JPS6015650B2 - 光重合性組成物 - Google Patents

光重合性組成物

Info

Publication number
JPS6015650B2
JPS6015650B2 JP48137437A JP13743773A JPS6015650B2 JP S6015650 B2 JPS6015650 B2 JP S6015650B2 JP 48137437 A JP48137437 A JP 48137437A JP 13743773 A JP13743773 A JP 13743773A JP S6015650 B2 JPS6015650 B2 JP S6015650B2
Authority
JP
Japan
Prior art keywords
irradiated
alkyl
photochromic
irradiation
polymerization
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP48137437A
Other languages
English (en)
Japanese (ja)
Other versions
JPS49105601A (enExample
Inventor
ア−ウイン シユリシンガ− シエルドン
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Primerica Inc
Original Assignee
American Can Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by American Can Co filed Critical American Can Co
Publication of JPS49105601A publication Critical patent/JPS49105601A/ja
Publication of JPS6015650B2 publication Critical patent/JPS6015650B2/ja
Expired legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031Organic compounds not covered by group G03F7/029
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00Processes of polymerisation
    • C08F2/46Polymerisation initiated by wave energy or particle radiation
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/18Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
    • C08G59/68Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the catalysts used
    • C08G59/686Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the catalysts used containing nitrogen
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G63/00Macromolecular compounds obtained by reactions forming a carboxylic ester link in the main chain of the macromolecule
    • C08G63/78Preparation processes
    • C08G63/82Preparation processes characterised by the catalyst used
    • C08G63/823Preparation processes characterised by the catalyst used for the preparation of polylactones or polylactides
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G65/00Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule
    • C08G65/02Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from cyclic ethers by opening of the heterocyclic ring
    • C08G65/26Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from cyclic ethers by opening of the heterocyclic ring from cyclic ethers and other compounds
    • C08G65/2642Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from cyclic ethers by opening of the heterocyclic ring from cyclic ethers and other compounds characterised by the catalyst used
    • C08G65/2669Non-metals or compounds thereof
    • C08G65/2672Nitrogen or compounds thereof
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055Radiation sensitive composition or product or process of making
    • Y10S430/114Initiator containing
    • Y10S430/115Cationic or anionic

Landscapes

  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Epoxy Resins (AREA)
  • Polymerisation Methods In General (AREA)
  • Paints Or Removers (AREA)
JP48137437A 1973-02-09 1973-12-11 光重合性組成物 Expired JPS6015650B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US331179A US3895952A (en) 1973-02-09 1973-02-09 Phototropic compounds as acid catalyst for epoxy materials
US331179 1973-02-09

Publications (2)

Publication Number Publication Date
JPS49105601A JPS49105601A (enExample) 1974-10-07
JPS6015650B2 true JPS6015650B2 (ja) 1985-04-20

Family

ID=23292915

Family Applications (1)

Application Number Title Priority Date Filing Date
JP48137437A Expired JPS6015650B2 (ja) 1973-02-09 1973-12-11 光重合性組成物

Country Status (5)

Country Link
US (1) US3895952A (enExample)
JP (1) JPS6015650B2 (enExample)
AU (1) AU6185373A (enExample)
DE (1) DE2361141A1 (enExample)
FR (1) FR2217380A1 (enExample)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4035189A (en) * 1972-02-25 1977-07-12 Hitachi Chemical Company, Ltd. Image forming curable resin compositions
US4025348A (en) * 1974-05-10 1977-05-24 Hitachi Chemical Company, Ltd. Photosensitive resin compositions
US4198242A (en) * 1976-03-17 1980-04-15 E. I. Du Pont De Nemours And Company Photopolymerizable composition containing an o-nitroaromatic compound as photoinhibitor
DE2710417C3 (de) * 1976-03-17 1980-08-14 E.I. Du Pont De Nemours And Co., Wilmington, Del. (V.St.A.) Photopolymerisierbares Gemisch und Verfahren zur Erzeugung von positiven oder negativen Bildern
US4269933A (en) * 1978-06-08 1981-05-26 E. I. Du Pont De Nemours And Company Methods of developing photopolymerizable compositions containing an 0-nitroaromatic compound as photoinhibitor
US4245029A (en) * 1979-08-20 1981-01-13 General Electric Company Photocurable compositions using triarylsulfonium salts
US4477556A (en) * 1982-08-18 1984-10-16 E. I. Du Pont De Nemours And Company Acidic o-nitroaromatics as photoinhibitors of polymerization in positive working films
DE3231145A1 (de) * 1982-08-21 1984-02-23 Basf Ag, 6700 Ludwigshafen Negativ arbeitendes verfahren zur herstellung von reliefbildern oder resistmustern
AT515711B1 (de) * 2014-04-23 2019-10-15 Polymer Competence Center Leoben Gmbh Verfahren zur Herstellung eines epoxidbasierten Duromers und damit hergestelltes Duromer
EP3911197A4 (en) * 2019-01-14 2022-03-09 Glisten LLC MOLECULAR COATINGS AND PROCESSES FOR THEIR PRODUCTION AND USE

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3450613A (en) * 1964-03-09 1969-06-17 Bausch & Lomb Epoxy adhesive containing acrylic acid-epoxy reaction products and photosensitizers
US3386829A (en) * 1965-03-15 1968-06-04 Eastman Kodak Co Photoreproduction process utilizing photosensitive thianthrene compositions
US3649549A (en) * 1967-10-19 1972-03-14 Hughes Aircraft Co Structures for photochromic compounds
US3708296A (en) * 1968-08-20 1973-01-02 American Can Co Photopolymerization of epoxy monomers
US3721617A (en) * 1971-05-18 1973-03-20 American Can Co Photopolymerizable epoxy systems containing cyclic amide gelation inhibitors
US3711390A (en) * 1971-05-18 1973-01-16 J Feinberg Photopolymerizable epoxy systems containing substituted cyclic amides or substituted ureas as gelation inhibitors
US3711391A (en) * 1971-05-18 1973-01-16 American Can Co Photopolymerizable epoxy systems containing sulfoxide gelation inhibitors

Also Published As

Publication number Publication date
US3895952A (en) 1975-07-22
DE2361141A1 (de) 1974-08-15
JPS49105601A (enExample) 1974-10-07
FR2217380A1 (enExample) 1974-09-06
AU6185373A (en) 1975-05-01

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