JPS60236223A - 基板の冷却装置 - Google Patents
基板の冷却装置Info
- Publication number
- JPS60236223A JPS60236223A JP59091879A JP9187984A JPS60236223A JP S60236223 A JPS60236223 A JP S60236223A JP 59091879 A JP59091879 A JP 59091879A JP 9187984 A JP9187984 A JP 9187984A JP S60236223 A JPS60236223 A JP S60236223A
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- substrate holder
- holder
- elasticity
- fine wires
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/34—Arrangements for cooling, heating, ventilating or temperature compensation ; Temperature sensing arrangements
- H01L23/46—Arrangements for cooling, heating, ventilating or temperature compensation ; Temperature sensing arrangements involving the transfer of heat by flowing fluids
- H01L23/473—Arrangements for cooling, heating, ventilating or temperature compensation ; Temperature sensing arrangements involving the transfer of heat by flowing fluids by flowing liquids
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/0001—Technical content checked by a classifier
- H01L2924/0002—Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00
Landscapes
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP59091879A JPS60236223A (ja) | 1984-05-10 | 1984-05-10 | 基板の冷却装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP59091879A JPS60236223A (ja) | 1984-05-10 | 1984-05-10 | 基板の冷却装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS60236223A true JPS60236223A (ja) | 1985-11-25 |
| JPH0212383B2 JPH0212383B2 (enExample) | 1990-03-20 |
Family
ID=14038841
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP59091879A Granted JPS60236223A (ja) | 1984-05-10 | 1984-05-10 | 基板の冷却装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS60236223A (enExample) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6142843A (ja) * | 1984-08-02 | 1986-03-01 | Ulvac Corp | 基板の冷却装置 |
| JPH04214620A (ja) * | 1990-12-12 | 1992-08-05 | Nec Kyushu Ltd | イオン注入装置用ディスク |
| JP2005100988A (ja) * | 2003-09-24 | 2005-04-14 | Carl Zeiss Nts Gmbh | 粒子放射装置 |
-
1984
- 1984-05-10 JP JP59091879A patent/JPS60236223A/ja active Granted
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6142843A (ja) * | 1984-08-02 | 1986-03-01 | Ulvac Corp | 基板の冷却装置 |
| JPH04214620A (ja) * | 1990-12-12 | 1992-08-05 | Nec Kyushu Ltd | イオン注入装置用ディスク |
| JP2005100988A (ja) * | 2003-09-24 | 2005-04-14 | Carl Zeiss Nts Gmbh | 粒子放射装置 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0212383B2 (enExample) | 1990-03-20 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US3133336A (en) | Semiconductor device fabrication | |
| JPH05275429A (ja) | 接合された基板中に真性ゲッタリング・サイトを作る方法およびシリコン半導体基板中の可動性イオンを捕捉する方法 | |
| EP0248445A3 (en) | Semiconductor device having a diffusion barrier and process for its production | |
| JPS6293927A (ja) | 固体平板状拡散源の急速熱処理による半導体ウェ−ハのド−ピング方法 | |
| JPS60201666A (ja) | 半導体装置 | |
| US3913217A (en) | Method of producing a semiconductor device | |
| GB751278A (en) | Method and apparatus for making semiconductor devices | |
| JPS60236223A (ja) | 基板の冷却装置 | |
| US3171761A (en) | Particular masking configuration in a vapor deposition process | |
| US3579375A (en) | Method of making ohmic contact to semiconductor devices | |
| US2817607A (en) | Method of making semi-conductor bodies | |
| JPH0311666A (ja) | 半導体集積回路装置 | |
| JPS6021558A (ja) | バイポ−ラ型半導体集積回路装置 | |
| US3156593A (en) | Fabrication of semiconductor devices | |
| JPS58169788A (ja) | 真空用試料加熱装置 | |
| JPH0313703B2 (enExample) | ||
| JPS6169122A (ja) | 半導体装置の製造方法 | |
| JPH0733364Y2 (ja) | ウエハー保持機構 | |
| US6248647B1 (en) | Fabrication of integrated circuits on both sides of a semiconductor wafer | |
| JPH0417920B2 (enExample) | ||
| JPS63285928A (ja) | 半導体製造装置 | |
| JPS62221122A (ja) | 半導体装置の製造方法 | |
| JPH07221053A (ja) | 半導体基板の研磨方法及びその半導体基板の研磨方法を用いたノンパンチスルー型半導体装置の製造方法 | |
| JPS5244163A (en) | Process for productin of semiconductor element | |
| JPS60148113A (ja) | 半導体装置の製造方法 |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| LAPS | Cancellation because of no payment of annual fees |