JPS6029470A - 量産型グロ−放電分解装置 - Google Patents
量産型グロ−放電分解装置Info
- Publication number
- JPS6029470A JPS6029470A JP58138132A JP13813283A JPS6029470A JP S6029470 A JPS6029470 A JP S6029470A JP 58138132 A JP58138132 A JP 58138132A JP 13813283 A JP13813283 A JP 13813283A JP S6029470 A JPS6029470 A JP S6029470A
- Authority
- JP
- Japan
- Prior art keywords
- gas
- electrode
- electrode plate
- glow discharge
- drums
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Plasma & Fusion (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Physics & Mathematics (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Light Receiving Elements (AREA)
- Photoreceptors In Electrophotography (AREA)
- Chemical Vapour Deposition (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP58138132A JPS6029470A (ja) | 1983-07-27 | 1983-07-27 | 量産型グロ−放電分解装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP58138132A JPS6029470A (ja) | 1983-07-27 | 1983-07-27 | 量産型グロ−放電分解装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6029470A true JPS6029470A (ja) | 1985-02-14 |
| JPH0545672B2 JPH0545672B2 (cs) | 1993-07-09 |
Family
ID=15214730
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP58138132A Granted JPS6029470A (ja) | 1983-07-27 | 1983-07-27 | 量産型グロ−放電分解装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6029470A (cs) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS62142772A (ja) * | 1985-12-18 | 1987-06-26 | Canon Inc | マイクロ波プラズマcvd法による堆積膜形成装置 |
| JPS62146267A (ja) * | 1985-12-20 | 1987-06-30 | Canon Inc | 堆積膜形成装置 |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS57185971A (en) * | 1981-05-11 | 1982-11-16 | Oki Electric Ind Co Ltd | Formation of glow discharge film |
| JPS5889943A (ja) * | 1981-11-26 | 1983-05-28 | Canon Inc | プラズマcvd法 |
| JPS58101735A (ja) * | 1981-12-11 | 1983-06-17 | Canon Inc | プラズマcvd装置 |
| JPS6024378A (ja) * | 1983-07-19 | 1985-02-07 | Kyocera Corp | 量産型グロ−放電分解装置 |
-
1983
- 1983-07-27 JP JP58138132A patent/JPS6029470A/ja active Granted
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS57185971A (en) * | 1981-05-11 | 1982-11-16 | Oki Electric Ind Co Ltd | Formation of glow discharge film |
| JPS5889943A (ja) * | 1981-11-26 | 1983-05-28 | Canon Inc | プラズマcvd法 |
| JPS58101735A (ja) * | 1981-12-11 | 1983-06-17 | Canon Inc | プラズマcvd装置 |
| JPS6024378A (ja) * | 1983-07-19 | 1985-02-07 | Kyocera Corp | 量産型グロ−放電分解装置 |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS62142772A (ja) * | 1985-12-18 | 1987-06-26 | Canon Inc | マイクロ波プラズマcvd法による堆積膜形成装置 |
| JPS62146267A (ja) * | 1985-12-20 | 1987-06-30 | Canon Inc | 堆積膜形成装置 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0545672B2 (cs) | 1993-07-09 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US4780169A (en) | Non-uniform gas inlet for dry etching apparatus | |
| JP7267308B2 (ja) | 上方電極アセンブリ、反応チャンバおよび原子層堆積装置 | |
| JP3652249B2 (ja) | 窒化チタンのコンタクトプラグの形成 | |
| JPH02234419A (ja) | プラズマ電極 | |
| JPS6029470A (ja) | 量産型グロ−放電分解装置 | |
| JPH0423429A (ja) | 半導体装置のプラズマ処理装置及びプラズマ処理方法 | |
| TWI834658B (zh) | 用於處理基板的設備 | |
| JPS6036664A (ja) | 量産型グロー放電分解装置 | |
| JPH04297578A (ja) | プラズマ処理装置 | |
| JPH02198138A (ja) | 平行平板型ドライエッチング装置の電極板 | |
| JPS6056793B2 (ja) | プラズマ表面処理装置 | |
| JPS6353854B2 (cs) | ||
| JPH02184022A (ja) | Cvd電極 | |
| JPH0338730B2 (cs) | ||
| JPH0532472B2 (cs) | ||
| JPH062952B2 (ja) | プラズマcvd装置及びプラズマcvdによる成膜方法 | |
| JPH0438449B2 (cs) | ||
| JPH0555150A (ja) | マイクロ波プラズマ処理装置 | |
| JPS5919326A (ja) | プラズマ処理装置 | |
| JPH0663107B2 (ja) | 平行平板型ドライエツチング装置 | |
| JPS60262972A (ja) | プラズマcvd装置 | |
| JPH034025Y2 (cs) | ||
| JPH02148835A (ja) | プラズマ処理装置 | |
| JPS60126833A (ja) | プラズマエツチング装置 | |
| JPS6410933B2 (cs) |