JPS60200249A - 感光性積層体 - Google Patents

感光性積層体

Info

Publication number
JPS60200249A
JPS60200249A JP5651584A JP5651584A JPS60200249A JP S60200249 A JPS60200249 A JP S60200249A JP 5651584 A JP5651584 A JP 5651584A JP 5651584 A JP5651584 A JP 5651584A JP S60200249 A JPS60200249 A JP S60200249A
Authority
JP
Japan
Prior art keywords
photosensitive
layer
cover film
photosensitive layer
film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP5651584A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0327109B2 (enrdf_load_stackoverflow
Inventor
Akira Tomita
晃 富田
Toshiaki Fujimura
藤村 敏明
Michiatsu Kawamura
河村 通篤
Masaru Nanhei
南平 勝
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toyobo Co Ltd
Original Assignee
Toyobo Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toyobo Co Ltd filed Critical Toyobo Co Ltd
Priority to JP5651584A priority Critical patent/JPS60200249A/ja
Publication of JPS60200249A publication Critical patent/JPS60200249A/ja
Publication of JPH0327109B2 publication Critical patent/JPH0327109B2/ja
Granted legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/09Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/092Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by backside coating or layers, by lubricating-slip layers or means, by oxygen barrier layers or by stripping-release layers or means

Landscapes

  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
JP5651584A 1984-03-23 1984-03-23 感光性積層体 Granted JPS60200249A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP5651584A JPS60200249A (ja) 1984-03-23 1984-03-23 感光性積層体

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5651584A JPS60200249A (ja) 1984-03-23 1984-03-23 感光性積層体

Publications (2)

Publication Number Publication Date
JPS60200249A true JPS60200249A (ja) 1985-10-09
JPH0327109B2 JPH0327109B2 (enrdf_load_stackoverflow) 1991-04-12

Family

ID=13029256

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5651584A Granted JPS60200249A (ja) 1984-03-23 1984-03-23 感光性積層体

Country Status (1)

Country Link
JP (1) JPS60200249A (enrdf_load_stackoverflow)

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62223747A (ja) * 1986-03-25 1987-10-01 Toyobo Co Ltd 画像形成板
JPH01287671A (ja) * 1988-05-16 1989-11-20 Tokyo Ohka Kogyo Co Ltd 感光性樹脂版
JPH02113254A (ja) * 1988-08-30 1990-04-25 E I Du Pont De Nemours & Co フレキソ印刷版用の可塑化されたポリビニルアルコール剥離層
JPH05501314A (ja) * 1989-10-31 1993-03-11 イー・アイ・デュポン・ドゥ・ヌムール・アンド・カンパニー 水性または半水性で処理可能なフレキソグラフ印刷板用のレリーズ層
WO1996034317A1 (en) * 1995-04-28 1996-10-31 Polaroid Corporation On-press removable overcoat for lithographic printing plates
US5786127A (en) * 1996-08-15 1998-07-28 Western Litho Plate & Supply Co. Photosensitive element having an overcoat which increases photo-speed and is substantially impermeable to oxygen
JP2013117741A (ja) * 2011-09-09 2013-06-13 Toyobo Co Ltd 水現像性感光性樹脂積層体
US20150221881A1 (en) * 2012-10-19 2015-08-06 Fujifilm Corporation Resin composition for forming protective film, protective film, pattern forming method, method for manufacturing electronic device, and electronic device

Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62223747A (ja) * 1986-03-25 1987-10-01 Toyobo Co Ltd 画像形成板
JPH01287671A (ja) * 1988-05-16 1989-11-20 Tokyo Ohka Kogyo Co Ltd 感光性樹脂版
JPH02113254A (ja) * 1988-08-30 1990-04-25 E I Du Pont De Nemours & Co フレキソ印刷版用の可塑化されたポリビニルアルコール剥離層
JPH05501314A (ja) * 1989-10-31 1993-03-11 イー・アイ・デュポン・ドゥ・ヌムール・アンド・カンパニー 水性または半水性で処理可能なフレキソグラフ印刷板用のレリーズ層
WO1996034317A1 (en) * 1995-04-28 1996-10-31 Polaroid Corporation On-press removable overcoat for lithographic printing plates
US5677108A (en) * 1995-04-28 1997-10-14 Polaroid Corporation On-press removable quenching overcoat for lithographic plates
US5786127A (en) * 1996-08-15 1998-07-28 Western Litho Plate & Supply Co. Photosensitive element having an overcoat which increases photo-speed and is substantially impermeable to oxygen
JP2013117741A (ja) * 2011-09-09 2013-06-13 Toyobo Co Ltd 水現像性感光性樹脂積層体
US20150221881A1 (en) * 2012-10-19 2015-08-06 Fujifilm Corporation Resin composition for forming protective film, protective film, pattern forming method, method for manufacturing electronic device, and electronic device
US9601706B2 (en) * 2012-10-19 2017-03-21 Fujifilm Corporation Resin composition for forming protective film, protective film, pattern forming method, method for manufacturing electronic device, and electronic device

Also Published As

Publication number Publication date
JPH0327109B2 (enrdf_load_stackoverflow) 1991-04-12

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Legal Events

Date Code Title Description
EXPY Cancellation because of completion of term