JPS60211347A - Gaseous hydrogen sensor - Google Patents

Gaseous hydrogen sensor

Info

Publication number
JPS60211347A
JPS60211347A JP6933584A JP6933584A JPS60211347A JP S60211347 A JPS60211347 A JP S60211347A JP 6933584 A JP6933584 A JP 6933584A JP 6933584 A JP6933584 A JP 6933584A JP S60211347 A JPS60211347 A JP S60211347A
Authority
JP
Japan
Prior art keywords
electrode
hydrogen
film
hydrogen gas
sensor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP6933584A
Other languages
Japanese (ja)
Other versions
JPH053539B2 (en
Inventor
Nobuyuki Yoshiike
信幸 吉池
Shigeo Kondo
繁雄 近藤
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP6933584A priority Critical patent/JPS60211347A/en
Publication of JPS60211347A publication Critical patent/JPS60211347A/en
Publication of JPH053539B2 publication Critical patent/JPH053539B2/ja
Granted legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N27/00Investigating or analysing materials by the use of electric, electrochemical, or magnetic means
    • G01N27/02Investigating or analysing materials by the use of electric, electrochemical, or magnetic means by investigating impedance
    • G01N27/04Investigating or analysing materials by the use of electric, electrochemical, or magnetic means by investigating impedance by investigating resistance
    • G01N27/12Investigating or analysing materials by the use of electric, electrochemical, or magnetic means by investigating impedance by investigating resistance of a solid body in dependence upon absorption of a fluid; of a solid body in dependence upon reaction with a fluid, for detecting components in the fluid

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Investigating Or Analyzing Materials By The Use Of Fluid Adsorption Or Reactions (AREA)
  • Investigating Or Analyzing Materials By The Use Of Electric Means (AREA)

Abstract

PURPOSE:To increase the sensitivity of a hydrogen sensor by making use of the decrease in the resistance value of tungsten oxide when gaseous hydrogen is absorbed to the tungsten oxide. CONSTITUTION:The 1st electrode 2 and the 2nd electrode 4 are provided on a substrate 1. The 1st electrode 2 is made of Pt, Pd, Ti, etc. and the 2nd electrode 4 of Pd, etc. A WO3 film 3 is formed on the electrode 2 and under the electrode 4 to 4.0-6.0g/cm<3> packing density and 100-10,000Angstrom film thickness, thereby constituting a hydrogen sensor. When hydrogen is brought into contact with the sensor, the hydrogen is absorbed by the film 3 by the catalytic effect of Pt, etc. of the electrode 4, by which the resistance value thereof is decreased and the resistance 7 between the 1st electrode 2 and the 2nd electrode 4 is decreased. The hydrogen is consequently more absorbed by the WO3 film and the resistance is lower as the concn. of the hydrogen is higher. The hydrogen is thus detected with high sensitivity.

Description

【発明の詳細な説明】 産業上の利用分野 本発明は、水素ガスの気体中に含有される量を電気的信
号として検出する水素ガスセンサーに関する。
DETAILED DESCRIPTION OF THE INVENTION Field of the Invention The present invention relates to a hydrogen gas sensor that detects the amount of hydrogen gas contained in the gas as an electrical signal.

従来例の構成とその問題点 最近、エネルギー需要の増大、環境汚染によるクリーン
エネルギーの要望から、水素ガスをエネルギー源に使用
しようとする要求が高まっている。
Conventional configurations and their problems Recently, due to the increase in energy demand and the desire for clean energy due to environmental pollution, there has been an increasing demand for using hydrogen gas as an energy source.

一方、水素ガスは、−引火点が低く危険性の高いガスで
あることから、水素ガスのガス濡れを検出するガスセン
サーの要求も高まりつつある。
On the other hand, since hydrogen gas is a highly dangerous gas with a low flash point, there is an increasing demand for gas sensors that detect gas wetness of hydrogen gas.

従来、一般に使用されている水素ガスセンサーは、加熱
白金線において水素ガスを燃焼させることによる白金線
の電気抵抗値変化を利用したものである。このようなセ
ンサーにおいては、次の欠点を有していた。すなわち、
水素ガス以外のイソブタン、プロパン等の可燃性のガス
が共存lする場合にも、水素ガスと同様に感知してしま
い誤動作する。そのため水素ガスだけを感知できる信頼
性の高いセンサーが望まれていた。
Conventionally, commonly used hydrogen gas sensors utilize changes in the electrical resistance of a platinum wire caused by burning hydrogen gas in a heated platinum wire. Such a sensor had the following drawbacks. That is,
Even if flammable gases other than hydrogen gas, such as isobutane and propane, coexist, they will be detected in the same way as hydrogen gas and will malfunction. Therefore, there was a need for a highly reliable sensor that could only detect hydrogen gas.

従来より、酸化タングステン(WO2)が白金等の触媒
により水素と反応することが知られている。
It has been known that tungsten oxide (WO2) reacts with hydrogen using a catalyst such as platinum.

その反応機構は、酸化タングステンと白金もしくはパラ
ジウム等の接触界面において、水素ガスが酸化タングス
テン中にInterca/ation(Spi4./o
ver現象とも言う)することであり、その結果、生成
したタングステンブロンズの電気抵抗が、極端に低くな
る。
The reaction mechanism is that hydrogen gas enters tungsten oxide at the contact interface between tungsten oxide and platinum or palladium.
As a result, the electrical resistance of the produced tungsten bronze becomes extremely low.

このような現象を利用したものとして、例えば特開昭5
7−74648号公報には、スパッタ蒸着によるWO3
膜を利用したガスセンサーが記載されている。しかし、
とのWO3膜は多結晶体であり、水素ガスに対して感度
の低いものであった。
For example, Japanese Patent Application Laid-open No. 5 (1973)
7-74648, WO3 by sputter deposition
Gas sensors using membranes have been described. but,
The WO3 film was polycrystalline and had low sensitivity to hydrogen gas.

発明の目的 本発明は、このWO3膜を利用する水素ガスセンサーを
改良して、より感度を高くすることを目的とする。
OBJECTS OF THE INVENTION The present invention aims to improve the hydrogen gas sensor that utilizes this WO3 film to make it more sensitive.

発明の構成 本発明は、充填密度の低いアモルファスWO3膜が水素
ガスに対して高感度であることを見出したことに基づく
もので、第1の電極上にアモルファスWO3膜を形成し
、その上に第2電極として白金もしくはパラジウムの薄
膜を設けたものである。
Structure of the Invention The present invention is based on the discovery that an amorphous WO3 film with a low packing density is highly sensitive to hydrogen gas. A thin film of platinum or palladium is provided as the second electrode.

本発明では、前記のように、触媒金属の白金もしくはパ
ラジウムが第2の電極を兼用しているのなお、WO2の
充填密度は4.0〜6 、Oy/mA、その膜厚は10
0〜10000人が好ましい。
In the present invention, as mentioned above, the catalyst metal platinum or palladium also serves as the second electrode, and the packing density of WO2 is 4.0 to 6 Oy/mA, and the film thickness is 10
Preferably 0 to 10,000 people.

実施例の説明 実施例1 セラミック・ガラス等の絶縁性基板上に、Pt。Description of examples Example 1 Pt on an insulating substrate such as ceramic or glass.

Pd、Ni 、Ti 、Ta、A(1,Aq、AI等の
金属もしくはIn2o3.5no2等の半導体からなる
第1の電極を設け、その上に真空蒸着法によってアモル
ファスWO3膜を形成し、さらにその上にパラジウムを
蒸着によって積層し、第2の電極を設けた。
A first electrode made of a metal such as Pd, Ni, Ti, Ta, A(1, Aq, AI, etc.) or a semiconductor such as In2o3.5no2 is provided, and an amorphous WO3 film is formed thereon by a vacuum evaporation method. Palladium was laminated thereon by vapor deposition, and a second electrode was provided.

第1図は上記のようにして構成した水素ガスセンサーを
示すもので、1は基板、2は第1の電極、3はWO3膜
、4は第2の電極である。WO2の充填密度は5 、4
 p/ctli、その膜厚は3000人であり、第2の
電極の膜厚は500人である。
FIG. 1 shows a hydrogen gas sensor constructed as described above, in which 1 is a substrate, 2 is a first electrode, 3 is a WO3 film, and 4 is a second electrode. The packing density of WO2 is 5,4
p/ctli, its thickness is 3000 mm, and the thickness of the second electrode is 500 mm.

なお、6および6はそれぞれ第1および第2の電極のリ
ード、7は電気抵抗の検出器である。
Note that 6 and 6 are leads for the first and second electrodes, respectively, and 7 is an electrical resistance detector.

上記のセンサー部に一定濃度の水素ガスを吹きつけると
、第1電極と第2電極間の抵抗が大きく変化する。水素
ガス濃度と電極間の抵抗値の関係を第2図に示す。
When a certain concentration of hydrogen gas is blown onto the sensor section, the resistance between the first electrode and the second electrode changes significantly. FIG. 2 shows the relationship between the hydrogen gas concentration and the resistance value between the electrodes.

なお、電気抵抗値の測定は、±50 mV、 60Hz
で行なった。測定値は水素ガス吹きつけ後3秒後の値で
ある。この後、センサー部に空気を吹きつけると、5〜
10秒以内に元の状態に回復した。
The electrical resistance value is measured at ±50 mV, 60Hz.
I did it. The measured value is the value 3 seconds after spraying hydrogen gas. After this, when air is blown onto the sensor part, 5~
It recovered to its original state within 10 seconds.

実施例2 実施例1においてアモルファスWO3膜の蒸着時の真空
度をかえて異なった充填密度の膜を3000人の厚みに
蒸着し、実施例1と同様のセンサーを構成して試験した
Example 2 In Example 1, the degree of vacuum during the deposition of the amorphous WO3 film was changed, and films with different packing densities were deposited to a thickness of 3000 mm, and the same sensor as in Example 1 was constructed and tested.

その結果、充填密度が低くなる膜はど水素ガスに対する
感度が高くなった。しかし、充填密度が低くなるとWo
3膜自身が脆くなり、安定性に欠けることが判かった。
As a result, membranes with lower packing densities were more sensitive to hydrogen gas. However, when the packing density becomes low, Wo
It was found that the 3 films themselves became brittle and lacked stability.

安定で、かつ高感度のVVO3膜としては、充填密度4
o〜6t Of/c、aの範囲のものが好捷しかった。
A stable and highly sensitive VVO3 film has a packing density of 4.
Those in the range of o to 6t Of/c, a were favorable.

さらに、WO3膜の充填密度を5.4y/c?l!と一
定にして蒸着膜厚を変化させて検討した結果、薄い状態
の膜はど高い感度を示した。好ましい膜厚は100〜1
0000人の範囲であった。
Furthermore, the packing density of the WO3 film is 5.4y/c? l! As a result of examining the deposition film thickness while keeping it constant, the thinner film showed the highest sensitivity. The preferred film thickness is 100-1
It was in the range of 0,000 people.

実施例3 実施例1において、第2電極のパラジウムにかえて、白
金を用いたセンサーを作成し、水素ガスに対する感度を
測定した結果、実施例1とほぼ同程度の感度が得られた
Example 3 In Example 1, a sensor was made using platinum instead of palladium for the second electrode, and the sensitivity to hydrogen gas was measured. As a result, almost the same sensitivity as in Example 1 was obtained.

実施例4 実施例1において、第2電極のパラジウムの蒸着膜厚の
異なるセンサーを作成した。パラジウム膜厚が薄い程■
o3への水素ガスのインターカレーション反応は速くな
るが、電極自身の電気抵抗が高くなる。パラジウム膜厚
は100〜1000人が好ましいものであった。白金に
ついても同様であった。
Example 4 In Example 1, sensors were created in which the thickness of the palladium vapor deposition film of the second electrode was different. The thinner the palladium film is, the
Although the intercalation reaction of hydrogen gas to o3 becomes faster, the electrical resistance of the electrode itself becomes higher. The thickness of the palladium film was preferably 100 to 1,000. The same was true for platinum.

発明の効果 以上のように、本発明によれば、構造が簡単で高感度の
安定した水素ガスセンサーが得られる。
Effects of the Invention As described above, according to the present invention, a highly sensitive and stable hydrogen gas sensor with a simple structure can be obtained.

また、このセンサーは、他の可燃性ガスに応答すること
がないので、信頼性の高いものである・
Additionally, this sensor is highly reliable as it does not respond to other flammable gases.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は本発明の水素ガスセンサーの実施例を示す要部
を断面にした図、第2図は水素ガス濃度とセンサーの電
気抵抗値の関係を示す図である。 1・・・・・基板、2・・・・・・第1の電極、3・・
・・・・wO3膜、4・・・・・・第2の電極。 代理人の氏名 弁理士 中 尾 敏 男 ほか1名第1
図 第2図 He JLjll tpprn)
FIG. 1 is a cross-sectional view of the main part of a hydrogen gas sensor according to an embodiment of the present invention, and FIG. 2 is a diagram showing the relationship between the hydrogen gas concentration and the electrical resistance value of the sensor. 1...Substrate, 2...First electrode, 3...
... wO3 film, 4... second electrode. Name of agent: Patent attorney Toshio Nakao and 1 other person No. 1
Figure 2He JLjll tpprn)

Claims (3)

【特許請求の範囲】[Claims] (1)第1の電極上にアモルファス酸化タングステン層
を設け、さらにその上に第2電極として白金もしくはパ
ラジウムの薄膜層を積層したことを特徴とする水素ガス
センサー。
(1) A hydrogen gas sensor characterized in that an amorphous tungsten oxide layer is provided on a first electrode, and a platinum or palladium thin film layer is further laminated thereon as a second electrode.
(2)前記酸化タングステン層が、充填密度4.0〜6
 、Of/ctAで、かつ膜厚100〜10000人で
ある特許請求の範囲第1項記載の水素ガスセンサー。
(2) The tungsten oxide layer has a packing density of 4.0 to 6.
, Of/ctA, and a film thickness of 100 to 10,000. The hydrogen gas sensor according to claim 1.
(3)前記白金もしくはパラジウムの膜厚が100〜1
ooO人である特許請求の範囲第2項記載の水素ガスセ
ンサー。
(3) The thickness of the platinum or palladium film is 100 to 1
The hydrogen gas sensor according to claim 2, which is an ooO person.
JP6933584A 1984-04-06 1984-04-06 Gaseous hydrogen sensor Granted JPS60211347A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP6933584A JPS60211347A (en) 1984-04-06 1984-04-06 Gaseous hydrogen sensor

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6933584A JPS60211347A (en) 1984-04-06 1984-04-06 Gaseous hydrogen sensor

Publications (2)

Publication Number Publication Date
JPS60211347A true JPS60211347A (en) 1985-10-23
JPH053539B2 JPH053539B2 (en) 1993-01-18

Family

ID=13399574

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6933584A Granted JPS60211347A (en) 1984-04-06 1984-04-06 Gaseous hydrogen sensor

Country Status (1)

Country Link
JP (1) JPS60211347A (en)

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE4440572A1 (en) * 1994-11-14 1996-05-15 Fraunhofer Ges Forschung Switchable coating structure
JP2007071866A (en) * 2005-08-10 2007-03-22 Tokyo Univ Of Science Film for gas sensor, element for gas sensor and method for manufacturing the element for gas sensor
JP2011021911A (en) * 2009-07-13 2011-02-03 Ulvac Japan Ltd Hydrogen gas sensor and method of manufacturing the same
JP2011203256A (en) * 2010-03-25 2011-10-13 Stichting Imec Nederland Amorphous thin film for sensing
WO2018123674A1 (en) * 2016-12-28 2018-07-05 パナソニックIpマネジメント株式会社 Gas detection device, gas sensor system, fuel cell vehicle, and hydrogen detection method
WO2018123673A1 (en) * 2016-12-28 2018-07-05 パナソニックIpマネジメント株式会社 Gas detection device, gas detection system, fuel cell vehicle, and gas detection method
US10408779B2 (en) 2016-03-25 2019-09-10 Panasonic Intellectual Property Management Co., Ltd. Gas sensor including metal oxide layer and hydrogen detection method using gas sensor
JP2019200071A (en) * 2018-05-14 2019-11-21 キヤノン株式会社 Reducing gas detection material, and reducing gas detection sensor

Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS53141098A (en) * 1977-05-16 1978-12-08 Toshiba Corp Gas sensing element
JPS53141097A (en) * 1977-05-16 1978-12-08 Toshiba Corp Gas sensing element
JPS53141096A (en) * 1977-05-16 1978-12-08 Toshiba Corp Gas sensing element
JPS55124058A (en) * 1979-03-09 1980-09-24 Gen Motors Corp Titanium dioxide exhaust sensor
JPS5690250A (en) * 1979-12-22 1981-07-22 Matsushita Electric Works Ltd Detection element of combustible gas
JPS5774648A (en) * 1980-08-28 1982-05-10 Siemens Ag Selective thin film gas sensor and manufacture thereof
JPS5857702A (en) * 1981-09-30 1983-04-06 三洋電機株式会社 Moisture sensor
JPS58182545A (en) * 1982-04-21 1983-10-25 Hitachi Ltd Detecting element of gaseous carbon monoxide

Patent Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS53141098A (en) * 1977-05-16 1978-12-08 Toshiba Corp Gas sensing element
JPS53141097A (en) * 1977-05-16 1978-12-08 Toshiba Corp Gas sensing element
JPS53141096A (en) * 1977-05-16 1978-12-08 Toshiba Corp Gas sensing element
JPS55124058A (en) * 1979-03-09 1980-09-24 Gen Motors Corp Titanium dioxide exhaust sensor
JPS5690250A (en) * 1979-12-22 1981-07-22 Matsushita Electric Works Ltd Detection element of combustible gas
JPS5774648A (en) * 1980-08-28 1982-05-10 Siemens Ag Selective thin film gas sensor and manufacture thereof
JPS5857702A (en) * 1981-09-30 1983-04-06 三洋電機株式会社 Moisture sensor
JPS58182545A (en) * 1982-04-21 1983-10-25 Hitachi Ltd Detecting element of gaseous carbon monoxide

Cited By (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE4440572A1 (en) * 1994-11-14 1996-05-15 Fraunhofer Ges Forschung Switchable coating structure
JP2007071866A (en) * 2005-08-10 2007-03-22 Tokyo Univ Of Science Film for gas sensor, element for gas sensor and method for manufacturing the element for gas sensor
JP2011021911A (en) * 2009-07-13 2011-02-03 Ulvac Japan Ltd Hydrogen gas sensor and method of manufacturing the same
JP2011203256A (en) * 2010-03-25 2011-10-13 Stichting Imec Nederland Amorphous thin film for sensing
US10408779B2 (en) 2016-03-25 2019-09-10 Panasonic Intellectual Property Management Co., Ltd. Gas sensor including metal oxide layer and hydrogen detection method using gas sensor
US10591432B2 (en) 2016-03-25 2020-03-17 Panasonic Intellectual Property Management Co., Ltd. Hydrogen detection method using gas sensor having a metal oxide layer
WO2018123674A1 (en) * 2016-12-28 2018-07-05 パナソニックIpマネジメント株式会社 Gas detection device, gas sensor system, fuel cell vehicle, and hydrogen detection method
WO2018123673A1 (en) * 2016-12-28 2018-07-05 パナソニックIpマネジメント株式会社 Gas detection device, gas detection system, fuel cell vehicle, and gas detection method
JPWO2018123674A1 (en) * 2016-12-28 2019-10-31 パナソニックIpマネジメント株式会社 Gas detection device, gas sensor system, fuel cell vehicle, and hydrogen detection method
JPWO2018123673A1 (en) * 2016-12-28 2019-10-31 パナソニックIpマネジメント株式会社 Gas detection device, gas detection system, fuel cell vehicle, and gas detection method
JP2019200071A (en) * 2018-05-14 2019-11-21 キヤノン株式会社 Reducing gas detection material, and reducing gas detection sensor

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