JPH0519692B2 - - Google Patents
Info
- Publication number
- JPH0519692B2 JPH0519692B2 JP59099559A JP9955984A JPH0519692B2 JP H0519692 B2 JPH0519692 B2 JP H0519692B2 JP 59099559 A JP59099559 A JP 59099559A JP 9955984 A JP9955984 A JP 9955984A JP H0519692 B2 JPH0519692 B2 JP H0519692B2
- Authority
- JP
- Japan
- Prior art keywords
- exposure
- light source
- mask
- optical system
- wafer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 230000003287 optical effect Effects 0.000 claims description 42
- 238000002955 isolation Methods 0.000 claims description 2
- 238000000034 method Methods 0.000 claims 1
- 238000005286 illumination Methods 0.000 description 24
- 230000004907 flux Effects 0.000 description 6
- 238000010586 diagram Methods 0.000 description 4
- 230000010355 oscillation Effects 0.000 description 3
- 230000003595 spectral effect Effects 0.000 description 3
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- 229910004261 CaF 2 Inorganic materials 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 230000004075 alteration Effects 0.000 description 1
- 230000002950 deficient Effects 0.000 description 1
- 239000005350 fused silica glass Substances 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- 150000002367 halogens Chemical class 0.000 description 1
- 238000002347 injection Methods 0.000 description 1
- 239000007924 injection Substances 0.000 description 1
- 230000007774 longterm Effects 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 1
- 229910052753 mercury Inorganic materials 0.000 description 1
- 230000010287 polarization Effects 0.000 description 1
- 238000001228 spectrum Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
- G03F7/709—Vibration, e.g. vibration detection, compensation, suppression or isolation
Landscapes
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Atmospheric Sciences (AREA)
- Toxicology (AREA)
- Engineering & Computer Science (AREA)
- Environmental & Geological Engineering (AREA)
- Epidemiology (AREA)
- Public Health (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Projection-Type Copiers In General (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP59099559A JPS60242421A (ja) | 1984-05-17 | 1984-05-17 | 露光装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP59099559A JPS60242421A (ja) | 1984-05-17 | 1984-05-17 | 露光装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS60242421A JPS60242421A (ja) | 1985-12-02 |
| JPH0519692B2 true JPH0519692B2 (enrdf_load_stackoverflow) | 1993-03-17 |
Family
ID=14250502
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP59099559A Granted JPS60242421A (ja) | 1984-05-17 | 1984-05-17 | 露光装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS60242421A (enrdf_load_stackoverflow) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE3588012T2 (de) * | 1984-06-21 | 1995-09-14 | At & T Corp., New York, N.Y. | Lithographie im fernen UV-Gebiet. |
| DE102013202292A1 (de) * | 2013-02-13 | 2014-01-30 | Carl Zeiss Smt Gmbh | Schwingungsdämpfung optischer Elemente |
| EP4390544A1 (en) * | 2022-12-23 | 2024-06-26 | ASML Netherlands B.V. | Optical system |
-
1984
- 1984-05-17 JP JP59099559A patent/JPS60242421A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS60242421A (ja) | 1985-12-02 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| EXPY | Cancellation because of completion of term |