JPS60193965U - Vacuum deposition equipment - Google Patents
Vacuum deposition equipmentInfo
- Publication number
- JPS60193965U JPS60193965U JP8279784U JP8279784U JPS60193965U JP S60193965 U JPS60193965 U JP S60193965U JP 8279784 U JP8279784 U JP 8279784U JP 8279784 U JP8279784 U JP 8279784U JP S60193965 U JPS60193965 U JP S60193965U
- Authority
- JP
- Japan
- Prior art keywords
- deposition equipment
- vacuum deposition
- substrate
- holder
- vapor deposition
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Physical Vapour Deposition (AREA)
- Electrodes Of Semiconductors (AREA)
- Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
Abstract
(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.
Description
第１図は本考案の一実施例を示す構成図、第２図は従来
の方法による構成図である。
１・・・・・・蒸着室、２・・・・・・基板ホルダー、
３・・・・・・基板、４・・・・・・蒸着ヒーター、５
・・・・・・電極（蒸着）、６．７・・・・・・シャッ
ター板、８・・・・・・膜厚モニターヘッド、９・・・
・・・基板加熱用ランプヒーター、１０・・・・・・主
バルブ、１１・・・・・・主ポンプ、１２・・・・・・
油回転真空ポンプ、１３・・・・・・ソース、１４・・
・・・・荒引バルブ、１５・・・・・・シャッター回転
軸。FIG. 1 is a block diagram showing an embodiment of the present invention, and FIG. 2 is a block diagram showing a conventional method. 1... Vapor deposition chamber, 2... Substrate holder,
3... Substrate, 4... Evaporation heater, 5
... Electrode (vapor deposition), 6.7 ... Shutter plate, 8 ... Film thickness monitor head, 9 ...
...Lamp heater for substrate heating, 10...Main valve, 11...Main pump, 12...
Oil rotary vacuum pump, 13... Source, 14...
... Roughing valve, 15 ... Shutter rotation axis.
Claims (1)
の上方にソースの加熱源を設け、蒸着されるべき基板の
位置と対向した反対側に膜厚モニターを装備したことを
特徴とする真空蒸着装置。A vacuum characterized in that a substrate holder is rotatably disposed at the bottom of the evaporation chamber, a heating source is provided above the holder, and a film thickness monitor is equipped on the opposite side facing the position of the substrate to be evaporated. Vapor deposition equipment.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8279784U JPS60193965U (en) | 1984-06-04 | 1984-06-04 | Vacuum deposition equipment |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8279784U JPS60193965U (en) | 1984-06-04 | 1984-06-04 | Vacuum deposition equipment |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS60193965U true JPS60193965U (en) | 1985-12-24 |
Family
ID=30630835
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP8279784U Pending JPS60193965U (en) | 1984-06-04 | 1984-06-04 | Vacuum deposition equipment |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS60193965U (en) |
-
1984
- 1984-06-04 JP JP8279784U patent/JPS60193965U/en active Pending
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