JPS60253222A - 欠陥検査方法 - Google Patents

欠陥検査方法

Info

Publication number
JPS60253222A
JPS60253222A JP59108337A JP10833784A JPS60253222A JP S60253222 A JPS60253222 A JP S60253222A JP 59108337 A JP59108337 A JP 59108337A JP 10833784 A JP10833784 A JP 10833784A JP S60253222 A JPS60253222 A JP S60253222A
Authority
JP
Japan
Prior art keywords
pattern
inspected
defect
image
pattern detection
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP59108337A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0516585B2 (enrdf_load_stackoverflow
Inventor
Hideaki Doi
秀明 土井
Keiichi Okamoto
啓一 岡本
Mitsuzo Nakahata
仲畑　光蔵
Yukio Matsuyama
松山　幸雄
Mineo Nomoto
峰生 野本
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP59108337A priority Critical patent/JPS60253222A/ja
Publication of JPS60253222A publication Critical patent/JPS60253222A/ja
Publication of JPH0516585B2 publication Critical patent/JPH0516585B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP59108337A 1984-05-30 1984-05-30 欠陥検査方法 Granted JPS60253222A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP59108337A JPS60253222A (ja) 1984-05-30 1984-05-30 欠陥検査方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59108337A JPS60253222A (ja) 1984-05-30 1984-05-30 欠陥検査方法

Publications (2)

Publication Number Publication Date
JPS60253222A true JPS60253222A (ja) 1985-12-13
JPH0516585B2 JPH0516585B2 (enrdf_load_stackoverflow) 1993-03-04

Family

ID=14482129

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59108337A Granted JPS60253222A (ja) 1984-05-30 1984-05-30 欠陥検査方法

Country Status (1)

Country Link
JP (1) JPS60253222A (enrdf_load_stackoverflow)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010049250A (ja) * 2008-08-20 2010-03-04 Asml Holding Nv オブジェクト表面上における粒子検出
JP2014025809A (ja) * 2012-07-26 2014-02-06 Jfe Steel Corp 疵検出方法および疵検出装置

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5472975A (en) * 1977-11-24 1979-06-11 Hitachi Ltd Mask inspecting method
JPS5961762A (ja) * 1982-10-01 1984-04-09 Nippon Kogaku Kk <Nikon> 異物検査装置

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5472975A (en) * 1977-11-24 1979-06-11 Hitachi Ltd Mask inspecting method
JPS5961762A (ja) * 1982-10-01 1984-04-09 Nippon Kogaku Kk <Nikon> 異物検査装置

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010049250A (ja) * 2008-08-20 2010-03-04 Asml Holding Nv オブジェクト表面上における粒子検出
JP2014025809A (ja) * 2012-07-26 2014-02-06 Jfe Steel Corp 疵検出方法および疵検出装置

Also Published As

Publication number Publication date
JPH0516585B2 (enrdf_load_stackoverflow) 1993-03-04

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