JPS60238477A - Ion plating method - Google Patents

Ion plating method

Info

Publication number
JPS60238477A
JPS60238477A JP9294984A JP9294984A JPS60238477A JP S60238477 A JPS60238477 A JP S60238477A JP 9294984 A JP9294984 A JP 9294984A JP 9294984 A JP9294984 A JP 9294984A JP S60238477 A JPS60238477 A JP S60238477A
Authority
JP
Japan
Prior art keywords
ion
workpiece
color tone
evaporation
blating
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP9294984A
Other languages
Japanese (ja)
Other versions
JPH0542505B2 (en
Inventor
Hideo Shinomiya
篠宮 秀夫
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Citizen Holdings Co Ltd
Citizen Watch Co Ltd
Original Assignee
Citizen Holdings Co Ltd
Citizen Watch Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Citizen Holdings Co Ltd, Citizen Watch Co Ltd filed Critical Citizen Holdings Co Ltd
Priority to JP9294984A priority Critical patent/JPS60238477A/en
Publication of JPS60238477A publication Critical patent/JPS60238477A/en
Publication of JPH0542505B2 publication Critical patent/JPH0542505B2/ja
Granted legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24Vacuum evaporation
    • C23C14/32Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

PURPOSE:To finish all materials to be processed in uniform color tone by isolating each vapor source on specified conditions when the ion plating is finished in ion-plating many circulating and moving materials to be processed from two kinds of vapor sources. CONSTITUTION:Ti ions and Au ions from a Ti vapor source 2 and an Au vapor source 3 are compositely ion-plated on the surface of many works 4 to be processed which are circulated and moved by a moving device 5 in a vacuum vessel 1. Ti ions fly in zones A and B in the vacuum vessel 1, and Au ions fly in zones B and C. When the ion plating is finished, Ti ions contributing scarcely to color tone are isolated with a shutter 8 on the Ti vapor source 2, and Au ions are isolated with a shutter 9 after 1/2-1 cycle of the work 4 by the work moving device 5. Accordingly, the vapor deposition film in uniform color tone can be formed on many works 4.

Description

【発明の詳細な説明】 皮帆分更 この発明はイオンブレーティング方法に関し、特に2つ
の蒸発源を用いて2種類の蒸発物質を同時に蒸発させて
、被加工物の表面に所望の色調の被膜を形成する二元蒸
発のイオンブレーティング方法に関する。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to an ion blating method, and more particularly, to a method for ion blating, in which two types of evaporation substances are evaporated simultaneously using two evaporation sources, thereby forming a coating of a desired color on the surface of a workpiece. This invention relates to an ion blating method for binary evaporation to form.

灸来投轍 イオンブレーティングは、真空容器内に蒸発源を設置し
、その上方に被加工物(以下「ワーク」という)を配設
して、蒸発源で例えば金(A u )のような物質を蒸
発させてイオン化し、そのイオン化極性と逆極性の電圧
を印加したワークの表面に付着させて被膜を形成する方
法である。
In moxibustion track ion blating, an evaporation source is installed in a vacuum container, a workpiece (hereinafter referred to as a "work") is placed above the evaporation source, and the evaporation source is used to irradiate a material such as gold (A u ) with the evaporation source. This is a method in which a substance is evaporated and ionized, and a film is formed by adhering it to the surface of a workpiece to which a voltage of opposite polarity to the ionization polarity is applied.

このようなイオンブレーティングに、よって、例えば時
計の外装部品(ケースやバンド等)などに所望の色調の
被膜を形成して装飾性を高めることが従来から行なわれ
ている。
Conventionally, such ion blating has been used to form a coating of a desired color on, for example, exterior parts of watches (cases, bands, etc.) to enhance decorativeness.

その場合、蒸発物質として例えば金(A u )のみを
用いたのでは、所望の色調を得ることができないので、
例えば金(A u )とチタン(Ti)の2種類の蒸発
物質製用いる場合がある。
In that case, if only gold (A u ) is used as the evaporative substance, the desired color tone cannot be obtained.
For example, two types of vaporized substances, gold (A u ) and titanium (Ti), may be used.

その場合、この2種類の金属(例えばAuとTi)を合
金にして、1つの蒸発源で蒸発させてイオンブレーティ
ングすることも行なわれているが、2種類の金属の蒸発
温度が異なる場合にはそのような方法はとれないし、合
金を作る設備が別に必要になるため、少量生産には適さ
ない。
In that case, ion blating has been carried out by making an alloy of these two types of metals (for example, Au and Ti) and evaporating them with one evaporation source, but when the evaporation temperatures of the two types of metals are different, This method cannot be used, and separate equipment for making the alloy is required, making it unsuitable for small-scale production.

そこで、同一の真空容器内で、2つの蒸発源を用いて2
種類の物質を別々に蒸発させ、その上方で多数のワーク
を循環移動させながらイオンブレーティングを行なう方
法がある。
Therefore, we decided to use two evaporation sources in the same vacuum container.
There is a method of evaporating different types of substances separately and performing ion blating while circulating a large number of workpieces above the evaporation.

従来のこのようなイオンブレーティング方法では、2つ
の蒸発源をそれぞれ覆うシャツタ板を同時に開放してイ
オンブレーティングを開始し、2種類の蒸発物質による
薄暎がワークの表面に順次形成されて所望の色調が得ら
れた時に、2つの蒸発源を同時にシャツタ板で覆ってイ
オンブレーティングを終了していた。
In the conventional ion blating method, ion blating is started by simultaneously opening the shirt plates that cover the two evaporation sources, and thin strips of two types of evaporation substances are sequentially formed on the surface of the workpiece to achieve the desired effect. When this color tone was obtained, the two evaporation sources were simultaneously covered with a shutter plate to complete the ion blating.

しかしながら、このような従来のイオンブレーティング
方法では、例は前述のように時計の外装部品にAuとT
iによって黄金色の被膜を形成するような場合、イオン
ブレーティングを終了する直前にAuの蒸発源の上方に
位置していたワークとTiの蒸発源の上方に位置してい
たワークとでは仕上りの色調が違ってしまい、前者の方
が幾分濃い金色になり、後者の方がそれに比べて淡い金
色になる。
However, in such conventional ion blating methods, examples include Au and T on the exterior parts of watches, as mentioned above.
In the case where a golden-yellow film is formed by i, the finish is different between the workpiece that was located above the Au evaporation source and the workpiece that was located above the Ti evaporation source just before ion blating was completed. The colors are different, with the former being a somewhat darker gold, and the latter being a lighter gold.

これは、Auの蒸発源の上方ではAuの蒸発粒子が多く
付着し、Tiの蒸発源の上方ではTiの蒸発粒子が多く
付着するか、ワークの最終色調に寄与する率が大きいの
はAuであり、Tiは金色を薄める役目を果すためであ
る。
This is because many Au evaporation particles adhere above the Au evaporation source, and many Ti evaporation particles adhere above the Ti evaporation source, or it is Au that contributes to the final color tone of the workpiece. This is because Ti serves to dilute the gold color.

1−許 この発明は、このような問題を解決するためになされた
もので、2つの蒸発源を用いて2種類の蒸発物質による
イオンブレーティングを一度に多数のワークに対して行
なっても、全てのワークの仕上り色調が均一になるよう
にすることを目的とする。
1. This invention was made to solve this problem. Even if ion blating is performed on a large number of workpieces at once using two evaporation sources and two types of evaporation substances, The purpose is to make the finished color tone of all workpieces uniform.

11文 そのため、この発明によるイオンブレーティング方法は
、イオンブレーティングを終了する際に、2つの蒸発源
のうち、ワークの最終色調への寄与率か小さい方の物質
を蒸発させる蒸発源を先にシャツタ板で覆い、その後ワ
ークの循環移動周期の1/2〜1周期遅らせてワークの
最終色調への寄与率が大きい方の物質を蒸発させる蒸発
源をシャツタ板で覆うようにする。
Sentence 11 Therefore, in the ion blating method according to the present invention, when ion blating is finished, of the two evaporation sources, the evaporation source that evaporates the substance with the smaller contribution to the final color tone of the workpiece is selected first. The evaporation source for evaporating the substance having a larger contribution rate to the final color tone of the workpiece is covered with a shirttail plate, and then delayed by 1/2 to 1 period of the circulation movement period of the workpiece.

害−旅−的− 以l:、この発明の実施例を添伺図面を参照して説明す
る、。
Embodiments of the present invention will be described with reference to the accompanying drawings.

第1図は、この発明を実施するためのイオンブレーティ
ング装置であり、真空容器であるベルジャ1内の下部に
2つの蒸発源2,6が間隔を置いて設計面されており、
その上方に被膜を形成すべき多数のワーク4を自転させ
なから矢示方向に循環移動させるワーク移動装置5が配
置されている。
FIG. 1 shows an ion brating device for carrying out the present invention, in which two evaporation sources 2 and 6 are spaced apart from each other at the bottom of a bell jar 1, which is a vacuum container.
A workpiece moving device 5 is disposed above the workpieces 4 for rotating and circulatingly moving a large number of works 4 on which coatings are to be formed in the direction of the arrow.

ベルジャ1には、内部の空気を排出して真空にするため
の排気口6と、必要に応じてアルゴン等の不活生ガスを
導入するためのガス導入ロアが設られており、各蒸発源
2,3の近くにはシャッタ板8.9が図示のように各蒸
発源2.′5の上方を開放する位置と覆う位置とに回動
可能に設けられている。
The bell jar 1 is equipped with an exhaust port 6 for discharging the internal air to create a vacuum, and a gas introduction lower for introducing inert gas such as argon as necessary. A shutter plate 8.9 is provided near each evaporation source 2.2 as shown in the figure. It is rotatably provided between a position where the upper part of '5 is opened and a position where it is covered.

このシャッタ板8,9は、例えば第2図に示すように、
ロータリソレノイド又はモータ等の駆動源10のベルジ
ャ1内に延びる回転軸10aに略水平に取付けられてお
り、軸10.の回転により矢示のように水平面内で90
°程度回動するようになっている。
The shutter plates 8 and 9 are, for example, as shown in FIG.
It is attached substantially horizontally to a rotating shaft 10a of a drive source 10 such as a rotary solenoid or a motor, which extends inside the bell jar 1, and the shaft 10. 90 degrees in the horizontal plane as shown by the arrow.
It is designed to rotate about 1°.

蒸発源2,3は、それぞれ蒸発用交流電源10゜11に
よって給電され、電子ビーム加熱や抵抗加熱等によって
、るつぼ内に置かれた蒸発物質(例えばTj、Au等)
を蒸発させる。 。
The evaporation sources 2 and 3 are powered by evaporation AC power sources 10 and 11, respectively, and evaporate the evaporation material (for example, Tj, Au, etc.) placed in the crucible by electron beam heating, resistance heating, etc.
evaporate. .

ワーク4には、高圧直流電源12によって蒸発源2,3
に対して負の高電圧がワーク移動装置5を介して印加さ
れる。
The workpiece 4 is provided with evaporation sources 2 and 3 by a high-voltage DC power supply 12.
A negative high voltage is applied to the workpiece moving device 5 via the workpiece moving device 5.

それによって、蒸発源2,3によって蒸発される蒸発物
質粒子が、ワーク4との間の電界あるいは別に設けたイ
オン化電極(図示せず)によってイオン化され、ワーク
4に引き付けられてその全表面に略均−に付着して被膜
を形成する。
As a result, the evaporated substance particles evaporated by the evaporation sources 2 and 3 are ionized by the electric field between them and the workpiece 4 or by a separately provided ionization electrode (not shown), and are attracted to the workpiece 4 and spread over the entire surface of the workpiece 4. Adheres evenly to form a film.

このイオンブレーティング装置において、例えば蒸発源
2によってチタン(Ti)を、蒸発源乙によって金(A
u)それぞれ蒸発させ、シャッタ板8,9を第1図に破
線で示す遮蔽位置から実線で示す開放位置へ回動させる
と、イオンブレーティングが開始される。
In this ion blating device, for example, titanium (Ti) is evaporated by evaporation source 2, and gold (A) is oxidized by evaporation source B.
u) When the shutter plates 8 and 9 are evaporated and rotated from the shielding position shown in broken lines in FIG. 1 to the open position shown in solid lines, ion blating is started.

そして、第1図にA、Bで示す範囲にはTiの蒸発粒子
が飛翔し、B、Cで示す範囲にはAuの蒸発粒子が飛翔
して(Bで示す範囲にはTiとΔUの両方の蒸発粒子が
飛翔する)、それぞれワーク移動装置5によって矢示方
向に循環移動される多数のワーク4の表面に順次付着し
て被膜を形成する。
In Fig. 1, evaporated Ti particles fly in the ranges shown by A and B, and evaporated Au particles fly in the ranges shown by B and C (both Ti and ΔU particles fly in the range shown by B). The evaporated particles fly) and are sequentially attached to the surfaces of a large number of works 4 that are circulated in the direction of the arrow by the workpiece moving device 5 to form a coating.

そのため、イオンブレーティングを終了する際に、従来
のように両シャッタ板8.9を同時に破線で示す位置へ
回動させて蒸発源2.ろの上面を覆うと、Aの範囲内で
終了したワークには最後にTiの被膜が形成され、Bの
範囲内で終了したワークには最後にTiとAuの混合被
膜が形成され、Cの範囲内で終了したワークには最後に
Auの被膜が形成されているので、それぞれ色調が異な
り、A、B、Cの順で順次濃い金色になる。
Therefore, when ion blating is finished, the evaporation source 2. When the upper surface of the filter is covered, a Ti film is finally formed on the workpiece that ends within the range of A, a mixed film of Ti and Au is finally formed on the workpiece that ends within the range of B, and a film of Ti and Au is finally formed on the workpiece that ends within the range of Since the Au film is finally formed on the workpieces completed within the range, each workpiece has a different color tone, and becomes a deep gold color in the order of A, B, and C.

この場合、ワークの最終色調に寄与する率が大きいのは
Auであり、Tiは最終色調に寄与する率が小さい(色
をうすくする役目をなす)。
In this case, Au has a large contribution to the final color tone of the workpiece, and Ti has a small contribution to the final color tone (plays the role of making the color lighter).

そこで、この発明によるイオンブレーティング方法では
、イオンブレーティングを終了する際に、先ずシャツタ
板8を破線で示す位置へ回動させてTiを蒸発させる蒸
発源2の上面を覆い、その後、ワーク移動装置5による
ワーク4の循環移動周期の1/2〜1周期(1/2周期
より若干長い程度が最適)だけ遅らせて、シャッタFi
Sを破線で示す位置へ回動させてAuを蒸発させる蒸発
源乙の上面を覆うようにする。
Therefore, in the ion blating method according to the present invention, when finishing ion blating, the shirt plate 8 is first rotated to the position shown by the broken line to cover the upper surface of the evaporation source 2 for evaporating Ti, and then the workpiece is moved. The shutter Fi is delayed by 1/2 to 1 period (slightly longer than 1/2 period is optimal) of the circulation movement period of the workpiece 4 by the device 5.
S is rotated to the position shown by the broken line so that it covers the upper surface of the evaporation source B for evaporating Au.

このようにすれば、各ワーク4の表面に最後に形成され
る被膜は全てAuになるので、全てのワーク4の仕上り
色調に殆んど差がなくなり、所望の色調が得られる。
In this way, the final coating formed on the surface of each workpiece 4 is all Au, so there is almost no difference in the finished color tone of all the workpieces 4, and a desired color tone can be obtained.

この発明によるイオンブレーティングを行なうのに適し
た蒸発物質の組合わせとしては、ワークの最終色調に寄
与する率の大きい物質としてA、 uを使用し、最終色
調に寄与する率の小さい色調調整用の物質としてT1の
ほかに、N i I P a +Cυ、Cr、Coなど
が使用される。
As a combination of evaporative substances suitable for performing ion blating according to the present invention, A and u are used as substances that contribute to the final color tone of the workpiece in a large proportion, and substances for color tone adjustment that contribute in a small proportion to the final color tone are used. In addition to T1, N i I P a +Cυ, Cr, Co, etc. are used as the material.

また、いずれか一方が合金で他方が単体(例えはAuと
Tiの合金とTi)でもよいし、両方とも合金でもよい
Further, one of them may be an alloy and the other may be a single substance (for example, an alloy of Au and Ti and Ti), or both may be an alloy.

次に、上記実施例におけるワーク移動装置5及びそれに
ワークを取付ける取付具の具体例を、第3図及び第4図
によって説明する。
Next, a specific example of the workpiece moving device 5 and the fixture for attaching the workpiece thereto in the above embodiment will be explained with reference to FIGS. 3 and 4.

第3図は、ワーク移動装置及びワーク取付具の要部斜視
図であり、図示しない一対のスプロケットに無端状に張
装したチェーン13の中空連結ピン13aに挿着した軸
(図示せず)にローラ14を回転自在に軸支させ、この
ローラ14に形成したボス部14aに設けた切欠き溝1
4bに仮バネによるクリップ15を固着している。
FIG. 3 is a perspective view of the main parts of the workpiece moving device and the workpiece fixing device. A notched groove 1 is provided in a boss portion 14a formed on the roller 14, which rotatably supports the roller 14.
A clip 15 using a temporary spring is fixed to 4b.

このクリップ15に、ローラ14の軸方向に沿って取付
具20の支持軸21を挿着してローラ14と一体的に回
転するようにし、この支持軸2複数個のボス部22を間
隔を置いて固設している。
The support shaft 21 of the fixture 20 is inserted into the clip 15 along the axial direction of the roller 14 so that it rotates integrally with the roller 14, and a plurality of boss portions 22 of the support shaft 2 are arranged at intervals. It is permanently installed.

そして、この取付具20の各ロット23の先端部に固着
した略三角形状の板バネからなる係止片24によって、
各ワーク4を点接触で支持する。
Then, by means of a locking piece 24 made of a substantially triangular leaf spring fixed to the tip of each lot 23 of this fixture 20,
Each workpiece 4 is supported by point contact.

このようにして多数のワーク取付゛具20を回転自在に
支持するワーク移動装置5のチェーン13が、第1図に
おけるベルジャ1内の蒸発源2.乙の上方に、第4図に
示すように軸16a、17aによってそれぞれ回転可能
に軸支された一対のスプロケット16.17に無端状に
張装される。
The chain 13 of the workpiece moving device 5, which rotatably supports a large number of workpiece fixtures 20 in this way, is connected to the evaporation source 2.0 in the bell jar 1 in FIG. As shown in FIG. 4, a pair of sprockets 16 and 17 are rotatably supported by shafts 16a and 17a, respectively.

そして、このチェーン13の」三方走行部及び下方走行
部の下側に、それぞれローラ14を転接させるように所
定領域に亘ってカイトレール18゜1Bを固設している
A kite rail 18.degree. 1B is fixed to the lower side of the three-way running section and the downward running section of the chain 13 over a predetermined area so as to roll the rollers 14 into contact with each other.

したがって、スプロケット16.17を矢示A方向に回
転させると、チェーン13の」三方走行部は矢示B方向
に、下側走行部は矢示C方向に走行し、各ローラ14は
それぞ匙チェーン13と同方向に移動すると共に、ガイ
ドレール18.19に書;鉢ナスレ&−;山トヘ1−面
紳ナスそれによって、各ワーク取付具20の支持軸21
がローラ14に同動して循環移動しながら自転する。
Therefore, when the sprockets 16 and 17 are rotated in the direction of arrow A, the three-way running part of the chain 13 runs in the direction of arrow B, the lower running part runs in the direction of arrow C, and each roller 14 moves in the direction of arrow C. While moving in the same direction as the chain 13, the support shaft 21 of each workpiece fixture 20
moves along with the rollers 14 and rotates while circulating.

なお、第1図の高圧直流電源12からの電圧は。Note that the voltage from the high voltage DC power supply 12 in FIG.

全て金属製のスプロケット16又は17.チェーン16
.ローラ14.及び支持軸21を含む取付具20を介し
て印加される。
All metal sprocket 16 or 17. chain 16
.. Roller 14. and is applied via a fixture 20 including a support shaft 21.

効果 以上、実施例について説明してきたように、この発明に
よる二元蒸発のイオンブレーティング方法は、イオンブ
レーティングを終了する際に2つの蒸発源をシャッタ仮
によって遮蔽する時期を、ワークの循環移動の]72〜
1周期すらすたけであるが、それによって、一度にイオ
ンブレーティングを行なう多数のワークの仕上り色調を
略均−にすることができる。
Effects As described above with reference to the embodiments, the ion blating method for binary evaporation according to the present invention allows the two evaporation sources to be shielded by temporary shutters at the time of finishing ion blating to be controlled by changing the period of time when the work is circulated. ]72~
Although it takes only one cycle, it is possible to substantially equalize the finished color tone of a large number of works that are subjected to ion blating at once.

しかも、特別な装置を必要としないので簡単に9ご施で
き、特に多品種少量生産に適する。
Moreover, since no special equipment is required, the process can be easily carried out, making it particularly suitable for high-mix, low-volume production.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は、この発明を実施するためのイオンブレーティ
ング装置の概略を示す模式的構成図、第2図は、同じく
そのシャツタ板の取付合1を示す斜視図、 第6図及び第4図は、同じくそのワーク移動装置及び取
付具の具体例を示す要部斜視図及びベルジャ内の配置例
を示す模式図である。 1・・・ベルジャ(真空容器) 2,3・・・蒸発源4
・・・ワーク(被加工物) 5・・ワーク移動装置8.
9・・・シャツタ板 10.11・蒸発用交流電源 12・・・高圧直流電源 第1図 第2図 第3図 4 第4図
FIG. 1 is a schematic configuration diagram showing an outline of an ion brating device for carrying out the present invention, FIG. 2 is a perspective view showing the attachment 1 of the shirt shirt plate, FIGS. 6 and 4 2 is a perspective view of main parts showing a specific example of the workpiece moving device and the fixture, and a schematic diagram showing an example of arrangement in a bell jar. 1... Belljar (vacuum container) 2, 3... Evaporation source 4
... Workpiece (workpiece) 5. Workpiece moving device 8.
9...Shutter plate 10.11/Evaporation AC power supply 12...High voltage DC power supply Figure 1 Figure 2 Figure 3 Figure 4 Figure 4

Claims (1)

【特許請求の範囲】[Claims] 1 真空容器内に異なる物質を蒸発させる2つの蒸発源
を間隔を置いて配置し、その上方で多数の被加工物を循
環移動させながらイオンブレーティングを行なう方法に
おいて、イオンブレーティングを終了する際に、前記2
つの蒸発源のうち、被加工物の最終色調に寄与する率が
小さい方の物質を蒸発させる蒸発源を先にシャツタ板で
覆い、その後前記被加工物の循環移動周期の172〜1
周期遅らせて被加工物の最終色調に寄与する率が大きい
方の蒸発物質を蒸発させる蒸発源をシャツタ板で覆うこ
とを特徴とするイオンブレーティング方法。
1 In a method in which two evaporation sources that evaporate different substances are arranged at a distance in a vacuum container, and ion blating is performed while circulating a large number of workpieces above them, when ion blating is finished, In the above 2
Of the two evaporation sources, the evaporation source that evaporates the substance that contributes to the final color tone of the workpiece is first covered with a shirt plate, and then the evaporation source that evaporates the material that contributes to the final color tone of the workpiece is covered with a shirt plate, and then
An ion blating method characterized in that an evaporation source for evaporating the evaporation substance that contributes to the final color tone of the workpiece with a larger rate by delaying the period is covered with a shatter plate.
JP9294984A 1984-05-11 1984-05-11 Ion plating method Granted JPS60238477A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP9294984A JPS60238477A (en) 1984-05-11 1984-05-11 Ion plating method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9294984A JPS60238477A (en) 1984-05-11 1984-05-11 Ion plating method

Publications (2)

Publication Number Publication Date
JPS60238477A true JPS60238477A (en) 1985-11-27
JPH0542505B2 JPH0542505B2 (en) 1993-06-28

Family

ID=14068712

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9294984A Granted JPS60238477A (en) 1984-05-11 1984-05-11 Ion plating method

Country Status (1)

Country Link
JP (1) JPS60238477A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6350463A (en) * 1986-08-19 1988-03-03 Toobi:Kk Method and apparatus for ion plating
US5510012A (en) * 1992-02-19 1996-04-23 Leybold Aktiengesellschaft Method for producing a decorative gold alloy coating

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0762855A (en) * 1993-08-26 1995-03-07 Japan Steels Internatl Kk Expandable scaffolding board

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6350463A (en) * 1986-08-19 1988-03-03 Toobi:Kk Method and apparatus for ion plating
US5510012A (en) * 1992-02-19 1996-04-23 Leybold Aktiengesellschaft Method for producing a decorative gold alloy coating

Also Published As

Publication number Publication date
JPH0542505B2 (en) 1993-06-28

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