JPS6027141A - ウエハ−のセツト機構 - Google Patents

ウエハ−のセツト機構

Info

Publication number
JPS6027141A
JPS6027141A JP58134368A JP13436883A JPS6027141A JP S6027141 A JPS6027141 A JP S6027141A JP 58134368 A JP58134368 A JP 58134368A JP 13436883 A JP13436883 A JP 13436883A JP S6027141 A JPS6027141 A JP S6027141A
Authority
JP
Japan
Prior art keywords
wafer
wafers
support
heat treatment
supporter
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP58134368A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6334622B2 (Direct
Inventor
Yoshiki Mimura
芳樹 三村
Tetsuharu Arai
荒井　徹治
Satoru Fukuda
悟 福田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ushio Denki KK
Ushio Inc
Original Assignee
Ushio Denki KK
Ushio Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ushio Denki KK, Ushio Inc filed Critical Ushio Denki KK
Priority to JP58134368A priority Critical patent/JPS6027141A/ja
Publication of JPS6027141A publication Critical patent/JPS6027141A/ja
Publication of JPS6334622B2 publication Critical patent/JPS6334622B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H10P72/0436—
    • H10P72/3306—
    • H10P72/7612—

Landscapes

  • Recrystallisation Techniques (AREA)
JP58134368A 1983-07-25 1983-07-25 ウエハ−のセツト機構 Granted JPS6027141A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP58134368A JPS6027141A (ja) 1983-07-25 1983-07-25 ウエハ−のセツト機構

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58134368A JPS6027141A (ja) 1983-07-25 1983-07-25 ウエハ−のセツト機構

Publications (2)

Publication Number Publication Date
JPS6027141A true JPS6027141A (ja) 1985-02-12
JPS6334622B2 JPS6334622B2 (Direct) 1988-07-11

Family

ID=15126740

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58134368A Granted JPS6027141A (ja) 1983-07-25 1983-07-25 ウエハ−のセツト機構

Country Status (1)

Country Link
JP (1) JPS6027141A (Direct)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH07161632A (ja) * 1993-07-16 1995-06-23 Semiconductor Syst Inc 基板コーティング／現像システム用熱処理モジュール

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5457867A (en) * 1977-10-17 1979-05-10 Nichiden Varian Kk Vacuum processor with automatic wafer feeder
JPS56123552U (Direct) * 1980-02-20 1981-09-19
JPS58118112A (ja) * 1981-12-30 1983-07-14 ア−ノン・エマニエル・ガツト 半導体材料の熱処理装置

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5457867A (en) * 1977-10-17 1979-05-10 Nichiden Varian Kk Vacuum processor with automatic wafer feeder
JPS56123552U (Direct) * 1980-02-20 1981-09-19
JPS58118112A (ja) * 1981-12-30 1983-07-14 ア−ノン・エマニエル・ガツト 半導体材料の熱処理装置

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH07161632A (ja) * 1993-07-16 1995-06-23 Semiconductor Syst Inc 基板コーティング／現像システム用熱処理モジュール
US5935768A (en) * 1993-07-16 1999-08-10 Semiconductor Systems, Inc. Method of processing a substrate in a photolithography system utilizing a thermal process module

Also Published As

Publication number Publication date
JPS6334622B2 (Direct) 1988-07-11

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