JPS60208829A - 位置検出装置 - Google Patents
位置検出装置Info
- Publication number
- JPS60208829A JPS60208829A JP59063173A JP6317384A JPS60208829A JP S60208829 A JPS60208829 A JP S60208829A JP 59063173 A JP59063173 A JP 59063173A JP 6317384 A JP6317384 A JP 6317384A JP S60208829 A JPS60208829 A JP S60208829A
- Authority
- JP
- Japan
- Prior art keywords
- mask
- wafer
- position detection
- electron beam
- optical system
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Electron Beam Exposure (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP59063173A JPS60208829A (ja) | 1984-04-02 | 1984-04-02 | 位置検出装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP59063173A JPS60208829A (ja) | 1984-04-02 | 1984-04-02 | 位置検出装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS60208829A true JPS60208829A (ja) | 1985-10-21 |
| JPH0582731B2 JPH0582731B2 (enExample) | 1993-11-22 |
Family
ID=13221601
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP59063173A Granted JPS60208829A (ja) | 1984-04-02 | 1984-04-02 | 位置検出装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS60208829A (enExample) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6420619A (en) * | 1987-07-15 | 1989-01-24 | Toshiba Corp | Electron beam aligner |
| JP2013140844A (ja) * | 2011-12-28 | 2013-07-18 | Canon Inc | 描画装置及び物品の製造方法 |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5271985A (en) * | 1975-12-08 | 1977-06-15 | Siemens Ag | Apparatus for making iluminating pattern for specimen |
-
1984
- 1984-04-02 JP JP59063173A patent/JPS60208829A/ja active Granted
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5271985A (en) * | 1975-12-08 | 1977-06-15 | Siemens Ag | Apparatus for making iluminating pattern for specimen |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6420619A (en) * | 1987-07-15 | 1989-01-24 | Toshiba Corp | Electron beam aligner |
| JP2013140844A (ja) * | 2011-12-28 | 2013-07-18 | Canon Inc | 描画装置及び物品の製造方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0582731B2 (enExample) | 1993-11-22 |
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