JPS6013065A - 固体表面の撥水性処理方法 - Google Patents

固体表面の撥水性処理方法

Info

Publication number
JPS6013065A
JPS6013065A JP11985283A JP11985283A JPS6013065A JP S6013065 A JPS6013065 A JP S6013065A JP 11985283 A JP11985283 A JP 11985283A JP 11985283 A JP11985283 A JP 11985283A JP S6013065 A JPS6013065 A JP S6013065A
Authority
JP
Japan
Prior art keywords
water
repellent
plasma
treatment
treated
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP11985283A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0320465B2 (enExample
Inventor
Hiroyuki Tanigami
谷上　広幸
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Stanley Electric Co Ltd
Original Assignee
Stanley Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Stanley Electric Co Ltd filed Critical Stanley Electric Co Ltd
Priority to JP11985283A priority Critical patent/JPS6013065A/ja
Publication of JPS6013065A publication Critical patent/JPS6013065A/ja
Publication of JPH0320465B2 publication Critical patent/JPH0320465B2/ja
Granted legal-status Critical Current

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D1/00—Processes for applying liquids or other fluent materials
    • B05D1/62—Plasma-deposition of organic layers
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D2506/00—Halogenated polymers
    • B05D2506/10—Fluorinated polymers
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D5/00—Processes for applying liquids or other fluent materials to surfaces to obtain special surface effects, finishes or structures
    • B05D5/08—Processes for applying liquids or other fluent materials to surfaces to obtain special surface effects, finishes or structures to obtain an anti-friction or anti-adhesive surface

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Treatments Of Macromolecular Shaped Articles (AREA)
  • Surface Treatment Of Glass (AREA)
  • Polymerisation Methods In General (AREA)
  • Physical Vapour Deposition (AREA)
  • ing And Chemical Polishing (AREA)
JP11985283A 1983-07-01 1983-07-01 固体表面の撥水性処理方法 Granted JPS6013065A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP11985283A JPS6013065A (ja) 1983-07-01 1983-07-01 固体表面の撥水性処理方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11985283A JPS6013065A (ja) 1983-07-01 1983-07-01 固体表面の撥水性処理方法

Publications (2)

Publication Number Publication Date
JPS6013065A true JPS6013065A (ja) 1985-01-23
JPH0320465B2 JPH0320465B2 (enExample) 1991-03-19

Family

ID=14771861

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11985283A Granted JPS6013065A (ja) 1983-07-01 1983-07-01 固体表面の撥水性処理方法

Country Status (1)

Country Link
JP (1) JPS6013065A (enExample)

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61289354A (ja) * 1985-06-18 1986-12-19 Oki Electric Ind Co Ltd 電子写真感光体の製造方法
JPS62138529A (ja) * 1985-12-10 1987-06-22 Mitsubishi Electric Corp 有機シリコ−ン薄膜の形成方法
EP0593988A1 (de) * 1992-10-20 1994-04-27 Bayer Ag Verfahren zur Hydrophilisierung von Festkörper-Oberflächen
US5733610A (en) * 1988-06-06 1998-03-31 Research Development Corporation Of Japan Atmospheric pressure plasma reaction method of forming a hydrophobic film
JPH10251857A (ja) * 1997-03-12 1998-09-22 Ulvac Japan Ltd 撥水性窓材とその製造方法
GB2326165B (en) * 1996-02-21 2000-08-09 Commw Scient Ind Res Org Method for reducing crazing in a plastics material
SG81989A1 (en) * 1999-05-19 2001-07-24 Tokyo Electron Ltd Plasma treatment method
WO2006037989A1 (en) * 2004-10-04 2006-04-13 C-Tech Innovation Limited Method of production of fluorinated carbon nanostructures
US7291281B2 (en) 2000-05-22 2007-11-06 Seiko Epson Corporation Head member, method for ink-repellent treatment and apparatus for the same

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH10101829A (ja) * 1996-10-01 1998-04-21 Matsushita Electric Ind Co Ltd プラスチック基材およびその製造方法、並びにインクジェットプリンタ用ヘッドおよびその製造方法

Cited By (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61289354A (ja) * 1985-06-18 1986-12-19 Oki Electric Ind Co Ltd 電子写真感光体の製造方法
JPS62138529A (ja) * 1985-12-10 1987-06-22 Mitsubishi Electric Corp 有機シリコ−ン薄膜の形成方法
US5733610A (en) * 1988-06-06 1998-03-31 Research Development Corporation Of Japan Atmospheric pressure plasma reaction method of forming a hydrophobic film
EP0593988A1 (de) * 1992-10-20 1994-04-27 Bayer Ag Verfahren zur Hydrophilisierung von Festkörper-Oberflächen
GB2326165B (en) * 1996-02-21 2000-08-09 Commw Scient Ind Res Org Method for reducing crazing in a plastics material
JPH10251857A (ja) * 1997-03-12 1998-09-22 Ulvac Japan Ltd 撥水性窓材とその製造方法
SG81989A1 (en) * 1999-05-19 2001-07-24 Tokyo Electron Ltd Plasma treatment method
US7291281B2 (en) 2000-05-22 2007-11-06 Seiko Epson Corporation Head member, method for ink-repellent treatment and apparatus for the same
US7344221B2 (en) 2000-05-22 2008-03-18 Seiko Epson Corporation Head member, method for ink-repellent treatment and apparatus for the same
WO2006037989A1 (en) * 2004-10-04 2006-04-13 C-Tech Innovation Limited Method of production of fluorinated carbon nanostructures
US7700192B2 (en) 2004-10-04 2010-04-20 C-Tech Innovation Limited Fluorinated carbon nanostructures of CFx where 0.05<x<0.30
US7939141B2 (en) 2004-10-04 2011-05-10 C-Tech Innovation Limited Method of production of fluorinated carbon nanostructures

Also Published As

Publication number Publication date
JPH0320465B2 (enExample) 1991-03-19

Similar Documents

Publication Publication Date Title
KR101083148B1 (ko) 플라즈마 에칭 방법 및 플라즈마 에칭 장치 및 기억매체
JP5686999B2 (ja) 改良されたチャンバ洗浄方法及び装置
JPS6013065A (ja) 固体表面の撥水性処理方法
KR102528430B1 (ko) 피처리체를 처리하는 방법
JP2005314137A (ja) 圧電性酸化物単結晶の帯電抑制処理方法、および帯電抑制処理装置
EP0298204A2 (en) Plasma etching with a large molecular mass inert gas
JPS6392658A (ja) 高分子表面改質のための空気酸素溶存下におけるラジカル重合法
JPS5813625B2 (ja) ガスプラズマ食刻法
JP2020512479A (ja) 優れた安定性及び耐久性を有する親水性の多機能性超薄コーティング
CN106277814A (zh) 一种熔石英光学元件表面的处理方法
KR100232664B1 (ko) 반도체장치의 제조방법 및 반도체 제조장치
US10541144B2 (en) Self-assembled monolayers as an etchant in atomic layer etching
US4536415A (en) Method of manufacturing an optically readable information disc
JPH0415179B2 (enExample)
CN109841499A (zh) 非晶硅膜的形成方法
JPH08188658A (ja) 基材の表面処理方法
CN110364441A (zh) 用于铌酸锂材料的刻蚀方法
JPH04309532A (ja) テフロン治具の表面処理方法
JPH08188663A (ja) 基材の表面処理方法
CN116444167B (zh) 一种提升熔石英元件抗紫外激光诱导损伤性能的刻蚀方法
CN114645281B (zh) 一种褪除金属工件表面碳膜的方法
JPH0521009B2 (enExample)
Wang et al. Self-Limited Etching of Silicon Nitride Using Cyclic Process with CH2F2 Chemistry
JPS6151036B2 (enExample)
JPH1112375A (ja) 防汚性薄膜の形成方法