JPS49105601A - - Google Patents

Info

Publication number
JPS49105601A
JPS49105601A JP48137437A JP13743773A JPS49105601A JP S49105601 A JPS49105601 A JP S49105601A JP 48137437 A JP48137437 A JP 48137437A JP 13743773 A JP13743773 A JP 13743773A JP S49105601 A JPS49105601 A JP S49105601A
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP48137437A
Other languages
Japanese (ja)
Other versions
JPS6015650B2 (ja
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPS49105601A publication Critical patent/JPS49105601A/ja
Publication of JPS6015650B2 publication Critical patent/JPS6015650B2/ja
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
    • C08G59/68—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the catalysts used
    • C08G59/686—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the catalysts used containing nitrogen
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G63/00—Macromolecular compounds obtained by reactions forming a carboxylic ester link in the main chain of the macromolecule
    • C08G63/78—Preparation processes
    • C08G63/82—Preparation processes characterised by the catalyst used
    • C08G63/823—Preparation processes characterised by the catalyst used for the preparation of polylactones or polylactides
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G65/00—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule
    • C08G65/02—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from cyclic ethers by opening of the heterocyclic ring
    • C08G65/26—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from cyclic ethers by opening of the heterocyclic ring from cyclic ethers and other compounds
    • C08G65/2642—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from cyclic ethers by opening of the heterocyclic ring from cyclic ethers and other compounds characterised by the catalyst used
    • C08G65/2669—Non-metals or compounds thereof
    • C08G65/2672—Nitrogen or compounds thereof
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/115—Cationic or anionic

Landscapes

  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Epoxy Resins (AREA)
  • Polymerisation Methods In General (AREA)
  • Paints Or Removers (AREA)
JP48137437A 1973-02-09 1973-12-11 光重合性組成物 Expired JPS6015650B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US331179A US3895952A (en) 1973-02-09 1973-02-09 Phototropic compounds as acid catalyst for epoxy materials
US331179 1973-02-09

Publications (2)

Publication Number Publication Date
JPS49105601A true JPS49105601A (enExample) 1974-10-07
JPS6015650B2 JPS6015650B2 (ja) 1985-04-20

Family

ID=23292915

Family Applications (1)

Application Number Title Priority Date Filing Date
JP48137437A Expired JPS6015650B2 (ja) 1973-02-09 1973-12-11 光重合性組成物

Country Status (5)

Country Link
US (1) US3895952A (enExample)
JP (1) JPS6015650B2 (enExample)
AU (1) AU6185373A (enExample)
DE (1) DE2361141A1 (enExample)
FR (1) FR2217380A1 (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS52111985A (en) * 1976-03-17 1977-09-20 Du Pont Photopolymerizable composition containing photosensitive inhibitor composed of oonitro aromatic compound

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4035189A (en) * 1972-02-25 1977-07-12 Hitachi Chemical Company, Ltd. Image forming curable resin compositions
US4025348A (en) * 1974-05-10 1977-05-24 Hitachi Chemical Company, Ltd. Photosensitive resin compositions
US4198242A (en) * 1976-03-17 1980-04-15 E. I. Du Pont De Nemours And Company Photopolymerizable composition containing an o-nitroaromatic compound as photoinhibitor
US4269933A (en) * 1978-06-08 1981-05-26 E. I. Du Pont De Nemours And Company Methods of developing photopolymerizable compositions containing an 0-nitroaromatic compound as photoinhibitor
US4245029A (en) * 1979-08-20 1981-01-13 General Electric Company Photocurable compositions using triarylsulfonium salts
US4477556A (en) * 1982-08-18 1984-10-16 E. I. Du Pont De Nemours And Company Acidic o-nitroaromatics as photoinhibitors of polymerization in positive working films
DE3231145A1 (de) * 1982-08-21 1984-02-23 Basf Ag, 6700 Ludwigshafen Negativ arbeitendes verfahren zur herstellung von reliefbildern oder resistmustern
AT515711B1 (de) * 2014-04-23 2019-10-15 Polymer Competence Center Leoben Gmbh Verfahren zur Herstellung eines epoxidbasierten Duromers und damit hergestelltes Duromer
EP3911197A4 (en) * 2019-01-14 2022-03-09 Glisten LLC MOLECULAR COATINGS AND PROCESSES FOR THEIR PRODUCTION AND USE

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3450613A (en) * 1964-03-09 1969-06-17 Bausch & Lomb Epoxy adhesive containing acrylic acid-epoxy reaction products and photosensitizers
US3386829A (en) * 1965-03-15 1968-06-04 Eastman Kodak Co Photoreproduction process utilizing photosensitive thianthrene compositions
US3649549A (en) * 1967-10-19 1972-03-14 Hughes Aircraft Co Structures for photochromic compounds
US3708296A (en) * 1968-08-20 1973-01-02 American Can Co Photopolymerization of epoxy monomers
US3721617A (en) * 1971-05-18 1973-03-20 American Can Co Photopolymerizable epoxy systems containing cyclic amide gelation inhibitors
US3711390A (en) * 1971-05-18 1973-01-16 J Feinberg Photopolymerizable epoxy systems containing substituted cyclic amides or substituted ureas as gelation inhibitors
US3711391A (en) * 1971-05-18 1973-01-16 American Can Co Photopolymerizable epoxy systems containing sulfoxide gelation inhibitors

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS52111985A (en) * 1976-03-17 1977-09-20 Du Pont Photopolymerizable composition containing photosensitive inhibitor composed of oonitro aromatic compound

Also Published As

Publication number Publication date
JPS6015650B2 (ja) 1985-04-20
US3895952A (en) 1975-07-22
DE2361141A1 (de) 1974-08-15
FR2217380A1 (enExample) 1974-09-06
AU6185373A (en) 1975-05-01

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