JPS60177421A - Magneto-resistance effect head - Google Patents

Magneto-resistance effect head

Info

Publication number
JPS60177421A
JPS60177421A JP3392984A JP3392984A JPS60177421A JP S60177421 A JPS60177421 A JP S60177421A JP 3392984 A JP3392984 A JP 3392984A JP 3392984 A JP3392984 A JP 3392984A JP S60177421 A JPS60177421 A JP S60177421A
Authority
JP
Japan
Prior art keywords
magnetic field
signal magnetic
field
slit
magneto
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP3392984A
Other languages
Japanese (ja)
Other versions
JPH0441413B2 (en
Inventor
Kohei Izawa
井沢 康平
Mikio Kitamura
幹夫 北村
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Renesas Semiconductor Manufacturing Co Ltd
Kansai Nippon Electric Co Ltd
Original Assignee
Renesas Semiconductor Manufacturing Co Ltd
Kansai Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Renesas Semiconductor Manufacturing Co Ltd, Kansai Nippon Electric Co Ltd filed Critical Renesas Semiconductor Manufacturing Co Ltd
Priority to JP3392984A priority Critical patent/JPS60177421A/en
Publication of JPS60177421A publication Critical patent/JPS60177421A/en
Publication of JPH0441413B2 publication Critical patent/JPH0441413B2/ja
Granted legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11BINFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/127Structure or manufacture of heads, e.g. inductive
    • G11B5/33Structure or manufacture of flux-sensitive heads, i.e. for reproduction only; Combination of such heads with means for recording or erasing only
    • G11B5/39Structure or manufacture of flux-sensitive heads, i.e. for reproduction only; Combination of such heads with means for recording or erasing only using magneto-resistive devices or effects
    • G11B5/3903Structure or manufacture of flux-sensitive heads, i.e. for reproduction only; Combination of such heads with means for recording or erasing only using magneto-resistive devices or effects using magnetic thin film layers or their effects, the films being part of integrated structures

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Magnetic Heads (AREA)

Abstract

PURPOSE:To enable efficient reproduction even with a signal magnetic field of an extremely short wavelength by increasing the width of the part near the juncture of leads connecting to both ends of an MR elememt and forming a fine slit in proximity to the MR element so as to face said elememt. CONSTITUTION:Lead patterns 23, 24 consisting of conductors are connected to both ends 21, 22 of a magneto-resistance effect element (MR element) 20 and the parts 25, 26 near the juncture are widened in the width and an extremely fine slit S is formed therein in proximity to the element 20 so as to face the element. A magnetic field in the direction where the demagnetizing field is negated is generated in said space S. Reproducing efficiency is decreased by the demagnetizing field in the short wavelength signal magnetic field of high density recording where the change in the signal magnetic field is acute in the prior art but the effect of negating the demagnetizing field is generated by the formation of the slit S, by which the efficient reproduction is made possible even in the signal magnetic field of an extreme short recording wavelength.

Description

【発明の詳細な説明】 技術分野 この発明は、磁束応答型である磁気抵抗効果ヘッドの再
生効率向上に関する技術である。
DETAILED DESCRIPTION OF THE INVENTION Technical Field The present invention relates to a technique for improving the reproduction efficiency of a magnetic flux responsive magnetoresistive head.

技術的背景 POM磁気記録再生等に好適な、薄膜磁気ヘッドは、バ
ルク型のリングヘッドと同様な誘導型ヘッドと、磁束応
答型の磁気抵抗効果ヘッドとに分類きれる。磁気抵抗効
果ヘッドは、金属強磁性体全素子とすると、その比抵抗
ρが、外部磁場に応じて変化する自らの磁化Mと、それ
に流f N、流工とのなす角度θによって変化する磁気
抵抗効果(Magneto−Resistance E
ffect )を利用したもので、一般にMRヘヘラと
呼ばれているので、以降はMRヘヘラと記すこ々にする
。さて、MRヘヘラは、第1図に示すように、金属強硼
性体片1f素子とし、その両端部2.3全外部より通電
するり一ド4.5と接続しておき、素子IK流す電流1
と直交方向に、磁界の強さHの外部磁場全印加すると、
素子1の磁化Mが電流■となす角度全θとし、リード4
とリード50両端間の抵抗を比抵抗ρとすると、先述の
磁気抵抗効果によって、次のように示される。
Technical Background Thin film magnetic heads suitable for POM magnetic recording/reproducing etc. can be classified into inductive heads similar to bulk ring heads and magnetic flux responsive magnetoresistive heads. When a magnetoresistive head is made entirely of metal ferromagnetic elements, its resistivity ρ changes depending on its own magnetization M, which changes in response to an external magnetic field, and the angle θ formed by its own magnetization, fN, and flow. Magneto-Resistance E
ffect) and is generally called MR Hehera, so it will be referred to as MR Hehera from now on. Now, as shown in Fig. 1, the MR Hehera is a 1f element made of a strong metal material, and both ends 2.3 are connected to a lead 4.5 to which electricity is applied from the entire outside, and the element IK is applied. current 1
When a full external magnetic field of field strength H is applied in the direction perpendicular to ,
Let the angle between the magnetization M of element 1 and the current ■ be the total θ, and lead 4
Letting the resistance between both ends of the lead 50 be the specific resistance ρ, it is expressed as follows due to the above-mentioned magnetoresistive effect.

すなわち、ρ(の−ρ/cos2θ十ρ土5in2θ#
ρ2−Δρsin 2θ ・・・・・・ ・−(I)但
し ρ7は電流XV平行な比抵抗成分p□Ir1S流工
に垂直な比抵抗成分でありΔρ−ρ7−ρ上と表わした
ものである。
That is, ρ(-ρ/cos2θ 10ρ soil 5in2θ#
ρ2−Δρsin 2θ ・・・・・−(I) However, ρ7 is the resistivity component parallel to the current XV and the resistivity component perpendicular to the flow of p□Ir1S, which is expressed as above Δρ−ρ7−ρ .

そして式(1)で示される比抵抗ρ(ののパラメータで
ある角度θは磁界Hの影響全受けるので、磁界Hと比抵
抗ρの関係全表−f、第2図の曲線7で示される。この
曲線7かも判るように、ρ−H関係は、線形的変化をす
る範囲8は狭いので、一般に外部磁場には、強さHBの
バイアス磁界全常時印加している。したがって、記録媒
体より、強さがHlで曲線9で示す信号磁界全加えると
、忠実に曲線lOで示す比抵抗ρの変化として再生され
る。
Since the angle θ, which is a parameter of the resistivity ρ shown in equation (1), is fully influenced by the magnetic field H, the relationship between the magnetic field H and the resistivity ρ is expressed by curve 7 in Figure 2. As can be seen from this curve 7, the range 8 in which the ρ-H relationship changes linearly is narrow, so generally a bias magnetic field with a strength HB is constantly applied to the external magnetic field. , when the entire signal magnetic field shown by curve 9 with intensity Hl is applied, it is faithfully reproduced as a change in resistivity ρ shown by curve lO.

ところで、MRヘヘラは、」二記の通り素子1に対して
、バイアス磁界HBt印加するために、第1図に示すよ
うに、素子lの幅方向に反磁界Hdt生じることになる
。そしてその反磁界Hdの大きさけ、素子lの中央部よ
り幅方向端部へ向う程大きくなるので、MRヘヘラにお
ける実際のバイアス磁界HB′の分布は、第3図に示す
曲線11のような上方に凸となり一定ではない。よって
、信号磁界■(↓の変化が急な、つまり記録密度が高い
短波長信号磁界H1では、再生効率が低下してしまう欠
点があった。
By the way, since the MR heherer applies a bias magnetic field HBt to the element 1 as described in "2," a demagnetizing field Hdt is generated in the width direction of the element 1, as shown in FIG. Since the magnitude of the demagnetizing field Hd increases from the central part of the element l toward the ends in the width direction, the actual distribution of the bias magnetic field HB' in the MR heherer is in the upward direction as shown in the curve 11 shown in FIG. It is convex and not constant. Therefore, in a short wavelength signal magnetic field H1 in which the signal magnetic field (↓) changes rapidly, that is, the recording density is high, there is a drawback that the reproduction efficiency decreases.

発明の目的 この発明は、上記の短記録波長rなるほど問題となる反
磁界の影響によるMR−ラドの再生出力低下全解消する
こと全目的とするものである。
OBJECTS OF THE INVENTION It is an object of the present invention to completely eliminate the reduction in reproduction output of MR-RAD due to the influence of the demagnetizing field, which becomes more problematic as the recording wavelength r becomes shorter.

発明の構成 この発明は、上述の目的全実現するために、MR素子の
両端に接続するリードの、接続部近傍部の幅全拡げて、
MR素子に近接対向させ、極めて細いスリットを形成さ
せること全特徴としている。
Structure of the Invention In order to achieve all of the above-mentioned objects, the present invention expands the width of the lead connected to both ends of the MR element in the vicinity of the connection part,
The main feature is that the slit is closely opposed to the MR element and an extremely thin slit is formed.

つまり、この発明は、リード[バイアス磁界補償の役割
全果させるものであり、余分な反磁界相殺手段等全必要
としない。tたこの発明は、リードの構造を設定する以
外は、従来通りに製造できるので、実現性も高くなるも
のである。
In other words, the present invention fully fulfills the role of lead bias magnetic field compensation, and does not require any extra demagnetizing field canceling means. This invention can be manufactured in the conventional manner except for setting the structure of the leads, so it is highly practical.

発明の実施例 第4図は、この発明の一実施例全説明する前提1・とじ
てその原理全示−fMRヘッドの概念図である。
Embodiment of the Invention FIG. 4 is a conceptual diagram of an fMR head, which fully explains the premise 1 and the principle of an embodiment of the present invention.

1ず20は、細い短形状に薄膜パターン形成したMR素
子で、その長子方向両端部21.22に強磁性体かつ導
電体のリードパターン23.2ai:夫々接続されてい
る。これらのリードパターン23と24とは対称形であ
って、それらの接続近傍部25゜26は、他部よりも著
しく幅全拡け、かつMRR子20と微小間隙δまで近接
対向させである。但し接続近傍部25,146同士は、
最小絶縁距離lたけ離隔されている。さてこのMRヘヘ
ラに、第1図に示L7Th従来の場合と同様なバイアス
磁界HB全印加すると、MRR子20.接続近傍部25
.26とによって囲まれるスリット空間sVi、対向間
隙δが著L〈小ざいので、バイアス磁界HBの作Jl]
により、第4図では、MR素素子2犬 性2’7,27,・・・・全、接続近傍部25.26表
面に一点m荷28.2B,・・・・・全夫々生じる。し
たがってスリット空間Sの一部である円A部を拡大して
示す第5図のように、スリット空間Sでは、反磁界Ha
全打消す方向に磁界Hcomが形成さ゛れる。よって、
従来の場合と対比して第3図と同様なMRR子20にお
ける実際のバイアス磁界HB#の分布全描かせると、第
6図に示す曲線29のようになり、平坦な分布特性が得
られるのである。
Reference numeral 1 20 denotes an MR element formed with a thin rectangular thin film pattern, and lead patterns 23.2ai of ferromagnetic and conductive material are connected to both ends 21.22 in the longitudinal direction of the MR element. These lead patterns 23 and 24 are symmetrical, and their connecting portions 25.degree. 26 are significantly wider than the other portions, and are closely opposed to the MRR element 20 with a minute gap δ. However, the connection vicinity parts 25 and 146 are
They are separated by a minimum insulation distance l. Now, when a full bias magnetic field HB similar to that of the conventional L7Th shown in FIG. 1 is applied to this MR heherer, the MRR element 20. Connection vicinity part 25
.. The slit space sVi surrounded by
As a result, in FIG. 4, a load 28.2B, . . . , is generated at one point on the surface of the two MR elements 2'7, 27, . . . , and the connection vicinity portion 25, 26, respectively. Therefore, as shown in FIG. 5, which is an enlarged view of the circle A which is a part of the slit space S, in the slit space S, the demagnetizing field Ha
A magnetic field Hcom is formed in the direction of total cancellation. Therefore,
If the entire distribution of the actual bias magnetic field HB# in the MRR element 20 similar to that shown in FIG. 3 is drawn in comparison with the conventional case, it will become like the curve 29 shown in FIG. 6, and a flat distribution characteristic will be obtained. be.

第7図は、上述の原理に基いた垂直型MRヘヘラの斜視
図である。ここで第4図に示したものと同一図番は、勿
論同一名称であり、さらに、30はガラスやサファイア
等の基板、31は強磁性体合金例えばパーマロイ全ヘッ
ド位置に対応させて付着させた第1i気シールド層、3
2は、絶縁性かフ非磁性の例えば5i02膜やj120
.1膜である。
FIG. 7 is a perspective view of a vertical MR heherer based on the above-described principle. Here, the same figure numbers as those shown in FIG. 4 are of course the same names, and 30 is a substrate made of glass or sapphire, and 31 is a ferromagnetic alloy such as permalloy, which are attached in correspondence with all head positions. 1st i shield layer, 3
2 is an insulating or non-magnetic film such as 5i02 film or j120 film.
.. 1 film.

それから33は磁気記録媒体としての磁気テープであり
,その磁気トラックTf,SiO□膜32上に形成され
ているMRR子20が対応している。
The reference numeral 33 designates a magnetic tape as a magnetic recording medium, and its magnetic track Tf corresponds to the MRR element 20 formed on the SiO□ film 32.

また、リードパターン23.24もS i O2膜32
上に形成され、その接続近傍部25%スリット空間Sが
図示されている。そして34は、図番32と同様な51
02膜又はA7I203@、35は、MRR子20バイ
アス磁界HB′に加えるための導体膜で、36、37は
そのバイアスリードである。さら(738.。
In addition, the lead patterns 23 and 24 are also made of the SiO2 film 32.
A 25% slit space S formed above and near the connection is shown. And 34 is 51 which is similar to figure number 32.
02 film or A7I203@, 35 is a conductor film for applying to the bias magnetic field HB' of the MRR element 20, and 36 and 37 are its bias leads. Sara (738.

は、導体膜35上[5i02膜やAg2O3膜の絶縁膜
39全介して設けた第2磁気シールド層である。
is a second magnetic shield layer provided on the conductive film 35 [through the entire insulating film 39 such as a 5i02 film or an Ag2O3 film.

このMRヘヘラは、MRR子20をFe2O−Ni20
合金薄膜とし、リードパターン23.24は、Fe−1
Ji合金厚膜表面にAu全被覆形成したものとし、MR
素子20リストライブ幅寸法W全数μm、スリット空間
Sの間隙寸法δf2μm以下に設計すると第6図に示し
たバイアス磁界特性曲線29が良好に平坦となり、磁気
テープ33の記録波長λが1μm程度でも従来よりも十
分大きな再生効率となる。
This MR Hehera uses MRR element 20 as Fe2O-Ni20.
The alloy thin film is used, and the lead patterns 23 and 24 are Fe-1
It is assumed that the surface of the thick film of the Ji alloy is completely coated with Au, and the MR
If the element 20 wrist drive width dimension W is designed to be less than 2 μm in total and the gap dimension δf in the slit space S is less than 2 μm, the bias magnetic field characteristic curve 29 shown in FIG. This results in a regeneration efficiency that is sufficiently greater than .

尚上記実施例は、いわゆる垂直型MRヘヘラについて説
明したが、この発明は、これに限定するものではなく、
例えば水平型MRヘヘラにも適用可能である。
In the above embodiment, a so-called vertical MR heherer was described, but the present invention is not limited to this.
For example, it is also applicable to a horizontal MR hehera.

発明の作用効果 この発明は、実施例の説明からも明らかな通り、MR素
子自身と、これに接続するリードとによって形成される
スリットにより反磁界全打消す作用があるので、極めて
短かい記録波長の信号磁界でも効率よく再生することで
きる効果がある。しかもこの発明よれば、その再生効率
は、従来の長い記録波長と同等若しくはそれ以」の再生
効率となり、その上、MRヘヘラ構造としては、蝮雑化
することもなく、従来通りの製造プロセスが適用できる
優れた長所がある。
Effects of the Invention As is clear from the description of the embodiments, this invention has the effect of completely canceling out the demagnetizing field by the slit formed by the MR element itself and the leads connected to it, so it is possible to record at an extremely short recording wavelength. It has the effect of being able to efficiently reproduce even a signal magnetic field of . Moreover, according to this invention, the reproduction efficiency is equal to or higher than that of conventional long recording wavelengths, and the MR hehera structure does not become complicated and can be manufactured using the conventional manufacturing process. It has great advantages that can be applied.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は、従来の磁気抵抗効果ヘッド2示す概念図、第
2図は、その一般的な特性を示すρ−H特性曲線図、第
3図は、その磁気抵抗効果素子Gτ及ぼすバイアス磁界
分布2示−f(進向線図、第4図〜第7図は、この発明
の一実施例に係り、第4図は、磁気抵抗効果素子の概念
2示す要部正面図、第5図は、その円A部全拡大した正
面図、第6図は、イのバイアス磁界分布2示す特性曲線
図、第7図I−1、その具体的構造2示す斜視図である
。 20・・・磁気抵抗効果素子、 21.22・・・両端部、 23、j4・・・リードパターン、 25.26・・拳接続近傍部、 S・・・スリット空間。
FIG. 1 is a conceptual diagram showing a conventional magnetoresistive head 2, FIG. 2 is a ρ-H characteristic curve diagram showing its general characteristics, and FIG. 3 is a bias magnetic field distribution exerted by the magnetoresistive element Gτ. 2-f (advance diagram, FIGS. 4 to 7 are related to one embodiment of the present invention, FIG. 4 is a front view of main parts showing the concept 2 of the magnetoresistive element, and FIG. 5 is a front view of main parts. , FIG. 6 is a characteristic curve diagram showing the bias magnetic field distribution 2 of A, and FIG. 7 I-1 is a perspective view showing its specific structure 2. 20...Magnetic Resistance effect element, 21.22...Both ends, 23, j4...Lead pattern, 25.26...Fist connection vicinity, S...Slit space.

Claims (1)

【特許請求の範囲】 磁気抵抗効果素子の両端に接続するリードの。 接続部近傍部の幅全拡げて、磁気抵抗効果素子に近接対
向させ、極めて細いスリ″ソト、形成させたこと全特徴
とする磁気抵抗効果ヘッド。
[Claims] A lead connected to both ends of a magnetoresistive element. This magnetoresistive head is characterized in that the width of the area near the connection part is fully expanded, and an extremely thin slit is formed so as to closely face the magnetoresistive element.
JP3392984A 1984-02-23 1984-02-23 Magneto-resistance effect head Granted JPS60177421A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP3392984A JPS60177421A (en) 1984-02-23 1984-02-23 Magneto-resistance effect head

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3392984A JPS60177421A (en) 1984-02-23 1984-02-23 Magneto-resistance effect head

Publications (2)

Publication Number Publication Date
JPS60177421A true JPS60177421A (en) 1985-09-11
JPH0441413B2 JPH0441413B2 (en) 1992-07-08

Family

ID=12400202

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3392984A Granted JPS60177421A (en) 1984-02-23 1984-02-23 Magneto-resistance effect head

Country Status (1)

Country Link
JP (1) JPS60177421A (en)

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5637823A (en) * 1979-09-03 1981-04-11 Mitsubishi Electric Corp Thin-film magnetic resistance head
JPS5727419A (en) * 1980-07-28 1982-02-13 Canon Inc Magnetic resistance effect type magnetic head and its production
JPS57208622A (en) * 1981-06-17 1982-12-21 Hitachi Ltd Magneto-resistance effect head

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5637823A (en) * 1979-09-03 1981-04-11 Mitsubishi Electric Corp Thin-film magnetic resistance head
JPS5727419A (en) * 1980-07-28 1982-02-13 Canon Inc Magnetic resistance effect type magnetic head and its production
JPS57208622A (en) * 1981-06-17 1982-12-21 Hitachi Ltd Magneto-resistance effect head

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Publication number Publication date
JPH0441413B2 (en) 1992-07-08

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