JPS60214410A - Manufacture of thin film magnetic head - Google Patents

Manufacture of thin film magnetic head

Info

Publication number
JPS60214410A
JPS60214410A JP7197384A JP7197384A JPS60214410A JP S60214410 A JPS60214410 A JP S60214410A JP 7197384 A JP7197384 A JP 7197384A JP 7197384 A JP7197384 A JP 7197384A JP S60214410 A JPS60214410 A JP S60214410A
Authority
JP
Japan
Prior art keywords
melting point
low melting
point glass
thin film
glass
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP7197384A
Other languages
Japanese (ja)
Inventor
Masayuki Chifuku
地福 正幸
Yoshiji Nakagawa
祥次 中川
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP7197384A priority Critical patent/JPS60214410A/en
Publication of JPS60214410A publication Critical patent/JPS60214410A/en
Pending legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11BINFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/127Structure or manufacture of heads, e.g. inductive
    • G11B5/31Structure or manufacture of heads, e.g. inductive using thin films
    • G11B5/3103Structure or manufacture of integrated heads or heads mechanically assembled and electrically connected to a support or housing
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11BINFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/127Structure or manufacture of heads, e.g. inductive
    • G11B5/31Structure or manufacture of heads, e.g. inductive using thin films
    • G11B5/3163Fabrication methods or processes specially adapted for a particular head structure, e.g. using base layers for electroplating, using functional layers for masking, using energy or particle beams for shaping the structure or modifying the properties of the basic layers

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Magnetic Heads (AREA)

Abstract

PURPOSE:To eliminate a process having high difficulty and to attain ease of positioning by bringing a surface of a low melting point glass of a protection base to which the low melting point glass is weleded into contact with a thin film structure provided to other base, heating and bonding them at a temperature over the softening point of the welded low melting point glass. CONSTITUTION:It is desirable to select the low melting point glass 9 having a thermal expansion coefficient near to that of a background base 7 and a protection base 6 in order to avoid generation of cracks. The probability of generation of cracks is high when the difference is >=+ or -10X10<-7>/ deg.C. Further, the bonding temperature of <=600 deg.C from the standpoint of the deterioration of the magnetic characteristic of a ''Permalloy'' being a part of material of the thin film structure 8 and the low melting point glass of <=600 deg.C is desired as the working point. As the welding method of the low melting point glass 9 to the protection base 6, the welding by the screen print method is most practical. Further, the melting point higher than the work point of the low melting point glass 9 by 50-200 deg.C is used in order to attain the extraction of air bubbles in the low melting point glass 9 and the smoothing of the surface of the low melting point glass 9 after welding.

Description

【発明の詳細な説明】 産業上の利用分野 本発明はコンピュータのデータ記録等に用いられる薄膜
磁気ヘッドの製造方法に関する。
DETAILED DESCRIPTION OF THE INVENTION Field of the Invention The present invention relates to a method of manufacturing a thin film magnetic head used for recording data in computers and the like.

従来例の構成とその問題点 テープ用薄膜磁気ヘッドでは、薄膜構成部保護のため、
基板(単結晶フェライト、ガラス等)を薄膜構成部分上
に接着させている。従来、薄膜構成部と保護用基板の接
着はその製法の容易さによシ主に有機系接着剤が使用さ
れていた。しかし有機系接着剤による保護用基板の接着
は耐久性に乏しく、保護用基板の剥離、ずれ等の発生率
が高く、製品の信頼性が問題となっていた。そこで高耐
久性、高信頼性が要求される一部の薄膜磁気ヘッドにお
いては、第1図に示すように薄膜構成部3と保護用基板
1との間に両面研磨を施駄た低融点ガラスの薄板4を挾
み、低融点ガラスの軟化点以上に加熱することで、薄膜
構成部3と保護用基板1の接着を行なう方法が考えられ
実施されていた。
Conventional structure and its problems Thin-film magnetic heads for tape use
A substrate (single crystal ferrite, glass, etc.) is bonded onto the thin film component. Conventionally, organic adhesives have been mainly used to bond thin film components and protective substrates due to their ease of production. However, bonding the protective substrate with an organic adhesive has poor durability, and the rate of peeling and displacement of the protective substrate is high, resulting in problems with product reliability. Therefore, in some thin film magnetic heads that require high durability and high reliability, as shown in FIG. A method has been devised and implemented in which the thin film component 3 and the protective substrate 1 are bonded by sandwiching the thin plates 4 of the glass and heating the glass to a temperature higher than the softening point of the low melting point glass.

低融点ガラスを薄板に切断加工したり、その両面を研磨
したシすることは非常に困難であったが、基板材料に比
べて低融点ガラス接着層のテープ摺動に対する耐摩耗性
が低いことを考慮すれば、低融点ガラスの薄板を可能な
限シ薄くすることが望ましく、又低融点ガラス接着層が
気泡を包含することを阻止するために、両面を平面状に
研摩する必要があった。したがって薄膜構成部3と保護
用基板1との間に両面研磨を施した低融点ガラスの゛薄
板4茶挾む前記製造方法によれば、高耐久性。
Although it was extremely difficult to cut low-melting point glass into thin sheets or polish both sides, it was discovered that the low-melting point glass adhesive layer had lower wear resistance against tape sliding than the substrate material. Considering this, it is desirable to make the thin plate of low melting point glass as thin as possible, and in order to prevent the low melting point glass adhesive layer from containing air bubbles, it is necessary to polish both sides into a flat shape. Therefore, according to the above-mentioned manufacturing method in which the thin plate 4 of low melting point glass is polished on both sides between the thin film component 3 and the protective substrate 1, the durability is high.

高信頼性の製品は得られたが、低融点ガラスの加工、及
び保護用基板1.低融点ガラスの薄板4゜基板2上の薄
膜構成部3の位置合わせに問題があり、製造上回難度が
高く、高価々薄膜磁気ヘッドのみがこの方法で製造され
ていた。又この方法によシ製造された薄膜磁気ヘッドで
は、低融点ガラスの薄板−\の加工厚さに限界があり、
ガラスのはみ出し量が多く配線パターン5を長くする必
要があった。配線パターン6を長くすることは抵抗値の
増大、パターンの切れや短絡等のパターン不良増加の原
因と寿っていた。
Although a highly reliable product was obtained, processing of low melting point glass and protective substrate 1. There is a problem in the alignment of the thin film component 3 on the thin 4° substrate 2 made of low melting point glass, which makes manufacturing difficult and expensive, and only thin film magnetic heads have been manufactured using this method. In addition, in the thin-film magnetic head manufactured by this method, there is a limit to the processing thickness of the thin plate of low-melting glass.
There was a large amount of protrusion of the glass, so it was necessary to make the wiring pattern 5 longer. Increasing the length of the wiring pattern 6 has long been a cause of an increase in resistance value and an increase in pattern defects such as pattern breakage and short circuits.

発明の目的 本発明は前記製造上の困難さを除去した、薄膜磁気ヘッ
ドの製造方法を提供しようとするものである。
OBJECTS OF THE INVENTION The present invention provides a method of manufacturing a thin film magnetic head that eliminates the above-mentioned manufacturing difficulties.

発明の構成 本発明はスパッタ法、フリット沈殿法(DG法)。Composition of the invention The present invention uses a sputtering method and a frit precipitation method (DG method).

スクリーン印刷法等によシ予め低融点ガラスを任意の厚
さに融着させた保護用基板の低融点ガラス層側の表面を
別の基板上に設けられた薄膜構成部と対接させ、前記融
着させた低融点ガラスの軟化点以上の温度に加熱し接着
させる方法である。
The surface of the low melting point glass layer side of the protective substrate, on which low melting point glass has been fused in advance to an arbitrary thickness by screen printing or the like, is brought into contact with a thin film component provided on another substrate, and the This is a method of bonding by heating to a temperature higher than the softening point of the fused low melting point glass.

この方法によれば、低融点ガラスの薄板への切断及び両
面研摩等の困難度の高い工程は削除され、又低融点ガラ
ス層が保護用基板に融着されているために別の基板上に
設けられた薄膜構成部との位置合わせが容易となり、作
業性が著しく向上する。
According to this method, highly difficult steps such as cutting the low-melting point glass into thin sheets and polishing both sides are eliminated, and since the low-melting point glass layer is fused to the protective substrate, it can be placed on another substrate. Positioning with the provided thin film component becomes easy, and workability is significantly improved.

実施例の説明 以下本発明の実施例について、第2図を用いて説明する
DESCRIPTION OF EMBODIMENTS An embodiment of the present invention will be described below with reference to FIG.

ソーダ石灰ガラス(融点M、P、=720℃、熱膨張係
数α−93×10 /′C)を下地基板7とし、薄膜構
成部8の最高段差が3μmである3層構造を有する磁気
抵抗効果型磁気ヘッド(MRヘッド)を形成し、この上
に低融点ガラス9を融着させた保護用基板6を接着した
。保護用基板6は前記下地基板7と同質のガラスとした
。低融点ガラス9の選択は接着後のクラック発生を阻止
するため、前記下地基板7及び保護用基板6と熱膨張係
数が近似したものが望ましい。その差が±10×10−
77℃以上のものでは低融点ガラス接着層のクラック発
生確率が高い。又接着温度は薄膜構成部8の一部材料で
あるパーマロイの磁気特性劣化の点から600 ’C以
下が望ましく、この温度を越えた場合パーマロイ磁気特
性の不良発生率は高くなる。
The magnetoresistive effect has a three-layer structure in which the base substrate 7 is made of soda-lime glass (melting point M, P, = 720°C, thermal expansion coefficient α-93×10 /′C), and the highest step difference in the thin film component 8 is 3 μm. A type magnetic head (MR head) was formed, and a protective substrate 6 on which a low melting point glass 9 was fused was adhered. The protective substrate 6 was made of glass of the same quality as the base substrate 7. The low melting point glass 9 is desirably selected to have a coefficient of thermal expansion similar to that of the underlying substrate 7 and the protective substrate 6 in order to prevent cracks from occurring after bonding. The difference is ±10×10−
If the temperature is 77° C. or higher, there is a high probability that cracks will occur in the low melting point glass adhesive layer. In addition, the adhesion temperature is desirably 600'C or less in view of the deterioration of the magnetic properties of permalloy, which is a part of the material of the thin film component 8. If this temperature is exceeded, the rate of defects in the permalloy magnetic properties increases.

従って保護用基板6に融着させる伺融点ガラス9の軟化
点は600で以下と限定され、実際には低融点ガラス接
着層の薄膜化を考慮し、作業点として600 ’C以下
の低融点ガラスが望ましい。保護用基板6への低融点ガ
ラス9の融着方法としてはスパッタ法、フリット沈殿法
(DG法)、スクリーン印刷法等があげられるが、スク
リーン印刷法による融着が問題も少なく、最も実用的で
ある。
Therefore, the softening point of the low melting point glass 9 to be fused to the protective substrate 6 is limited to 600°C or less, and in reality, considering the thinning of the low melting point glass adhesive layer, the working point of the low melting point glass is 600'C or less. is desirable. Methods for fusing the low melting point glass 9 to the protective substrate 6 include sputtering, frit precipitation (DG method), screen printing, etc., but fusing by screen printing is the most practical as it has fewer problems. It is.

又融着温度は、低融点ガラス9中の気泡の押し出し、融
着後の低融点ガラス9表面の平滑化を図るために、低融
点ガラス9の作業点より60〜200″C程度高い温度
で行なうことが望ましく、これによ用 シ良好な接着が得られた。保1系板6への低融点ガラス
9の融着厚は薄くすることが望ましいが、少なくとも合
体させる薄膜構成部8の最高段差以上の厚みは必要であ
る。この厚さに満たカい場合には接着後の低融点ガラス
層への気泡の包含が多い。
In addition, the fusing temperature is approximately 60 to 200"C higher than the working point of the low melting point glass 9 in order to extrude air bubbles in the low melting point glass 9 and smoothing the surface of the low melting point glass 9 after fusing. It is desirable to do this, and good adhesion was obtained during use.It is desirable that the thickness of the fusion bonding of the low melting point glass 9 to the protective board 6 is made thin, but at least the maximum thickness of the thin film component 8 to be combined is It is necessary to have a thickness equal to or greater than the step difference.If this thickness is not met, many air bubbles will be included in the low melting point glass layer after bonding.

本実施例では前記のソーダ石灰ガラスの保護基板7上に
、熱膨張係数が94 X 10 ’/’C1作業点64
3℃の低融点ガラスのフリットを沈殿法(DG法)によ
り3〜10μm、又スクリーン印刷法により30〜50
μmの厚さに融着させた。
In this embodiment, the thermal expansion coefficient is 94 x 10'/'C1 working point 64 on the soda lime glass protective substrate 7.
Frits made of low melting point glass at 3°C are 3-10 μm thick by precipitation method (DG method), and 30-50 μm thick by screen printing method.
It was fused to a thickness of μm.

焼付温度は融着させた低融点ガラス9の表面状態が良好
であること及び下地の保護用基板6であるソーダ石灰ガ
ラスの変形がほとんどないことから600〜650 ′
Cで行々った。これら前記の方法によシ低融点ガラス9
を各厚さに融着させた保護用基板6を前記下地基板7上
へ形成された薄膜構成部8へ対接させ窒素雰囲気中で5
60’C,10分間の保持で接着を行なった。これら方
法により作製された薄膜磁気ヘッドはいずれも苛酷環境
下(温度60’C,相対湿度95%)にi ooo時間
放置した後も保護用輩板6の剥離1位置ずれの発生は無
く高耐久性、高信頼性のものであった。
The baking temperature is 600 to 650' because the surface condition of the fused low-melting glass 9 is good and there is almost no deformation of the soda lime glass that is the underlying protective substrate 6.
I went with C. Low melting point glass 9 produced by these above-mentioned methods
The protective substrate 6, which is fused to various thicknesses, is brought into contact with the thin film component 8 formed on the base substrate 7, and is heated in a nitrogen atmosphere for 5 minutes.
Bonding was carried out at 60'C and held for 10 minutes. All of the thin film magnetic heads fabricated by these methods have high durability, with no peeling or displacement of the protective plate 6 even after being left in a harsh environment (temperature 60'C, relative humidity 95%) for i ooo hours. It was highly reliable.

更に実施例としてMn−Zn−フェライト (熱膨張係
数α−12o×1o−′/l)を下地基板7とし、薄膜
構成部8の最高段差が約10μmである9層構造を有す
る薄膜マルチへノドパターンを設け、この上に低融点カ
ラス9を融着させた保護用基板6を接着させた。保護用
基板6は前記下地基板7と同質のMn−Zn−フェライ
トとし、熱膨張係数α=126×10−7 /l、作業
点548℃の低融点ガラヌフリフトをスクリーン印刷法
により650〜760℃の焼成温度で2o〜30μmの
厚さに融着させた。このようにして作製した保護用基板
6を前記薄膜構成部8と合体させ、窒素雰囲気中で55
0 ’(,10分間の保持により接着を行なった。
Furthermore, as an example, a thin film multilayer node having a nine-layer structure in which the base substrate 7 is made of Mn-Zn-ferrite (thermal expansion coefficient α-12o×1o-'/l) and the highest level difference of the thin-film component 8 is about 10 μm. A pattern was provided, and a protective substrate 6 on which a low melting point glass 9 was fused was adhered. The protective substrate 6 is made of Mn-Zn-ferrite, which is the same as the base substrate 7, and has a thermal expansion coefficient α=126×10-7/l and a low melting point Galanuf lift with a working point of 548°C and a temperature of 650 to 760°C by screen printing. It was fused to a thickness of 20 to 30 μm at the firing temperature. The protective substrate 6 produced in this way was combined with the thin film component 8, and
0' (, adhesion was performed by holding for 10 minutes.

この方法によシ作製した薄膜マルチヘッドにおいても薄
膜構成部8の高段差領域は低融点ガラスに完全に充填さ
れ、高耐久性、高信頼性のものであった。又、配線パタ
ーン10上への低融点ガラスのはみ出し量は、融着する
低融点ガラス9の厚さを薄くすることにより容易に減少
させることができ、配線パターン10を短くすることが
できることとなった。配線パターン及びパターン間隔が
極端に狭い薄膜マルチヘッドにおいては、配線パターン
10の長さを短くすることで、断線及び線間短絡等の不
良の発生を著しく少なくすることができる。
Even in the thin film multihead produced by this method, the high step region of the thin film component 8 was completely filled with low melting point glass, and the head was highly durable and reliable. Further, the amount of protrusion of the low melting point glass onto the wiring pattern 10 can be easily reduced by reducing the thickness of the low melting point glass 9 to be fused, and the wiring pattern 10 can be shortened. Ta. In a thin film multihead with extremely narrow wiring patterns and pattern intervals, by shortening the length of the wiring pattern 10, the occurrence of defects such as disconnections and shorts between lines can be significantly reduced.

発明の効果 本発明は以上のように、予め低融点ガラスを任意の厚さ
に融着させた保護用基板の低融点ガラス層側の表面を別
の基板上に設けられた薄膜構成部に対接させ、融着させ
た低融点ガラスの軟化点以上の温度に加熱し接着させる
方法であり、この方法によれば、低融点ガラスの薄板へ
の切断及び両面研摩等の困難塵の高い工程は削除され、
又低融点ガラス層が保護用基板に融着されているために
別の基板上に設けられた薄膜構成部との位置合わせが容
易とカリ、作業性を著しく向上させることができる。
Effects of the Invention As described above, the present invention applies the surface of the low melting point glass layer side of a protective substrate, on which low melting point glass is fused to an arbitrary thickness, to a thin film component provided on another substrate. This is a method of bonding by heating to a temperature above the softening point of the low melting point glass that has been brought into contact and fused. According to this method, difficult and dusty processes such as cutting the low melting point glass into thin sheets and polishing both sides can be done. deleted,
Furthermore, since the low melting point glass layer is fused to the protective substrate, alignment with the thin film component provided on another substrate is easy and workability can be significantly improved.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は従来の薄膜マルチヘッドを示す分解図、第2図
は本発明を示す斜視図である。 6・・・・・・保護用基板、7・・・・・・下地基板、
8・・・・・・薄膜構成部、9・・・・・・低融点ガラ
ス、10・・・・・・配線パターン。
FIG. 1 is an exploded view showing a conventional thin film multihead, and FIG. 2 is a perspective view showing the present invention. 6...Protective substrate, 7... Base substrate,
8... Thin film component, 9... Low melting point glass, 10... Wiring pattern.

Claims (1)

【特許請求の範囲】 (1)予めガラス層が表面に形成された一方の基板を、
薄膜ヘッド構成部を有する他方の基板に前記ガラス層が
前記薄膜ヘッド構成部と対向するよう対接させ、加熱す
ることにより前記ガラス゛ 層を軟化させて、両者を接
着一体化することを特徴とする薄膜磁気ヘッドの製造方
法。 (−一方の基板のガラス層は軟化点が600℃以下であ
ることを特徴とする特許請求の範囲第1項記載の薄膜磁
気ヘッドの製造方法。 (3) 一方の基板に融着せしめるガラスの厚さが他方
の基板上に設けられた薄膜構成部の最も厚い厚さ以上で
あることを特徴とする特許請求の範囲第1項記載の薄膜
磁気ヘッドの製造方法。 (41ガラス層をスクリーン印刷法により形成すること
を特徴とする特許請求の範囲第1項記載の薄膜磁気ヘッ
ドの製造方法。
[Claims] (1) One substrate on which a glass layer has been formed in advance,
The glass layer is brought into contact with the other substrate having the thin film head component so as to face the thin film head component, and the glass layer is softened by heating to bond and integrate the two. A method for manufacturing a thin film magnetic head. (-A method for manufacturing a thin film magnetic head according to claim 1, characterized in that the glass layer of one substrate has a softening point of 600° C. or less. (3) The glass layer fused to one substrate. A method for manufacturing a thin film magnetic head according to claim 1, characterized in that the thickness is greater than or equal to the thickest thickness of the thin film component provided on the other substrate. (41 glass layers are screen printed. 2. A method of manufacturing a thin film magnetic head according to claim 1, wherein the thin film magnetic head is formed by a method.
JP7197384A 1984-04-11 1984-04-11 Manufacture of thin film magnetic head Pending JPS60214410A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP7197384A JPS60214410A (en) 1984-04-11 1984-04-11 Manufacture of thin film magnetic head

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP7197384A JPS60214410A (en) 1984-04-11 1984-04-11 Manufacture of thin film magnetic head

Publications (1)

Publication Number Publication Date
JPS60214410A true JPS60214410A (en) 1985-10-26

Family

ID=13475915

Family Applications (1)

Application Number Title Priority Date Filing Date
JP7197384A Pending JPS60214410A (en) 1984-04-11 1984-04-11 Manufacture of thin film magnetic head

Country Status (1)

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JP (1) JPS60214410A (en)

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5817614B2 (en) * 1980-03-15 1983-04-08 工業技術院長 Connector for living bones
JPS59140618A (en) * 1983-01-31 1984-08-13 Nec Home Electronics Ltd Production of thin film magnetic head

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5817614B2 (en) * 1980-03-15 1983-04-08 工業技術院長 Connector for living bones
JPS59140618A (en) * 1983-01-31 1984-08-13 Nec Home Electronics Ltd Production of thin film magnetic head

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