-18 1982-12-06 Philips Nv Radiant lithographic mask and manufacture thereof
JPS57208138A (en) * 1981-06-18 1982-12-21 Toshiba Corp Manufacture of mask for x-ray exposure
JPS5858545A (ja) * 1981-10-02 1983-04-07 Nippon Telegr & Teleph Corp <Ntt> Ｘ線露光用マスクおよびその製造法

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5337704A (en) * 1976-09-20 1978-04-07 Kobe Steel Ltd Conversion of coal
JPS57198461A (en) * 1981-05-18 1982-12-06 Philips Nv Radiant lithographic mask and manufacture thereof
JPS57208138A (en) * 1981-06-18 1982-12-21 Toshiba Corp Manufacture of mask for x-ray exposure
JPS5858545A (ja) * 1981-10-02 1983-04-07 Nippon Telegr & Teleph Corp <Ntt> Ｘ線露光用マスクおよびその製造法

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62140421A (ja) * 1985-12-14 1987-06-24 Nippon Telegr & Teleph Corp <Ntt> Ｘ線露光用マスク及びその製法
JPH01150324A (ja) * 1987-12-07 1989-06-13 Dainippon Printing Co Ltd Ｘ線露光用マスクの製造方法
JPH03110821A (ja) * 1989-09-26 1991-05-10 Toppan Printing Co Ltd Ｘ線露光用マスク

Also Published As

Publication number Publication date
JPH0458171B2 (cg-RX-API-DMAC7.html) 1992-09-16

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