JPS60148041A - イオンマイクロアナライザ - Google Patents

イオンマイクロアナライザ

Info

Publication number
JPS60148041A
JPS60148041A JP59003021A JP302184A JPS60148041A JP S60148041 A JPS60148041 A JP S60148041A JP 59003021 A JP59003021 A JP 59003021A JP 302184 A JP302184 A JP 302184A JP S60148041 A JPS60148041 A JP S60148041A
Authority
JP
Japan
Prior art keywords
sweep
ion
depth direction
concentration
area
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP59003021A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0326499B2 (enrdf_load_stackoverflow
Inventor
Yoshiaki Kato
義昭 加藤
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP59003021A priority Critical patent/JPS60148041A/ja
Publication of JPS60148041A publication Critical patent/JPS60148041A/ja
Publication of JPH0326499B2 publication Critical patent/JPH0326499B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
    • G01N23/22—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material
    • G01N23/225—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material using electron or ion
    • G01N23/2255—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material using electron or ion using incident ion beams, e.g. proton beams
    • G01N23/2258—Measuring secondary ion emission, e.g. secondary ion mass spectrometry [SIMS]

Landscapes

  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Molecular Biology (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
JP59003021A 1984-01-11 1984-01-11 イオンマイクロアナライザ Granted JPS60148041A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP59003021A JPS60148041A (ja) 1984-01-11 1984-01-11 イオンマイクロアナライザ

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59003021A JPS60148041A (ja) 1984-01-11 1984-01-11 イオンマイクロアナライザ

Publications (2)

Publication Number Publication Date
JPS60148041A true JPS60148041A (ja) 1985-08-05
JPH0326499B2 JPH0326499B2 (enrdf_load_stackoverflow) 1991-04-11

Family

ID=11545669

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59003021A Granted JPS60148041A (ja) 1984-01-11 1984-01-11 イオンマイクロアナライザ

Country Status (1)

Country Link
JP (1) JPS60148041A (enrdf_load_stackoverflow)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2015227779A (ja) * 2014-05-30 2015-12-17 富士通株式会社 二次イオン質量分析装置の制御方法及び制御プログラム、二次イオン質量分析装置

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2015227779A (ja) * 2014-05-30 2015-12-17 富士通株式会社 二次イオン質量分析装置の制御方法及び制御プログラム、二次イオン質量分析装置

Also Published As

Publication number Publication date
JPH0326499B2 (enrdf_load_stackoverflow) 1991-04-11

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