JPS6024021A - 寸法チエツクパタ−ン - Google Patents

寸法チエツクパタ−ン

Info

Publication number
JPS6024021A
JPS6024021A JP58132305A JP13230583A JPS6024021A JP S6024021 A JPS6024021 A JP S6024021A JP 58132305 A JP58132305 A JP 58132305A JP 13230583 A JP13230583 A JP 13230583A JP S6024021 A JPS6024021 A JP S6024021A
Authority
JP
Japan
Prior art keywords
pattern
patterns
rectangular
rows
order
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP58132305A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0142625B2 (enExample
Inventor
「さな」田　克
Katsu Sanada
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp, Nippon Electric Co Ltd filed Critical NEC Corp
Priority to JP58132305A priority Critical patent/JPS6024021A/ja
Publication of JPS6024021A publication Critical patent/JPS6024021A/ja
Publication of JPH0142625B2 publication Critical patent/JPH0142625B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H10P50/00—

Landscapes

  • Length Measuring Devices By Optical Means (AREA)
  • Weting (AREA)
JP58132305A 1983-07-20 1983-07-20 寸法チエツクパタ−ン Granted JPS6024021A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP58132305A JPS6024021A (ja) 1983-07-20 1983-07-20 寸法チエツクパタ−ン

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58132305A JPS6024021A (ja) 1983-07-20 1983-07-20 寸法チエツクパタ−ン

Publications (2)

Publication Number Publication Date
JPS6024021A true JPS6024021A (ja) 1985-02-06
JPH0142625B2 JPH0142625B2 (enExample) 1989-09-13

Family

ID=15078189

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58132305A Granted JPS6024021A (ja) 1983-07-20 1983-07-20 寸法チエツクパタ−ン

Country Status (1)

Country Link
JP (1) JPS6024021A (enExample)

Also Published As

Publication number Publication date
JPH0142625B2 (enExample) 1989-09-13

Similar Documents

Publication Publication Date Title
US4433911A (en) Method of evaluating measure precision of patterns and photomask therefor
CN111312691B (zh) 一种套刻对准标记结构、套刻对准测量方法及半导体器件
JPS6127631A (ja) 半導体装置
CN115097691B (zh) 一种掩模板及形成方法
JPH0411801B2 (enExample)
JP4387583B2 (ja) 校正用プレート、校正用プレート生成方法、及び半導体装置の製造方法
JPS5846054B2 (ja) フオトマスク
JPS6024021A (ja) 寸法チエツクパタ−ン
JP2633228B2 (ja) 半導体装置のエッチング精度検査方法
JP2587614B2 (ja) 半導体装置
CN113515018A (zh) 一种60μm划片槽的对位标记设计方法
JPS59134826A (ja) バ−ニヤパタ−ン
US6403978B1 (en) Test pattern for measuring variations of critical dimensions of wiring patterns formed in the fabrication of semiconductor devices
JP2839469B2 (ja) マスク合わせずれ測定用パターン及びその測定方法
JPS6148708B2 (enExample)
KR100262667B1 (ko) 반도체장치제조방법
KR100187661B1 (ko) 반도체 소자의 임계치수 측정용 바아 형성방법
JP3698843B2 (ja) フォトマスク
JP3128947B2 (ja) 寸法測定セルのエッチングマスクパターン
KR100618689B1 (ko) 반도체 소자의 오버레이 버어니어 형성방법
JPH11211432A (ja) 半導体装置及びガラスマスク
JPH0545948B2 (enExample)
JP2853471B2 (ja) 半導体集積回路装置の製造方法
CN103943607B (zh) 划片槽条宽测试结构及方法
JPS60136326A (ja) 半導体装置