JPS60243811A - Manufacture of thin film magnetic head - Google Patents
Manufacture of thin film magnetic headInfo
- Publication number
- JPS60243811A JPS60243811A JP10017984A JP10017984A JPS60243811A JP S60243811 A JPS60243811 A JP S60243811A JP 10017984 A JP10017984 A JP 10017984A JP 10017984 A JP10017984 A JP 10017984A JP S60243811 A JPS60243811 A JP S60243811A
- Authority
- JP
- Japan
- Prior art keywords
- thin film
- glass layer
- magnetic head
- protective plate
- glass
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/127—Structure or manufacture of heads, e.g. inductive
- G11B5/31—Structure or manufacture of heads, e.g. inductive using thin films
- G11B5/3109—Details
- G11B5/313—Disposition of layers
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/127—Structure or manufacture of heads, e.g. inductive
- G11B5/31—Structure or manufacture of heads, e.g. inductive using thin films
- G11B5/3163—Fabrication methods or processes specially adapted for a particular head structure, e.g. using base layers for electroplating, using functional layers for masking, using energy or particle beams for shaping the structure or modifying the properties of the basic layers
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Magnetic Heads (AREA)
Abstract
Description
【発明の詳細な説明】
産業上の利用分野
本発明は薄膜磁気ヘッドの製法に関し、特に薄膜磁気ヘ
ッド素子に対する保−板の被着に関するものである。DETAILED DESCRIPTION OF THE INVENTION Field of the Invention The present invention relates to a method for manufacturing a thin film magnetic head, and more particularly to the attachment of a retaining plate to a thin film magnetic head element.
背景技術とその問題点
従来、薄Km気ヘッドは第4図に示すように基板(2)
上に磁性薄膜(3)、導電性薄膜(4)及び絶縁性薄膜
(5)よりなる薄膜磁気ヘッド−素子(1)側に810
2等の絶縁膜(6)を厚(形成してその表面側を平坦化
した後、接着剤(7ンにより保禮板(8)を接着して與
債するか、第5図或いは第6図に示すように薄膜磁気ヘ
ッド素子(1)側忙融着保穫層(9)を介してガラスa
Iをパックしたり、或いはガラス棒(10’)を介挿し
た保護板(8)を配し、この状態で加熱してバックガラ
スミG或いはガラス棒(10’)を溶融することにより
保護板(8)を接着して製造していたが、第4図に示す
前者の場合は膜形成装置が高価であること、またヘッド
素子側に段差が少ない場合は良いとしても10μm以上
の高段差を持つ場合等は膜形成に長時間を必要とするこ
と等の欠点があり、さらに保祿板の接合は接着剤により
行なうため信頼性の点で問題がある。BACKGROUND TECHNOLOGY AND PROBLEMS Conventionally, thin Km air heads have a substrate (2) as shown in Figure 4.
A thin film magnetic head consisting of a magnetic thin film (3), a conductive thin film (4) and an insulating thin film (5) on top - 810 on the element (1) side.
After forming a second grade insulating film (6) thickly and flattening its surface side, attach the protective plate (8) with an adhesive (7), or use the method shown in Fig. 5 or 6. As shown in the figure, the glass a is
The protective plate can be made by packing I or placing a protective plate (8) with a glass rod (10') inserted therein, and heating it in this state to melt the back glass glass G or the glass rod (10'). (8), but in the former case shown in Figure 4, the film forming equipment is expensive, and if there are few steps on the head element side, a high step of 10 μm or more may be required. In the case where the adhesive is held, there are drawbacks such as the need for a long time to form the film, and furthermore, there is a problem in terms of reliability since the abrasive plate is bonded with an adhesive.
一方第5図、第6図に示す後者の場合は保護板の接着に
おいて融着ガラスを基板と保^板との間の狭い空間に流
すため、その空間の気体が抜は切らなかったり、また)
ラド素子に段差がかなりあるためガラスの流れない部分
が出来て、ガラス気泡孔が発生し、このガラス孔がテー
プP5動向の研摩後、かなりの数表用することになり、
このガラス孔はヘッド当たりに影#を与えたり、異物が
入りてテープに損傷を与える等の欠点があり、また保後
板の接合上の信頼性の点でも問題がある。On the other hand, in the latter case shown in Figures 5 and 6, when bonding the protective plate, the fused glass is flowed into the narrow space between the substrate and the protective plate, so the gas in that space cannot be drained or )
Since there are considerable steps in the RAD element, there are areas where the glass does not flow, creating glass bubble holes, which will be used a considerable number of times after polishing with tape P5.
This glass hole has drawbacks such as casting a shadow on the head and damaging the tape due to foreign matter entering it, and also poses a problem in terms of reliability in bonding the backing plate.
発明の目的
本発明はかかる点に鑑み薄膜磁気ヘッド素子忙対する保
護板の被着を短時間で簡単かつ確実に行なえて信頼性が
高い薄膜磁気ヘッドを得ることができる薄膜磁気ヘッド
の製法を提供するものである。OBJECTS OF THE INVENTION In view of the above, the present invention provides a method for manufacturing a thin-film magnetic head that can easily and reliably attach a protective plate to a thin-film magnetic head element in a short period of time, thereby obtaining a highly reliable thin-film magnetic head. It is something to do.
発明の概要
本発明は上記の目的を達成するために、基板上に磁性薄
膜、導電性薄膜及び絶縁性薄膜よりなる薄膜磁気ヘッド
素子を形成し、この薄膜磁気ヘッド素子@に融着保護層
を介してガラス層を溶融により表面平坦状に形成した後
、その上に保護板を被着することにより、信頼性が高い
薄膜磁気ヘッドを得ることができるものである。SUMMARY OF THE INVENTION In order to achieve the above object, the present invention forms a thin film magnetic head element made of a magnetic thin film, a conductive thin film, and an insulating thin film on a substrate, and forms a fusion protective layer on the thin film magnetic head element. A highly reliable thin-film magnetic head can be obtained by melting a glass layer through the glass layer to form a flat surface and then attaching a protective plate thereon.
実施例
以下、本発明の実施例を第1図乃至第3図を参照して説
明する。Embodiments Hereinafter, embodiments of the present invention will be described with reference to FIGS. 1 to 3.
先ず、第1図は本発明製法により製造される薄膜磁気ヘ
ッドの一例の断面図を示し、この磁気ヘッドは基板(2
)上に磁性薄膜(3)、導電性薄膜(4)及び絶縁性薄
膜(5)より形成された薄膜磁気ヘッド素子(1)K融
、着保護膜(9)を介してガラス層Ql)を形成し、こ
のガラス層aυを溶融することにより保護板(8)を接
着して形成したものである。First, FIG. 1 shows a cross-sectional view of an example of a thin film magnetic head manufactured by the manufacturing method of the present invention.
), a thin film magnetic head element (1) formed of a magnetic thin film (3), a conductive thin film (4) and an insulating thin film (5) is coated with a glass layer Ql) via a protective film (9). The protective plate (8) is formed by bonding the protective plate (8) by melting the glass layer aυ.
次に第2図及び第3図忙ついて本発明製法の工程例を説
明する。先ず上述の如く薄膜磁気ヘッド素子(1)を形
成した後、保護膜(9′)として8i02膜を0.2μ
m厚で全面にわたって形成する。そして保護板(8)を
接合する部面に融着保i1j M (9)としてTa2
0sjlKを1βm厚にマスクスパッタリングにより形
成する。Next, an example of the manufacturing process of the present invention will be explained with reference to FIGS. 2 and 3. First, a thin film magnetic head element (1) is formed as described above, and then an 8i02 film with a thickness of 0.2μ is formed as a protective film (9').
Formed over the entire surface with a thickness of m. Then, Ta2 was applied as a fusion bond i1j M (9) to the part where the protective plate (8) was to be joined.
0sjlK is formed to a thickness of 1βm by mask sputtering.
次いで第2図に示すように例えば直径が約0.4mlの
ガラス棒(11’)を融着保護膜(9)上に置き、これ
を約650℃で加熱溶融させ、融着保禮膜(9)上にガ
ラスN (11) 1に:形成する。Next, as shown in FIG. 2, a glass rod (11') with a diameter of about 0.4 ml, for example, is placed on the fusion protection film (9), and this is heated and melted at about 650°C to form the fusion protection film (9). 9) Form glass N (11) 1: on top.
その披講3図に示すようにガラス層(X?)を2ツピン
クにより平坦化し、Wr要厚さの平坦ガラス層ttuv
形成する。As shown in Fig. 3, the glass layer (X?) is flattened by two-pink, and the flat glass layer with a thickness of Wr is ttuv.
Form.
そして束径に平坦ガラス層Ql)上に例えばセラミック
等により形成される保護板(8)を押し当てて約500
℃で加熱し平坦ガラス層(IIIを溶融させることによ
り保護板(8ンと基板(2)とが融着されて、(工1図
に示す薄膜磁気ヘッドが形成される。Then, a protective plate (8) made of ceramic or the like is pressed onto the flat glass layer (Ql) on the diameter of the bundle for approximately 500
By heating at .degree. C. to melt the flat glass layer (III), the protective plate (8) and the substrate (2) are fused together to form the thin film magnetic head shown in FIG.
次に第2の実施例は図示しないが第1の実施例における
保護膜(9′)、融着保護M (9)として5i02膜
とCr膜とを連続でマスクスパッタリングにより形成す
る。Next, in the second embodiment, although not shown, a 5i02 film and a Cr film are successively formed by mask sputtering as the protective film (9') and fusion protection M (9) in the first embodiment.
そして、この融着保護膜上にガラス粉を溶剤で混合した
ものをスクリーン印刷により20μm程の厚忙塗布する
。その後、約600℃でガラス粉を溶融させガラス層を
形成し、このガラス層上の所定位置忙保−板を押し当て
て約480℃で加熱しガラスノ峠を溶融させることによ
り保護板と基板とが融sされて第1図に示すヘッドと同
様の薄膜磁気ヘッドか形成される。Then, a mixture of glass powder and a solvent is coated onto this fused protective film to a thickness of about 20 μm by screen printing. After that, the glass powder is melted at about 600°C to form a glass layer, and a protective plate is pressed onto the glass layer at a predetermined position and heated at about 480°C to melt the glass layer, thereby forming a protective plate and a substrate. is melted to form a thin film magnetic head similar to the head shown in FIG.
以上の実施例において加熱溶融の温度条件は、保−板融
着温度をTa、ガラス層形成温度yTb、ガラス軟什f
lA IllをTcJ−−FムシTc (Ta (Tb
の関係である。In the above examples, the temperature conditions for heating and melting are as follows: the retaining plate fusion temperature is Ta, the glass layer forming temperature yTb, and the glass softness f.
lA Ill is TcJ--F insect Tc (Ta (Tb) relationship.
また、ガラス層の形成においては溶融ガラスの流れを規
制する手段として、ガラス層形成部にはTa205、C
r等のようなガラスの流れのよい膜を形成しておき、そ
れ以外の部分は8i02のようなガラスの流れの悪い膜
を形成しておくことにより、溶融ガラスの流れをほぼ完
全に制御することができる。In addition, in the formation of the glass layer, Ta205, C
The flow of molten glass can be controlled almost completely by forming a film with good glass flow, such as r, and forming a film with poor glass flow, such as 8i02, in other parts. be able to.
また、保護板のガラス融着面にもTa 205膜、Cr
膜等を形成して全面にわたって溶融ガラスが均等に行渡
り融着が確実に行なえることになる。In addition, Ta 205 film, Cr
By forming a film or the like, the molten glass is evenly distributed over the entire surface and fusion can be reliably performed.
以上のように各実施例においては保護板の融着ガラス層
は平面上においてガラスを溶融させて形成するので気泡
孔が生じることなく形成されて、保護板が確実に融着さ
れると共に滑らかなテープ摺動向を有する薄膜磁気ヘッ
ドが優られる。As described above, in each of the embodiments, the fused glass layer of the protective plate is formed by melting glass on a flat surface, so it is formed without creating air bubbles, and the protective plate is reliably fused and has a smooth surface. Thin film magnetic heads with tape sliding behavior are preferred.
なお、各実施例において保−板とガラス層とを接着剤を
用いて接合してもよい。In addition, in each embodiment, the retaining plate and the glass layer may be bonded using an adhesive.
発明の効果
以上のように本発明によれば基板上に形成した薄膜磁気
ヘッド素子側に融着保護層を介してガラス層を表面平坦
状に形成した後、その上に保護板を被着して薄膜磁気ヘ
ッドを形成するので保護板が被着されるガラス層は平面
状態で溶融形成されることKより気泡孔が生じることな
く形成・できて保護板を確実に融着できて信頼性が高く
、またテープ摺動面は表出するガラス層が少なく、しか
も気泡孔もないことによりms耗の点で有利であると共
に滑らかに形成できてヘッド当りが良好でテープに損傷
ヲ与えるおそれのない薄膜磁気ヘッドが得られる。さら
に製造工程においては保護板にガラスをパックする等の
加工を施す必要がないので工程の簡略化、短時間化が可
能となると共に融着ガラス層の形成及びそのガラス層の
表面平坦化と保i*板との被着は別工程となるので加工
精度に余裕が出て(ることになって製造し易くなる等の
効果を有する。Effects of the Invention As described above, according to the present invention, a glass layer is formed with a flat surface on the side of a thin film magnetic head element formed on a substrate via a fused protective layer, and then a protective plate is attached thereon. Since the thin-film magnetic head is formed using a thin-film magnetic head, the glass layer to which the protective plate is attached is melt-formed in a flat state.This allows the glass layer to be formed and formed without creating air bubbles, and the protective plate can be reliably fused to ensure reliability. In addition, the tape sliding surface has less exposed glass layer and no air bubbles, which is advantageous in terms of MS wear, and it can be formed smoothly and has good head contact, so there is no risk of damaging the tape. A thin film magnetic head is obtained. Furthermore, in the manufacturing process, there is no need to perform processing such as packing the glass into the protective plate, which simplifies the process and shortens the time, as well as forming a fused glass layer and flattening the surface of the glass layer. Since adhering to the i* plate is a separate process, there is a margin for machining accuracy (which in turn has the effect of making manufacturing easier).
第1図は本究明製法により製造される4膜磁気ヘツドの
一例の断面図、第2図及び第3図は本発明製法の一例の
工程を示す断面図、第4図は従来の薄膜磁気ヘッドの構
造例を示す断面図、第5図及び第6図は従来の薄膜磁気
ヘッドの製造状態を示す断面図である。
図中(1)は薄膜磁気ヘッド素子、(2)は基板、(8
)は保護板、(9)は融着保護膜、aυはガラス層であ
る。
第3図
第4図
第5図
θ
第6図
一二二つ。FIG. 1 is a cross-sectional view of an example of a four-film magnetic head manufactured by the method of the present invention, FIGS. 2 and 3 are cross-sectional views showing steps of an example of the manufacturing method of the present invention, and FIG. 4 is a conventional thin-film magnetic head. FIGS. 5 and 6 are cross-sectional views showing a manufacturing state of a conventional thin-film magnetic head. In the figure, (1) is a thin film magnetic head element, (2) is a substrate, (8
) is a protective plate, (9) is a fused protective film, and aυ is a glass layer. Figure 3 Figure 4 Figure 5 θ Figure 6 122.
Claims (1)
薄膜磁気ヘッド素子を形成し、該薄膜磁気ヘッド素子側
に融着保護層を介してガラス層を溶融により表面平坦状
に形成した後、その上に保護板を被着することを特徴と
する薄膜磁気ヘッドの製法。After forming a thin film magnetic head element consisting of a magnetic thin film, a conductive thin film, and an insulating thin film on a substrate, and forming a glass layer on the thin film magnetic head element side through a fusion protection layer by melting to have a flat surface, A method for manufacturing a thin film magnetic head, which is characterized in that a protective plate is adhered thereon.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP10017984A JPS60243811A (en) | 1984-05-18 | 1984-05-18 | Manufacture of thin film magnetic head |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP10017984A JPS60243811A (en) | 1984-05-18 | 1984-05-18 | Manufacture of thin film magnetic head |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS60243811A true JPS60243811A (en) | 1985-12-03 |
Family
ID=14267080
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP10017984A Pending JPS60243811A (en) | 1984-05-18 | 1984-05-18 | Manufacture of thin film magnetic head |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS60243811A (en) |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS57172521A (en) * | 1981-04-16 | 1982-10-23 | Matsushita Electric Ind Co Ltd | Manufacture of thin-film magnetic head |
JPS5841408A (en) * | 1981-09-01 | 1983-03-10 | Sony Corp | Thin film magnetic head |
-
1984
- 1984-05-18 JP JP10017984A patent/JPS60243811A/en active Pending
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS57172521A (en) * | 1981-04-16 | 1982-10-23 | Matsushita Electric Ind Co Ltd | Manufacture of thin-film magnetic head |
JPS5841408A (en) * | 1981-09-01 | 1983-03-10 | Sony Corp | Thin film magnetic head |
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