JPS60182439A - クロムマスク素材 - Google Patents
クロムマスク素材Info
- Publication number
- JPS60182439A JPS60182439A JP59038281A JP3828184A JPS60182439A JP S60182439 A JPS60182439 A JP S60182439A JP 59038281 A JP59038281 A JP 59038281A JP 3828184 A JP3828184 A JP 3828184A JP S60182439 A JPS60182439 A JP S60182439A
- Authority
- JP
- Japan
- Prior art keywords
- layer
- chromium
- oxygen
- nitrogen
- chromium oxide
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 title claims description 43
- 229910052804 chromium Inorganic materials 0.000 title claims description 24
- 239000011651 chromium Substances 0.000 title claims description 24
- 239000000463 material Substances 0.000 title description 24
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims abstract description 56
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims abstract description 38
- 239000001301 oxygen Substances 0.000 claims abstract description 38
- 229910052760 oxygen Inorganic materials 0.000 claims abstract description 38
- 229910052757 nitrogen Inorganic materials 0.000 claims abstract description 28
- WGLPBDUCMAPZCE-UHFFFAOYSA-N Trioxochromium Chemical compound O=[Cr](=O)=O WGLPBDUCMAPZCE-UHFFFAOYSA-N 0.000 claims abstract description 25
- 229910000423 chromium oxide Inorganic materials 0.000 claims abstract description 25
- 239000000203 mixture Substances 0.000 claims abstract description 19
- CXOWYMLTGOFURZ-UHFFFAOYSA-N azanylidynechromium Chemical compound [Cr]#N CXOWYMLTGOFURZ-UHFFFAOYSA-N 0.000 claims abstract description 11
- 238000005530 etching Methods 0.000 abstract description 43
- 230000003287 optical effect Effects 0.000 abstract description 8
- 238000009792 diffusion process Methods 0.000 abstract description 7
- 230000000694 effects Effects 0.000 abstract description 7
- 229910001415 sodium ion Inorganic materials 0.000 abstract description 7
- 239000010410 layer Substances 0.000 description 59
- 239000010408 film Substances 0.000 description 27
- 239000000758 substrate Substances 0.000 description 14
- 239000002253 acid Substances 0.000 description 11
- 230000007547 defect Effects 0.000 description 9
- 239000007789 gas Substances 0.000 description 9
- 238000000034 method Methods 0.000 description 6
- 150000004767 nitrides Chemical class 0.000 description 6
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 5
- 125000004429 atom Chemical group 0.000 description 4
- 229910052751 metal Inorganic materials 0.000 description 4
- 239000002184 metal Substances 0.000 description 4
- 239000007921 spray Substances 0.000 description 4
- 230000000052 comparative effect Effects 0.000 description 3
- 230000007423 decrease Effects 0.000 description 3
- 230000006866 deterioration Effects 0.000 description 3
- 239000011521 glass Substances 0.000 description 3
- 239000002699 waste material Substances 0.000 description 3
- 239000012298 atmosphere Substances 0.000 description 2
- 238000004140 cleaning Methods 0.000 description 2
- 238000005520 cutting process Methods 0.000 description 2
- QDOXWKRWXJOMAK-UHFFFAOYSA-N dichromium trioxide Chemical group O=[Cr]O[Cr]=O QDOXWKRWXJOMAK-UHFFFAOYSA-N 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 238000000206 photolithography Methods 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 238000004544 sputter deposition Methods 0.000 description 2
- 238000003860 storage Methods 0.000 description 2
- 238000005406 washing Methods 0.000 description 2
- 230000005856 abnormality Effects 0.000 description 1
- 150000007513 acids Chemical class 0.000 description 1
- 239000012790 adhesive layer Substances 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 239000007844 bleaching agent Substances 0.000 description 1
- 239000005388 borosilicate glass Substances 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- UOUJSJZBMCDAEU-UHFFFAOYSA-N chromium(3+);oxygen(2-) Chemical class [O-2].[O-2].[O-2].[Cr+3].[Cr+3] UOUJSJZBMCDAEU-UHFFFAOYSA-N 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000002845 discoloration Methods 0.000 description 1
- 238000004090 dissolution Methods 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 230000001939 inductive effect Effects 0.000 description 1
- 238000007733 ion plating Methods 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 238000001755 magnetron sputter deposition Methods 0.000 description 1
- 239000011259 mixed solution Substances 0.000 description 1
- 125000004430 oxygen atom Chemical group O* 0.000 description 1
- 230000002093 peripheral effect Effects 0.000 description 1
- 230000002265 prevention Effects 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 238000005546 reactive sputtering Methods 0.000 description 1
- 230000001846 repelling effect Effects 0.000 description 1
- 239000005361 soda-lime glass Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 235000011149 sulphuric acid Nutrition 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 238000007738 vacuum evaporation Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/54—Absorbers, e.g. of opaque materials
- G03F1/58—Absorbers, e.g. of opaque materials having two or more different absorber layers, e.g. stacked multilayer absorbers
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP59038281A JPS60182439A (ja) | 1984-02-29 | 1984-02-29 | クロムマスク素材 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP59038281A JPS60182439A (ja) | 1984-02-29 | 1984-02-29 | クロムマスク素材 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS60182439A true JPS60182439A (ja) | 1985-09-18 |
| JPS6322575B2 JPS6322575B2 (enrdf_load_stackoverflow) | 1988-05-12 |
Family
ID=12520929
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP59038281A Granted JPS60182439A (ja) | 1984-02-29 | 1984-02-29 | クロムマスク素材 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS60182439A (enrdf_load_stackoverflow) |
Cited By (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4720442A (en) * | 1985-05-28 | 1988-01-19 | Asahi Glass Company Ltd. | Photomask blank and photomask |
| JPH05297570A (ja) * | 1992-04-20 | 1993-11-12 | Toppan Printing Co Ltd | フォトマスクブランクの製造方法 |
| WO2007010935A1 (ja) * | 2005-07-21 | 2007-01-25 | Shin-Etsu Chemical Co., Ltd. | フォトマスクブランクおよびフォトマスクならびにこれらの製造方法 |
| JP2011221377A (ja) * | 2010-04-13 | 2011-11-04 | Ulvac Seimaku Kk | マスクブランクス、フォトマスクの製造方法及びフォトマスク |
| US8507155B2 (en) | 2008-03-31 | 2013-08-13 | Hoya Corporation | Photomask blank, photomask, and method for manufacturing photomask blank |
| JP5562834B2 (ja) * | 2008-03-31 | 2014-07-30 | Ｈｏｙａ株式会社 | フォトマスクブランク、フォトマスクおよびフォトマスクブランクの製造方法 |
| WO2020241116A1 (ja) * | 2019-05-31 | 2020-12-03 | 信越化学工業株式会社 | フォトマスクブランク、フォトマスクの製造方法及びフォトマスク |
| JP2022160364A (ja) * | 2021-04-06 | 2022-10-19 | 信越化学工業株式会社 | フォトマスクブランク、フォトマスクの製造方法及びフォトマスク |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS57104141A (en) * | 1980-12-22 | 1982-06-29 | Dainippon Printing Co Ltd | Photomask and photomask substrate |
| JPS5831336A (ja) * | 1981-08-19 | 1983-02-24 | Konishiroku Photo Ind Co Ltd | ホトマスク素材 |
-
1984
- 1984-02-29 JP JP59038281A patent/JPS60182439A/ja active Granted
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS57104141A (en) * | 1980-12-22 | 1982-06-29 | Dainippon Printing Co Ltd | Photomask and photomask substrate |
| JPS5831336A (ja) * | 1981-08-19 | 1983-02-24 | Konishiroku Photo Ind Co Ltd | ホトマスク素材 |
Cited By (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4720442A (en) * | 1985-05-28 | 1988-01-19 | Asahi Glass Company Ltd. | Photomask blank and photomask |
| JPH05297570A (ja) * | 1992-04-20 | 1993-11-12 | Toppan Printing Co Ltd | フォトマスクブランクの製造方法 |
| WO2007010935A1 (ja) * | 2005-07-21 | 2007-01-25 | Shin-Etsu Chemical Co., Ltd. | フォトマスクブランクおよびフォトマスクならびにこれらの製造方法 |
| US7771893B2 (en) | 2005-07-21 | 2010-08-10 | Shin-Etsu Chemical Co., Ltd. | Photomask blank, photomask and fabrication method thereof |
| JP5562835B2 (ja) * | 2008-03-31 | 2014-07-30 | Ｈｏｙａ株式会社 | フォトマスクブランク、フォトマスクおよびフォトマスクブランクの製造方法 |
| US8507155B2 (en) | 2008-03-31 | 2013-08-13 | Hoya Corporation | Photomask blank, photomask, and method for manufacturing photomask blank |
| JP5562834B2 (ja) * | 2008-03-31 | 2014-07-30 | Ｈｏｙａ株式会社 | フォトマスクブランク、フォトマスクおよびフォトマスクブランクの製造方法 |
| US9075314B2 (en) | 2008-03-31 | 2015-07-07 | Hoya Corporation | Photomask blank, photomask, and method for manufacturing photomask blank |
| JP2011221377A (ja) * | 2010-04-13 | 2011-11-04 | Ulvac Seimaku Kk | マスクブランクス、フォトマスクの製造方法及びフォトマスク |
| WO2020241116A1 (ja) * | 2019-05-31 | 2020-12-03 | 信越化学工業株式会社 | フォトマスクブランク、フォトマスクの製造方法及びフォトマスク |
| JP2020197566A (ja) * | 2019-05-31 | 2020-12-10 | 信越化学工業株式会社 | フォトマスクブランク、フォトマスクの製造方法及びフォトマスク |
| US11971653B2 (en) | 2019-05-31 | 2024-04-30 | Shin-Etsu Chemical Co., Ltd. | Photomask blank, method for producing photomask, and photomask |
| JP2022160364A (ja) * | 2021-04-06 | 2022-10-19 | 信越化学工業株式会社 | フォトマスクブランク、フォトマスクの製造方法及びフォトマスク |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6322575B2 (enrdf_load_stackoverflow) | 1988-05-12 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| EXPY | Cancellation because of completion of term |