JPS6038788B2 - ion implantation bubble device - Google Patents

ion implantation bubble device

Info

Publication number
JPS6038788B2
JPS6038788B2 JP57025995A JP2599582A JPS6038788B2 JP S6038788 B2 JPS6038788 B2 JP S6038788B2 JP 57025995 A JP57025995 A JP 57025995A JP 2599582 A JP2599582 A JP 2599582A JP S6038788 B2 JPS6038788 B2 JP S6038788B2
Authority
JP
Japan
Prior art keywords
cusp
bubble
ion
ion implantation
transfer path
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP57025995A
Other languages
Japanese (ja)
Other versions
JPS58143489A (en
Inventor
良夫 佐藤
誠 大橋
勉 宮下
和雄 松田
和成 米納
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP57025995A priority Critical patent/JPS6038788B2/en
Priority to US06/468,707 priority patent/US4462087A/en
Priority to DE8383300919T priority patent/DE3365054D1/en
Priority to EP83300919A priority patent/EP0087910B1/en
Publication of JPS58143489A publication Critical patent/JPS58143489A/en
Publication of JPS6038788B2 publication Critical patent/JPS6038788B2/en
Expired legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C19/00Digital stores in which the information is moved stepwise, e.g. shift registers
    • G11C19/02Digital stores in which the information is moved stepwise, e.g. shift registers using magnetic elements
    • G11C19/08Digital stores in which the information is moved stepwise, e.g. shift registers using magnetic elements using thin films in plane structure
    • G11C19/0808Digital stores in which the information is moved stepwise, e.g. shift registers using magnetic elements using thin films in plane structure using magnetic domain propagation
    • G11C19/0816Digital stores in which the information is moved stepwise, e.g. shift registers using magnetic elements using thin films in plane structure using magnetic domain propagation using a rotating or alternating coplanar magnetic field
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41JTYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2/00Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
    • B41J2/22Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by selective application of impact or pressure on a printing material or impression-transfer material
    • B41J2/23Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by selective application of impact or pressure on a printing material or impression-transfer material using print wires
    • B41J2/235Print head assemblies
    • B41J2/25Print wires

Landscapes

  • Thin Magnetic Films (AREA)

Description

【発明の詳細な説明】 {1}発明の技術分野 本発明はイオン注入法で作成される磁気バブルメモリデ
バイスに関するものである。
DETAILED DESCRIPTION OF THE INVENTION {1} Technical Field of the Invention The present invention relates to a magnetic bubble memory device fabricated by ion implantation.

【2ー 技術の背景 最近磁気バブルメモリデバイスにおいて、そのバブル転
送路をイオン注入法により形成し、記憶密度を高度化す
る方法が開発されている。
[2- Background of the Technology Recently, a method has been developed to improve the storage density of magnetic bubble memory devices by forming bubble transfer paths by ion implantation.

このイオン注入バブルデバイスは第1図の平面図及び第
2図の断面図に示す如くガドリニウム・ガリウム・ガー
ネット(OGG)基板1の上に液相ェピタキシャル成長
させた磁性ガーネットの薄膜2に対し、パターン3以外
の領域4に水素,ネオン,ヘリウム等のイオンを注入し
たものである。このようにパターン3を形成した素子は
イオンが注入された領域4の磁化容易軸方向が矢印aの
如く面内方向と一致し、パターン3の磁化容易軸方向は
矢印bの如くもとのままの面内方向と垂直である。。従
ってバブル5は回転磁界によってパターン3の周緑に沿
って矢印cの如く転送される。そしてこのパターン3は
円形や四角形を一部が重なるようにして列状に配列した
形状であるため、従来のギャップを必要としたパーマロ
イパターンに比し寸法精度が緩くとも良く、従ってパタ
ーンが小さくでき高密度化が実現される。このようなイ
オン注入バブルデバイスにおいて、バブル転送路をメジ
ャーマイナー構成とした場合、マイナーループをそれぞ
れ1本のパターンとすることは従来行なわれているが、
転送路を折り返しU字形にすることは実現されていない
This ion implantation bubble device has a thin film 2 of magnetic garnet grown epitaxially in liquid phase on a gadolinium gallium garnet (OGG) substrate 1, as shown in the plan view of FIG. 1 and the cross-sectional view of FIG. Ions such as hydrogen, neon, helium, etc. are implanted into a region 4 other than the pattern 3. In the device in which pattern 3 is formed in this way, the direction of the easy axis of magnetization of region 4 into which ions are implanted coincides with the in-plane direction as shown by arrow a, and the direction of the easy axis of magnetization of pattern 3 remains the same as shown by arrow b. is perpendicular to the in-plane direction of . Therefore, the bubble 5 is transferred along the periphery of the pattern 3 as shown by the arrow c by the rotating magnetic field. Since this pattern 3 has a shape in which circles and squares are arranged in a row so that some of them overlap, the dimensional accuracy can be less strict compared to conventional permalloy patterns that require gaps, so the pattern can be made smaller. High density is achieved. In such an ion-implanted bubble device, when the bubble transfer path has a major-minor configuration, it has conventionally been done to have one minor loop each.
It has not been realized to turn the transfer path into a U-shape.

これはインサィドコーナ−として第3図に示す如くゆる
やかに1800方向を変換するものしかなく、これでは
マイナーループの高密度化が実現不可能なためである。
【3}発明の目的 本発明は上詫間題点に鑑み、最小のスペースで転送路を
折り返す例えば1800折り返したマイナーループを有
するイオン注入バブルデバイスを提供することを目的と
するものである。
This is because there is only an inside corner that gently converts 1800 directions as shown in FIG. 3, and with this, it is impossible to achieve a high density of minor loops.
[3] Purpose of the Invention In view of the above-mentioned problems, it is an object of the present invention to provide an ion implantation bubble device having a minor loop in which a transfer path is turned back in a minimum space, for example, by 1800 turns.

t4)発明の構成 そしてこの目的は、本発明によれば、磁気バブル結晶に
イオン注入によってバブルの転送路を形成したイオン注
入バブルデバイスにおいて、バフルの転送路を折り返す
転送路は、折り返し点のパターン形状が少なくとも1個
以上のカスプ部をもち、かつそのカスプ部の三角形のカ
スプからバフルを引出す辺のカスプ頂点を回転中心とし
た傾きが結晶のストライプ容易方向から時計方向もしく
は反時計方向に30o偏った方向から同じ方向に測つて
60〜110oの範囲の角度をもち、同じ方向に磁界を
回転する場合に適用され、かつ折り返し点のカスプ部は
隣接する入路側及び出路側のカスプ部に対して必ずイオ
ン非注入領域の山を持ち、折り返し点のカスプの頂点か
ら隣接するカスプの頂点へ直線的に見通せないようにし
たことを特徴とするイオン注入バブルデバイスを提供す
ることによって達成される。
t4) Structure of the invention and its object is that, according to the present invention, in an ion-implanted bubble device in which a bubble transfer path is formed by ion implantation into a magnetic bubble crystal, the transfer path that turns back the baffle transfer path has a pattern of turning points. The shape has at least one cusp part, and the inclination around the cusp apex of the side from which the baffle is pulled out from the triangular cusp part is deviated 30 degrees clockwise or counterclockwise from the crystal stripe easy direction. Applicable when rotating the magnetic field in the same direction with an angle in the range of 60 to 110 degrees measured in the same direction from the same direction, and the cusp at the turning point is relative to the adjacent cusp on the entry and exit sides. This is achieved by providing an ion implantation bubble device that always has a peak in the ion non-implanted region so that it is impossible to see straight from the apex of a cusp at a turning point to the apex of an adjacent cusp.

{5) 発明の実施例 以下本発明実施例を図面によって詳述する。{5) Examples of the invention Embodiments of the present invention will be described in detail below with reference to the drawings.

先ず隣接する2本のマイナーループをパッド側にカスプ
を持つような1800ターンのインサイドコーナーで接
続することを考えた場合、最小スペースとなる形状とし
ては第4図に示されるようなものとなる。しかしこの形
状ではAの方向から反B寺計回りの回転磁界で入ってき
たバブルがDまで到達した後、回転磁界が6の方向に向
いた時再びバブルはカスプBまで逆戻りしてしまい結局
B−○間で振動するだけとなる。本発明はこの点を改良
したものである。第5図は本発明によるイオン注入バブ
ルデバイスの転送路における1800折り返し部分の形
状を示した図である。
First, if we consider connecting two adjacent minor loops at an inside corner of 1800 turns with a cusp on the pad side, the shape with the minimum space will be as shown in Figure 4. However, in this shape, the bubble enters from the direction of A due to the rotating magnetic field counterclockwise to B and reaches D, and then when the rotating magnetic field turns in the direction of 6, the bubble returns to cusp B and ends up at B. It only vibrates between −○. The present invention improves this point. FIG. 5 is a diagram showing the shape of the 1800 folded portion in the transfer path of the ion implantation bubble device according to the present invention.

本発明は第5図に示す如く入路側(バブルがコーナーへ
入ってくる側)と出路側(出る側)との間に少なくとも
1個以上のカスプ6が設けられ、またそのカスプ6の最
も窪んだ頂点をカスプの中心線から進行方向に偏らせて
いる。
As shown in FIG. 5, the present invention provides at least one or more cusps 6 between the entrance side (the side where the bubble enters the corner) and the exit side (the side where the bubble exits), and the most concave portion of the cusp 6. The apex is offset from the center line of the cusp in the direction of travel.

この偏りはC・C・Shir(IBM)がJ・A・p・
52く3)2388(1981>で報告している『カス
プからバブルを引出す側の辺はバブルのストライプ容易
方向と垂直に近い程良いマージンが得られる』ことを利
用したものである。従って本発明ではこの偏りを得るた
めカスプ部6からバブルを引出す辺7のカスプ頂点を回
転中心とした懐きが結晶のストライプ容易方向K,から
時計方向又は反時計方向に30o偏よった方向(直線X
,X′)から同じ方向に測つた60〜110oの範囲に
規定した。図は反時計方向に測つた場合を示しており、
回転磁界HRが反時計万向に回転する場合に適用され、
回転磁界HRが時計方向に回転する場合には8を60〜
11びの範囲とする。また折り返し点のカスプ6の頂点
から隣接するカスプ8及び9の頂点へ直線的に見通せな
いように(見通せる場合は第4図と同様になる)折り返
し点のカスプ6と隣接する入路側及び出路側のカスプ8
及び9との間にイオン非注入領域の山10及び11を形
成している。第6図は第5図におけるaを変化させたと
きのバイアス磁界HBと駆動磁界HRの関係を実験によ
り求めた図であり、曲線Aは8=1100の場合、曲線
Bは8=900の場合、曲線Dは8=600の場合、曲
線Cはカプスの頂点をカプスの中心線上に位層せしめた
場合をそれぞれ示している。
This bias was explained by C.C. Shir (IBM) and J.A.P.
This method utilizes the fact that ``the side on which the bubble is drawn from the cusp is closer to perpendicular to the bubble stripe direction, the better the margin can be obtained'' reported in 2388 (1981).Therefore, the present invention In order to obtain this deviation, the center of rotation is the cusp apex of side 7, which pulls out the bubble from cusp part 6, in a direction deviated clockwise or counterclockwise by 30 degrees from the crystal stripe easy direction K (straight line
, X') in the same direction from 60 to 110 degrees. The figure shows the case when measured counterclockwise.
Applied when the rotating magnetic field HR rotates counterclockwise,
When the rotating magnetic field HR rotates clockwise, 8 is 60~
The range shall be 11 people. In addition, the entrance and exit sides adjacent to the cusp 6 of the turning point are designed so that the apex of the cusp 6 at the turning point cannot be seen in a straight line from the apex of the adjacent cusps 8 and 9 (if it is visible, it will be the same as in Figure 4). cusp 8
and 9, mountains 10 and 11 of ion non-implanted regions are formed. Fig. 6 is a diagram obtained by experiment with the relationship between the bias magnetic field HB and the drive magnetic field HR when a is changed in Fig. 5. Curve A is for 8 = 1100, and curve B is for 8 = 900. , curve D shows the case where 8=600, and curve C shows the case where the apex of the cup is placed on the center line of the cup.

図より本発明の8=60〜1100においてはカスプの
頂点をカスプの中心線上に位置せしめた場合に比しマー
ジンが増大していることがわかる。第7図は駆動磁界H
R=50氏の時の8とバイアスマージン△HBとの関係
を示した図であり、8が600、即ちバブルを引き出す
辺がストライプ容易方向と垂直になるにつれてマージン
幅が大となっている。
It can be seen from the figure that when 8=60 to 1100 of the present invention, the margin is increased compared to the case where the apex of the cusp is located on the center line of the cusp. Figure 7 shows the driving magnetic field H
This is a diagram showing the relationship between 8 and the bias margin ΔHB when R=50, where 8 is 600, that is, the margin width increases as the side that draws out the bubble becomes perpendicular to the stripe easy direction.

なお8が600以下は光りングラフィ技術上パターン形
成が困難となると同時にストライプ容易方向と垂直な方
向からまたずれてくるのでマージンが劣化してゆくこと
が推測される。従ってひの範囲は60〜1100が適当
となる。第8図は本発明の他の実施例を示したものであ
り、第5図の実施例と異なるところはパターンの角部を
曲線としたことであって、その作用効果は第5図の場合
と同様である。‘6} 発明の効果 以上、詳細に説明したように、本発明のイオン注入バブ
ルデバイスは、折り返したバブル転送路のィンサィドコ
ーナを簡単な形状で、且つ最小のスペースで実現したも
のであり、メジャーマイナ構成を小型化し得るといった
効果大なるものである。
Note that when 8 is less than 600, it is difficult to form a pattern in terms of phosphorography technology, and at the same time, it is assumed that the margin will deteriorate because the pattern will deviate from the direction perpendicular to the easy stripe direction. Therefore, the range of 60 to 1100 is appropriate. Fig. 8 shows another embodiment of the present invention, and the difference from the embodiment shown in Fig. 5 is that the corners of the pattern are curved, and the effect is the same as that in Fig. 5. It is similar to '6} Effects of the Invention As explained in detail above, the ion implantation bubble device of the present invention realizes the inside corner of the folded bubble transfer path in a simple shape and in the minimum space, and has major minor problems. This has a great effect in that the structure can be made smaller.

【図面の簡単な説明】[Brief explanation of drawings]

第1図はイオン注入バブルデバイスを説明するための図
、第2図は第1図のローロ線における断面図、第3図は
従来の1800折り返しバブル転送略を示した図、第4
図は180o折り返しバブル転送路のィンサィドコーナ
が最小スペースとなる場合を示した図、第5図は本発明
によるイオン注入バブルデバイスのバブル転送路におけ
る1800折り返し部分の形状を示した図、第6図はバ
ブル転送路の180o折り返し点における8を変化させ
たときのバイアス磁界−駆動磁界特性を示した図、第7
図はそのバイアスマージンを示した図、第8図は他の実
施例を示した図である。 第1図 第2図 第3図 第4図 第5図 第6図 第7図 第8図
Fig. 1 is a diagram for explaining the ion implantation bubble device, Fig. 2 is a cross-sectional view taken along the Rolo line in Fig. 1, Fig. 3 is a diagram illustrating the conventional 1800 folded bubble transfer, and Fig. 4 is a diagram for explaining the ion implantation bubble device.
The figure shows the case where the inside corner of the 180° folded bubble transfer path has the minimum space, FIG. 5 shows the shape of the 1800 folded part in the bubble transfer path of the ion implantation bubble device according to the present invention, and FIG. Figure 7 shows the bias magnetic field-drive magnetic field characteristics when changing 8 at the 180° turning point of the bubble transfer path.
The figure shows the bias margin, and FIG. 8 shows another embodiment. Figure 1 Figure 2 Figure 3 Figure 4 Figure 5 Figure 6 Figure 7 Figure 8

Claims (1)

【特許請求の範囲】[Claims] 1 磁気バブル結晶にイオン注入によつてバブルの転送
路を形成したイオン注入バブルデバイスにおいて、バブ
ルの転送路を折り返すインサイドコーナーは、折り返し
点のパターン形状が少なくとも1個以上のカスプ部をも
ち、かつそのカスプ部の三角形のカスプからバブルを引
出す辺のカスプ頂点を回転中心とした傾きが結晶のスト
ライプ容易方向から時計方向もしくは反時計方向に30
°偏よつた方向から同じ方向に測つて60〜110°の
範囲の角度をもち、同じ方向に磁界を回転する場合に適
用され、かつ折り返し点のカスプ部は隣接する入路側及
び出路側のカスプ部に対して必ずイオン非注入領域の山
を持ち、折り返し点のカスプの頂点から隣接するカスプ
の頂点へ直線的に見通せないようにしたことを特徴とす
るイオン注入バブルデバイス。
1. In an ion-implanted bubble device in which a bubble transfer path is formed by ion implantation into a magnetic bubble crystal, the inside corner where the bubble transfer path is folded has at least one cusp portion in the pattern shape of the folding point, and The inclination around the cusp apex of the side that pulls out the bubble from the triangular cusp of the cusp part is 30 degrees clockwise or counterclockwise from the crystal stripe easy direction.
° It is applied when the angle is in the range of 60 to 110 degrees measured in the same direction from the deflection direction, and the magnetic field is rotated in the same direction, and the cusp part at the turning point is the same as the cusp part on the adjacent entry and exit sides. An ion-implanted bubble device characterized in that it always has a peak in the non-ion-implanted region for each part, so that it is impossible to see straight from the vertex of a cusp at a turning point to the vertex of an adjacent cusp.
JP57025995A 1982-02-22 1982-02-22 ion implantation bubble device Expired JPS6038788B2 (en)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP57025995A JPS6038788B2 (en) 1982-02-22 1982-02-22 ion implantation bubble device
US06/468,707 US4462087A (en) 1982-02-22 1983-02-22 Ion-implanted bubble device
DE8383300919T DE3365054D1 (en) 1982-02-22 1983-02-22 Ion-implanted magnetic bubble memory device
EP83300919A EP0087910B1 (en) 1982-02-22 1983-02-22 Ion-implanted magnetic bubble memory device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP57025995A JPS6038788B2 (en) 1982-02-22 1982-02-22 ion implantation bubble device

Publications (2)

Publication Number Publication Date
JPS58143489A JPS58143489A (en) 1983-08-26
JPS6038788B2 true JPS6038788B2 (en) 1985-09-03

Family

ID=12181294

Family Applications (1)

Application Number Title Priority Date Filing Date
JP57025995A Expired JPS6038788B2 (en) 1982-02-22 1982-02-22 ion implantation bubble device

Country Status (1)

Country Link
JP (1) JPS6038788B2 (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7535180B2 (en) * 2005-04-04 2009-05-19 Cree, Inc. Semiconductor light emitting circuits including light emitting diodes and four layer semiconductor shunt devices

Also Published As

Publication number Publication date
JPS58143489A (en) 1983-08-26

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