JPS59107415A - Magnetic head - Google Patents

Magnetic head

Info

Publication number
JPS59107415A
JPS59107415A JP21620482A JP21620482A JPS59107415A JP S59107415 A JPS59107415 A JP S59107415A JP 21620482 A JP21620482 A JP 21620482A JP 21620482 A JP21620482 A JP 21620482A JP S59107415 A JPS59107415 A JP S59107415A
Authority
JP
Japan
Prior art keywords
film
glass
gap
core
core pieces
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP21620482A
Other languages
Japanese (ja)
Inventor
Hideo Mochizuki
秀雄 望月
Tokio Kamioka
上岡 登喜夫
Masaru Morikawa
森川 勝
Kiyoshi Kurakane
倉金 清
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
TDK Corp
Original Assignee
TDK Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by TDK Corp filed Critical TDK Corp
Priority to JP21620482A priority Critical patent/JPS59107415A/en
Publication of JPS59107415A publication Critical patent/JPS59107415A/en
Pending legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11BINFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/127Structure or manufacture of heads, e.g. inductive
    • G11B5/187Structure or manufacture of the surface of the head in physical contact with, or immediately adjacent to the recording medium; Pole pieces; Gap features
    • G11B5/23Gap features
    • G11B5/232Manufacture of gap

Abstract

PURPOSE:To obtain a head having a long life by forming an SiO2 film and a silicate glass film on each of the gap forming surfaces of a pair of core chips to form a spacer and by bonding the core chips together with a glass chip having a softening point almost equal to that of the glass film so as to carry out firm bonding. CONSTITUTION:A pair of core chips 2 are worked to a prescribed shape, and the gap forming surfaces 2A are polished to specular surfaces. An SiO2 film 7 having a prescribed thickness is formed on each of the surfaces 2A by sputtering, and an SiO2-base glass film 8 consisting of SiO2, K2O, B2O3, CaO and PbO is formed on the film 7 by sputtering to form a gap spacer having a prescribed thickness. The film 8 is made thinner than the film 7. The core chips 2 are placed so as to bring the films 8 into contact with each other, and a prescribed pressure P is applied. Using a glass chip 9 having a softening point almost equal to that of the films 8, melt bonding is carried out under heating at a slightly higher temp. than the softening point of the films 8 in a state in which the glass of the films 8 shows about 10<7>-10<6>cps viscosity. The chips 2 are bonded together while maintaining the dimensional accuracy of the gap.

Description

【発明の詳細な説明】 本発明はテープレコーダ、ビデオテープレコーダ等に使
用する磁気ヘッドに係り、更に詳細には1対のコア片か
ら成るコアのギャップスペーサをスパッタリング法によ
って蒸着した酸化けい素(Sin2)膜と、その上に設
けたけい酸が主成分のガラス(SiOg・KzO・B2
O3・CcLO@P7!IO)膜とによって形成し、1
対のコア片を所定の圧力で圧接し、さらにギャップスペ
ーサ部にけい酸が主成分のガラスの軟化点とほぼ同一の
軟化点を有するガラス片を載置し、けい酸が主成分のガ
ラスが半溶融の状態となるまで加圧、加熱することによ
ってギャップ長さの精度を向上したコアを有する磁気ヘ
ッドに関する。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a magnetic head used in tape recorders, video tape recorders, etc., and more specifically, the present invention relates to a magnetic head used in tape recorders, video tape recorders, etc. Sin2) film and glass (SiOg/KzO/B2) whose main component is silicic acid provided on it
O3・CcLO@P7! IO) film formed by 1
A pair of core pieces are pressed together under a predetermined pressure, and a piece of glass having a softening point that is almost the same as that of glass whose main component is silicic acid is placed on the gap spacer part. The present invention relates to a magnetic head having a core whose gap length accuracy is improved by pressurizing and heating the core until it becomes a semi-molten state.

磁気ヘッドのうち、たとえばビデオテープレコーダの音
声コントロールヘッドとして用いられるものは第1図(
斜視図)に示すようなコアを有している(判りやすくす
るためギャップスペーサの厚さのみは他の部分に較べて
拡大して図示しである。以下の図面も同様である。)。
Among magnetic heads, those used as audio control heads of video tape recorders are shown in Fig. 1 (
(In order to make it easier to understand, only the thickness of the gap spacer is shown enlarged compared to other parts. The same applies to the following drawings.)

すなわち同図において、コア1は1対のコア片2.2が
ギャップスペーサ3を介して相互に接着して成っている
。周知のようにこの両コア片2のギャップ構成面2人間
の距離(ギャップ長さ)は磁気ヘッドの性能に極めて重
大な影響を有しているため、寸法精度を高く、またバラ
ツキのないように仕上げることが要求される。
That is, in the figure, the core 1 is made up of a pair of core pieces 2.2 bonded to each other with a gap spacer 3 interposed therebetween. As is well known, the distance between the gap-forming surfaces 2 of both core pieces 2 (gap length) has an extremely important effect on the performance of the magnetic head, so it is important to have high dimensional accuracy and to avoid variations. required to be completed.

従来この部分の加工は第2図(正面図)に示すような方
法によって行なわれていた。すなわち同図において、1
対のコア片2のギャップ構成面2人の一方または双方(
第2図は双方に形成されている場合を示している。)に
は、一部を残して、SiO2膜4がギャップ長さに等し
くなるように形成される。このSiO2膜4の形成は真
空放電の除に電極材料が飛散蒸着される現象を利用した
いわゆるスパッタリング法によっている。このようにS
 i 02膜4が形成された一対のコア片2を当接し、
S i O2膜の形成されていない空隙5の端縁にガラ
ス片6を載置し、約1000’″Cの温度に加熱してガ
ラス片6を溶融し空隙5に充填し、両コア片2を接着す
る。
Conventionally, this part has been processed by the method shown in FIG. 2 (front view). In other words, in the same figure, 1
One or both of the two gap-constituting surfaces of the paired core pieces 2 (
FIG. 2 shows a case in which they are formed on both sides. ), the SiO2 film 4 is formed to be equal to the gap length, except for a portion. This SiO2 film 4 is formed by a so-called sputtering method that utilizes the phenomenon of scattering and vapor deposition of electrode material in addition to vacuum discharge. In this way S
A pair of core pieces 2 on which the i02 film 4 is formed are brought into contact with each other,
A piece of glass 6 is placed on the edge of the gap 5 where the SiO2 film is not formed, and heated to a temperature of approximately 1000'''C to melt the glass piece 6 and fill the gap 5. Both core pieces 2 Glue.

以上述べた従来の加工方法によれば、スパッタリング法
を導入するととによシきわめて薄い(たとえば1μ程度
)膜厚のS L 02 もきわめて正確な寸法に形成す
ることが可能であシ、また溶融ガラスが空隙5内に充填
されてコア片2を接着するため接着強度の強いコア′を
得ることもできる。しかしながら、ガラス片6は100
0°C程度に加熱溶融されるので、両コア片の当接面間
に拡散侵入し、5i02膜の寸法がきわめて正確に形成
されても、製品コアのギャップ長さは必ずしも精度よく
仕上げられず、またバラツキも多いという欠点がみられ
た。
According to the conventional processing method described above, when sputtering is introduced, it is possible to form S L 02 with an extremely thin film thickness (for example, about 1 μm) to extremely accurate dimensions, and Since glass is filled in the void 5 and the core pieces 2 are bonded together, it is also possible to obtain a core' with strong adhesive strength. However, the glass piece 6 is 100
Since it is heated and melted to about 0°C, it diffuses into the space between the contact surfaces of both core pieces, and even if the dimensions of the 5i02 film are formed with great accuracy, the gap length of the product core cannot necessarily be finished with high precision. Also, there was a drawback that there was a lot of variation.

本発明は従来の磁気ヘッド用コアの製造法の以上述べた
欠点を改善することによって、ギャップ長さが精度よく
加工され、またバラツキの少いコアを有し、したがって
また、性能がすぐれた磁気ヘッドを安価に提供すること
を目的としている。
The present invention improves the above-mentioned drawbacks of the conventional manufacturing method of magnetic head cores, thereby providing a magnetic head with a gap length that is processed with high accuracy and a core with little variation. The aim is to provide heads at low prices.

本発明は1対のコア片のギャップ構成面に5iCh膜と
、けい酸が主成分のガラス膜とを設けてギャップスペー
サを形成し、その面を当接し、所定の圧力(1〜3kg
の力を加えることが望ましい。)を加えながら加熱し、
その際に当接面の端縁にけい酸が主成分のガラスとほぼ
同一の軟化点を有するガラス片を載置し、けい酸が主成
分のガラスとこのガラス片とを共に半溶融状態にし、相
互に接着固定することによって前記目的を達成している
In the present invention, a 5iCh film and a glass film mainly composed of silicic acid are provided on the gap forming surfaces of a pair of core pieces to form a gap spacer, and the surfaces are brought into contact and a predetermined pressure (1 to 3 kg) is applied.
It is desirable to apply a force of ) while heating,
At that time, a piece of glass having almost the same softening point as the glass whose main component is silicic acid is placed on the edge of the contact surface, and both the glass whose main component is silicic acid and this glass piece are brought into a semi-molten state. , the above object is achieved by mutually adhesively fixing them.

以下図面に基いて本発明の実施例について説明する。第
3図(イ)〜e→は本発明に係る磁気ヘッド罠使用する
コアの製造方法を例示したものである。
Embodiments of the present invention will be described below based on the drawings. FIGS. 3(a) to 3(e) illustrate a method of manufacturing a core using a magnetic head trap according to the present invention.

このコアの製造方法は次に示す工程手順で行なわれる。The method for manufacturing this core is carried out in the following process steps.

(α) 1対のコア片2を所定の形状に加工し、そのギ
ヤング構成面2人を鏡面訴願仕上げをする。
(α) A pair of core pieces 2 are processed into a predetermined shape, and the two surfaces constituting the gigang are given a mirror finish.

(b)  ギャップ構成面2人にスパッタリング法によ
り所定の厚さの5iOz膜を蒸着形成する(第3図0)
参照)。この蒸着は次の方法で行なうことが望まれる。
(b) A 5iOz film of a predetermined thickness is deposited on the two gap forming surfaces by sputtering (Fig. 3 0).
reference). This vapor deposition is preferably performed by the following method.

すなわち、コアを真空中で200’Cで1゜分間加熱し
、コア表面の02.CO2,水分を除去し、(M−0,
1−1チ入りたアルゴンガスで2、OX 10−3〜4
. OX 10−3<Torr)程度の圧力のもとで行
なう。
That is, the core is heated in vacuum at 200'C for 1°, and the core surface is heated to 02. CO2 and moisture are removed, (M-0,
2 with argon gas containing 1-1, OX 10-3~4
.. This is carried out under a pressure of approximately OX 10-3<Torr).

(C)この5zOx [7上に更にけい酸が主成分のガ
ラ−X (SiOz”KzOllBxOaIICaO・
PbOで示す成分がらなシその標準的な組成割合は、’
SiO’z70〜75チ(wt%、以下同じ。)、Kz
013〜17 %、BzOa4〜6%、Cα03〜5%
、P、1502〜4チ)膜8をスパッタリング法によっ
て蒸着形成する。この蒸着は次の方法で行なうことが望
まれる。すなわち、10−’ (Torr)まで排気し
、O2が0.1〜1 %入ったアルゴンガスで2. O
X 10−3〜4. OX 10−3CTorr)程度
の圧力のもとで行なう。
(C) Gala-X (SiOz"KzOllBxOaIICaO・
The standard composition ratio of the components indicated by PbO is '
SiO'z70-75chi (wt%, same below), Kz
013-17%, BzOa4-6%, Cα03-5%
, P, 1502-4) A film 8 is formed by vapor deposition by sputtering. This vapor deposition is preferably performed by the following method. That is, the exhaust was evacuated to 10-' (Torr) and argon gas containing 0.1 to 1% O2 was used for 2. O
X 10-3~4. The test is carried out under a pressure of about OX 10-3 CTorr).

膜8の厚みは膜7の厚みに較べて小さい価をとるように
する。いまほぼ1μのギャップ長さをもつコアを得よう
とするときは、膜7の厚みを0.30〜0.35μ、膜
8の厚みを0.15〜0.20μ程度とすることが望ま
しい。この膜7および8がギャップスペーサを形成する
The thickness of the film 8 is set to be smaller than the thickness of the film 7. When attempting to obtain a core having a gap length of approximately 1 .mu., it is desirable that the thickness of the film 7 be 0.30 to 0.35 .mu. and the thickness of the film 8 be approximately 0.15 to 0.20 .mu.. The membranes 7 and 8 form gap spacers.

(d)  工程(C)によって製造されたコア片2の1
組をそのけい酸が主成分のガラス膜8の面を相互に当接
せしめ、両者を所定の力P(たとえばl−,3kg程度
の力)で押圧する。さらにとの当接部の端縁にけい酸が
主成古ラスとほぼ同一の軟化点を有するガラス片9を載
置する(図(ロ)参照)。さらにこの状態で全体なけい
敵が主成分のガラスが半溶融状態となる温度つまりガラ
ス軟化点よシ少し制い温度<72o〜780°C)に加
熱する。前記したようにガラス片9の107〜106ポ
イズの粘度を示す゛温度はけい酸が主成分のガラスの1
0〜10ポイズの粘度を示す温If (750’C〜8
00°C)とほぼ同一であるから、この加熱によって、
けい酸が主成分のガラス膜8も、ガラス片9も半溶融状
態となり、両コア片2は押圧されているから相互に強固
に接着する。
(d) 1 of the core pieces 2 manufactured by step (C)
The surfaces of the glass membranes 8 whose main component is silicic acid are brought into contact with each other, and both are pressed with a predetermined force P (for example, a force of about 1-, 3 kg). Furthermore, a piece of glass 9 whose silicic acid has almost the same softening point as the main mature lath is placed on the edge of the abutting part (see figure (b)). Further, in this state, the entire glass is heated to a temperature at which the main component glass becomes semi-molten, that is, a temperature slightly below the glass softening point (<72° C. to 780° C.). As mentioned above, the temperature at which the glass piece 9 exhibits a viscosity of 107 to 106 poise is 1
Temperature If showing viscosity of 0 to 10 poise (750'C to 8
00°C), so by this heating,
Both the glass film 8 whose main component is silicic acid and the glass piece 9 are in a semi-molten state, and since both core pieces 2 are pressed, they are firmly adhered to each other.

第3図e→は完成したコア1を示したものである。FIG. 3e shows the completed core 1.

図示のようにガラス片9は半溶融後固化した状態となっ
ている。
As shown in the figure, the glass piece 9 is in a semi-molten and solidified state.

以上述べた製造方法によれば、5iOa7、けい酸が主
成分のガラス膜8はスパッタリング法によって形成され
ているので各膜厚寸法はきわめて正確に成形することが
できる。またけい酸が主成分のガラスは半溶融状態であ
って液状ではないから圧着によるけい酸が主成分のガラ
ス膜8の厚みの減少は少ない。5iOzはその軟化点が
1500°C程度であるからこの程度の温度では圧着し
ても厚みの減少はない。さらに、けい酸が主成分のガラ
ス膜8の厚さの全ギャップ長さに対する割合は前記の例
の場合30−〜40%であるが、ガラスの粘度カニ0フ
〜10’ポイズ程度の温度で爆着するため、加熱圧着し
ても、ガラスは流動したシつぶれがほとんどないため全
ギャップ長さの寸法精度に影響を及ぼすことはなく、出
来上った製品コアのギャップ長さの寸法精度はきわめて
良好である。
According to the manufacturing method described above, since the glass film 8 mainly composed of 5iOa7 and silicic acid is formed by the sputtering method, each film thickness dimension can be formed very accurately. Further, since the glass mainly composed of silicic acid is in a semi-molten state and not in a liquid state, the thickness of the glass film 8 mainly composed of silicic acid is not reduced by pressure bonding. Since the softening point of 5iOz is about 1500°C, there is no decrease in thickness even if it is pressure bonded at this temperature. Furthermore, the ratio of the thickness of the glass film 8 whose main component is silicic acid to the total gap length is 30-40% in the above example, but at a temperature where the viscosity of the glass is about 0 to 10' poise. Due to the explosive bonding, even if the glass is bonded under heat and pressure, the dimensional accuracy of the entire gap length will not be affected because there is almost no fracture caused by the flow of the glass, and the dimensional accuracy of the gap length of the finished product core will be Very good condition.

以上の実施例は主としてビデオテープレコーダ用の音声
コントロールヘッドとして用いられる磁気ヘッドについ
て述べているが、他の磁気ヘッドについても本発明が有
効に実施できることは明らかである。
Although the above embodiments mainly describe a magnetic head used as an audio control head for a video tape recorder, it is clear that the present invention can be effectively implemented with other magnetic heads.

本発明は1対のコア片の接着が確′実でしかもギャップ
長さの寸法f#曳がきわめて高く、ノ(ラツキの少ない
コアを容易に製造することを可能とし、したがって磁気
ヘッドの性能を向上し、原価を低減する等、きわめて優
れた効果を有する。
The present invention makes it possible to easily manufacture a core in which the adhesion of a pair of core pieces is reliable, the gap length dimension f# is extremely high, and there is little wobble, thus improving the performance of the magnetic head. It has extremely excellent effects, such as improved performance and reduced cost.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図はビデオチーブレコーダの音声コントロールヘッ
ドに使用されているコアを示す斜視図、第2図は従来の
コアの加工方法を示す正面図、第3図(イ)〜(1)は
本発明に係る磁気ヘッドに用いられるコアの製造方法を
示す斜視図である。 1・・・・コア、2・φ・・コア片、2A・・拳・ギャ
ップ構成面、3・・・−ギャップスペーサ、4・e・・
SiO2膜、5・−・・空隙、6・・・・ガラス片、7
・・・・5iOz膜、81111@・けい酸が主成分の
ガラス膜、9・・・・ガラス片持許出願人 東京電気化学工業株式会社 代理人 弁理士 塚 本大三部 第1図 第3図 第2図  b
Fig. 1 is a perspective view showing a core used in the audio control head of a video chip recorder, Fig. 2 is a front view showing a conventional core processing method, and Figs. 3 (a) to (1) are in accordance with the present invention. FIG. 2 is a perspective view showing a method of manufacturing a core used in the magnetic head. 1...Core, 2.φ...Core piece, 2A...Fist/gap forming surface, 3...-gap spacer, 4.e...
SiO2 film, 5... void, 6... glass piece, 7
...5iOz film, 81111@・Glass film mainly composed of silicic acid, 9...Glass cantilever license applicant Tokyo Denki Kagaku Kogyo Co., Ltd. Representative Patent attorney Tsukamoto University Department Third Department Figure 1 Figure 3 Figure 2 b

Claims (1)

【特許請求の範囲】 1対のコア片をギャップスペーサを介して接着して成シ
、次の(α)〜(d)の工程手順によって製造されたコ
アを有する磁気ヘッド。 (α) 1対のコア片を所定の形状に成形し、そのギャ
ップ構成面は鏡面研磨によって仕上げる(b)  ギャ
ップ構成面にスパッタリング法にょシ坊定厚さの酸化け
い素C3iOx)膜を蒸着形成する(C)前記5i02
膜上にさらにスパッタリング法によシS L 02膜よ
シも薄い所定厚さのけい酸が主成分ツカラス(SaO2
・に2011B203−cao@Pbo)膜を設はギャ
ップスペーサを形成する (d)1対のコア片のけい酸塩が主成分のガラス膜の表
面を相互に当接せしめ、該当接部の端縁に前記けい改が
主成分のガラスの軟化点とほぼ同一の軟化点を有するガ
ラス片を載置し、両コア片を所定の圧力で圧接しながら
、前記けい酸が主成分のガラスが粘度10’−106ポ
イズの作業温度の下限に近い粘度を示す温度に加熱して
所定時間ピーク温度を保ち両コア片を接着する1
[Scope of Claims] A magnetic head having a core manufactured by bonding a pair of core pieces with a gap spacer interposed therebetween and following the steps (α) to (d) below. (α) Form a pair of core pieces into a predetermined shape, and finish the gap-forming surfaces by mirror polishing. (b) Form a silicon oxide (C3iOx) film with a constant thickness by sputtering on the gap-forming surfaces. (C) 5i02 above
The S L 02 film is further coated with a predetermined thin layer of silicic acid mainly composed of SaO2 by sputtering.
・2011B203-cao@Pbo) film is installed to form a gap spacer. (d) The surfaces of the glass films mainly composed of silicate of a pair of core pieces are brought into contact with each other, and the edges of the corresponding contact parts are brought into contact with each other. A piece of glass having a softening point almost the same as that of the glass whose main component is silicic acid is placed on the glass, and while pressing both core pieces together under a predetermined pressure, the glass whose main component is silicic acid has a viscosity of 10. Heat to a temperature that exhibits a viscosity close to the lower limit of the working temperature of '-106 poise and maintain the peak temperature for a predetermined time to bond both core pieces 1
JP21620482A 1982-12-09 1982-12-09 Magnetic head Pending JPS59107415A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP21620482A JPS59107415A (en) 1982-12-09 1982-12-09 Magnetic head

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP21620482A JPS59107415A (en) 1982-12-09 1982-12-09 Magnetic head

Publications (1)

Publication Number Publication Date
JPS59107415A true JPS59107415A (en) 1984-06-21

Family

ID=16684899

Family Applications (1)

Application Number Title Priority Date Filing Date
JP21620482A Pending JPS59107415A (en) 1982-12-09 1982-12-09 Magnetic head

Country Status (1)

Country Link
JP (1) JPS59107415A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04226211A (en) * 1990-07-27 1992-08-14 Eltech Syst Corp Heat insulating roll cover

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04226211A (en) * 1990-07-27 1992-08-14 Eltech Syst Corp Heat insulating roll cover

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