JPS60262964A - 化合物薄膜蒸着装置 - Google Patents

化合物薄膜蒸着装置

Info

Publication number
JPS60262964A
JPS60262964A JP11690984A JP11690984A JPS60262964A JP S60262964 A JPS60262964 A JP S60262964A JP 11690984 A JP11690984 A JP 11690984A JP 11690984 A JP11690984 A JP 11690984A JP S60262964 A JPS60262964 A JP S60262964A
Authority
JP
Japan
Prior art keywords
thin film
compound thin
electron beam
cluster
substance
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP11690984A
Other languages
English (en)
Japanese (ja)
Other versions
JPH027392B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html
Inventor
Kenichiro Yamanishi
山西　健一郎
Akira Nushihara
主原　昭
Takashi Tsukasaki
塚崎　尚
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP11690984A priority Critical patent/JPS60262964A/ja
Publication of JPS60262964A publication Critical patent/JPS60262964A/ja
Publication of JPH027392B2 publication Critical patent/JPH027392B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/221—Ion beam deposition
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
JP11690984A 1984-06-06 1984-06-06 化合物薄膜蒸着装置 Granted JPS60262964A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP11690984A JPS60262964A (ja) 1984-06-06 1984-06-06 化合物薄膜蒸着装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11690984A JPS60262964A (ja) 1984-06-06 1984-06-06 化合物薄膜蒸着装置

Publications (2)

Publication Number Publication Date
JPS60262964A true JPS60262964A (ja) 1985-12-26
JPH027392B2 JPH027392B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1990-02-16

Family

ID=14698643

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11690984A Granted JPS60262964A (ja) 1984-06-06 1984-06-06 化合物薄膜蒸着装置

Country Status (1)

Country Link
JP (1) JPS60262964A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4941430A (en) * 1987-05-01 1990-07-17 Nihon Sinku Gijutsu Kabusiki Kaisha Apparatus for forming reactive deposition film
US4951604A (en) * 1989-02-17 1990-08-28 Optical Coating Laboratory, Inc. System and method for vacuum deposition of thin films

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0462391U (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) * 1990-10-02 1992-05-28

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4941430A (en) * 1987-05-01 1990-07-17 Nihon Sinku Gijutsu Kabusiki Kaisha Apparatus for forming reactive deposition film
US4951604A (en) * 1989-02-17 1990-08-28 Optical Coating Laboratory, Inc. System and method for vacuum deposition of thin films

Also Published As

Publication number Publication date
JPH027392B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1990-02-16

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