JPS60136908A - Welding method - Google Patents

Welding method

Info

Publication number
JPS60136908A
JPS60136908A JP25074883A JP25074883A JPS60136908A JP S60136908 A JPS60136908 A JP S60136908A JP 25074883 A JP25074883 A JP 25074883A JP 25074883 A JP25074883 A JP 25074883A JP S60136908 A JPS60136908 A JP S60136908A
Authority
JP
Japan
Prior art keywords
substrate
film
welding
substrates
pbo
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP25074883A
Other languages
Japanese (ja)
Inventor
Shuhei Tsuchimoto
修平 土本
Tetsuo Muramatsu
哲郎 村松
Tatsushi Yamamoto
達志 山本
Mitsuhiko Yoshikawa
吉川 光彦
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sharp Corp
Original Assignee
Sharp Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sharp Corp filed Critical Sharp Corp
Priority to JP25074883A priority Critical patent/JPS60136908A/en
Publication of JPS60136908A publication Critical patent/JPS60136908A/en
Pending legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C27/00Joining pieces of glass to pieces of other inorganic material; Joining glass to glass other than by fusing
    • C03C27/06Joining glass to glass by processes other than fusing
    • CCHEMISTRY; METALLURGY
    • C04CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04BLIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B37/00Joining burned ceramic articles with other burned ceramic articles or other articles by heating
    • C04B37/02Joining burned ceramic articles with other burned ceramic articles or other articles by heating with metallic articles
    • C04B37/023Joining burned ceramic articles with other burned ceramic articles or other articles by heating with metallic articles characterised by the interlayer used

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Ceramic Engineering (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Magnetic Heads (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Structural Engineering (AREA)

Abstract

PURPOSE:To enable welding with a simple stage by pressing a substrate stuck respectively with specific different metallic films on the surface in a laminated state and the other substrate to each other with these metallic films on the inside and welding the substrate thereby increasing the thickness of the adhered layer and improving the adhesive strength and weatherability. CONSTITUTION:An alloy film 9 is formed on a substrate 8 and an SiO2 film 10 thereon by vapor deposition and further a PbO film 11 is formed thereon. An alloy film 9' is formed on the other substrate 8' as well and an SiO2 film 10' thereon by vapor deposition. The PbO film 11 of one substrate and the SiO2 film 10' of the other substrate are positioned to face each other and are welded by the chemical reaction of PbO and SiO2 by heating and pressurizing from the arrow direction. The adhered layer between the substrates is thus made thin in the stage of adhering the substrates and the temp. during the welding is made relatively low. Since the intrication of the structure of the substrates is averted, the less stage is required and the substantial adhesive strength and weatherability are provided.

Description

【発明の詳細な説明】 く技術分野〉 本発明は2枚の基板を溶着する方法の改良に関する。[Detailed description of the invention] Technical fields> The present invention relates to an improved method for welding two substrates together.

〈従来技術〉 従来、基板同士の面と面とを接着するために一般に樹脂
系の有機接着剤が使用されている。しかしこの有機接着
剤を基板面に塗布した後、数百度以内で加圧接着した場
合、接着層の厚みは数十μlη以上もの厚さになってし
まう為に接着面を良好に保つことが難しく、又、有機接
着剤の接着層では耐磨耗性、耐候性に問題があった。
<Prior Art> Conventionally, a resin-based organic adhesive has generally been used to bond the surfaces of substrates together. However, if this organic adhesive is applied to the substrate surface and then bonded under pressure within a few hundred degrees, the thickness of the adhesive layer will be several tens of μlη or more, making it difficult to maintain a good bonding surface. Furthermore, the adhesive layer made of organic adhesive has problems in abrasion resistance and weather resistance.

一方基板同士の面と面とを接着するもう一つのやり方と
して、第5図に示す様に基板1,1の側面に溝2,2を
設け、この側面溝2,2に低融点ガラス3を充填する溶
着方法がある。しかしこの方法は接着したい個所をまわ
りから補強するために、基板1,1の側部に溝加工なし
、更にこの溝に低融点ガラス3を溶融充填後、その接着
面を整えるための研磨を必要とするという複雑な工程を
必要とするという煩わしさがあった。
On the other hand, as another method for bonding the surfaces of the substrates together, grooves 2, 2 are provided on the side surfaces of the substrates 1, 1, as shown in FIG. There is a welding method for filling. However, this method does not require grooves to be formed on the sides of the substrates 1, 1 in order to reinforce the area to be bonded from the surrounding area, and further requires polishing to prepare the bonding surface after melting and filling the grooves with low-melting glass 3. There was a problem in that it required a complicated process.

〈目 的〉 本発明は以上の従来欠点を解消するために、なされたも
のであり、接着層の厚みを極めて薄く制御することがで
き、しかも接着強度及び耐候性を向上でき、容易な工程
で溶着可能な溶着方法を提供することを目的とするもの
である。
<Purpose> The present invention has been made in order to eliminate the above-mentioned conventional drawbacks, and it is possible to control the thickness of the adhesive layer to be extremely thin, improve adhesive strength and weather resistance, and achieve it in a simple process. The object of the present invention is to provide a welding method that can perform welding.

〈実施例〉 以下本発明に係る溶着方法の一実施例について図面を用
いて詳細に説明を行なう。尚、実施例の説明は七ンダス
ト合金膜を用いて構成される磁気ヘッドコアの製造工程
を用いて説明する。
<Example> An example of the welding method according to the present invention will be described in detail below with reference to the drawings. The embodiment will be explained using the manufacturing process of a magnetic head core constructed using a seven-dust alloy film.

第2図はセンダスト合金膜を用いて構成された磁気へラ
ドコアの外観斜視図である。同図で4,4′は感光性ガ
ラス基板であり該基板4,4′間にセンダスト合金膜5
が挾持された構造を有し、その中央に形成された穴6を
通ってエナメル銅線7が巻かれている。θはアジマス角
を示している。同図の磁気ヘッドコアは一方若しくは両
方の基板4,4′にセンダスト合金膜5を被覆し、その
後で両者を溶着してなるものである。この様に磁気”%
7ドコアの作成に際しては溶着が多く用いられるもので
あり、この溶着を行なうに際し極めて好適なものが本発
明に係る溶着方法である。
FIG. 2 is an external perspective view of a magnetic herad core constructed using a Sendust alloy film. In the figure, 4 and 4' are photosensitive glass substrates, and a Sendust alloy film 5 is placed between the substrates 4 and 4'.
It has a sandwiched structure, and an enamelled copper wire 7 is wound through a hole 6 formed in the center. θ indicates the azimuth angle. The magnetic head core shown in the figure is formed by coating one or both of the substrates 4, 4' with a sendust alloy film 5, and then welding the two together. In this way magnetic”%
Welding is often used in the production of 7-dore cores, and the welding method according to the present invention is extremely suitable for this welding.

以下に本発明に係る溶着方法を用い上記磁気へラドコア
の2枚の基板を溶着する製造工程について説明する。
A manufacturing process for welding the two substrates of the magnetic held core using the welding method according to the present invention will be described below.

第3図(a)は一方の基板の構造を示すものであり、8
は平担な結晶性ガラス基板であり、該結晶性ガラス基板
8上に蒸着によって5μmの膜厚でセンダスト合金膜9
が形成され、更にその上にスパッタ蒸着(電子ビーム蒸
着、CVD法等でもよい。)によって0.3μmの膜厚
で5i02膜10が形成され、更にその上に抵抗加熱蒸
着(スパッタ蒸着等でもよい。)によって1.09μm
の膜厚でPbO膜11が形成されている。
FIG. 3(a) shows the structure of one of the substrates, 8
is a flat crystalline glass substrate, and a sendust alloy film 9 with a thickness of 5 μm is deposited on the crystalline glass substrate 8 by vapor deposition.
is formed, and then a 5i02 film 10 is formed with a thickness of 0.3 μm by sputter deposition (electron beam deposition, CVD, etc.). ) by 1.09μm
The PbO film 11 is formed with a film thickness of .

第3図(b)は他方の基板の構造を示すものであり、8
′は平担な結晶性ガラス基板であり、該結晶性ガラス基
板8′上に蒸着によって5μmの膜厚でセンダスト合金
膜9tが形成(センダスト合金膜多層化の為)され、更
にその上にスパッタ蒸着によって0.3μmの膜厚で5
i02膜10′が形成されている。
FIG. 3(b) shows the structure of the other substrate, 8
' is a flat crystalline glass substrate, and on the crystalline glass substrate 8', a sendust alloy film 9t with a thickness of 5 μm is formed by vapor deposition (for multilayering the sendust alloy film), and then sputtering is further applied on top of the sendust alloy film 9t. 5 with a film thickness of 0.3 μm by vapor deposition.
An i02 film 10' is formed.

次に第1図に示す如く、一方の基板のPb0膜11と他
方の基板のSio2膜10’とを対向させて矢印方向か
ら加熱加圧しPbOとS i02の化学反応によって溶
着せしめる。ここで加圧力の方向が熱履歴の途中で変動
すると上記PbOと5i02の化学反応の終了後の冷却
過程で接着層が砕けることがあり、接着層の厚さを制御
することが不可能となる虞れがあるので、上記加熱加圧
に際しては第4図に示す如き特殊な治具を用いた。同図
において12.13はインコネルブロックであり、該イ
ンコネルブロック12.18に第3図で示した基板8.
8′が固定される。このインコネルブロック12.13
は保持治具14に組み込まれる。上記インコネルブロッ
ク13には細長い溝15が例貫かれ、この溝15の働き
によってインコネルブロック13には弾性が生ずる。又
インコネルブロック13は高温でもバネ力を維持できる
金属体であるので600℃程度の加熱加圧状態において
もインコネルブロック13から基板8,8′に対しての
弾性力が付与される。16はビスであり、該ビス16に
加圧力を加えることによって上記インコネルブロック1
3の弾性力を基板8,8′に対して与えている。上記イ
ンコネルブロック】3の溝15は基板8,8′の接着面
に対して平行に細長く形成しているので加圧力の方向は
上記接着面に対して極めて都合よく印加され、600°
C程度の加熱加圧状態においても加圧力の方向が変動す
ることなく、上記接着面に対して加えることができるも
のである。
Next, as shown in FIG. 1, the Pb0 film 11 on one substrate and the Sio2 film 10' on the other substrate are placed facing each other and heated and pressurized in the direction of the arrow to weld them together by a chemical reaction between PbO and Si02. If the direction of the pressure changes during the thermal history, the adhesive layer may break during the cooling process after the chemical reaction between PbO and 5i02 is completed, making it impossible to control the thickness of the adhesive layer. To avoid this risk, a special jig as shown in FIG. 4 was used for the heating and pressurization. In the same figure, 12.13 is an Inconel block, and the substrate 8.1 shown in FIG. 3 is attached to the Inconel block 12.18.
8' is fixed. This Inconel block 12.13
is incorporated into the holding jig 14. The Inconel block 13 is provided with an elongated groove 15, and the function of the groove 15 causes the Inconel block 13 to have elasticity. Furthermore, since the Inconel block 13 is a metal body that can maintain its spring force even at high temperatures, elastic force is applied from the Inconel block 13 to the substrates 8 and 8' even when heated and pressurized at about 600°C. 16 is a screw, and by applying pressure to the screw 16, the above-mentioned Inconel block 1
An elastic force of 3 is applied to the substrates 8, 8'. Since the groove 15 of the above Inconel block 3 is formed into a long and narrow shape parallel to the bonding surface of the substrates 8 and 8', the direction of the pressing force is very conveniently applied to the bonding surface, and the direction of the pressure is 600°.
Even in a heated and pressurized state of about C, the direction of the pressing force can be applied to the adhesive surface without changing.

尚、−例として基板8,8′の接着面の面積を2mmX
1O+m++とし、ビス+6の径を3mmφとし、ビス
16に加えるトルクを1〜2Kg(2)とし、窒素雰囲
気内で2時間保持して溶着実験を行なったところ、溶着
前の5i02とPb0からなる接着層の合計厚みは2.
78μmであったが、溶着後の接着層の厚みは18μm
と極めて薄くなった。これはPb0と8102の化学反
応(ガラス化)によるものである。
As an example, if the area of the adhesive surface of the substrates 8 and 8' is 2 mm
1O+m++, the diameter of screw +6 was 3 mmφ, and the torque applied to screw 16 was 1 to 2 kg (2), and a welding experiment was performed by holding it in a nitrogen atmosphere for 2 hours. The total thickness of the layers is 2.
The thickness of the adhesive layer after welding was 78 μm, but the thickness of the adhesive layer after welding was 18 μm.
It became extremely thin. This is due to a chemical reaction (vitrification) between Pb0 and 8102.

尚、溶着後のセンダスト合金膜の磁気特性の劣化はなか
った。又溶着された基板を、水冷しながらダイヤモンド
刃で切断し、それをアルミナ塗粒で研磨しても、強度的
にも耐水性にも充分に強いものであった。又、溶着前に
結晶性ガラス上に5i02とPbOを蒸着した基板をX
線回折法で測定したところ、回折線は5i02.Pb、
PbOを示したが、上記溶着の際の400°C〜600
°Cの各温度履歴を経た上記接着面の回折線はS i 
02とLeadSilicateであり、PbとSiと
が原子的に結合してガラス質を形成していることが判明
した。
Note that there was no deterioration in the magnetic properties of the Sendust alloy film after welding. Furthermore, even when the welded substrate was cut with a diamond blade while cooling with water and polished with alumina coating, it still had sufficient strength and water resistance. In addition, a substrate with 5i02 and PbO deposited on crystalline glass before welding was
When measured by line diffraction method, the diffraction line was 5i02. Pb,
PbO was shown, but at 400°C to 600°C during the above welding.
The diffraction line of the adhesive surface after passing through each temperature history of °C is S i
02 and LeadSilicate, and it was found that Pb and Si are atomically bonded to form a glassy substance.

以上の工程によって得られた磁気へラドコアは、センダ
スト合金膜が5i02によって保護された状態で、Si
O2とPb0との化学反応による溶着が行なわれるもの
である為、センダス)合金膜の磁気特性を劣化すること
がなかった。尚、5i02膜を基板全面に一様に被覆す
る為、又センダスト合金膜の保護の為に5i02膜の膜
厚は0.1μm以上ある方が好ましい。又、接着層を薄
く且つ接着力を充分に得る為にはPb0(Pbでも構わ
ない)膜の膜厚は01〜3μm程度が好ましい。又溶着
時の加熱温度は350”C〜750℃が好ましい。ここ
で一般にセンダスト合金膜の低融点ガラスによる溶着は
、低融点ガラスの構成物質がセンダスト合金内へ拡散し
その磁気特性を劣化させるという点で好ましくなく、又
センダスト合金膜の銀ろう付による溶着では極めて高温
(900℃程度)の溶着になる為やはりセンダスト合金
膜の磁気特性を劣化させるという点で好ましくないので
、上記した本発明に係る溶着方法の利点が顕著なところ
である。
The magnetic herad core obtained through the above steps is made of Si with the sendust alloy film protected by 5i02.
Since welding was performed by a chemical reaction between O2 and Pb0, the magnetic properties of the Sendas alloy film were not deteriorated. In order to uniformly cover the entire surface of the substrate with the 5i02 film and to protect the sendust alloy film, the thickness of the 5i02 film is preferably 0.1 μm or more. Further, in order to make the adhesive layer thin and to obtain sufficient adhesive strength, the thickness of the Pb0 (Pb may also be used) film is preferably about 01 to 3 μm. The heating temperature during welding is preferably 350"C to 750C. Generally, when welding a sendust alloy film with low melting point glass, the constituent substances of the low melting point glass diffuse into the sendust alloy, degrading its magnetic properties. Furthermore, silver brazing welding the sendust alloy film involves welding at an extremely high temperature (approximately 900°C), which is also undesirable in that it deteriorates the magnetic properties of the sendust alloy film. The advantages of this welding method are significant.

以上の実施例以外に、一方の基板の構造としてガラス基
板にセンダスト合金膜及び5i02膜及びPb0膜を被
覆したものを用い他方の基板の構造として、ガラス基板
、又はガラス基板上にセンダスト合金膜及び5i02膜
を被覆したもの、又はガラス基板上にSiO2膜を被覆
したものを用いても構わない。尚、センダスト合金以外
の金属膜、半導体膜等の溶着を行なっても構わない。
In addition to the above embodiments, one substrate may have a glass substrate coated with a Sendust alloy film, a 5i02 film, and a Pb0 film, and the other substrate may have a glass substrate or a Sendust alloy film coated on a glass substrate. A substrate coated with a 5i02 film or a glass substrate coated with a SiO2 film may also be used. Note that metal films other than Sendust alloy, semiconductor films, etc. may be welded.

〈効 果〉 以上の本発明によれば基板間の溶着を行なうに際しその
接着層を非常に薄くすることができ、溶着の際の温度を
比較的低くできるものである。又基板の構造を複雑化し
なくともよいので工程が少なくて済み大量生産に適し、
しかも接着強度及び耐候性を充分なものにできるという
極めて有益なものである。
<Effects> According to the present invention as described above, when welding substrates together, the adhesive layer can be made very thin, and the temperature during welding can be kept relatively low. In addition, there is no need to complicate the structure of the board, so there are fewer steps and it is suitable for mass production.
Moreover, it is extremely beneficial in that it can provide sufficient adhesive strength and weather resistance.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は本発明に係る溶着方法の一実施例を示すもので
溶着状態の2枚の基板の側面図、第2図は磁気へラドコ
アの外観斜視図、第3図は溶着を行なう前の基板の側面
図、第4図は溶着治具の外観斜視面、第5図は従来の溶
着方法によって溶着を行なった基板の側面図を示す。 図 中、 l、1:基板 2,2:側面溝 3:低融点ガラス 4.4’:基板 5:センダスト合金膜 6:穴 7°エナメル銅、1j18.8’:結晶性ガラス基板9
:センダスト合金膜 10 : 5i02膜+1:Pb
0膜 12.13 :インコネルプロ、り14:保持治
具 15:溝 16:ビス
Fig. 1 shows an embodiment of the welding method according to the present invention, and is a side view of two boards in a welded state, Fig. 2 is an external perspective view of the magnetic helad core, and Fig. 3 shows the state before welding. FIG. 4 shows a perspective view of the external appearance of the welding jig, and FIG. 5 shows a side view of the board welded by a conventional welding method. In the figure, l, 1: Substrate 2, 2: Side groove 3: Low melting point glass 4.4': Substrate 5: Sendust alloy film 6: Hole 7° enamelled copper, 1j18.8': Crystalline glass substrate 9
: Sendust alloy film 10: 5i02 film +1: Pb
0 membrane 12.13: Inconel Pro, Ri 14: Holding jig 15: Groove 16: Screw

Claims (1)

【特許請求の範囲】[Claims] 1 基板表面に5i02膜とPbO膜(又はPb膜)を
夫々苧層状態にて付着せしめ、この基板と他の基板とを
前記5i02膜とPb0膜(又はPb膜)1内側にして
当接せしめ、加熱加圧して溶着することを特徴とする溶
着方法。
1. A 5i02 film and a PbO film (or Pb film) are adhered to the surface of the substrate in the form of a moss layer, and this substrate and another substrate are brought into contact with the 5i02 film and the Pb0 film (or Pb film) 1 inside. , a welding method characterized by welding by heating and pressurizing.
JP25074883A 1983-12-26 1983-12-26 Welding method Pending JPS60136908A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP25074883A JPS60136908A (en) 1983-12-26 1983-12-26 Welding method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP25074883A JPS60136908A (en) 1983-12-26 1983-12-26 Welding method

Publications (1)

Publication Number Publication Date
JPS60136908A true JPS60136908A (en) 1985-07-20

Family

ID=17212446

Family Applications (1)

Application Number Title Priority Date Filing Date
JP25074883A Pending JPS60136908A (en) 1983-12-26 1983-12-26 Welding method

Country Status (1)

Country Link
JP (1) JPS60136908A (en)

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