JPS60212232A - クロルシランの不均化触媒 - Google Patents
クロルシランの不均化触媒Info
- Publication number
- JPS60212232A JPS60212232A JP6748984A JP6748984A JPS60212232A JP S60212232 A JPS60212232 A JP S60212232A JP 6748984 A JP6748984 A JP 6748984A JP 6748984 A JP6748984 A JP 6748984A JP S60212232 A JPS60212232 A JP S60212232A
- Authority
- JP
- Japan
- Prior art keywords
- chlorosilane
- catalyst
- disproportionation
- hydrochloride
- tertiary amine
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000003054 catalyst Substances 0.000 title claims abstract description 39
- 238000007323 disproportionation reaction Methods 0.000 title claims abstract description 32
- 239000005046 Chlorosilane Substances 0.000 title claims abstract description 26
- KOPOQZFJUQMUML-UHFFFAOYSA-N chlorosilane Chemical compound Cl[SiH3] KOPOQZFJUQMUML-UHFFFAOYSA-N 0.000 title claims abstract description 26
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 claims abstract description 21
- 229930195734 saturated hydrocarbon Natural products 0.000 claims abstract description 4
- 150000001412 amines Chemical class 0.000 claims description 12
- 125000001183 hydrocarbyl group Chemical group 0.000 claims description 5
- 125000004432 carbon atom Chemical group C* 0.000 claims description 4
- 238000006243 chemical reaction Methods 0.000 abstract description 22
- 150000003512 tertiary amines Chemical class 0.000 abstract description 12
- 239000002131 composite material Substances 0.000 abstract 4
- 238000000034 method Methods 0.000 description 10
- ZDHXKXAHOVTTAH-UHFFFAOYSA-N trichlorosilane Chemical compound Cl[SiH](Cl)Cl ZDHXKXAHOVTTAH-UHFFFAOYSA-N 0.000 description 7
- 239000005052 trichlorosilane Substances 0.000 description 7
- 238000002474 experimental method Methods 0.000 description 6
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 4
- 239000012071 phase Substances 0.000 description 4
- GETQZCLCWQTVFV-UHFFFAOYSA-N trimethylamine Chemical compound CN(C)C GETQZCLCWQTVFV-UHFFFAOYSA-N 0.000 description 4
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 3
- 238000009835 boiling Methods 0.000 description 3
- 150000001875 compounds Chemical class 0.000 description 3
- 239000002994 raw material Substances 0.000 description 3
- 239000007787 solid Substances 0.000 description 3
- 238000003756 stirring Methods 0.000 description 3
- 230000000052 comparative effect Effects 0.000 description 2
- MROCJMGDEKINLD-UHFFFAOYSA-N dichlorosilane Chemical compound Cl[SiH2]Cl MROCJMGDEKINLD-UHFFFAOYSA-N 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000004817 gas chromatography Methods 0.000 description 2
- 150000007517 lewis acids Chemical class 0.000 description 2
- RCIGOSUMVYRJEC-UHFFFAOYSA-N n-butyl-n-octyloctan-1-amine Chemical compound CCCCCCCCN(CCCC)CCCCCCCC RCIGOSUMVYRJEC-UHFFFAOYSA-N 0.000 description 2
- -1 silicon hydride compounds Chemical class 0.000 description 2
- JDEUUKYNTHHAQH-UHFFFAOYSA-N 2,2-dimethylbutanamide Chemical compound CCC(C)(C)C(N)=O JDEUUKYNTHHAQH-UHFFFAOYSA-N 0.000 description 1
- YJLUBHOZZTYQIP-UHFFFAOYSA-N 2-[5-[2-(2,3-dihydro-1H-inden-2-ylamino)pyrimidin-5-yl]-1,3,4-oxadiazol-2-yl]-1-(2,4,6,7-tetrahydrotriazolo[4,5-c]pyridin-5-yl)ethanone Chemical compound C1C(CC2=CC=CC=C12)NC1=NC=C(C=N1)C1=NN=C(O1)CC(=O)N1CC2=C(CC1)NN=N2 YJLUBHOZZTYQIP-UHFFFAOYSA-N 0.000 description 1
- VXEGSRKPIUDPQT-UHFFFAOYSA-N 4-[4-(4-methoxyphenyl)piperazin-1-yl]aniline Chemical compound C1=CC(OC)=CC=C1N1CCN(C=2C=CC(N)=CC=2)CC1 VXEGSRKPIUDPQT-UHFFFAOYSA-N 0.000 description 1
- 239000004215 Carbon black (E152) Substances 0.000 description 1
- XZMCDFZZKTWFGF-UHFFFAOYSA-N Cyanamide Chemical compound NC#N XZMCDFZZKTWFGF-UHFFFAOYSA-N 0.000 description 1
- 239000002841 Lewis acid Substances 0.000 description 1
- IPSDYDNAPDFVQB-UHFFFAOYSA-N N-butyl-N-octyldodecan-1-amine Chemical compound CCCCCCCCCCCCN(CCCC)CCCCCCCC IPSDYDNAPDFVQB-UHFFFAOYSA-N 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 238000005054 agglomeration Methods 0.000 description 1
- 230000002776 aggregation Effects 0.000 description 1
- 125000001931 aliphatic group Chemical group 0.000 description 1
- 125000000217 alkyl group Chemical group 0.000 description 1
- 229910021417 amorphous silicon Inorganic materials 0.000 description 1
- 239000007795 chemical reaction product Substances 0.000 description 1
- 238000011437 continuous method Methods 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- 229930195733 hydrocarbon Natural products 0.000 description 1
- 150000002430 hydrocarbons Chemical class 0.000 description 1
- 150000003840 hydrochlorides Chemical class 0.000 description 1
- 239000007791 liquid phase Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- VORBAKHNTVKJNK-UHFFFAOYSA-N n-butyl-n-hexyloctan-1-amine Chemical compound CCCCCCCCN(CCCC)CCCCCC VORBAKHNTVKJNK-UHFFFAOYSA-N 0.000 description 1
- JTRJYFZORBIJMZ-UHFFFAOYSA-N n-hexyl-n-octyloctan-1-amine Chemical compound CCCCCCCCN(CCCCCC)CCCCCCCC JTRJYFZORBIJMZ-UHFFFAOYSA-N 0.000 description 1
- 150000002825 nitriles Chemical class 0.000 description 1
- 239000000047 product Substances 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 229910000077 silane Inorganic materials 0.000 description 1
- 150000004756 silanes Chemical class 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 229910052990 silicon hydride Inorganic materials 0.000 description 1
- 239000005049 silicon tetrachloride Substances 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
Landscapes
- Silicon Compounds (AREA)
- Catalysts (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP6748984A JPS60212232A (ja) | 1984-04-06 | 1984-04-06 | クロルシランの不均化触媒 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP6748984A JPS60212232A (ja) | 1984-04-06 | 1984-04-06 | クロルシランの不均化触媒 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS60212232A true JPS60212232A (ja) | 1985-10-24 |
JPS6333423B2 JPS6333423B2 (en, 2012) | 1988-07-05 |
Family
ID=13346442
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP6748984A Granted JPS60212232A (ja) | 1984-04-06 | 1984-04-06 | クロルシランの不均化触媒 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS60212232A (en, 2012) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS62209085A (ja) * | 1986-03-10 | 1987-09-14 | Ichiro Kijima | ケイ素イソシアネ−トの製造法 |
-
1984
- 1984-04-06 JP JP6748984A patent/JPS60212232A/ja active Granted
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS62209085A (ja) * | 1986-03-10 | 1987-09-14 | Ichiro Kijima | ケイ素イソシアネ−トの製造法 |
Also Published As
Publication number | Publication date |
---|---|
JPS6333423B2 (en, 2012) | 1988-07-05 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
CN100384858C (zh) | 双(叔丁氨基)硅烷的生产和纯化方法 | |
JPS5988492A (ja) | モノマ−またはオリゴマ−のアルコキシシランの連続的製造方法 | |
JP2020522509A (ja) | ゲルマニウムシリコン層の製造のためのトリフェニルゲルミルシランおよびトリクロロシリルトリクロロゲルマン、ならびにトリクロロシリルトリフェニルゲルマンからのその製造方法 | |
US2990434A (en) | Polymerization of acetylenic compounds | |
WO2013042109A1 (en) | Processes for preparing n-ethyl-2-methylpyridinium bromide and n-ethyl-3-methylpyridinium bromide | |
US4644076A (en) | Continuous process for the synthesis of hexamethyldisilazane | |
US6288257B1 (en) | Method for making tetraorganooxysilanes | |
JPS60212232A (ja) | クロルシランの不均化触媒 | |
Devi et al. | Synthesis and Structures of (N3) 2Ga [(CH2) 3NMe2],(N3) Ga [(CH2) 3NMe2] 2 and (N3) 3Ga (NR3)(R= CH3, C2H5) | |
WO2009133929A1 (ja) | ジアルキル亜鉛及びジアルキルアルミニウムモノハライドの製造方法 | |
US2775606A (en) | Reaction of benzene and dichlorosilane trichlorosilane mix | |
JP4856155B2 (ja) | ジアルキルアルミニウムモノハライドの製造方法 | |
JPS5970691A (ja) | 水素含有シリルカ−バメ−ト | |
US4242272A (en) | Substituted phenethyldichlorosilanes and method for producing same | |
US4297499A (en) | Novel disubstituted dichlorosilane and method for producing same | |
JPS6030667B2 (ja) | ジシクロヘキシルジスルフイドの製造法 | |
US3704260A (en) | Purification of dimethylhydrogenchlorosilane | |
JPS6333422B2 (en, 2012) | ||
JPS6327056B2 (en, 2012) | ||
US3054817A (en) | Process for the preparation of organosilicon compounds | |
US3180882A (en) | Process for producing cyanoalkylsilanes | |
US2839557A (en) | Process of preparing halogenohydrocarbon silanes | |
CN118852233A (zh) | 二甲基乙烯基氯硅烷及其制备方法 | |
JPH03118358A (ja) | 第4級アンモニウム・エチルサルフェートの製造法 | |
CN1034359A (zh) | 二氯丁烯异构化的改进方法 |