JPS6041226A - 荷電粒子線装置 - Google Patents

荷電粒子線装置

Info

Publication number
JPS6041226A
JPS6041226A JP59121728A JP12172884A JPS6041226A JP S6041226 A JPS6041226 A JP S6041226A JP 59121728 A JP59121728 A JP 59121728A JP 12172884 A JP12172884 A JP 12172884A JP S6041226 A JPS6041226 A JP S6041226A
Authority
JP
Japan
Prior art keywords
deflection
mark
charged particle
particle beam
height
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP59121728A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0317214B2 (enrdf_load_stackoverflow
Inventor
Norio Saito
徳郎 斉藤
Susumu Ozasa
小笹　進
Katsuhiro Kuroda
勝広 黒田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP59121728A priority Critical patent/JPS6041226A/ja
Publication of JPS6041226A publication Critical patent/JPS6041226A/ja
Publication of JPH0317214B2 publication Critical patent/JPH0317214B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Electron Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP59121728A 1984-06-15 1984-06-15 荷電粒子線装置 Granted JPS6041226A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP59121728A JPS6041226A (ja) 1984-06-15 1984-06-15 荷電粒子線装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59121728A JPS6041226A (ja) 1984-06-15 1984-06-15 荷電粒子線装置

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
JP567580A Division JPS56103420A (en) 1980-01-23 1980-01-23 Compensating method for deflection distortion in charged particle beam apparatus

Publications (2)

Publication Number Publication Date
JPS6041226A true JPS6041226A (ja) 1985-03-04
JPH0317214B2 JPH0317214B2 (enrdf_load_stackoverflow) 1991-03-07

Family

ID=14818408

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59121728A Granted JPS6041226A (ja) 1984-06-15 1984-06-15 荷電粒子線装置

Country Status (1)

Country Link
JP (1) JPS6041226A (enrdf_load_stackoverflow)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002110530A (ja) * 2000-10-03 2002-04-12 Advantest Corp 電子ビーム露光装置

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002110530A (ja) * 2000-10-03 2002-04-12 Advantest Corp 電子ビーム露光装置

Also Published As

Publication number Publication date
JPH0317214B2 (enrdf_load_stackoverflow) 1991-03-07

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