JPS60262045A - 誘導結合高周波プラズマ発光分析装置用試料導入装置 - Google Patents

誘導結合高周波プラズマ発光分析装置用試料導入装置

Info

Publication number
JPS60262045A
JPS60262045A JP11885884A JP11885884A JPS60262045A JP S60262045 A JPS60262045 A JP S60262045A JP 11885884 A JP11885884 A JP 11885884A JP 11885884 A JP11885884 A JP 11885884A JP S60262045 A JPS60262045 A JP S60262045A
Authority
JP
Japan
Prior art keywords
sample
plasma flame
chamber
plasma
atomizer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP11885884A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0578783B2 (enExample
Inventor
Kazuo Moriya
森谷 一夫
Konosuke Oishi
大石 公之助
Koji Iwata
岩田 浩二
Noritoshi Seya
瀬谷 徳寿
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP11885884A priority Critical patent/JPS60262045A/ja
Publication of JPS60262045A publication Critical patent/JPS60262045A/ja
Publication of JPH0578783B2 publication Critical patent/JPH0578783B2/ja
Granted legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/62Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light
    • G01N21/71Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light thermally excited
    • G01N21/73Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light thermally excited using plasma burners or torches

Landscapes

  • Health & Medical Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Plasma & Fusion (AREA)
  • Nuclear Medicine, Radiotherapy & Molecular Imaging (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Investigating, Analyzing Materials By Fluorescence Or Luminescence (AREA)
JP11885884A 1984-06-08 1984-06-08 誘導結合高周波プラズマ発光分析装置用試料導入装置 Granted JPS60262045A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP11885884A JPS60262045A (ja) 1984-06-08 1984-06-08 誘導結合高周波プラズマ発光分析装置用試料導入装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11885884A JPS60262045A (ja) 1984-06-08 1984-06-08 誘導結合高周波プラズマ発光分析装置用試料導入装置

Publications (2)

Publication Number Publication Date
JPS60262045A true JPS60262045A (ja) 1985-12-25
JPH0578783B2 JPH0578783B2 (enExample) 1993-10-29

Family

ID=14746878

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11885884A Granted JPS60262045A (ja) 1984-06-08 1984-06-08 誘導結合高周波プラズマ発光分析装置用試料導入装置

Country Status (1)

Country Link
JP (1) JPS60262045A (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01158334A (ja) * 1987-12-16 1989-06-21 Shimadzu Corp Icp発光分析装置

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58103356U (ja) * 1981-12-30 1983-07-14 株式会社島津製作所 高周波誘導結合プラズマ発光分光分析装置

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58103356U (ja) * 1981-12-30 1983-07-14 株式会社島津製作所 高周波誘導結合プラズマ発光分光分析装置

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01158334A (ja) * 1987-12-16 1989-06-21 Shimadzu Corp Icp発光分析装置

Also Published As

Publication number Publication date
JPH0578783B2 (enExample) 1993-10-29

Similar Documents

Publication Publication Date Title
JP3581604B2 (ja) 大気圧イオン化質量分析装置
JPS60262045A (ja) 誘導結合高周波プラズマ発光分析装置用試料導入装置
CN212883164U (zh) 一种高稳定性石英玻璃雾化器
JP3666851B2 (ja) 熱分析装置、熱分析測定方法及びガスフローユニット
JP3764798B2 (ja) 誘導結合プラズマ質量及び分光分析装置
CN116013761A (zh) 一种同心气动雾化器
Matusiewicz A microwave plasma cavity assembly for atomic emission spectrometry
JP2007057420A (ja) 溶液供給装置
CN209589928U (zh) 一种残余气体质谱分析装置
JPS6250644A (ja) プラズマ発光分析装置用廃液槽
JPH01158334A (ja) Icp発光分析装置
JPS586903B2 (ja) ブンセキソウチヨウサンプリングソウチ
JPH09199076A (ja) 誘導結合プラズマ質量分析装置及びその方法
JP2557673Y2 (ja) 蛍光測定用試料セル
CN110441291A (zh) 一种等离子体原子发射光谱分析仪
JPH07209190A (ja) 溶液試料の測定方法および装置
JPH0726691Y2 (ja) プラズマ発光分光分析装置
JPS6139964Y2 (enExample)
WO1982000201A1 (en) Gas mixing apparatus for metastable transfer emission spectroscopy
JPS60209148A (ja) Icp分析用の密閉循環式チェンバ
JP2019012038A (ja) 試料導入部品及び試料導入方法
WO2025068885A3 (en) Sample analysis system with lens apparatus
JPH11153542A (ja) Icp発光分光分析におけるプラズマトーチのクリーニング方法
JPH11142336A (ja) Icp分析装置
JPH05142151A (ja) プラズマ励起による分析装置