JPS6029470A - 量産型グロ−放電分解装置 - Google Patents

量産型グロ−放電分解装置

Info

Publication number
JPS6029470A
JPS6029470A JP58138132A JP13813283A JPS6029470A JP S6029470 A JPS6029470 A JP S6029470A JP 58138132 A JP58138132 A JP 58138132A JP 13813283 A JP13813283 A JP 13813283A JP S6029470 A JPS6029470 A JP S6029470A
Authority
JP
Japan
Prior art keywords
gas
electrode
electrode plate
glow discharge
drums
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP58138132A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0545672B2 (enrdf_load_stackoverflow
Inventor
Takao Kawamura
河村 孝夫
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kyocera Corp
Original Assignee
Kyocera Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kyocera Corp filed Critical Kyocera Corp
Priority to JP58138132A priority Critical patent/JPS6029470A/ja
Publication of JPS6029470A publication Critical patent/JPS6029470A/ja
Publication of JPH0545672B2 publication Critical patent/JPH0545672B2/ja
Granted legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Plasma & Fusion (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Physics & Mathematics (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Photoreceptors In Electrophotography (AREA)
  • Chemical Vapour Deposition (AREA)
  • Light Receiving Elements (AREA)
JP58138132A 1983-07-27 1983-07-27 量産型グロ−放電分解装置 Granted JPS6029470A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP58138132A JPS6029470A (ja) 1983-07-27 1983-07-27 量産型グロ−放電分解装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58138132A JPS6029470A (ja) 1983-07-27 1983-07-27 量産型グロ−放電分解装置

Publications (2)

Publication Number Publication Date
JPS6029470A true JPS6029470A (ja) 1985-02-14
JPH0545672B2 JPH0545672B2 (enrdf_load_stackoverflow) 1993-07-09

Family

ID=15214730

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58138132A Granted JPS6029470A (ja) 1983-07-27 1983-07-27 量産型グロ−放電分解装置

Country Status (1)

Country Link
JP (1) JPS6029470A (enrdf_load_stackoverflow)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62142772A (ja) * 1985-12-18 1987-06-26 Canon Inc マイクロ波プラズマcvd法による堆積膜形成装置
JPS62146267A (ja) * 1985-12-20 1987-06-30 Canon Inc 堆積膜形成装置

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57185971A (en) * 1981-05-11 1982-11-16 Oki Electric Ind Co Ltd Formation of glow discharge film
JPS5889943A (ja) * 1981-11-26 1983-05-28 Canon Inc プラズマcvd法
JPS58101735A (ja) * 1981-12-11 1983-06-17 Canon Inc プラズマcvd装置
JPS6024378A (ja) * 1983-07-19 1985-02-07 Kyocera Corp 量産型グロ−放電分解装置

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57185971A (en) * 1981-05-11 1982-11-16 Oki Electric Ind Co Ltd Formation of glow discharge film
JPS5889943A (ja) * 1981-11-26 1983-05-28 Canon Inc プラズマcvd法
JPS58101735A (ja) * 1981-12-11 1983-06-17 Canon Inc プラズマcvd装置
JPS6024378A (ja) * 1983-07-19 1985-02-07 Kyocera Corp 量産型グロ−放電分解装置

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62142772A (ja) * 1985-12-18 1987-06-26 Canon Inc マイクロ波プラズマcvd法による堆積膜形成装置
JPS62146267A (ja) * 1985-12-20 1987-06-30 Canon Inc 堆積膜形成装置

Also Published As

Publication number Publication date
JPH0545672B2 (enrdf_load_stackoverflow) 1993-07-09

Similar Documents

Publication Publication Date Title
US4780169A (en) Non-uniform gas inlet for dry etching apparatus
JP7267308B2 (ja) 上方電極アセンブリ、反応チャンバおよび原子層堆積装置
JP2001135628A (ja) プラズマcvd装置
JP3652249B2 (ja) 窒化チタンのコンタクトプラグの形成
JPS6029470A (ja) 量産型グロ−放電分解装置
JPS6137968A (ja) プラズマcvd装置
JPS6036664A (ja) 量産型グロー放電分解装置
JPH04297578A (ja) プラズマ処理装置
JPH02198138A (ja) 平行平板型ドライエッチング装置の電極板
JPS6353854B2 (enrdf_load_stackoverflow)
JPS6260875A (ja) プラズマcvd装置
JPH02184022A (ja) Cvd電極
JPH0338730B2 (enrdf_load_stackoverflow)
JPH0532472B2 (enrdf_load_stackoverflow)
JPH062952B2 (ja) プラズマcvd装置及びプラズマcvdによる成膜方法
JPH0438449B2 (enrdf_load_stackoverflow)
JPH0555150A (ja) マイクロ波プラズマ処理装置
JPS59172236A (ja) 反応性イオンエツチング装置
JPS61119685A (ja) 平行平板型ドライエツチング装置
JPS5919326A (ja) プラズマ処理装置
JPS6164128A (ja) 試料処理装置
JPH034025Y2 (enrdf_load_stackoverflow)
JPH02148835A (ja) プラズマ処理装置
JP2577397Y2 (ja) グロー放電分解装置
JPS60126833A (ja) プラズマエツチング装置