JPS6048254A - 結晶化ガラスの精密研摩方法 - Google Patents
結晶化ガラスの精密研摩方法Info
- Publication number
- JPS6048254A JPS6048254A JP58155178A JP15517883A JPS6048254A JP S6048254 A JPS6048254 A JP S6048254A JP 58155178 A JP58155178 A JP 58155178A JP 15517883 A JP15517883 A JP 15517883A JP S6048254 A JPS6048254 A JP S6048254A
- Authority
- JP
- Japan
- Prior art keywords
- polishing
- crystallized glass
- liquid
- fine powder
- less
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000005498 polishing Methods 0.000 title claims abstract description 40
- 239000011521 glass Substances 0.000 title claims abstract description 22
- 239000000843 powder Substances 0.000 claims abstract description 28
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 claims abstract description 19
- 239000007788 liquid Substances 0.000 claims abstract description 17
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 14
- 239000002270 dispersing agent Substances 0.000 claims abstract description 13
- 239000002245 particle Substances 0.000 claims abstract description 11
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims abstract description 10
- 125000005372 silanol group Chemical group 0.000 claims abstract description 6
- 239000000377 silicon dioxide Substances 0.000 claims abstract description 5
- 238000000034 method Methods 0.000 claims description 16
- 229910052751 metal Inorganic materials 0.000 abstract description 5
- 239000002184 metal Substances 0.000 abstract description 5
- 230000003746 surface roughness Effects 0.000 description 14
- 239000000758 substrate Substances 0.000 description 8
- 239000006061 abrasive grain Substances 0.000 description 7
- 238000007792 addition Methods 0.000 description 7
- 230000000052 comparative effect Effects 0.000 description 6
- 239000010408 film Substances 0.000 description 6
- 239000010409 thin film Substances 0.000 description 5
- 238000005520 cutting process Methods 0.000 description 4
- 230000007547 defect Effects 0.000 description 4
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- 230000009471 action Effects 0.000 description 2
- 238000005054 agglomeration Methods 0.000 description 2
- 230000002776 aggregation Effects 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- 238000007517 polishing process Methods 0.000 description 2
- 229920006395 saturated elastomer Polymers 0.000 description 2
- 230000002393 scratching effect Effects 0.000 description 2
- 240000007594 Oryza sativa Species 0.000 description 1
- 235000007164 Oryza sativa Nutrition 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 235000013339 cereals Nutrition 0.000 description 1
- CETPSERCERDGAM-UHFFFAOYSA-N ceric oxide Chemical compound O=[Ce]=O CETPSERCERDGAM-UHFFFAOYSA-N 0.000 description 1
- 229910000420 cerium oxide Inorganic materials 0.000 description 1
- 229910000422 cerium(IV) oxide Inorganic materials 0.000 description 1
- 230000002925 chemical effect Effects 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 238000009833 condensation Methods 0.000 description 1
- 230000005494 condensation Effects 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 230000007123 defense Effects 0.000 description 1
- 230000002950 deficient Effects 0.000 description 1
- 239000000428 dust Substances 0.000 description 1
- 230000016615 flocculation Effects 0.000 description 1
- 238000005189 flocculation Methods 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 229910052745 lead Inorganic materials 0.000 description 1
- 239000000314 lubricant Substances 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- BMMGVYCKOGBVEV-UHFFFAOYSA-N oxo(oxoceriooxy)cerium Chemical compound [Ce]=O.O=[Ce]=O BMMGVYCKOGBVEV-UHFFFAOYSA-N 0.000 description 1
- 229910000889 permalloy Inorganic materials 0.000 description 1
- 230000002265 prevention Effects 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 235000009566 rice Nutrition 0.000 description 1
- 239000000523 sample Substances 0.000 description 1
- 229910000679 solder Inorganic materials 0.000 description 1
- 239000000725 suspension Substances 0.000 description 1
- 229910052718 tin Inorganic materials 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
Landscapes
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP58155178A JPS6048254A (ja) | 1983-08-24 | 1983-08-24 | 結晶化ガラスの精密研摩方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP58155178A JPS6048254A (ja) | 1983-08-24 | 1983-08-24 | 結晶化ガラスの精密研摩方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6048254A true JPS6048254A (ja) | 1985-03-15 |
| JPS6247663B2 JPS6247663B2 (enrdf_load_stackoverflow) | 1987-10-08 |
Family
ID=15600194
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP58155178A Granted JPS6048254A (ja) | 1983-08-24 | 1983-08-24 | 結晶化ガラスの精密研摩方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6048254A (enrdf_load_stackoverflow) |
-
1983
- 1983-08-24 JP JP58155178A patent/JPS6048254A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6247663B2 (enrdf_load_stackoverflow) | 1987-10-08 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US8763428B2 (en) | Method for producing glass substrate for magnetic disk and method for manufacturing magnetic disk | |
| TWI405195B (zh) | Vertical magnetic recording disc and manufacturing method thereof | |
| JP3284156B2 (ja) | 薄膜磁気ヘッドを製造する方法及びそのような方法を用いて製造された薄膜磁気ヘッド | |
| JPH07216345A (ja) | 研磨用組成物 | |
| US4358295A (en) | Polishing method | |
| JP4293389B2 (ja) | 磁気ディスクの製造方法 | |
| JP4667025B2 (ja) | 研磨スラリー及び方法 | |
| JPS6048254A (ja) | 結晶化ガラスの精密研摩方法 | |
| JPH03146585A (ja) | ガラス研磨用研磨材 | |
| JPS58171264A (ja) | 導電性研磨用部材 | |
| JPS6048253A (ja) | 結晶化ガラスの精密研摩方法 | |
| JP2002237008A (ja) | 薄膜磁気ヘッド | |
| JPS60155359A (ja) | セラミツクス材料の無孔化研摩方法 | |
| JPH044656B2 (enrdf_load_stackoverflow) | ||
| JP2001323255A (ja) | 研磨液組成物 | |
| JPS6331343B2 (enrdf_load_stackoverflow) | ||
| JPH07129952A (ja) | 磁気ディスク用基板およびその製造方法 | |
| JPH09316430A (ja) | 磁気ディスク基板研磨用組成物 | |
| JPH03146584A (ja) | ガラス研磨用研磨材 | |
| JPH05228845A (ja) | 磁気ディスク基板テクスチャリング用研磨フィルム | |
| JPH0823935B2 (ja) | 薄膜磁気記録媒体 | |
| JPS5996539A (ja) | 磁気記録デイスク | |
| CN103050133B (zh) | 磁记录介质用玻璃基板、及使用了该磁记录介质用玻璃基板的磁记录介质 | |
| JP2009093758A (ja) | 磁気記録媒体用シリコン基板の製造方法および磁気記録媒体 | |
| JP3097001B2 (ja) | 磁気ディスク用基板のテクスチャリング用研磨組成物 |