JPS60133451A - ホトマスクのパタ−ン位置の検査方式 - Google Patents
ホトマスクのパタ−ン位置の検査方式Info
- Publication number
- JPS60133451A JPS60133451A JP58241311A JP24131183A JPS60133451A JP S60133451 A JPS60133451 A JP S60133451A JP 58241311 A JP58241311 A JP 58241311A JP 24131183 A JP24131183 A JP 24131183A JP S60133451 A JPS60133451 A JP S60133451A
- Authority
- JP
- Japan
- Prior art keywords
- distance
- work
- film
- pattern
- patterns
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
- G03F1/82—Auxiliary processes, e.g. cleaning or inspecting
- G03F1/84—Inspecting
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP58241311A JPS60133451A (ja) | 1983-12-21 | 1983-12-21 | ホトマスクのパタ−ン位置の検査方式 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP58241311A JPS60133451A (ja) | 1983-12-21 | 1983-12-21 | ホトマスクのパタ−ン位置の検査方式 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS60133451A true JPS60133451A (ja) | 1985-07-16 |
| JPS6260698B2 JPS6260698B2 (cs) | 1987-12-17 |
Family
ID=17072398
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP58241311A Granted JPS60133451A (ja) | 1983-12-21 | 1983-12-21 | ホトマスクのパタ−ン位置の検査方式 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS60133451A (cs) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH03145646A (ja) * | 1989-11-01 | 1991-06-20 | Matsushita Electric Ind Co Ltd | パターン検査方法 |
-
1983
- 1983-12-21 JP JP58241311A patent/JPS60133451A/ja active Granted
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH03145646A (ja) * | 1989-11-01 | 1991-06-20 | Matsushita Electric Ind Co Ltd | パターン検査方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6260698B2 (cs) | 1987-12-17 |
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