JPS60135809A - 欠陥検査装置 - Google Patents
欠陥検査装置Info
- Publication number
- JPS60135809A JPS60135809A JP24428983A JP24428983A JPS60135809A JP S60135809 A JPS60135809 A JP S60135809A JP 24428983 A JP24428983 A JP 24428983A JP 24428983 A JP24428983 A JP 24428983A JP S60135809 A JPS60135809 A JP S60135809A
- Authority
- JP
- Japan
- Prior art keywords
- regular pattern
- objective lens
- spatial frequency
- frequency filter
- lens
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
- G01N21/956—Inspecting patterns on the surface of objects
- G01N21/95623—Inspecting patterns on the surface of objects using a spatial filtering method
Landscapes
- Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Biochemistry (AREA)
- General Health & Medical Sciences (AREA)
- General Physics & Mathematics (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Length Measuring Devices By Optical Means (AREA)
- Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP24428983A JPS60135809A (ja) | 1983-12-26 | 1983-12-26 | 欠陥検査装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP24428983A JPS60135809A (ja) | 1983-12-26 | 1983-12-26 | 欠陥検査装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS60135809A true JPS60135809A (ja) | 1985-07-19 |
| JPH041849B2 JPH041849B2 (cs) | 1992-01-14 |
Family
ID=17116522
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP24428983A Granted JPS60135809A (ja) | 1983-12-26 | 1983-12-26 | 欠陥検査装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS60135809A (cs) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0293312A (ja) * | 1988-09-29 | 1990-04-04 | Dainippon Printing Co Ltd | 欠陥検査装置 |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5034552A (cs) * | 1973-07-28 | 1975-04-02 | ||
| JPS5146144A (cs) * | 1974-10-18 | 1976-04-20 | Victor Company Of Japan | |
| JPS51113596A (en) * | 1975-03-31 | 1976-10-06 | Hitachi Ltd | Lasar-processing apparatus |
| JPS54134605A (en) * | 1978-04-12 | 1979-10-19 | Olympus Optical Co Ltd | Method and appartus of controlling focus |
-
1983
- 1983-12-26 JP JP24428983A patent/JPS60135809A/ja active Granted
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5034552A (cs) * | 1973-07-28 | 1975-04-02 | ||
| JPS5146144A (cs) * | 1974-10-18 | 1976-04-20 | Victor Company Of Japan | |
| JPS51113596A (en) * | 1975-03-31 | 1976-10-06 | Hitachi Ltd | Lasar-processing apparatus |
| JPS54134605A (en) * | 1978-04-12 | 1979-10-19 | Olympus Optical Co Ltd | Method and appartus of controlling focus |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0293312A (ja) * | 1988-09-29 | 1990-04-04 | Dainippon Printing Co Ltd | 欠陥検査装置 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH041849B2 (cs) | 1992-01-14 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP3258385B2 (ja) | 光学式基板検査装置 | |
| JP4988224B2 (ja) | 欠陥検査方法及びその装置 | |
| JP2796316B2 (ja) | 欠陥または異物の検査方法およびその装置 | |
| US3658420A (en) | Photomask inspection by spatial filtering | |
| US5177559A (en) | Dark field imaging defect inspection system for repetitive pattern integrated circuits | |
| JP5303217B2 (ja) | 欠陥検査方法及び欠陥検査装置 | |
| JP4224863B2 (ja) | 検査装置及び検査方法、並びにパターン基板の製造方法 | |
| US7911599B2 (en) | Reticle defect inspection apparatus and reticle defect inspection method | |
| US5659390A (en) | Method and apparatus for detecting particles on a surface of a semiconductor wafer having repetitive patterns | |
| KR101216803B1 (ko) | 패턴 검사 방법, 패턴 검사 장치, 포토마스크 제조 방법, 및 패턴 전사 방법 | |
| JP2007248086A (ja) | 欠陥検査装置 | |
| JP2006250739A (ja) | 異物欠陥検査方法及びその装置 | |
| JPH0875661A (ja) | 欠陥検出装置 | |
| JP5276833B2 (ja) | 欠陥検査方法及び欠陥検査装置 | |
| JP3105702B2 (ja) | 光学式欠陥検査装置 | |
| JP2003282675A (ja) | ウエハマッピング装置 | |
| JPH0536726B2 (cs) | ||
| JPH06160062A (ja) | 欠陥検査装置 | |
| JPS60135809A (ja) | 欠陥検査装置 | |
| JP4518704B2 (ja) | 位相シフトマスク検査装置及び位相シフトマスク検査方法 | |
| US7457454B1 (en) | Detailed grey scale inspection method and apparatus | |
| JPH0340802B2 (cs) | ||
| JP2000180373A (ja) | 欠陥検査方法及び欠陥検査装置 | |
| JPH03154854A (ja) | 細線の微細欠陥検出装置 | |
| JPH0351747A (ja) | パターン検査装置 |