JPS60242421A - 露光装置 - Google Patents

露光装置

Info

Publication number
JPS60242421A
JPS60242421A JP59099559A JP9955984A JPS60242421A JP S60242421 A JPS60242421 A JP S60242421A JP 59099559 A JP59099559 A JP 59099559A JP 9955984 A JP9955984 A JP 9955984A JP S60242421 A JPS60242421 A JP S60242421A
Authority
JP
Japan
Prior art keywords
optical system
exposure mechanism
light source
vibration
exposure
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP59099559A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0519692B2 (enrdf_load_stackoverflow
Inventor
Takamasa Hirose
広瀬　隆昌
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP59099559A priority Critical patent/JPS60242421A/ja
Publication of JPS60242421A publication Critical patent/JPS60242421A/ja
Publication of JPH0519692B2 publication Critical patent/JPH0519692B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/709—Vibration, e.g. vibration detection, compensation, suppression or isolation

Landscapes

  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Toxicology (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Projection-Type Copiers In General (AREA)
JP59099559A 1984-05-17 1984-05-17 露光装置 Granted JPS60242421A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP59099559A JPS60242421A (ja) 1984-05-17 1984-05-17 露光装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59099559A JPS60242421A (ja) 1984-05-17 1984-05-17 露光装置

Publications (2)

Publication Number Publication Date
JPS60242421A true JPS60242421A (ja) 1985-12-02
JPH0519692B2 JPH0519692B2 (enrdf_load_stackoverflow) 1993-03-17

Family

ID=14250502

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59099559A Granted JPS60242421A (ja) 1984-05-17 1984-05-17 露光装置

Country Status (1)

Country Link
JP (1) JPS60242421A (enrdf_load_stackoverflow)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0750253A (ja) * 1984-06-21 1995-02-21 At & T Corp ディープ紫外線リソグラフィー
DE102013202292A1 (de) * 2013-02-13 2014-01-30 Carl Zeiss Smt Gmbh Schwingungsdämpfung optischer Elemente
EP4390544A1 (en) * 2022-12-23 2024-06-26 ASML Netherlands B.V. Optical system

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0750253A (ja) * 1984-06-21 1995-02-21 At & T Corp ディープ紫外線リソグラフィー
DE102013202292A1 (de) * 2013-02-13 2014-01-30 Carl Zeiss Smt Gmbh Schwingungsdämpfung optischer Elemente
EP4390544A1 (en) * 2022-12-23 2024-06-26 ASML Netherlands B.V. Optical system
WO2024133608A1 (en) * 2022-12-23 2024-06-27 Asml Netherlands B.V. Optical system

Also Published As

Publication number Publication date
JPH0519692B2 (enrdf_load_stackoverflow) 1993-03-17

Similar Documents

Publication Publication Date Title
JP3927753B2 (ja) 露光装置及びデバイス製造方法
US7095481B2 (en) Exposure method and apparatus
US6452723B1 (en) Exposure apparatus and method
US5650877A (en) Imaging system for deep ultraviolet lithography
EP0823073B1 (en) Illumination unit for an optical apparatus
EP1724816A1 (en) Exposure method and system, and device production method
JPH0661121A (ja) 照明光学装置
KR20070109928A (ko) 투사 노광 장치, 투사 노광 방법 및 투사 대물렌즈
US4922290A (en) Semiconductor exposing system having apparatus for correcting change in wavelength of light source
WO2000067303A1 (fr) Procede et appareil d'exposition
US4798962A (en) Multi-wavelength projection exposure and alignment apparatus
JPH10275771A (ja) 照明光学装置
JP2002033272A (ja) 露光方法及び装置、並びにデバイス製造方法
KR20010030561A (ko) 투영 노광 장치, 투영 노광 방법, 광 세정 방법 및 반도체디바이스의 제조 방법
JPH0721583B2 (ja) 露光装置
JPH10142555A (ja) 投影露光装置
JP6761306B2 (ja) 照明光学系、リソグラフィ装置、及び物品製造方法
JP2633028B2 (ja) 観察方法及び観察装置
KR20090060155A (ko) 주사 노광장치 및 디바이스 제조방법
WO2002042728A1 (fr) Procede et dispositif permettant de mesurer les aberrations d'un systeme optique de projection et procede et dispositif d'exposition
JPS60242421A (ja) 露光装置
JP3414476B2 (ja) 投影露光装置
JP3278892B2 (ja) 露光装置及び方法、並びにデバイス製造方法
JPH01119020A (ja) 露光装置
JPH09223661A (ja) 露光装置

Legal Events

Date Code Title Description
EXPY Cancellation because of completion of term