JPH0583964B2 - - Google Patents

Info

Publication number
JPH0583964B2
JPH0583964B2 JP22992784A JP22992784A JPH0583964B2 JP H0583964 B2 JPH0583964 B2 JP H0583964B2 JP 22992784 A JP22992784 A JP 22992784A JP 22992784 A JP22992784 A JP 22992784A JP H0583964 B2 JPH0583964 B2 JP H0583964B2
Authority
JP
Japan
Prior art keywords
glass
thin film
layer
head
substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP22992784A
Other languages
Japanese (ja)
Other versions
JPS61107517A (en
Inventor
Yoshiji Nakagawa
Masayuki Chifuku
Hiroshi Seki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Iwaki Glass Co Ltd
Panasonic Holdings Corp
Original Assignee
Iwaki Glass Co Ltd
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Iwaki Glass Co Ltd, Matsushita Electric Industrial Co Ltd filed Critical Iwaki Glass Co Ltd
Priority to JP22992784A priority Critical patent/JPS61107517A/en
Publication of JPS61107517A publication Critical patent/JPS61107517A/en
Publication of JPH0583964B2 publication Critical patent/JPH0583964B2/ja
Granted legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11BINFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/127Structure or manufacture of heads, e.g. inductive
    • G11B5/31Structure or manufacture of heads, e.g. inductive using thin films
    • G11B5/3103Structure or manufacture of integrated heads or heads mechanically assembled and electrically connected to a support or housing

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Magnetic Heads (AREA)

Description

【発明の詳細な説明】[Detailed description of the invention]

産業上の利用分野 本発明は耐久性、耐候性及び信頼性に優れた薄
膜磁気ヘツドに関するものである。 従来の技術 テープ用薄膜磁気ヘツド等では薄膜ヘツド構成
部の保護或いは耐摩耗性の向上、テープタツチ改
善等のため、保護用基板を薄膜ヘツド構成部上へ
接着し、この目的を果たしている。従来、薄膜ヘ
ツド構成部と保護用基板の接着にはその製法の容
易さにより主に有機系接着剤が使用されていた
が、有機系接着剤による保護用基板の接着は耐久
性に乏しく、保護用基板の剥離、ずれ、接着剤層
の局所的摩耗等の発生率が高く、製品の信頼性が
問題となつていた。そこで対策案として第3図に
示すように保護用基板1と基板2上に形成された
薄膜ヘツド構成部3との間に低融点ガラスの薄板
4を挟み、これを第4図に示すように低融点ガラ
スの軟化点以上に加熱一体化してヘツドアツセン
ブリ5を作り、この前端面6を第5図に死瀬うよ
うに丸く切削加工して薄膜磁気ヘツドを作つてい
た。又、第6図に示すような保護用基板7に予め
スクリーン印刷法等で低融点ガラス層8を設け、
更に加熱融着し、次に第7図に示すように基板9
上に形成された薄膜ヘツド構成部10と対接さ
せ、低融点ガラスの軟化点以上に加熱一体化させ
る方法等が保護用基板の接着法として考え出さ
れ、一部薄膜磁気ヘツドで実施されていた。これ
を更に詳しく説明すると、従来低融点ガラスを用
いた薄膜磁気ヘツドは第8図に例示したような基
板11上に次のものが積層状態に設けられてい
る。つまり、絶縁層12、絶縁層13、バイアス
印加用導体層14、パーマロイ等のMR磁性層1
5、配線用導体層16、絶縁層17、絶縁層1
8、シールド用磁性層19、保護層20、保護層
21、低融点ガラス層22、保護用基板23から
なり、前端面はテープ摺接面24である。このよ
うな薄膜磁気ヘツドへの熱的応力発生の緩和及び
磁性層15,19の熱による磁性特性の劣化をさ
けるため、一般には低温接着が可能なPbO・
B2O3系のガラスが用いられていた。 発明が解決しようとする問題点 しかし従来のPbO・B2O3系の低融点ガラスを
用いると耐湿性に問題があり、例えば温度60℃、
相対湿度95%の高温高湿下で96時間放置するとテ
ープ摺接面24上に現われる低融点ガラス層22
の表面が著しく変質することが明らかとなつた。
低融点ガラス層22の表面の変質により、テープ
摺接面24上に第9図a,bに示すような凸部2
5、凹部26が発生し、テープとの接触不良、及
びテープ磁性粉の目詰りによるヘツド特性の劣
化、又凹部の発生が原因でテープ走行時における
薄膜ヘツド構成部即ち絶縁層12から保護層21
までの崩れ及びそれに起因した磁性層15,19
の腐蝕が問題となつていた。本発明は上記従来の
問題点を解決するもので、耐久性、耐候性及び信
頼性に優れた薄膜磁気ヘツドを提供することを目
的とする。 問題点を解決するための手段 本発明は上記問題点を解決するため、基板上に
形成された薄膜ヘツド構成部とこの薄膜ヘツド構
成部を保護する他方の基板とをガラスにより接着
一体化させ、前記接着用ガラスの組成がモル%表
示でPbO30〜58%、B2O32〜15%、SiO220〜47
%、Al2O30〜15%、ZnO0〜15%、R2O0〜20%
(但しR2OはNa2O、K2O、Li2Oのうち1種又は
2種以上の合計)の範囲にある成分を含むもので
ある。 作 用 本発明は上記した構成により、耐久性、耐候性
及び信頼性に優れたガラスを用いて薄膜磁気ヘツ
ドの特性の低下を抑えている。 実施例 以下、本発明の一実施例について、図面に基づ
いて説明する。 先ず本発明薄膜磁気ヘツドを構成するために薄
膜ヘツド構成部と保護用基板との接着に用いるガ
ラスの組成を次のようにする。
INDUSTRIAL APPLICATION FIELD The present invention relates to a thin film magnetic head with excellent durability, weather resistance and reliability. Prior Art In thin film magnetic heads for tapes, etc., a protective substrate is adhered onto the thin film head component to protect the thin film head component, improve wear resistance, improve tape touch, etc. to achieve this purpose. Conventionally, organic adhesives have been mainly used to bond thin film head components and protective substrates due to their ease of production, but bonding protective substrates with organic adhesives lacks durability and is difficult to protect. There was a high incidence of peeling and shifting of the substrate, local wear of the adhesive layer, etc., and product reliability was a problem. Therefore, as a countermeasure, a thin plate 4 of low melting point glass is sandwiched between the protective substrate 1 and the thin film head component 3 formed on the substrate 2 as shown in FIG. A head assembly 5 was made by heating the glass to a temperature above the softening point of the low melting point glass, and the front end surface 6 of the glass was cut into a round shape as shown in FIG. 5 to make a thin film magnetic head. Furthermore, a low melting point glass layer 8 is provided in advance on the protective substrate 7 as shown in FIG. 6 by screen printing or the like.
After further heating and fusing, the substrate 9 is bonded as shown in FIG.
A method of bonding the protective substrate by bringing it into contact with the thin film head component 10 formed above and heating it to a temperature above the softening point of the low melting point glass has been devised, and has been implemented in some thin film magnetic heads. Ta. To explain this in more detail, a conventional thin film magnetic head using low melting point glass has the following components laminated on a substrate 11 as illustrated in FIG. That is, an insulating layer 12, an insulating layer 13, a conductor layer 14 for bias application, an MR magnetic layer 1 made of permalloy, etc.
5, wiring conductor layer 16, insulating layer 17, insulating layer 1
8. Consists of a shielding magnetic layer 19, a protective layer 20, a protective layer 21, a low melting point glass layer 22, and a protective substrate 23, and the front end surface is a tape sliding contact surface 24. In order to alleviate such thermal stress on the thin film magnetic head and to avoid deterioration of the magnetic properties of the magnetic layers 15 and 19 due to heat, PbO, which can be bonded at low temperatures, is generally used.
B 2 O 3 glass was used. Problems to be Solved by the Invention However, when using conventional PbO・B 2 O 3 based low melting point glass, there is a problem with moisture resistance, for example at a temperature of 60℃,
The low melting point glass layer 22 that appears on the tape sliding contact surface 24 when left for 96 hours under high temperature and high humidity conditions with a relative humidity of 95%.
It became clear that the surface of the material was significantly altered.
Due to the deterioration of the surface of the low melting point glass layer 22, convex portions 2 as shown in FIGS. 9a and 9b are formed on the tape sliding surface 24.
5. Concave portions 26 occur, resulting in poor contact with the tape and deterioration of head characteristics due to clogging of magnetic powder on the tape.Due to the occurrence of concave portions, the thin film head components, that is, from the insulating layer 12 to the protective layer 21, occur when the tape is running.
The collapse of the magnetic layers 15 and 19 caused by this collapse
Corrosion was becoming a problem. The present invention solves the above-mentioned conventional problems, and aims to provide a thin film magnetic head with excellent durability, weather resistance, and reliability. Means for Solving the Problems In order to solve the above-mentioned problems, the present invention integrates a thin film head component formed on a substrate with another substrate that protects the thin film head component using glass, The composition of the adhesive glass is PbO 30-58%, B 2 O 3 2-15%, SiO 2 20-47 in mol%.
%, Al2O3 0 ~15%, ZnO0~15%, R2O0 ~ 20%
(However, R 2 O includes one or the sum of two or more of Na 2 O, K 2 O, and Li 2 O). Effects The present invention uses glass having excellent durability, weather resistance, and reliability to suppress deterioration of the characteristics of the thin film magnetic head due to the above-described configuration. Embodiment Hereinafter, an embodiment of the present invention will be described based on the drawings. First, in order to construct the thin film magnetic head of the present invention, the composition of the glass used for adhering the thin film head component and the protective substrate is as follows.

【表】 更にAl2O3.ZnO、R2O(NaO、K2O、Li2Oのう
ち1種又は2種以上)を添加し、ガラスの膨脹係
数を調整することができる。 Al2O3はガラスの膨脹を下げ、又ガラスの耐
水・耐湿性にも好ましい効果を及ぼすが、ガラス
の粘性を大きくし、15mol%を越えると低温で封
着できなくなる。ZnOはガラスの粘性をあまり変
えず膨脹を下げるが、ガラスの失透傾向を大きく
し、15mol%を越えると均質なガラスが得られな
くなる。R2Oはガラスの膨張を大きくし、且つ粘
性も小さくするが、ガラスの失透傾向が大きくな
り、20mol%を越えると均質なガラスが得られな
い。これらガラスの評価はガラスブロツク単体で
行なつた。
[Table] Furthermore, the expansion coefficient of the glass can be adjusted by adding Al 2 O 3 .ZnO and R 2 O (one or more of NaO, K 2 O, and Li 2 O). Although Al 2 O 3 reduces the expansion of the glass and has a favorable effect on the water resistance and moisture resistance of the glass, it increases the viscosity of the glass, and if it exceeds 15 mol %, sealing will not be possible at low temperatures. ZnO reduces the expansion without changing the viscosity of the glass much, but it increases the tendency of the glass to devitrify, and if it exceeds 15 mol%, it becomes impossible to obtain a homogeneous glass. Although R 2 O increases the expansion of the glass and also reduces the viscosity, it increases the tendency of the glass to devitrify, and if it exceeds 20 mol %, a homogeneous glass cannot be obtained. The evaluation of these glasses was carried out on a single glass block.

【表】【table】

【表】 耐湿性:ガラス表面を酸化セリウムにより鏡面研
磨した後温度90℃、相対湿度95%(以下単位を
%RHと書く)で24時間(以下hrと書く)処理 No.1〜4は本発明実施例によるガラスであり、
No.5は従来のガラスである。No.1〜3は90℃、95
%RHの条件下24hr放置においても殆んど変化が
なく良好であつた。No.4については表面にややく
もりが見られる程度であつた。しかし従来品であ
るNo.5については表面が完全に白濁した結果とな
つた。 次に上記構成のガラスを用いて作成した薄膜磁
気ヘツドについて説明する。 薄膜ヘツド構成部は従来例で説明した第8図に
示すように、Mn−Zn−フエライト(α=120×
10-7/℃)を基板11とし、の上にSiO2絶縁層1
2、Al2O3絶縁層13、Ti導体層14、パーマロ
イ磁性層15、Au/Cr導体層16、SiO絶縁層
17、SiO2絶縁層18、パーマロイ磁性層19、
SiO保護層20、SiO2保護層21を形成したシヤ
ントバイアス方式のマルチトラツク再生ヘツドで
行なつた。 保護用基板の接着は従来法で説明した第6図、
第7図で示す方法と同じ方法により行ない、Mn
−Zn−フエライト製の保護用基板へガラス(前
記表中のNo.1)の150メツシユ以下のフリツトを
スクリーン印刷法により約30μm付着後、加熱融
着しガラス層を形成後、前記薄膜ヘツド構成部へ
N2雰囲気550℃、10分の加熱加圧の条件で行なつ
た。 ヘツド組立後は第8図に示すように保護用基板
23と薄膜ヘツド構成部最上層であるSiO2保護
層21間に本発明による低融点ガラス層22がで
きる。薄膜ヘツド構成部への保護用基板23の接
着は600℃以下で行なう必要があり、この温度を
越えると薄膜ヘツド構成部の破壊及び磁性層1
5,19の磁気特性の劣化が多発し、歩留りを考
慮すれば550℃以下で行なわなければならない。
本発明によるガラスは全て550℃以下で接着が可
能であり、本実施例で作成した薄膜磁気ヘツドの
歩留りは良好であつた。ヘツド特性は初期性能は
勿論のこと、60℃、95%RH、96hrの耐湿試験後
も本発明による低融点ガラス層22の表面は殆ん
ど変化しておらず、従つてヘツド出力、出力波形
の2次歪・3次高調波等の全てのスペツクを満足
した。更に実施例として、第1図及び第2図に示
すシンプルな構造の薄膜磁気ヘツドを本発明によ
るガラス(前記表中のNo.4)及び従来のガラス
(前記表中のNo.5)を用いて同一プロセス及び同
一の構造で作成し、比較を行なつた。第1図及び
第2図において31は基板、32は磁性層、33
は磁性層32へ電流を通じる配線用導体層、34
は保護層、35は低融点ガラス層、36は保護用
基板である。又37はテープ摺接面で、この摺接
面37を示す想像線(第1図参照)まで左端より
切削して摺接面37が作られる。薄膜ヘツド構成
用下地となる基板31及び保護用基板36はソー
ダ石灰ガラス(μ=93×10-3、軟化点M.P.=720
℃)とした。第1図、第2図に示す本発明及び従
来のMRヘツドは組立後は差が無く、外観ヘツド
特性とも良好であるが、60℃、95%RHの環境
下、96hrの放置で従来のガラスを用いた磁気ヘツ
ドはテープ摺接面37上のガラス層35が著しく
変質し、肌荒れが見られた。更に前記環境下で
1000hr経過後は本発明によるガラスを用いた薄膜
磁気ヘツドでは、テープ摺接面37上のガラス層
35は一部に若干の変色があるだけで殆んど変化
はない。ヘツド特性についても初期特性を維持し
ており、何ら異常は無い。以上薄膜磁気ヘツド
は、通常の用途では問題とならないガラス表面の
僅かな変質が大きな問題となり、ここに本発明に
おいて組成限定したガラスを使用する有意性が存
在する。 発明の効果 以上のように本発明によれば、モル%比で
PbO30〜58%、B2O32〜15%、SiO220〜47%、
Al2O30〜15%、ZnO0〜15%、R2O0〜20%の範囲
にある成分を含むガラスを用いて薄膜ヘツド構成
部と保護用基板との接着を行なつているため、耐
久性、耐候性及び信頼性に優れた薄膜磁気ヘツド
を提供することができる。
[Table] Moisture resistance: After the glass surface is mirror-polished with cerium oxide, it is treated at a temperature of 90℃ and a relative humidity of 95% (hereinafter written as %RH) for 24 hours (hereinafter written as hr). A glass according to an embodiment of the invention,
No. 5 is conventional glass. No. 1 to 3 are 90℃, 95
Even when left for 24 hours under %RH conditions, there was almost no change and the result was good. Regarding No. 4, the surface was only slightly cloudy. However, the surface of conventional product No. 5 became completely cloudy. Next, a thin film magnetic head made using the glass having the above structure will be explained. The thin film head component is made of Mn-Zn-ferrite (α=120×
10 -7 /℃) as the substrate 11, and a SiO 2 insulating layer 1 on top.
2, Al 2 O 3 insulating layer 13, Ti conductor layer 14, permalloy magnetic layer 15, Au/Cr conductor layer 16, SiO insulating layer 17, SiO 2 insulating layer 18, permalloy magnetic layer 19,
This was carried out using a shunt bias type multi-track reproducing head in which a SiO protective layer 20 and a SiO 2 protective layer 21 were formed. The bonding of the protective substrate is shown in Figure 6, which is explained using the conventional method.
The Mn
- After attaching a frit of 150 meshes or less of glass (No. 1 in the above table) to a protective substrate made of Zn-ferrite by screen printing, and heating and fusing it to form a glass layer, the above thin film head structure was formed. to the department
The test was carried out under the conditions of heating and pressurizing at 550°C in an N 2 atmosphere for 10 minutes. After the head is assembled, as shown in FIG. 8, a low melting point glass layer 22 according to the present invention is formed between the protective substrate 23 and the SiO 2 protective layer 21 which is the uppermost layer of the thin film head component. The protective substrate 23 must be bonded to the thin film head component at a temperature below 600°C; exceeding this temperature may cause damage to the thin film head component and damage to the magnetic layer 1.
5, 19, the magnetic properties frequently deteriorate, and in consideration of yield, it is necessary to carry out the process at a temperature of 550° C. or lower.
All glasses according to the present invention can be bonded at temperatures below 550°C, and the yield of the thin film magnetic heads produced in this example was good. Regarding the head characteristics, not only the initial performance but also the surface of the low melting point glass layer 22 according to the present invention hardly changes after the humidity test at 60°C, 95% RH, 96 hours, and therefore the head output and output waveform It met all specifications such as second-order distortion and third-order harmonics. Furthermore, as an example, a thin-film magnetic head having a simple structure as shown in FIGS. They were created using the same process and structure and compared. In FIGS. 1 and 2, 31 is a substrate, 32 is a magnetic layer, and 33
34 is a wiring conductor layer that conducts current to the magnetic layer 32;
35 is a low melting point glass layer, and 36 is a protective substrate. Reference numeral 37 denotes a tape sliding surface, and the sliding surface 37 is created by cutting from the left end to an imaginary line showing the sliding surface 37 (see FIG. 1). The substrate 31 and the protective substrate 36 that serve as the base for forming the thin film head are made of soda lime glass (μ=93×10 -3 , softening point MP=720
℃). There is no difference between the MR head of the present invention and the conventional MR head shown in Figs. 1 and 2 after assembly, and the appearance and head characteristics are good. In the magnetic head using the magnetic head, the glass layer 35 on the tape sliding contact surface 37 was significantly deteriorated, and roughness was observed. Furthermore, under the above environment
After 1000 hours, in the thin film magnetic head using the glass according to the present invention, there is almost no change in the glass layer 35 on the tape sliding contact surface 37 except for a slight discoloration in a part. The head characteristics also maintained their initial characteristics and there were no abnormalities. As described above, in thin film magnetic heads, slight deterioration of the glass surface, which is not a problem in normal applications, poses a major problem, and this is where the use of glass with a limited composition in the present invention is significant. Effects of the Invention As described above, according to the present invention, in terms of mol% ratio,
PbO30~58%, B2O3 2 ~15%, SiO2 20~47%,
The thin film head component and the protective substrate are bonded using glass containing components in the range of 0 to 15% Al 2 O 3 , 0 to 15% ZnO, and 0 to 20% R 2 O, ensuring durability. It is possible to provide a thin film magnetic head with excellent durability, weather resistance, and reliability.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図及び第2図は本発明の一実施例説明のた
めの要部切欠き斜視図及び縦断面図、第3図〜第
5図は従来の薄膜磁気ヘツドの製造順序を示す斜
視図、第6図、第7図は別の従来の製造順序を示
す斜視図、第8図は従来の薄膜磁気ヘツドの縦断
面図、第9図a,bは従来の薄膜磁気ヘツドの要
部拡大図である。 31……基板、32……磁性層、33……配線
用導体層、34……保護層、35……低融点ガラ
ス層、36……保護用基板、37……テープ摺接
面。
1 and 2 are cutaway perspective views and vertical cross-sectional views of essential parts for explaining one embodiment of the present invention, and FIGS. 3 to 5 are perspective views showing the manufacturing order of a conventional thin film magnetic head. 6 and 7 are perspective views showing another conventional manufacturing sequence, FIG. 8 is a vertical sectional view of a conventional thin film magnetic head, and FIGS. 9 a and b are enlarged views of main parts of a conventional thin film magnetic head. It is. 31... Substrate, 32... Magnetic layer, 33... Wiring conductor layer, 34... Protective layer, 35... Low melting point glass layer, 36... Protective substrate, 37... Tape sliding contact surface.

Claims (1)

【特許請求の範囲】[Claims] 1 基板上に形成された薄膜ヘツド構成部とこの
薄膜ヘツド構成部を保護する他方の基板とをガラ
スにより接着一体化させ、前記接着用ガラスの組
成がモル%表示でPbO30〜58%、B2O32〜15%、
SiO220〜47%、Al2O30〜15%、ZnO0〜15%、
R2O0〜20%(但しR2OはNa2O、K2O、Li2Oのう
ち1種又は2種以上の合計)の範囲にある成分を
含む薄膜磁気ヘツド。
1. The thin film head component formed on the substrate and the other substrate that protects the thin film head component are bonded and integrated with glass, and the composition of the adhesive glass is PbO30 to 58% in mol%, B2 O3 2-15%,
SiO2 20~47%, Al2O3 0 ~15%, ZnO0~15%,
A thin film magnetic head containing a component in the range of 0 to 20% R 2 O (where R 2 O is the sum of one or more of Na 2 O, K 2 O, and Li 2 O).
JP22992784A 1984-10-30 1984-10-30 Thin film magnetic head Granted JPS61107517A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP22992784A JPS61107517A (en) 1984-10-30 1984-10-30 Thin film magnetic head

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP22992784A JPS61107517A (en) 1984-10-30 1984-10-30 Thin film magnetic head

Publications (2)

Publication Number Publication Date
JPS61107517A JPS61107517A (en) 1986-05-26
JPH0583964B2 true JPH0583964B2 (en) 1993-11-30

Family

ID=16899915

Family Applications (1)

Application Number Title Priority Date Filing Date
JP22992784A Granted JPS61107517A (en) 1984-10-30 1984-10-30 Thin film magnetic head

Country Status (1)

Country Link
JP (1) JPS61107517A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2015076033A1 (en) 2013-11-21 2015-05-28 日立アロカメディカル株式会社 Radiation detection element, radiation detector provided with same, nuclear medicine diagnosis device and method for producing radiation detection element

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2015076033A1 (en) 2013-11-21 2015-05-28 日立アロカメディカル株式会社 Radiation detection element, radiation detector provided with same, nuclear medicine diagnosis device and method for producing radiation detection element

Also Published As

Publication number Publication date
JPS61107517A (en) 1986-05-26

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